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1.发明授权Neutral layer polymer composition for directed self assembly and processes thereof 有权用于定向自组装的中性层聚合物组合物及其工艺公开(公告)号：US08835581B2
公开(公告)日：2014-09-16
申请号：US13492125
申请日：2012-06-08
申请人： Hengpeng Wu , Orest Polishchuk , Yi Cao , SungEun Hong , Jian Yin , Guanyang Lin , Margareta Paunescu , Mark Neisser
发明人： Hengpeng Wu , Orest Polishchuk , Yi Cao , SungEun Hong , Jian Yin , Guanyang Lin , Margareta Paunescu , Mark Neisser
IPC分类号： C08F4/04 , C07C245/04
CPC分类号： C08F4/04 , C07C245/04 , C08F8/12 , C08F212/08 , C08F2800/20 , C08F2810/40 , G03F7/0002 , C08F220/14
摘要： The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein R1 represents a C1-C20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Rd is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.
摘要翻译： 本发明涉及包含具有两个或多个重复单元的新型聚合物和具有结构（1）的末端的新型聚合物组合物：其中R1表示C1-C20取代或未取代的烷基，w为1-8 ，X是氧（O）或氮（N），Rd是反应性基团。 本发明还涉及使用新型聚合物组合物形成图案的方法。 本发明还涉及制备该新型聚合物的方法。
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公开(公告)号：US20100248137A1
公开(公告)日：2010-09-30
申请号：US12797949
申请日：2010-06-10
申请人： David Abdallah , Francis Houlihan , Mark Neisser
发明人： David Abdallah , Francis Houlihan , Mark Neisser
CPC分类号： C08L81/06 , C08G75/20 , C09D165/00 , C09D181/06 , Y10S438/952
摘要： The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.
摘要翻译： 本发明公开了新型底部抗反射涂层组合物，其中来自组合物的涂层具有可通过蚀刻板温度调节的蚀刻速率。
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公开(公告)号：US20060228645A1
公开(公告)日：2006-10-12
申请号：US11103134
申请日：2005-04-11
申请人： Chunwei Chen , Ping-Hung Lu , Hong Zhuang , Mark Neisser
发明人： Chunwei Chen , Ping-Hung Lu , Hong Zhuang , Mark Neisser
IPC分类号： G03C1/00
CPC分类号： G03F7/0047 , G03F7/027 , G03F7/0382 , Y10S430/106
摘要： The present invention relates to a photoresist composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than 5 microns. The negative photoresist composition is selected from (1) a composition comprising (i) a resin binder, (ii) a photoacid generator, and (iii) a cross-linking agent; or (2) a composition comprising (i) a resin binder, (ii) optionally, addition-polymerizeable, ethylenically unsaturated compound(s) and (iii) a photoinitiator; or (3) a composition comprising (i) a photopolymerizable compound containing at least two pendant unsaturated groups; (ii) ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic compound(s); and (iii) a photoinitiator
摘要翻译： 本发明涉及一种光刻胶组合物，其适用于作为负性光致抗蚀剂的成像曝光和显影，其包含负性光致抗蚀剂组合物和平均粒度等于或大于10纳米的无机颗粒材料，其中光致抗蚀剂涂膜的厚度 大于5微米。 负光致抗蚀剂组合物选自（1）包含（i）树脂粘合剂，（ii）光致酸产生剂和（iii）交联剂）的组合物; 或（2）组合物，其包含（i）树脂粘合剂，（ii）任选的可加成聚合的烯属不饱和化合物和（iii）光引发剂; 或（3）包含（i）含有至少两个侧链不饱和基团的光聚合化合物的组合物; （ii）烯属不饱和光聚合聚环氧烷亲水化合物; 和（iii）光引发剂
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公开(公告)号：US20050214674A1
公开(公告)日：2005-09-29
申请号：US10808884
申请日：2004-03-25
申请人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark Neisser , Tomohide Katayama , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
发明人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark Neisser , Tomohide Katayama , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译： 本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。 本发明还涉及使用这种组合物的方法。
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公开(公告)号：US20130233827A1
公开(公告)日：2013-09-12
申请号：US13416669
申请日：2012-03-09
申请人： Jian YIN , Hengpeng WU , Muthiah THIYAGARAJAN , SungEun HONG , Mark NEISSER , Yi CAO
发明人： Jian YIN , Hengpeng WU , Muthiah THIYAGARAJAN , SungEun HONG , Mark NEISSER , Yi CAO
CPC分类号： B05D5/00 , B01D15/361 , B01J39/05 , B01J41/07 , B01J45/00 , B05D1/005 , B05D3/00 , C08F6/02 , C08J3/00 , C08L53/00
摘要： The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.
摘要翻译： 本发明涉及一种处理嵌段共聚物溶液的方法，其中该方法包括：在非水溶剂中提供包含嵌段共聚物的溶液; 并使用离子交换树脂处理该溶液以除去金属。 本发明还涉及使用经处理的嵌段共聚物形成图案的方法。
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公开(公告)号：US20120328990A1
公开(公告)日：2012-12-27
申请号：US13164869
申请日：2011-06-21
申请人： Huirong YAO , Guanyang LIN , Zachary BOGUSZ , PingHung LU , WooKyu KIM , Mark NEISSER
发明人： Huirong YAO , Guanyang LIN , Zachary BOGUSZ , PingHung LU , WooKyu KIM , Mark NEISSER
CPC分类号： C08K5/0091 , G03F7/091 , G03F7/094 , C08L33/16 , C08L101/06
摘要： The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.
摘要翻译： 本发明涉及包含聚合物，有机钛酸盐化合物和任选的热酸发生剂的底层组合物，其中聚合物包含至少一个氟代醇基团和至少一个环氧基团。 本发明还涉及使用该底层材料作为抗反射涂料组合物和/或用于图案转印的硬掩模的方法。
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公开(公告)号：US08211621B2
公开(公告)日：2012-07-03
申请号：US12797949
申请日：2010-06-10
申请人： David Abdallah , Francis Houlihan , Mark Neisser
发明人： David Abdallah , Francis Houlihan , Mark Neisser
CPC分类号： C08L81/06 , C08G75/20 , C09D165/00 , C09D181/06 , Y10S438/952
摘要： The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.
摘要翻译： 本发明公开了新型底部抗反射涂层组合物，其中来自组合物的涂层具有可通过蚀刻板温度调节的蚀刻速率。
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公开(公告)号：US20110300488A1
公开(公告)日：2011-12-08
申请号：US12792994
申请日：2010-06-03
申请人： Huirong Yao , Jain Yin , Guanyang Lin , Mark Neisser , David Abdallah
发明人： Huirong Yao , Jain Yin , Guanyang Lin , Mark Neisser , David Abdallah
CPC分类号： G03F7/091 , G02B1/04 , G02B1/111 , G03F7/0046 , C08L33/16 , C08L33/24 , C08L33/066 , C08L61/20 , C08L79/08
摘要： The invention related to an antireflective coating comprising a mixture of a first polymer and a second polymer, and a thermal acid generator, where the first polymer comprises at least one fluoroalcohol moiety, at least one aliphatic hydroxyl moiety, and at least one acid moiety other than fluoroalcohol with a pKa in the range of about 8 to about 11; where the second polymer is a reaction product of an aminoplast compound with a compound comprising at least one hydroxyl and/or at least one acid group. The invention further relates to a process for using the novel composition to form an image.
摘要翻译： 本发明涉及包含第一聚合物和第二聚合物和热酸产生剂的混合物的抗反射涂层，其中第一聚合物包含至少一个氟代醇部分，至少一个脂族羟基部分和至少一个酸部分其它 而pKa在约8至约11的范围内的氟代醇; 其中第二聚合物是氨基塑料化合物与包含至少一个羟基和/或至少一个酸基团的化合物的反应产物。 本发明还涉及使用该组合物形成图像的方法。
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公开(公告)号：US07666575B2
公开(公告)日：2010-02-23
申请号：US11550459
申请日：2006-10-18
申请人： Woo-Kyu Kim , Hengpeng Wu , David Abdallah , Mark Neisser , PingHung Lu , Ruzhi Zhang , M. Dalil Rahman
发明人： Woo-Kyu Kim , Hengpeng Wu , David Abdallah , Mark Neisser , PingHung Lu , Ruzhi Zhang , M. Dalil Rahman
CPC分类号： G03F7/091 , Y10S438/952
摘要： The present invention relates to an antireflective coating composition comprising, (i) a thermal acid generator; (ii) a crosslinkable polymer comprising at least one aromatic group; and, (iii) a polymeric crosslinker comprising at least one unit of structure (6), where R11 to R13 is independently selected from H, (C1-C6) alkyl and aromatic group, R14 and R15 are independently (C1-C10) alkyl. The invention also relates to a process for imaging the antireflective coating composition of the present invention.
摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含：（i）热酸发生剂; （ii）包含至少一个芳族基团的可交联聚合物; 和（iii）包含至少一个结构单元（6）的聚合物交联剂，其中R 11至R 13独立地选自H，（C 1 -C 6）烷基和芳族基团，R 14和R 15独立地为（C 1 -C 10）烷基 。 本发明还涉及一种用于对本发明的抗反射涂料组合物进行成像的方法。
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公开(公告)号：US20080096125A1
公开(公告)日：2008-04-24
申请号：US11550459
申请日：2006-10-18
申请人： Woo-Kyu Kim , Hengpeng Wu , David Abdallah , Mark Neisser , PingHung Lu , Ruzhi Zhang , M. Dalil Rahman
发明人： Woo-Kyu Kim , Hengpeng Wu , David Abdallah , Mark Neisser , PingHung Lu , Ruzhi Zhang , M. Dalil Rahman
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , Y10S438/952
摘要： The present invention relates to an antireflective coating composition comprising, (i) a thermal acid generator; (ii) a crosslinkable polymer comprising at least one aromatic group; and, (iii) a polymeric crosslinker comprising at least one unit of structure (6), where R11 to R13 is independently selected from H, (C1-C6) alkyl and aromatic group, R14 and R15 are independently (C1-C10) alkyl. The invention also relates to a process for imaging the antireflective coating composition of the present invention.
摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含：（i）热酸发生剂; （ii）包含至少一个芳族基团的可交联聚合物; 和（iii）包含结构（6）的至少一个单元的聚合物交联剂，其中R 11至R 13独立地选自H，（C 1 -C 6） C 1 -C 6烷基和芳基，R 14和R 15独立地是（C 1 -C 6）烷基和芳基， C 1 -C 10烷基。 本发明还涉及一种用于对本发明的抗反射涂料组合物进行成像的方法。
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