Electron beam apparatus
    5.
    发明授权
    Electron beam apparatus 有权
    电子束装置

    公开(公告)号:US06949745B2

    公开(公告)日:2005-09-27

    申请号:US10438145

    申请日:2003-05-14

    申请人: Akira Yonezawa

    发明人: Akira Yonezawa

    摘要: An electron beam apparatus has an optical axis, an electron beam source for generating an electron beam directed along the optical axis, and a magnetic field lens having an axis coincident with the optical axis for focusing the electron beam onto a sample which is subjected to a negative voltage so that secondary electrons are emitted from the sample. The magnetic field lens has a conductive cylinder surrounding a part of the optical axis to permit the passage therethrough of an electron beam from the electron beam source. A first detector detects secondary electrons emitted by the sample in a direction away from the optical axis and is disposed at a position generally confronting the conductive cylinder. A second detector is disposed over the conductive cylinder. A Wien filter deflector deflects secondary electrons emitted by the sample toward and for detection by the second detector. The Wien filter deflector is disposed on the optical axis and between the conductive cylinder and the second detector.

    摘要翻译: 电子束装置具有光轴,用于产生沿着光轴定向的电子束的电子束源和具有与光轴重合的轴的磁场透镜,用于将电子束聚焦到经受 负电压使得二次电子从样品发射。 磁场透镜具有围绕光轴的一部分的导电圆柱体,以允许电子束从电子束源通过。 第一检测器检测样品沿远离光轴的方向发射的二次电子,并且设置在通常面对导电圆柱体的位置。 第二检测器设置在导电圆柱体上。 维恩滤波器偏转器将由样本发射的二次电子偏转并由第二检测器检测。 维恩滤波器偏转器设置在光轴上并且在导电圆柱体和第二检测器之间。

    Scanning electron beam apparatus
    6.
    发明授权
    Scanning electron beam apparatus 失效
    扫描电子束装置

    公开(公告)号:US4961003A

    公开(公告)日:1990-10-02

    申请号:US430355

    申请日:1989-11-01

    申请人: Akira Yonezawa

    发明人: Akira Yonezawa

    CPC分类号: H01J37/09 H01J37/141

    摘要: An apparatus for directing a scanned electron beam to a sample along an axis. An objective magnetic lens of a single-pole type focusses the scanned electron beam onto the sample. The objective magnetic lens includes a central pole portion extending along the axis and having a central end face effective to generate a magnetic field for focusing the scanned electron beam onto the sample and a peripheral sleeve portion extending along the axis and having a peripheral edge face effective to form a magnetic circuit between the central end face and the peripheral edge face, the peripheral sleeve portion having an inner radius R. A magnetic shield member is disposed to surround the sample to magnetically shield the same. The magnetic shield member has a central section spaced axially from the central end face of the pole portion a distance L which is not substantially less than R so that the magnetic shield member is not magnetically coupled to the magnetic circuit, and a peripheral section spaced from the peripheral edge face of the peripheral sleeve a spatial gap sufficient to magnetically isolate the magnetic shield member from the magnetic lens.

    摘要翻译: 一种用于将扫描的电子束沿轴线引导到样品的装置。 单极型物镜磁透镜将扫描的电子束聚焦到样品上。 物镜磁性透镜包括沿着轴线延伸的中心极部分,并且具有中心端面,其有效地产生用于将扫描的电子束聚焦到样本上的磁场和沿轴线延伸并具有周边边缘面的周边套筒部分 为了在中心端面和周缘面之间形成磁路,外周套筒部分具有内半径R.磁屏蔽件被设置为包围样品以对其进行磁屏蔽。 磁屏蔽构件具有与磁极部分的中心端面轴向间隔开的距离L的中心部分,其距离L不大于R,使得磁屏蔽构件不与磁路磁耦合,并且周向部分与 周边套管的周缘面具有足以将磁屏蔽构件与磁性透镜磁隔离的空间间隙。

    Charged particle beam apparatus and contamination removal method therefor
    7.
    发明申请
    Charged particle beam apparatus and contamination removal method therefor 有权
    带电粒子束装置及其污染除去方法

    公开(公告)号:US20060138363A1

    公开(公告)日:2006-06-29

    申请号:US11293148

    申请日:2005-12-05

    IPC分类号: G01J3/10

    摘要: A charged particle beam apparatus comprising a preparatory evacuation chamber (15 in FIG. 1A) into which a sample (12) is conveyed and which is preliminarily evacuated, an ultraviolet irradiation unit (21) which is disposed in the preparatory evacuation chamber (15) and which irradiates the surface of the sample (12) conveyed into the preparatory evacuation chamber (15), with ultraviolet rays for a predetermined time period, and a sample chamber (16) into which the sample (12) is conveyed in the preliminarily evacuated state of the preparatory evacuation chamber (15) or from which the sample (12) is conveyed into the preparatory evacuation chamber (15), wherein the ultraviolet irradiation of the sample (12) by the ultraviolet irradiation unit (21) is performed before the conveyance of the sample (12) into the sample chamber (16), or/and after the conveyance thereof from the sample chamber (16), thereby to remove contamination on the surface of the sample (12).

    摘要翻译: 一种带电粒子束装置,包括:预先抽真空室(图1A中的15),其中输送样品(12)并预先抽真空;紫外线照射单元(21),设置在预备抽空室 ),并且用紫外线照射经预定的时间段的被输送到预备抽空室(15)的样品(12)的表面,以及将样品(12)预先传送到的样品室 预备排空室(15)的抽真空状态或将样品(12)从该排空状态输送到预备抽空室(15)中,其中紫外线照射单元(21)对样品(12)的紫外线照射在 将样品(12)输送到样品室(16)中,或者在从样品室(16)传送之后,从而去除样品表面上的污染物 (12)。

    Electron beam apparatus
    8.
    发明授权
    Electron beam apparatus 有权
    电子束装置

    公开(公告)号:US06740888B2

    公开(公告)日:2004-05-25

    申请号:US10438040

    申请日:2003-05-14

    IPC分类号: H01J314

    CPC分类号: H01J37/141 H01J2237/28

    摘要: In order to ensure that an electromagnetic field lens is capable of high-resolution observation using a magnetic field lens without leakage of magnetic flux, there is provided a magnetic field superimposing-type lens 1 for focusing an electron beam onto a sample 3 so as to irradiate the sample 3 is provided with an upper magnetic pole 213 a long way from the sample 3 and a lower side magnetic pole 214 close to the sample 3, with electrical insulation being provided between the upper magnetic pole 213 and the lower magnetic pole 214 by a ferrite insulator 215 provided between the upper magnetic pole 213 and the lower magnetic pole 214 in an integral manner with the magnetic poles so that the upper magnetic pole 213 and the lower magnetic pole 214 may be held at different potentials. There is therefore no leak in flux from between the upper magnetic pole 213 and the lower-magnetic pole 214, the chromatic aberration coefficient Cc can be made small, and high-resolution observation of the sample can be achieved.

    摘要翻译: 为了确保电磁场透镜能够使用磁场透镜进行高分辨率观察而不漏磁通,设置有用于将电子束聚焦到样品3上的磁场叠加型透镜1,以便 照射样品3设置有距离样品3很远的上磁极213和靠近样品3的下侧磁极214,电绝缘通过上磁极213和下磁极214之间设置在上磁极213和下磁极214之间, 铁氧体绝缘体215以与磁极成一体的方式设置在上磁极213和下磁极214之间,使得上磁极213和下磁极214可以保持在不同的电位。 因此,在上磁极213和下磁极214之间不存在磁通泄漏,可以使色差系数Cc小,并且可以实现样品的高分辨率观察。

    Objective lens for scanning electron microscope
    9.
    发明授权
    Objective lens for scanning electron microscope 失效
    物镜用于扫描电子显微镜

    公开(公告)号:US06335530B1

    公开(公告)日:2002-01-01

    申请号:US09126404

    申请日:1998-07-30

    IPC分类号: H01J37141

    CPC分类号: H01J37/141 H01J37/28

    摘要: In an object lens of a type of generating a magnetic field of the side of a specimen and maing a principal plan of the lens close to the specimen for reducing aberration coefficients, an inner magnetic pole is formed in a shape of a cone having an angle of 30° of less to an optical axis and an outer magnetic pole is also provided inside the cone by which even the large-size specimen can be inclined up to about 60° and the large-size specimen can be observed with high resolution even when the specimen is inclined at a high angle.

    摘要翻译: 在产生样本侧的磁场的类型的物镜中,并且为了减小像差系数而使靠近样本的透镜的主平面形成为内圆磁极,其形状为具有角度的锥形 在锥体内还设置有30°以下的光轴,外部磁极也通过该锥形体设置,即使大尺寸的试样也能够倾斜到大约60°,并且即使在高分辨率的情况下也可以高分辨率地观察大尺寸的试样 样品以高角度倾斜。

    Electromagnetic field superimposed lens and electron beam device using this electromagnetic field superimposed lens
    10.
    发明授权
    Electromagnetic field superimposed lens and electron beam device using this electromagnetic field superimposed lens 有权
    电磁场叠加透镜和电子束装置使用这种电磁场叠加透镜

    公开(公告)号:US06897450B2

    公开(公告)日:2005-05-24

    申请号:US09978258

    申请日:2001-10-15

    申请人: Akira Yonezawa

    发明人: Akira Yonezawa

    CPC分类号: H01J37/145 H01J2237/28

    摘要: A magnetic pole of a magnetic field type lens is divided into a first magnetic pole section that is at ground potential, and a second magnetic pole section facing a sample and to which a negative high voltage is applied, the first magnetic pole section and the second magnetic pole section 212 being electrically insulated from each other, and an electric field type bi-potential lens is made up of an electrode attached to the first magnetic pole section so as to surround an electron beam path. High resolution observation with small chromatic aberration factor Cs, Cc is made possible without forming a positive high voltage section inside an electron beam path of a lens barrel.

    摘要翻译: 磁场型透镜的磁极被分成位于地电位的第一磁极部分和面向样品的第二磁极部分,并且施加负的高电压,第一磁极部分和第二磁极部分 磁极部分212彼此电绝缘,并且电场型双电位透镜由附接到第一磁极部分的电极组成以包围电子束路径。 可以在镜筒的电子束路径内形成正高压部分的情况下,可以实现小色差因子Cs,Cc的高分辨率观察。