Method for fabricating a micromechanical component
    4.
    发明授权
    Method for fabricating a micromechanical component 有权
    微机械部件的制造方法

    公开(公告)号:US06268232B1

    公开(公告)日:2001-07-31

    申请号:US09302224

    申请日:1999-04-29

    IPC分类号: H01L2100

    摘要: A method for fabricating a micromechanical component, in particular a surface-micromechanical acceleration sensor, involves preparing a substrate and providing an insulation layer on the substrate, in which a patterned circuit trace layer is buried. A conductive layer, including a first region and a second region, is provided on the insulation layer, and a movable element is configured in the first region by forming a first plurality of trenches and by using an etching agent to remove at least one portion of the insulation layer from underneath the conductive layer. A contact element is formed and electrically connected to the circuit trace layer in the second region by configuring a second plurality of trenches, and the resultant movable element is encapsulated in the first region. The second plurality of trenches for forming the contact element in the second region is first formed after the encapsulation of the movable element formed in the first region.

    摘要翻译: 用于制造微机械部件,特别是表面微机械加速度传感器的方法涉及准备衬底并在衬底上提供绝缘层,其中掩埋有图案化的电路迹线层。 包括第一区域和第二区域的导电层设置在绝缘层上,并且可移动元件通过形成第一多个沟槽而被构造在第一区域中,并且通过使用蚀刻剂去除至少一部分 绝缘层从导电层下面。 通过构造第二多个沟槽,形成接触元件并在第二区域中电连接到电路迹线层,并且所得到的可移动元件被封装在第一区域中。 在第二区域中形成接触元件的第二多个沟槽首先在形成在第一区域中的可移动元件的封装之后形成。

    Method of manufacturing micromechanical surface structures by vapor-phase etching
    6.
    发明授权
    Method of manufacturing micromechanical surface structures by vapor-phase etching 失效
    通过气相蚀刻制造微机械表面结构的方法

    公开(公告)号:US06558559B1

    公开(公告)日:2003-05-06

    申请号:US09019011

    申请日:1998-02-05

    IPC分类号: C23F100

    CPC分类号: B81C1/00

    摘要: A method of sacrificial layer etching of micromechanical surface structures, in which a sacrificial layer is deposited on a heatable silicon substrate and is structured. A temperature difference between the substrate and the vapor phase of an etching medium is established in such a way that exposed metal contacts made of aluminum alloys are not attacked at the same time and are not subsequently exposed to any risk of corrosion.

    摘要翻译: 一种牺牲层蚀刻微机械表面结构的方法,其中牺牲层沉积在可加热的硅衬底上并被构造。 蚀刻介质的衬底和气相之间的温度差异以这样的方式建立,使得由铝合金制成的暴露的金属触点不会同时受到冲击,并且不会随后暴露于任何腐蚀的风险。