公开(公告)号：US06798812B2

公开(公告)日：2004-09-28

申请号：US10243102

申请日：2002-09-13

申请人： German E. Rylov ,  Thomas Hofmann ,  Richard L. Sandstrom

发明人： German E. Rylov ,  Thomas Hofmann ,  Richard L. Sandstrom

IPC分类号： H01S3223

CPC分类号： H01S3/225 ,  H01S3/03 ,  H01S3/036 ,  H01S3/09702 ,  H01S3/1055 ,  H01S3/2258 ,  H01S3/2308

摘要： The present invention provides an injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The parameters chamber can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment is a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In this preferred embodiment, both of the chambers and the laser optics are mounted on a vertical optical table within a laser enclosure. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is operated with a fluorine partial pressure and total gas pressure within specified ranges in order to reduce the intensity of the weak line to less than 0.01% of the strong line. Therefore, the need for line selection optical equipment is avoided.

摘要翻译： 本发明提供一种注射接种的模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率产生高质量的脉冲激光束，并且在约20至40瓦特的集成输出的脉冲能量为约5至10mJ或更大的脉冲能量 或更大。 提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 可以分别控制参数室，允许在主振荡器中优化波长参数并优化放大室中的脉冲能量参数。 优选实施例是被配置为MOPA并被专门设计用作集成电路光刻的光源的F2激光系统。 在该优选实施例中，腔室和激光光学器件都安装在激光外壳内的垂直光学平台上。 在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器以氟分压和总气体压力在指定范围内运行，以将弱线的强度降低到强线的0.01％以下。 因此，避免了线路选择光学设备的需要。

公开(公告)号：US08737438B2

公开(公告)日：2014-05-27

申请号：US13571129

申请日：2012-08-09

申请人： Palash P. Das ,  Thomas Hofmann ,  Jesse D. Davis ,  Richard L. Sandstrom

发明人： Palash P. Das ,  Thomas Hofmann ,  Jesse D. Davis ,  Richard L. Sandstrom

IPC分类号： H01S3/10

CPC分类号： B23K26/043 ,  B23K26/04 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24

摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.

摘要翻译： 公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。 该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。 在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。 在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。 在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

公开(公告)号：US20090116530A1

公开(公告)日：2009-05-07

申请号：US12284031

申请日：2008-09-17

申请人： Richard L. Sandstrom ,  Daniel J. W. Brown ,  Thomas Hofmann ,  Jason D. Robinson ,  Craig W. Unick

发明人： Richard L. Sandstrom ,  Daniel J. W. Brown ,  Thomas Hofmann ,  Jason D. Robinson ,  Craig W. Unick

IPC分类号： H01S3/22

CPC分类号： C30B13/24 ,  B23K26/0622 ,  B23K26/0738 ,  C30B29/06 ,  H01L21/67115

摘要： An apparatus and method of operation for a high power broad band elongated thin beam laser annealing light source, which may comprise a gas discharge seed laser oscillator having a resonance cavity, providing a seed laser output pulse; a gas discharge amplifier laser amplifying the seed laser output pulse to provide an amplified seed laser pulse output; a divergence correcting multi-optical element optical assembly intermediate the seed laser and the amplifier laser. The divergence correcting optical assembly may adjust the size and/or shape of the seed laser output pulse within a discharge region of the amplifier laser in order to adjust an output parameter of the amplified seed laser pulse output. The divergence correcting optical assembly may comprise a telescope with an adjustable focus. The adjustable telescope may comprise an active feedback-controlled actuator based upon a sensed parameter of the amplified seed laser output from the amplifier laser.

摘要翻译： 一种用于大功率宽带细长光束激光退火光源的装置和方法，其可以包括具有谐振腔的气体放电种子激光振荡器，提供种子激光输出脉冲; 气体放电放大器激光器，放大种子激光输出脉冲，以提供放大的种子激光脉冲输出; 种子激光器和放大器激光器之间的发散校正多光学元件光学组件。 发散校正光学组件可以在放大器激光器的放电区域内调整种子激光器输出脉冲的尺寸和/或形状，以便调节放大的种子激光脉冲输出的输出参数。 发散校正光学组件可以包括具有可调焦点的望远镜。 可调节望远镜可以包括基于从放大器激光器输出的放大的种子激光器的感测参数的主动反馈控制致动器。

公开(公告)号：US6018537A

公开(公告)日：2000-01-25

申请号：US273446

申请日：1999-03-19

申请人： Thomas Hofmann ,  Jean-Marc Hueber ,  Palash P. Das ,  Toshihiko Ishihara ,  Thomas P. Duffey ,  John T. Melchior ,  Herve A. Besaucele ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom

发明人： Thomas Hofmann ,  Jean-Marc Hueber ,  Palash P. Das ,  Toshihiko Ishihara ,  Thomas P. Duffey ,  John T. Melchior ,  Herve A. Besaucele ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom

IPC分类号： G01J9/00 ,  G03F7/20 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/08 ,  H01S3/0971 ,  H01S3/134 ,  H01S3/223 ,  H01S3/225 ,  H01S3/10

CPC分类号： G03F7/70025 ,  G01J9/00 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/0971 ,  H01S3/134 ,  H01S3/223 ,  H01S3/225 ,  H01S3/08009 ,  H01S3/09713 ,  H01S3/2251 ,  H01S3/2256

摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz or greater. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.

摘要翻译： 本发明提供了可产生1000Hz至2000Hz或更大范围内的10mJ激光脉冲的可靠的模块化生产质量准分子激光器。 可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。 在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。 这些改进包括增加容量的高压电源，具有用于精确电压调整的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次 具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。 用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

公开(公告)号：US20120298838A1

公开(公告)日：2012-11-29

申请号：US13571129

申请日：2012-08-09

申请人： Palash P. Das ,  Thomas Hofmann ,  Jesse D. Davis ,  Richard L. Sandstrom

发明人： Palash P. Das ,  Thomas Hofmann ,  Jesse D. Davis ,  Richard L. Sandstrom

IPC分类号： G01J1/16

CPC分类号： B23K26/043 ,  B23K26/04 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24

摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.

摘要翻译： 公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。 该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。 在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。 在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。 在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

公开(公告)号：US20090256057A1

公开(公告)日：2009-10-15

申请号：US12386771

申请日：2009-04-21

申请人： Palash P. Das ,  Thomas Hofmann ,  Jesse D. Davis ,  Richard L. Sandstrom

发明人： Palash P. Das ,  Thomas Hofmann ,  Jesse D. Davis ,  Richard L. Sandstrom

IPC分类号： G02B27/40 ,  G01B9/00

CPC分类号： B23K26/043 ,  B23K26/04 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24

摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.

摘要翻译： 公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。 该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。 在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。 在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。 在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

公开(公告)号：US06603549B2

公开(公告)日：2003-08-05

申请号：US09931726

申请日：2001-08-16

申请人： Steven F. Haas ,  Richard L. Sandstrom ,  Thomas Hofmann ,  Alexander I. Ershov

发明人： Steven F. Haas ,  Richard L. Sandstrom ,  Thomas Hofmann ,  Alexander I. Ershov

IPC分类号： G01J318

CPC分类号： G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/027 ,  G01J3/12 ,  G01J3/1809 ,  G01J3/22 ,  G01J3/28 ,  G01J9/02

摘要： A simple, reliable, easy to use method for calculating bandwidth data of very narrow band laser beams based on bandwidth data obtained with a spectrometer in circumstances where the laser bandwidths are not large compared to the slit function of the spectrometer. The slit function of the spectrometer is determined. Spectral data of the laser beam is measured with the spectrometer to produce a measured laser beam spectrum which represents a convolution of the laser beam spectrum and the spectrometer slit function. This measured laser spectrum is then mathematically convolved with the slit function of the spectrometer to produce a doubly convolved spectrum. Bandwidth values representing true laser bandwidths are determined from measured laser spectrum and the doubly convolved spectrum. Preferably the true laser bandwidths are calculated by determining the difference between “twice a measured laser bandwidth” and a corresponding “doubly convolved bandwidth”. This method provides an excellent estimate of the true laser bandwidth because “twice the measured laser bandwidth” represents two laser bandwidths and two spectrometer slit function bandwidths and the “doubly convolved bandwidth” represents one laser bandwidth and two spectrometer slit function bandwidths. Thus, the difference is a representation of the true laser bandwidth. In a preferred embodiment the bandwidth parameters measured are the full width half-maximum bandwidth and the 95% integral bandwidth.

公开(公告)号：US08265109B2

公开(公告)日：2012-09-11

申请号：US12386771

申请日：2009-04-21

申请人： Palash P. Das ,  Thomas Hofmann ,  Jesse D. Davis ,  Richard L. Sandstrom

发明人： Palash P. Das ,  Thomas Hofmann ,  Jesse D. Davis ,  Richard L. Sandstrom

IPC分类号： H01S3/10

CPC分类号： B23K26/043 ,  B23K26/04 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24

摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.

摘要翻译： 公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。 该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。 在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。 在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。 在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

公开(公告)号：US06914919B2

公开(公告)日：2005-07-05

申请号：US10187336

申请日：2002-06-28

申请人： Tom A. Watson ,  Richard C. Ujazdowski ,  Alex P. Ivaschenko ,  Richard L. Sandstrom ,  Robert A. Shannon ,  R. Kyle Webb ,  Frederick A. Palenschat ,  Thomas Hofmann ,  Curtis L. Rettig ,  Richard M. Ness ,  Paul C. Melcher ,  Alexander I. Ershov

发明人： Tom A. Watson ,  Richard C. Ujazdowski ,  Alex P. Ivaschenko ,  Richard L. Sandstrom ,  Robert A. Shannon ,  R. Kyle Webb ,  Frederick A. Palenschat ,  Thomas Hofmann ,  Curtis L. Rettig ,  Richard M. Ness ,  Paul C. Melcher ,  Alexander I. Ershov

IPC分类号： H01S3/134 ,  G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23 ,  H01S3/10

CPC分类号： H01S3/0385 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F2 lasers used for light sources for integrated circuit lithography. Improvements include a modified high voltage power supply capable for charging an initial capacitor of a magnetic compression pulse power system to precise target voltages 6,000 to 10,0000 times per second and a feedback control for monitoring pulse energy and determining the target voltages on a pulse-by-pulse basis. Several techniques are disclosed for removing discharge created debris from the discharge region between the laser electrodes during the intervals between discharges. In one embodiment the width of the discharge region is reduced from about 3 mm to about 1 mm so that a gas circulation system designed for 4,000 Hz operation could be utilized for 10,000 Hz operation. In other embodiments the gas flow between the electrodes is increased sufficiently to permit 10,000 Hz operation with a discharge region width of 3 mm. To provide these substantial increased gas flow rates, Applicants have disclosed preferred embodiments utilize tangential forms of the prior art but with improved and more powerful motors and novel bearing designs. New bearing designs include both ceramic bearings and magnetic bearings. In other embodiments, some or all of the gas circulation power is provided with a blower located outside the laser chamber. The outside blower can be located in the laser cabinet or in separate location.

摘要翻译： 本发明提供一种气体放电激光系统，其能够以6,000至1000000次脉冲功率秒的重复频率在生产线容量中可靠地长期运行。 优选的实施例被配置为用于集成电路光刻的光源的KrF，ArF和F 2 N 2激光器。 改进包括一种改进的高压电源，其能够将磁压缩脉冲电源系统的初始电容器充电至每秒精确的目标电压6,000至10,0000次，以及用于监视脉冲能量的反馈控制以及确定脉冲 - 逐脉冲基础。 公开了用于在放电间隔期间从激光电极之间的放电区域去除产生的碎屑的几种技术。 在一个实施例中，放电区域的宽度从约3mm减小至约1mm，使得设计用于4000Hz操作的气体循环系统可用于10,000Hz操作。 在其他实施例中，电极之间的气流充分增加，以允许10,000Hz的操作，放电区域宽度为3mm。 为了提供这些显着增加的气体流速，申请人已经公开了使用现有技术的切向形式的优选实施例，但是具有改进的和更强大的电动机和新颖的轴承设计。 新的轴承设计包括陶瓷轴承和磁性轴承。 在其他实施例中，一些或全部气体循环动力设置有位于激光室外部的鼓风机。 外部鼓风机可以位于激光柜内或分开的位置。

公开(公告)号：US6128323A

公开(公告)日：2000-10-03

申请号：US157067

申请日：1998-09-18

申请人： David W. Myers ,  Herve A. Besaucele ,  Palash P. Das ,  Thomas P. Duffey ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Thomas Hofmann ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  Robert G. Ozarski ,  Gamaralalage G. Padmabandu ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom ,  Paul S. Thompson ,  Richard C. Ujazdowski ,  Tom A. Watson ,  R. Kyle Webb ,  Paolo Zambon

发明人： David W. Myers ,  Herve A. Besaucele ,  Palash P. Das ,  Thomas P. Duffey ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Thomas Hofmann ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  Robert G. Ozarski ,  Gamaralalage G. Padmabandu ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom ,  Paul S. Thompson ,  Richard C. Ujazdowski ,  Tom A. Watson ,  R. Kyle Webb ,  Paolo Zambon

IPC分类号： G03F7/20 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/041 ,  H01S3/08 ,  H01S3/081 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/139 ,  H01S3/225 ,  H03K3/57 ,  H03K17/80 ,  H01S3/00

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225 ,  H03K17/80 ,  H03K3/57 ,  H01S3/08009 ,  H01S3/0812 ,  H01S3/1392 ,  H01S3/2251 ,  H01S3/2256

摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.

摘要翻译： 本发明提供了一种可靠的模块化生产质量准分子激光器，其能够在2000Hz下产生10mJ激光脉冲，全宽度为一半，最大带宽为约0.6μm或更小。 可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。 允许更高脉冲速率和改进的带宽性能的激光室的改进包括单个上游预分解器管和高效室。 该室设计用于在较低的氟浓度下运行。 在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。 这些改进包括增加容量的高压电源，具有用于精确电压调整的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次 具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。 用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。