Method of reducing stress on a semiconductor die with a distributed plating pattern
    8.
    发明申请
    Method of reducing stress on a semiconductor die with a distributed plating pattern 审中-公开
    以分布电镀图案减少半导体晶片上的应力的方法

    公开(公告)号:US20070269929A1

    公开(公告)日:2007-11-22

    申请号:US11435954

    申请日:2006-05-17

    IPC分类号: H01L21/00 H01L21/31

    摘要: A substrate, and a semiconductor die package formed therefrom, are disclosed which include a distributed plating pattern for reducing mechanical stress on the semiconductor die. The substrate according to embodiments of the invention may include traces and contact pads plated in a double image plating process. Additionally, the substrate may include dummy plating areas including plating material. The plated vias and/or traces and the plating material within the dummy plating areas provide a plating pattern which is evenly distributed across the surface of the substrate. The even distribution of the plating pattern prevents peaks and valleys in the finished substrate.

    摘要翻译: 公开了一种基板和由其形成的半导体管芯封装,其包括用于减小半导体管芯上的机械应力的分布电镀图案。 根据本发明的实施例的衬底可以包括以双映像电镀工艺电镀的迹线和接触焊盘。 此外,基板可以包括包括电镀材料的虚拟电镀区域。 电镀通孔和/或迹线以及虚拟电镀区域内的电镀材料提供均匀分布在基板表面上的电镀图案。 电镀图案的均匀分布防止成品基板中的峰和谷。