Low-k dielectric material
    2.
    发明申请
    Low-k dielectric material 审中-公开
    低k电介质材料

    公开(公告)号:US20070063188A1

    公开(公告)日:2007-03-22

    申请号:US10552737

    申请日:2004-04-13

    IPC分类号: H01L51/00 C07F7/12

    摘要: The present invention relates to thin films suitable as dielectrics in integrated circuits and for other similar applications and to methods for the production thereof. In particular, the invention concerns thin films comprising at least partially cross-linked siloxane structures obtainable by hydrolysis of one or more silicon compounds of the general formula R1—R2—Si—(X1)3, wherein X1 is a leaving group, R2 is a cycloalkyl having from 3 to 16 carbon atoms, an aryl having from 5 to 18 carbon atoms or a polycyclic alkyl group having from 7 to 16 carbon atoms, and R1 is a substituent of R2 selected from alkyl groups having from 1 to 4 carbon atoms, alkenyl groups having from 2 to 5 carbon atoms, alkynyl groups having from 2 to 5 carbon atoms, and aromatic groups having 5 or 6 carbon atoms, each of said groups being optionally substituted, and Cl and F.

    摘要翻译: 本发明涉及适用于集成电路和其他类似应用的电介质的薄膜及其生产方法。 特别地,本发明涉及包含至少部分交联的硅氧烷结构的薄膜,所述硅氧烷结构可通过一种或多种通式为R 1 -R 2 - 其中X 1是离去基团,R 2是具有(X 1)3个 3至16个碳原子的芳基,具有5至18个碳原子的芳基或具有7至16个碳原子的多环烷基,R 1是R 2的取代基, 选自具有1至4个碳原子的烷基,具有2至5个碳原子的烯基,具有2至5个碳原子的炔基,以及具有5或6个碳原子的芳族基团,每个所述基团是任选的 取代,Cl和F.

    Organo functionalized silane monomers and siloxane polymers of the same
    5.
    发明申请
    Organo functionalized silane monomers and siloxane polymers of the same 审中-公开
    有机官能化硅烷单体和硅氧烷聚合物相同

    公开(公告)号:US20060293482A1

    公开(公告)日:2006-12-28

    申请号:US11451596

    申请日:2006-06-13

    IPC分类号: C08G77/60

    摘要: A thin film comprising a composition obtained by polymerizing a monomer having the formula I: wherein: R1 is a hydrolysable group, R2 is an organic crosslinking group, a reactive cleaving group or a polarizability reducing organic group, and R3 is a bridging linear or branched bivalent hydrocarbyl group to form a siloxane material. The organo-functionalized molecule is capable of further reacting in the matrix so as to undergo cross-linking, cleaving or combination of both. The present invention provides excellent chemical resistance and very low chemical adsorption behavior due to high cross-linking bridging group density.

    摘要翻译: 一种薄膜,其包含通过聚合具有式I的单体获得的组合物:其中:R 1是可水解基团,R 2是有机交联基团,反应性裂解 基团或极化率降低有机基团,R 3是桥连的直链或支链二价烃基以形成硅氧烷材料。 有机官能化分子能够在基质中进一步反应以进行两者的交联,切割或组合。 本发明提供优异的耐化学性和由于高交联桥接基团密度而具有非常低的化学吸附性能。

    Methods and compounds for making coatings, waveguides and other optical devices
    6.
    发明申请
    Methods and compounds for making coatings, waveguides and other optical devices 有权
    用于制造涂层,波导和其他光学器件的方法和化合物

    公开(公告)号:US20050154212A1

    公开(公告)日:2005-07-14

    申请号:US11006754

    申请日:2004-12-08

    摘要: A compound of the general formula: R1R2R4MR5, wherein R1, R2 and R4 are independently an aryl, alkyl, alkenyl or alkynyl group, wherein at least one of R1, R2 and R4 is fully or partially fluorinated, wherein M is selected from group 14 of the periodic table, and wherein R5 is either an alkoxy group, OR3, or a halogen group, X. This compound formed can be further reacted to attach an additional organic R group, and/or hydrolyzed with one or more similar compounds (preferably having one or two R groups bound to M), to form a material having a molecular weight of from 500 to 10,000, which material can be deposited on various substrates as a coating or deposited and patterned for a waveguide or other optical device components. Methods for making and using compounds of the general formula R1R2R4MR5 are also disclosed.

    摘要翻译: 一种具有以下通式的化合物:其中R 1,R 2,R 2,R 4, R 2和R 4独立地是芳基,烷基,链烯基或炔基,其中R 1,R 2, R 2和R 4全部或部分氟化,其中M选自周期表第14族,其中R 5为 可以进一步反应所形成的化合物以附加另外的有机R基团,和/或用一种或多种类似化合物(优选具有 一个或两个与M结合的R基团),以形成分子量为500至10,000的材料,该材料可以作为涂层沉积在各种基材上,或者被沉积和图案化以用于波导或其它光学器件部件。 还公开了制备和使用通式为R 1,R 2,S 4,S 5,S 5的化合物的方法。

    Methods and compounds for making coatings, waveguides and other optical devices
    7.
    发明申请
    Methods and compounds for making coatings, waveguides and other optical devices 失效
    用于制造涂层,波导和其他光学器件的方法和化合物

    公开(公告)号:US20050101792A1

    公开(公告)日:2005-05-12

    申请号:US10862897

    申请日:2004-06-08

    摘要: A compound of the general formula R1MR4R5R6 is provided where R1 is a partially or fully fluorinated aryl, alkyl, alkenyl or alkynyl group, wherein M is selected from group 14 of the periodic table, wherein R4, R5 and R6 are independently an alkoxy group OR3 or a halogen group X—except, a) where R4, R5 and R6 are each ethoxy, M is Si and R1 is perfluorinated phenyl or perfluorinated vinyl; b) where R4 is ethoxy, R5 and R6 are chlorine, M is Si, and R1 is perfluorinated phenyl; or c) where R4, R5 and R6 are chlorine, M is Si, and R1 is perfluorinated phenyl, perfluorinated methyl or perfluorinated vinyl. This compound formed can be further reacted to attach an additional organic R group, and/or hydrolyzed, alone or with one or more similar compounds, to form a material having a molecular weight of from 500 to 10,000, which material can be deposited on various substrates as a coating or deposited and patterned for a waveguide or other optical device components. Methods for making compounds of the general formula R1MR4R5R6 are also disclosed.

    摘要翻译: 提供了通式R 1的化合物,其中R 1,R 2,R 4,R 6, 部分或完全氟化的芳基,烷基,烯基或炔基,其中M选自周期表的第14族,其中R 4,R 5, >和R 6独立地是烷氧基OR 3或卤素基团X,除了a)其中R 4,R 4, 5和R 6各自为乙氧基,M为Si,R 1为全氟化苯基或全氟化乙烯基; b)其中R 4为乙氧基,R 5和R 6为氯,M为Si,R 1为 >是全氟化苯基; 或c)其中R 4,R 5和R 6是氯,M是Si,R 1, 是全氟化苯基,全氟化甲基或全氟乙烯基。 形成的该化合物可以进一步反应以附加另外的有机R基团和/或单独或与一种或多种类似化合物水解形成分子量为500至10,000的材料,该材料可以沉积在各种 衬底作为涂层或沉积和图案化用于波导或其它光学器件部件。 还公开了制备通式为R 1,R 5,R 5,R 6和S 6的化合物的方法。