公开(公告)号：US5329129A

公开(公告)日：1994-07-12

申请号：US849238

申请日：1992-03-10

申请人： Kazuhiro Shono ,  Naomitsu Fujishita ,  Kazuhiko Noguchi ,  Takahisa Nagayama ,  Shigeo Sasaki

发明人： Kazuhiro Shono ,  Naomitsu Fujishita ,  Kazuhiko Noguchi ,  Takahisa Nagayama ,  Shigeo Sasaki

IPC分类号： H01J37/02 ,  H01J37/317 ,  H01J37/04

CPC分类号： H01J37/026 ,  H01J37/3171 ,  H01J2237/0045

摘要： There is disclosed an electron shower apparatus which eliminates the adverse effect of a magnetic field on electrons and which provides electrons in sufficient quantity when primary electrons having low energy are employed. In the apparatus, the magnetic field generated by a filament current is decreased or eliminated by pulsing the filament current or by passing a current opposite in direction to the filament current in the vicinity of the filament current.

摘要翻译： 公开了一种电子喷淋装置，其消除了磁场对电子的不利影响，并且当使用具有低能量的一次电子时，其提供足够量的电子。 在该装置中，由灯丝电流产生的磁场通过脉冲灯丝电流或通过在灯丝电流附近通过与灯丝电流相反的方向的电流来减小或消除。

公开(公告)号：US5132545A

公开(公告)日：1992-07-21

申请号：US568191

申请日：1990-08-16

申请人： Kazuhiro Shono ,  Shigeo Sasaki ,  Susumu Katoh ,  Masao Naitou ,  Tetsuya Nakanishi ,  Naomitsu Fujishita ,  Kazuhiko Noguchi ,  Masayasu Tanjo

发明人： Kazuhiro Shono ,  Shigeo Sasaki ,  Susumu Katoh ,  Masao Naitou ,  Tetsuya Nakanishi ,  Naomitsu Fujishita ,  Kazuhiko Noguchi ,  Masayasu Tanjo

IPC分类号： H01J37/302 ,  H01J37/317

CPC分类号： H01J37/302 ,  H01J37/3171 ,  H01J2237/24542

摘要： An ion implantation apparatus includes an ion source having an arc chamber generating ions and a drawing electrode drawing ions from the arc chamber, a mass separator transporting only ions desired for implantation, an ion implantation chamber in which the material to be implanted by ions is placed, and a controller means for automatically controlling the distance between the arc chamber and the drawing electrode incrementally in accordance with a theoretical calculation using normalized perveance considering the kind of ions to be implanted, the accelerating voltage, and the ion current and current density distribution.

公开(公告)号：US4916311A

公开(公告)日：1990-04-10

申请号：US166074

申请日：1988-03-09

申请人： Naomitsu Fuzishita ,  Shigeo Sasaki ,  Yasushi Matsumura ,  Akira Shuhara ,  Kazuhiro Shono

发明人： Naomitsu Fuzishita ,  Shigeo Sasaki ,  Yasushi Matsumura ,  Akira Shuhara ,  Kazuhiro Shono

IPC分类号： G21K1/14 ,  G21K5/00 ,  H01J27/02 ,  H05H3/00

CPC分类号： G21K5/00 ,  G21K1/14 ,  H01J27/02 ,  H05H3/00 ,  H01J2237/0041

摘要： In an ion beam irradiating apparatus for providing a neutralized ion beam to a sample, there are provided an ion source, an accelerating device and an ion beam selecting device to which the accelerated and selection ion beam is irradiated. This irradiating apparatus further includes an ion neutralizer positioned between the selecting device and the sample, and includes: an electron beam emitting source for emitting an electron beam; a first electron scatter preventing electrode for preventing the electron beam emitted from the electron beam emitting source from being scattered outside the ion neutralizer; a second electron scatter preventing electrode for preventing the electron beam induced into the specified ion beam from being scattered in a direction opposite to an ion irradiating direction; and a control electrode for controlling a traveling velocity of the electron beam emitted from the electron emitting source so as to drift the emitted electron beam toward the sample, thereby neutralizing the selected ion beam at a location adjacent to a surface of the sample that is being irradiated.

摘要翻译： 在用于向样品提供中和的离子束的离子束照射装置中，设置有照射加速选择离子束的离子源，加速装置和离子束选择装置。 该照射装置还包括位于选择装置和样品之间的离子中和器，包括：用于发射电子束的电子束发射源; 用于防止从电子束发射源发射的电子束被散射到离子中和器外的第一电子散射防止电极; 第二电子散射防止电极，用于防止被引导到指定的离子束中的电子束沿与离子照射方向相反的方向散射; 以及控制电极，用于控制从电子发射源发射的电子束的行进速度，以使所发射的电子束朝向样品漂移，从而在邻近样品表面的位置处中和选定的离子束 照射。

公开(公告)号：US5025167A

公开(公告)日：1991-06-18

申请号：US533769

申请日：1990-06-06

申请人： Soichiro Okuda ,  Tetsuya Nakanishi ,  Shigeo Sasaki ,  Kazuhiko Noguchi

发明人： Soichiro Okuda ,  Tetsuya Nakanishi ,  Shigeo Sasaki ,  Kazuhiko Noguchi

IPC分类号： H01J37/09 ,  H01J37/304 ,  H01J37/317

CPC分类号： H01J37/09 ,  H01J37/304 ,  H01J37/3171

摘要： An ion implantation apparatus comprises an ion beam measuring device to measure and analyze the shape of a beam projected on a substrate for ion implantation and the quantity of current obtained by the ion beam, an analyzing slit member having an opening whose width is changeable, which is located in the ion beam track to extract only implantation ions, and a shaping slit member having an opening whose width is changeable, which is located behind the analyzing slit member to determine the shape of the beam to be projected on the substrate for ion implantation, wherein the widths of the openings of the analyzing slit member and the shaping slit member are changed on the basis of the shape of the beam and the quantity of current obtained as a result of the measurement by the ion beam measuring device.

摘要翻译： 离子注入装置包括离子束测量装置，用于测量和分析投影在用于离子注入的基板上的光束的形状和由离子束获得的电流量，分析狭缝部件，其具有宽度可变的开口， 位于离子束轨道中以仅提取注入离子;以及成形狭缝构件，其具有位于分析狭缝构件后面的宽度可变的开口，以确定要投影到用于离子注入的衬底上的光束的形状 其中分析狭缝部件和成形狭缝部件的开口的宽度基于由离子束测量装置测量的结果获得的光束形状和电流量而改变。

公开(公告)号：US5952316A

公开(公告)日：1999-09-14

申请号：US911602

申请日：1997-08-14

申请人： Tetsuro Fujita ,  Shigeo Sasaki ,  Masahiko Yoneta ,  Tadashi Mishina ,  Kunitomo Adachi ,  Kenji Chiba

发明人： Tetsuro Fujita ,  Shigeo Sasaki ,  Masahiko Yoneta ,  Tadashi Mishina ,  Kunitomo Adachi ,  Kenji Chiba

IPC分类号： A01N33/02 ,  A01N43/40 ,  A01N43/60 ,  A01N57/00 ,  C07C215/10 ,  C07C215/18 ,  C07C215/20 ,  C07C215/24 ,  C07C215/26 ,  C07C215/28 ,  C07C215/34 ,  C07C215/42 ,  C07C215/54 ,  C07C215/56 ,  C07C215/68 ,  C07C217/28 ,  C07C217/30 ,  C07C217/34 ,  C07C217/48 ,  C07C217/52 ,  C07C217/64 ,  C07C217/72 ,  C07C217/76 ,  C07C219/06 ,  C07C219/24 ,  C07C219/30 ,  C07C225/04 ,  C07C225/06 ,  C07C225/10 ,  C07C225/14 ,  C07C225/16 ,  C07C229/22 ,  C07C229/38 ,  C07C229/46 ,  C07C233/18 ,  C07C233/31 ,  C07C233/35 ,  C07C233/36 ,  C07C233/41 ,  C07C233/43 ,  C07C233/47 ,  C07C237/06 ,  C07C237/24 ,  C07C237/30 ,  C07C251/38 ,  C07C271/20 ,  C07C271/24 ,  C07C271/28 ,  C07C323/25 ,  C07C323/30 ,  C07C323/32 ,  C07C323/34 ,  C07C323/41 ,  C07D207/06 ,  C07D207/09 ,  C07D207/32 ,  C07D207/325 ,  C07D207/335 ,  C07D211/14 ,  C07D211/26 ,  C07D213/38 ,  C07D213/40 ,  C07D233/54 ,  C07D237/08 ,  C07D239/26 ,  C07D241/12 ,  C07D261/08 ,  C07D263/32 ,  C07D265/30 ,  C07D275/02 ,  C07D277/28 ,  C07D279/12 ,  C07D295/13 ,  C07D295/135 ,  C07D307/52 ,  C07D309/32 ,  C07D317/28 ,  C07D333/20 ,  C07D521/00 ,  C07P211/00 ,  C07P401/00

CPC分类号： C07D207/325 ,  C07C215/10 ,  C07C215/18 ,  C07C215/20 ,  C07C215/24 ,  C07C215/26 ,  C07C215/28 ,  C07C215/34 ,  C07C215/42 ,  C07C215/54 ,  C07C215/56 ,  C07C215/68 ,  C07C217/28 ,  C07C217/30 ,  C07C217/34 ,  C07C217/48 ,  C07C217/52 ,  C07C217/64 ,  C07C217/72 ,  C07C217/76 ,  C07C219/06 ,  C07C219/24 ,  C07C219/30 ,  C07C225/04 ,  C07C225/06 ,  C07C225/10 ,  C07C225/14 ,  C07C225/16 ,  C07C229/22 ,  C07C229/38 ,  C07C229/46 ,  C07C233/18 ,  C07C233/31 ,  C07C233/35 ,  C07C233/36 ,  C07C233/41 ,  C07C233/43 ,  C07C233/47 ,  C07C237/06 ,  C07C237/24 ,  C07C237/30 ,  C07C251/38 ,  C07C271/20 ,  C07C271/24 ,  C07C271/28 ,  C07C323/25 ,  C07C323/30 ,  C07C323/32 ,  C07C323/34 ,  C07C323/41 ,  C07D207/06 ,  C07D207/09 ,  C07D207/335 ,  C07D211/14 ,  C07D211/26 ,  C07D213/38 ,  C07D213/40 ,  C07D231/12 ,  C07D233/56 ,  C07D233/64 ,  C07D237/08 ,  C07D239/26 ,  C07D241/12 ,  C07D249/08 ,  C07D261/08 ,  C07D263/32 ,  C07D265/30 ,  C07D275/02 ,  C07D277/28 ,  C07D279/12 ,  C07D295/13 ,  C07D295/135 ,  C07D307/52 ,  C07D309/32 ,  C07D317/28 ,  C07D333/20 ,  C07C2101/08 ,  C07C2101/14

摘要： 2-Amino-1,3-propanediol compounds of the formula (I) ##STR1## wherein R is an optionally substituted straight- or branched carbon chain, an optionally substituted aryl, an optionally substituted cycloalkyl or the like, and R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are the same or different and each is a hydrogen, an alkyl, an aralkyl, an acyl or an alkoxycarbonyl, pharmaceutically acceptable salts thereof and immunosuppressants comprising these compounds as active ingredients.The 2-amino-1,3-propanediol compounds of the present invention show immunosuppressive action and are useful for suppressing rejection in organ or bone marrow tranplantation, prevention and treatment of autoimmune diseases or as reagents for use in medicinal and pharmaceutical fields.

摘要翻译： 式（I）的2-氨基-1,3-丙二醇化合物，其中R是任选取代的直链或支链碳链，任选取代的芳基，任选取代的环烷基等，以及R 2，R 3，R 4和R 5 各自为氢，烷基，芳烷基，酰基或烷氧基羰基，其药学上可接受的盐和包含这些化合物作为活性成分的免疫抑制剂。 本发明的2-氨基-1,3-丙二醇化合物显示免疫抑制作用，可用于抑制器官或骨髓移植中的排斥反应，预防和治疗自身免疫性疾病或用作药物和药物领域的试剂。

公开(公告)号：US5403989A

公开(公告)日：1995-04-04

申请号：US36399

申请日：1993-03-24

申请人： Hiroaki Tobuse ,  Tomoyuki Kanda ,  Yasusi Hisaoka ,  Shigeo Sasaki ,  Minoru Kobayashi ,  Takuji Oda ,  Ryuji Ueda ,  Akio Yoshida ,  Tadayoshi Owaki ,  Akihiko Yamasaki ,  Masaaki Kinoshita ,  Toshiaki Fukunishi

发明人： Hiroaki Tobuse ,  Tomoyuki Kanda ,  Yasusi Hisaoka ,  Shigeo Sasaki ,  Minoru Kobayashi ,  Takuji Oda ,  Ryuji Ueda ,  Akio Yoshida ,  Tadayoshi Owaki ,  Akihiko Yamasaki ,  Masaaki Kinoshita ,  Toshiaki Fukunishi

IPC分类号： H01J9/50 ,  H04N3/30 ,  B23K15/00

CPC分类号： H04N3/30 ,  H01J9/50 ,  H01J2209/3893 ,  Y02W30/828

摘要： In a color cathode-ray tube, only a foreign matter adhering to a shadow mask is removed effectively without thermal deformation of the shadow mask or thermal denaturation of phosphors.An electron beam produced by an electron gun incorporated in a cathode-ray tube itself is scanned or irradiated to all over a shadow mask of the color cathode-ray tube. The radiant state of a fluorescent screen at this stage is checked to detect a foreign matter adhering to the shadow mask. The electron beam is deflected to align with the position at which the foreign matter is detected, and then irradiated to the foreign matter in the form of pulses. Thus, the foreign matter is heated and removed.

摘要翻译： 在彩色阴极射线管中，只有在荫罩的热变形或荧光体的热变性的情况下才能有效地去除附着在荫罩上的异物。 通过并入阴极射线管本身的电子枪产生的电子束被扫描或照射到彩色阴极射线管的阴影掩模上。 检查在该阶段的荧光屏的辐射状态以检测附着在荫罩上的异物。 电子束被偏转以与检测异物的位置对准，然后以脉冲的形式照射到异物。 因此，异物被加热和去除。

公开(公告)号：US06555418B2

公开(公告)日：2003-04-29

申请号：US09735617

申请日：2000-12-14

申请人： Tetsuya Kurosawa ,  Shigeo Sasaki

发明人： Tetsuya Kurosawa ,  Shigeo Sasaki

IPC分类号： H01L2148

CPC分类号： H01L21/67144 ,  H01L2221/68322 ,  H01L2924/0002 ,  Y10S156/943 ,  Y10T156/1983 ,  H01L2924/00

摘要： A push-up pin used for separating a semiconductor element attached by adhesive to an adhesive sheet of a semiconductor element pushing-up device in a die bonding apparatus from the adhesive sheet by pushing up the semiconductor element from the rear surface side of the adhesive sheet includes a tip end portion having a shape for applying pushing-up pressure with the thicknesses of the adhesive sheet and the adhesive kept constant when the pushing-up pressure for pushing up the semiconductor element from the rear surface side of the adhesive sheet is applied, and a base portion for supporting the tip end portion.

摘要翻译： 一种用于将由粘合剂附着的半导体元件与芯片接合装置中的半导体元件上推装置的粘合片从粘合片分离的上推销，其中该半导体元件从粘合片的后表面侧向上推 包括当施加用于从粘合片的后表面侧推上半导体元件的上推压力时，具有用于施加上推压力的形状的末端部分，其中粘合片和粘合剂的厚度保持恒定， 以及用于支撑前端部的基部。

公开(公告)号：US06201306B1

公开(公告)日：2001-03-13

申请号：US08760117

申请日：1996-12-03

申请人： Tetsuya Kurosawa ,  Shigeo Sasaki

发明人： Tetsuya Kurosawa ,  Shigeo Sasaki

IPC分类号： H01L2348

CPC分类号： H01L21/67144 ,  H01L2221/68322 ,  H01L2924/0002 ,  Y10S156/943 ,  Y10T156/1983 ,  H01L2924/00

摘要： A push-up pin used for separating a semiconductor element attached by adhesive to an adhesive sheet of a semiconductor element pushing-up device in a die bonding apparatus from the adhesive sheet by pushing up the semiconductor element from the rear surface side of the adhesive sheet includes a tip end portion having a shape for applying pushing-up pressure with the thicknesses of the adhesive sheet and the adhesive kept constant when the pushing-up pressure for pushing up the semiconductor element from the rear surface side of the adhesive sheet is applied, and a base portion for supporting the tip end portion.

摘要翻译： 一种用于将由粘合剂附着的半导体元件与芯片接合装置中的半导体元件上推装置的粘合片从粘合片分离的上推销，其中该半导体元件从粘合片的后表面侧向上推 包括当施加用于从粘合片的后表面侧推上半导体元件的上推压力时，具有用于施加上推压力的形状的末端部分，其中粘合片和粘合剂的厚度保持恒定， 以及用于支撑前端部的基部。

公开(公告)号：US5888883A

公开(公告)日：1999-03-30

申请号：US65626

申请日：1998-04-24

申请人： Shigeo Sasaki ,  Shinya Takyu ,  Keisuke Tokubuchi ,  Koichi Yazima

发明人： Shigeo Sasaki ,  Shinya Takyu ,  Keisuke Tokubuchi ,  Koichi Yazima

IPC分类号： H01L21/301 ,  H01L21/304 ,  H01L21/68 ,  H01L21/78

CPC分类号： H01L21/6835 ,  H01L21/3043 ,  H01L21/6836 ,  H01L21/78 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2224/32245 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/4826 ,  H01L2224/48465 ,  H01L2224/73215 ,  H01L2224/73265 ,  H01L24/73 ,  H01L2924/01079 ,  H01L2924/0132 ,  H01L2924/01322 ,  H01L2924/181 ,  H01L2924/19041

摘要： Grooves are formed in a surface of a wafer, on which surface semiconductor elements are formed, along dicing lines. The grooves are deeper than a thickness of a finished chip. A holding member is attached on the surface of the wafer on which the semiconductor elements are formed. A bottom surface of the wafer is lapped and polished to the thickness of the finished chip, thereby dividing the wafer into chips. When the wafer is divided into the chips, the lapping and polishing is continued until the thickness of the wafer becomes equal to the thickness of the finished chip, even after the wafer has been divided into the chips by the lapping and polishing.

摘要翻译： 沟槽沿着切割线形成在其上形成有表面半导体元件的晶片的表面中。 凹槽比成品芯片的厚度更深。 保持构件安装在其上形成有半导体元件的晶片的表面上。 将晶片的底表面研磨并抛光至成品芯片的厚度，从而将晶片分成芯片。 当晶片被分成芯片时，即使在通过研磨和抛光将晶片分割成芯片之后，研磨和抛光仍然持续到晶片的厚度等于成品芯片的厚度。

公开(公告)号：US4802045A

公开(公告)日：1989-01-31

申请号：US840866

申请日：1986-03-18

申请人： Osamu Yamamoto ,  Shigeo Sasaki ,  Shinichi Kagano

发明人： Osamu Yamamoto ,  Shigeo Sasaki ,  Shinichi Kagano

IPC分类号： G11B23/087 ,  G11B23/02

CPC分类号： G11B23/08785

摘要： In a tape cartridge of the Philips type, one or more ribs are projected from a main plate of each case half at regions except for the tape chamber and the tape path so as to conform to one or more flow lines of resin when each half of molded, the cartridge is so that the formation of traces of resin can be prevented, resulting in an increase in mechanical strength of the cartridge.

摘要翻译： 在飞利浦类型的带盒中，一个或多个肋从每个壳体半部的主板在除了带室和带路径之外的区域处突出，以便当每一半的树脂的一半 可以防止墨盒的形成，从而可以提高墨盒的机械强度。