Process for manufacturing printed wiring board using metal plating techniques
    3.
    发明授权
    Process for manufacturing printed wiring board using metal plating techniques 失效
    使用金属电镀技术制造印刷电路板的工艺

    公开(公告)号:US06662442B1

    公开(公告)日:2003-12-16

    申请号:US09619502

    申请日:2000-07-19

    IPC分类号: H01K310

    摘要: A process for producing a printed wiring board, particularly an interposer for a chip size package, which comprises the steps of (1) forming an outer insulator layer 22 having outer via-holes 24 on a substrate 32, (2) forming conducting passages 31 through the outer via-holes 24 by plating with metal up to substantially the same level as the upper surface of the outer insulator layer 22, (3) forming a thin metal film 29 on the outer insulator layer 22 and on the conducting passages 31, (4) forming a conductor layer 21 in a prescribed circuit pattern on the thin metal film 29 by plating, (5) removing the part of the thin metal film 29 on which the conductor layer 21 is not formed, (6) forming an inner insulator layer 23 on the conductor layer 21, and (7) removing the substrate 32. The outer insulator layer is formed with flatness to secure good adhesion to a semiconductor chip.

    摘要翻译: 一种用于制造印刷线路板的方法,特别是用于芯片尺寸封装的插入件,其包括以下步骤:(1)在基板32上形成具有外部通孔24的外部绝缘体层22,(2)形成导电通路31 通过用外部绝缘体层22的上表面大致相同的金属镀覆外部通孔24,(3)在外绝缘体层22和导电路31上形成薄金属膜29, (4)通过电镀在薄金属膜29上形成规定的电路图案的导体层21,(5)除去未形成导体层21的金属薄膜29的一部分,(6)形成内部 导体层21上的绝缘体层23,以及(7)去除衬底32.外绝缘层形成为平坦度,以确保对半导体芯片的良好粘合性。

    Method for manufacturing wired circuit board
    7.
    发明授权
    Method for manufacturing wired circuit board 失效
    布线电路板制造方法

    公开(公告)号:US06889426B2

    公开(公告)日:2005-05-10

    申请号:US10198121

    申请日:2002-07-19

    摘要: A method for manufacturing wired circuit board that enables a wired circuit board of high quality to be manufactured without changing in dimension of the wired circuit board substantially. In this method, the wired circuit board is wound in layers in the winding process in such a manner that after an uncured thermosetting resin layer is formed on the wired circuit board in the resin layer forming process, a right-side spacer and a left-side spacer are disposed on the already wound wired circuit board at both widthwise ends thereof and also an upper spacer is disposed on the right-side spacer and the left-side spacer so as to cover a widthwise area of the wired circuit board, so that the right-side spacer, the left-side spacer and the upper spacer are positioned between the layers of the wired circuit board when wound. Thereafter, the wired circuit board wound in the rolled state is heated as it is, to cure the uncured thermosetting resin layer in the curing process.

    摘要翻译: 一种用于制造布线电路板的方法,其能够在不改变布线电路板的尺寸的基础上制造高质量的布线电路板。 在这种方法中,布线电路板在卷绕过程中以这样一种方式缠绕,即在树脂层形成工艺中在布线电路板上形成未固化的热固性树脂层之后,将右侧间隔物和左侧间隔物 侧间隔件在其两个宽度方向的两端均布置在已经缠绕的布线电路板上,并且上侧间隔件设置在右侧隔离物和左侧间隔件上以覆盖布线电路板的宽度方向区域,使得 当缠绕时,右侧间隔件,左侧间隔件和上间隔件位于布线电路板的层之间。 此后,卷绕成轧制状态的布线电路板原样加热,在固化工序中固化未固化的热固性树脂层。

    Photosensitive resin composition and circuit board
    8.
    发明授权
    Photosensitive resin composition and circuit board 有权
    感光树脂组合物和电路板

    公开(公告)号:US06746816B2

    公开(公告)日:2004-06-08

    申请号:US09983943

    申请日:2001-10-26

    IPC分类号: G03C173

    摘要: A photosensitive resin composition which is excellent in both sensitivity and resolution, can be rapidly developed with an aqueous alkali solution alone, further has excellent adhesion to substrates, and can give through imidization a light-colored polyimide resin film; and a circuit board having an insulating layer obtained from the photosensitive resin composition. The photosensitive resin composition comprises a poly(amic acid) resin, a 1,4-dihydropyridine derivative and a polyethylene glycol, and may optionally further contain a polyhydric phenol compound. This photosensitive resin composition can be developed at a high rate with a developing solution consisting only of an aqueous alkali solution. As a result, a satisfactory negative-pattern film which is a light-colored film can be formed with high sensitivity, high resolution, and a reduced film loss while preventing film coloration.

    摘要翻译: 敏感性和分辨率优异的感光性树脂组合物可以单独用碱性水溶液快速显影,进一步具有优异的与基材的粘合性,并且可以通过酰亚胺化得到浅色聚酰亚胺树脂膜; 以及具有由感光性树脂组合物得到的绝缘层的电路基板。 感光性树脂组合物包含聚(酰胺酸)树脂,1,4-二氢吡啶衍生物和聚乙二醇,还可以含有多元酚化合物。 该感光性树脂组合物可以用仅由碱性水溶液构成的显影液高速显影。 结果,在防止膜着色的同时,可以以高灵敏度,高分辨率和降低的膜损失形成作为浅色膜的令人满意的负图案膜。

    Negative-working photoresist compositions and and use thereof
    9.
    发明授权
    Negative-working photoresist compositions and and use thereof 失效
    负性光致抗蚀剂组合物及其用途

    公开(公告)号:US6048663A

    公开(公告)日:2000-04-11

    申请号:US230583

    申请日:1999-01-29

    CPC分类号: G03F7/0387

    摘要: A negative-working photoresist composition comprising 1,4-dihydropyridine derivative as a photosensitive material and a polyamic acid, a heat-resisting photoresist composition comprising a photosensitive polyamic acid which is excellent in sensitivity and resolution and can be easily developed with an aqueous alkali solution is provided. The negative-working photoresist composition contains a polyamic acid and a 1,4-dihydropyridine derivative represented by following formula (I): ##STR1## wherein Ar represents an aromatic group having a nitro group at the ortho-position; R.sup.1 represents an alkylene group having from 1 to 5 carbon atoms; and R.sup.2, R.sup.3, R.sup.4, and R.sup.5 each represents a hydrogen atom or an alkyl group having from 1 to 4 carbon atoms.

    摘要翻译: PCT No.PCT / JP97 / 02605 Sec。 371日期1999年1月29日第 102(e)1999年1月29日PCT PCT 1997年7月28日PCT公布。 公开号WO98 / 04959 日期1998年2月5日包含感光材料的1,4-二氢吡啶衍生物和聚酰胺酸的负性光致抗蚀剂组合物,包含感光性聚酰胺酸的耐热性光致抗蚀剂组合物,其灵敏度和分辨率优异且易于开发 提供碱性水溶液。 负性光刻胶组合物含有聚酰胺酸和下式(I)表示的1,4-二氢吡啶衍生物:其中Ar表示在邻位具有硝基的芳基; R1表示具有1至5个碳原子的亚烷基; 并且R 2,R 3,R 4和R 5各自表示氢原子或具有1至4个碳原子的烷基。

    Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method
    10.
    发明授权
    Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method 有权
    负型感光材料,使用负型感光材料的感光板和负型图案形成方法

    公开(公告)号:US08728705B2

    公开(公告)日:2014-05-20

    申请号:US12788837

    申请日:2010-05-27

    IPC分类号: G03F7/038 G03F7/38

    摘要: A negative photosensitive material is provided which has a lower linear expansion coefficient and a lower hygroscopic expansion coefficient and is excellent in gradational patternability and PI etchability in patterning. The negative photosensitive material comprises: (A) a polyimide precursor having a structural unit represented by the following general formula (1) and a structural unit represented by the following general formula (2), the structural unit represented by the general formula (2) being present in the polyimide precursor in a proportion of less than 30 mol % based on the overall amount of the polyimide precursor; and (B) at least one of a pyridine derivative represented by the following general formula (3) and a pyridine derivative represented by the following general formula (4): wherein R1, R2, R3, R4 and R5, which may be the same or different, are each a C1 to C4 alkyl group, and Ar is an aryl group having a nitro group at its ortho position, wherein R1, R2, R4 and R5, which may be the same or different, are each a C1 to C4 alkyl group, and Ar is an aryl group having a nitro group at its ortho position.

    摘要翻译: 提供具有较低线性膨胀系数和较低吸湿膨胀系数的负型感光材料,并且在图案化中具有优异的梯度图案性和PI可蚀刻性。 负型感光材料包括:(A)具有由以下通式(1)表示的结构单元和由以下通式(2)表示的结构单元的聚酰亚胺前体,由通式(2)表示的结构单元, 以聚酰亚胺前体的总量小于30mol%的比例存在于聚酰亚胺前体中; 和(B)由以下通式(3)表示的吡啶衍生物和由以下通式(4)表示的吡啶衍生物中的至少一种:其中R1,R2,R3,R4和R5可以相同 或不同的,各自为C1〜C4烷基,Ar为其邻位具有硝基的芳基,其中R1,R2,R4和R5可以相同或不同,分别为C1〜C4 烷基,Ar是在其邻位具有硝基的芳基。