Process for manufacturing printed wiring board using metal plating techniques
    2.
    发明授权
    Process for manufacturing printed wiring board using metal plating techniques 失效
    使用金属电镀技术制造印刷电路板的工艺

    公开(公告)号:US06662442B1

    公开(公告)日:2003-12-16

    申请号:US09619502

    申请日:2000-07-19

    IPC分类号: H01K310

    摘要: A process for producing a printed wiring board, particularly an interposer for a chip size package, which comprises the steps of (1) forming an outer insulator layer 22 having outer via-holes 24 on a substrate 32, (2) forming conducting passages 31 through the outer via-holes 24 by plating with metal up to substantially the same level as the upper surface of the outer insulator layer 22, (3) forming a thin metal film 29 on the outer insulator layer 22 and on the conducting passages 31, (4) forming a conductor layer 21 in a prescribed circuit pattern on the thin metal film 29 by plating, (5) removing the part of the thin metal film 29 on which the conductor layer 21 is not formed, (6) forming an inner insulator layer 23 on the conductor layer 21, and (7) removing the substrate 32. The outer insulator layer is formed with flatness to secure good adhesion to a semiconductor chip.

    摘要翻译: 一种用于制造印刷线路板的方法,特别是用于芯片尺寸封装的插入件,其包括以下步骤:(1)在基板32上形成具有外部通孔24的外部绝缘体层22,(2)形成导电通路31 通过用外部绝缘体层22的上表面大致相同的金属镀覆外部通孔24,(3)在外绝缘体层22和导电路31上形成薄金属膜29, (4)通过电镀在薄金属膜29上形成规定的电路图案的导体层21,(5)除去未形成导体层21的金属薄膜29的一部分,(6)形成内部 导体层21上的绝缘体层23,以及(7)去除衬底32.外绝缘层形成为平坦度,以确保对半导体芯片的良好粘合性。

    Photosensitive resin composition and use of the same
    8.
    发明授权
    Photosensitive resin composition and use of the same 有权
    感光树脂组合物及其用途

    公开(公告)号:US07008752B2

    公开(公告)日:2006-03-07

    申请号:US11081516

    申请日:2005-03-17

    IPC分类号: G03F7/004 C08F2/46

    摘要: A photosensitive resin composition which, when exposed to light through a photomask and then developed, can form a pattern comprising a polyimide film having a thickness of 20 μm or larger with high resolution; and a use of the composition, in particular, a method of forming a pattern comprising the polyimide film. The photosensitive resin composition comprises (a) a poly(amic acid), (b) a specific 1,4-dihydropyridine derivative, and (c) a specific imide acrylate compound.

    摘要翻译: 一种光敏树脂组合物,当通过光掩模曝光然后显影时,可以以高分辨率形成包含厚度为20μm或更大的聚酰亚胺膜的图案; 以及组合物的使用,特别是形成包含聚酰亚胺膜的图案的方法。 感光性树脂组合物包含(a)聚(酰胺酸),(b)特定的1,4-二氢吡啶衍生物和(c)特定的酰亚胺丙烯酸酯化合物。

    Photosensitive resin composition and adhesive
    9.
    发明授权
    Photosensitive resin composition and adhesive 失效
    感光树脂组合物和粘合剂

    公开(公告)号:US06300037B1

    公开(公告)日:2001-10-09

    申请号:US09437232

    申请日:1999-11-10

    IPC分类号: G03F7004

    摘要: An adhesive in the form of a patterned film is disclosed, which is obtained from a photositive resin composition and exhibits satisfactory adhesive properties even when used for electronic parts of various shapes having a rugged surface. The adhesive is obtained from a photosensitive polyimide resin precursor which, after pattern formation, melts upon heating. The adhesive has a melt viscosity at 250 ° C. from 1,000 to 1,000,000 Pa·s.

    摘要翻译: 公开了一种图案化膜形式的粘合剂,其由光树脂组合物获得并且即使用于具有粗糙表面的各种形状的电子部件也显示令人满意的粘合性能。 粘合剂由光敏聚酰亚胺树脂前体获得,其在图案形成之后在加热时熔融。 粘合剂在250℃下的熔融粘度为1,000至1,000,000Pa.s。

    Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method
    10.
    发明授权
    Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method 有权
    负型感光材料,使用负型感光材料的感光板和负型图案形成方法

    公开(公告)号:US08728705B2

    公开(公告)日:2014-05-20

    申请号:US12788837

    申请日:2010-05-27

    IPC分类号: G03F7/038 G03F7/38

    摘要: A negative photosensitive material is provided which has a lower linear expansion coefficient and a lower hygroscopic expansion coefficient and is excellent in gradational patternability and PI etchability in patterning. The negative photosensitive material comprises: (A) a polyimide precursor having a structural unit represented by the following general formula (1) and a structural unit represented by the following general formula (2), the structural unit represented by the general formula (2) being present in the polyimide precursor in a proportion of less than 30 mol % based on the overall amount of the polyimide precursor; and (B) at least one of a pyridine derivative represented by the following general formula (3) and a pyridine derivative represented by the following general formula (4): wherein R1, R2, R3, R4 and R5, which may be the same or different, are each a C1 to C4 alkyl group, and Ar is an aryl group having a nitro group at its ortho position, wherein R1, R2, R4 and R5, which may be the same or different, are each a C1 to C4 alkyl group, and Ar is an aryl group having a nitro group at its ortho position.

    摘要翻译: 提供具有较低线性膨胀系数和较低吸湿膨胀系数的负型感光材料,并且在图案化中具有优异的梯度图案性和PI可蚀刻性。 负型感光材料包括:(A)具有由以下通式(1)表示的结构单元和由以下通式(2)表示的结构单元的聚酰亚胺前体,由通式(2)表示的结构单元, 以聚酰亚胺前体的总量小于30mol%的比例存在于聚酰亚胺前体中; 和(B)由以下通式(3)表示的吡啶衍生物和由以下通式(4)表示的吡啶衍生物中的至少一种:其中R1,R2,R3,R4和R5可以相同 或不同的,各自为C1〜C4烷基,Ar为其邻位具有硝基的芳基,其中R1,R2,R4和R5可以相同或不同,分别为C1〜C4 烷基,Ar是在其邻位具有硝基的芳基。