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42 条记录 (耗时 0.042 秒)

    Sensor card
    5.
    发明授权
    Sensor card 失效
    传感器卡

    公开(公告)号：US4972099A

    公开(公告)日：1990-11-20

    申请号：US302293

    申请日：1989-01-27

    申请人： Hideaki Amano ,  Yoshiaki Kudo

    发明人： Hideaki Amano ,  Yoshiaki Kudo

    IPC分类号： G01D21/00 ,  B42D15/10 ,  G01D1/00 ,  G01D9/00 ,  G01D21/02 ,  G01K1/02 ,  G06K19/00 ,  G06K19/077 ,  G07C3/00 ,  G07C5/08

    CPC分类号： G06K19/0716 ,  G01D1/00 ,  G01D21/02 ,  G01D9/005 ,  G01K1/02 ,  G06K19/077 ,  G07C3/00 ,  G07C5/0858

    摘要： A sensor card includes a signal card substrate in which are mounted a sensor for sensing an external physical phenonemon and for converting the sensed physical phenomenon into an electric signal. An integrated circuit processes the output of the sensor and stores the sensed value represented thereby in a memory. An output terminal outputs the sensed value stored in the memory of the integrated circuit. The sensor card can be adapted not only to store signal-processed detection values but also to have a function for subjecting these signals to computation or evaluation. The stored data can be read out to an external unit in the form of a signal through a physical contact or magnetically in contactless fashion.

    摘要翻译： 传感器卡包括信号卡基板，其中安装有用于感测外部物理遮罩的传感器并将感测的物理现象转换成电信号。 集成电路处理传感器的输出并将由此表示的感测值存储在存储器中。 输出端子输出存储在集成电路的存储器中的感测值。 传感器卡不仅可以用于存储信号处理的检测值，而且还具有对这些信号进行计算或评估的功能。 存储的数据可以通过物理接触或以非接触方式以信号的形式被读出到外部单元。

    Magnetic disk device including humidity controller in disk enclosure
    6.
    发明授权
    Magnetic disk device including humidity controller in disk enclosure 失效
    磁盘设备包括磁盘盒中的湿度控制器

    公开(公告)号：US5075807A

    公开(公告)日：1991-12-24

    申请号：US493318

    申请日：1990-03-14

    申请人： Yoichi Inoue ,  Katsuyuki Tanaka ,  Hideaki Amano

    发明人： Yoichi Inoue ,  Katsuyuki Tanaka ,  Hideaki Amano

    IPC分类号： G11B25/04 ,  G11B33/14

    CPC分类号： G11B33/1453 ,  G11B25/043 ,  G11B33/1486

    摘要： There is provided a magnetic recording device including recording mediums and an airtight enclosure containing the recording mediums therein and having a fine breathing hole created therethrough communicating with the outside thereof, wherein at least two types of moisture adsorbents composed of a one way type moisture adsorbent which adsorbs moisture and a reversible type moisture adsorbent which adsorbs moisture in high humidity and conversely discharges the same in low humidity are disposed in the cabinet and used in combination. There is also provided the same device except wherein gas adsorbents and moisture adsorbents are used in combination.

    摘要翻译： 提供了一种磁记录装置，包括记录介质和包含其中的记录介质的气密外壳，并具有与其外部连通的通孔，其中形成有精细的呼吸孔，其中至少两种类型的水分吸附剂由单向型水分吸附剂组成， 吸收水分，并将可吸湿型吸湿剂吸附在高湿度的水分中，并相反地将其在低湿度下放电，并且组合使用。 除了组合使用气体吸附剂和水分吸附剂之外，还提供了相同的装置。

    Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor
    7.
    发明授权
    Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor 失效
    电极，感受体，等离子体处理装置及制作电极和感受体的方法

    公开(公告)号：US07337745B1

    公开(公告)日：2008-03-04

    申请号：US09667777

    申请日：2000-09-22

    申请人： Mitsuaki Komino ,  Hideaki Amano ,  Shosuke Endo ,  Toshiaki Fujisato ,  Yasuharu Sasaki

    发明人： Mitsuaki Komino ,  Hideaki Amano ,  Shosuke Endo ,  Toshiaki Fujisato ,  Yasuharu Sasaki

    IPC分类号： C23C16/509 ,  C23F1/00 ,  H01L21/306 ,  C23C16/46

    CPC分类号： H01L21/6831

    摘要： A susceptor 24 includes a heater 38 disposed in a planar state, upper and lower ceramic-metal composites 40A and 40B disposed so as to sandwich the heater 38 from above and from below, and a ceramic electrostatic chuck 28 for attracting and holding an object to be treated, W. The electrostatic chuck is joined to an upper surface of the upper ceramic-metal composite 40A. The electrostatic chuck 28 has nearly the same coefficient of linear thermal expansion as that of the upper ceramic-metal composite 40A. Thus, peeling or cracking of the electrostatic chuck 28 due to the difference in thermal expansion and contraction between the electrostatic chuck 28 and the upper ceramic-metal composite 40A can be prevented.

    摘要翻译： 基座24包括设置在平面状态的加热器38，设置成从上下夹着加热器38的上下陶瓷金属复合体40A和40B以及用于吸引和保持加热器38的陶瓷静电卡盘28 静电卡盘与上部陶瓷 - 金属复合材料40A的上表面接合。静电卡盘28具有与上部陶瓷 - 金属复合材料40A的线性热膨胀系数几乎相同的线性热膨胀系数 因此，可以防止由于静电卡盘28和上部陶瓷 - 金属复合材料40A之间的热膨胀和收缩的差异导致的静电卡盘28的剥离或破裂。

    Plasma processing method
    8.
    发明授权
    Plasma processing method 失效
    等离子体处理方法

    公开(公告)号：US06392350B1

    公开(公告)日：2002-05-21

    申请号：US09656214

    申请日：2000-09-06

    申请人： Hideaki Amano

    发明人： Hideaki Amano

    IPC分类号： H05H116

    CPC分类号： C23C16/511 ,  C23C16/401 ,  C23C16/402 ,  H01J37/32192 ,  H01J37/3266 ,  H01L21/0212 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/022 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/31116 ,  H01L21/312 ,  H01L21/3127 ,  H01L21/31629 ,  H01L21/3185 ,  H01L21/32136 ,  H01L21/76804

    摘要： There is provided a method capable of shortening a preheat time when a thin film is deposited after a preheat is carried out. The current values of a main electromagnetic coil and an auxiliary electromagnetic coil during a preheat and during a thin-film deposition are set to be different from each other to change the shape of an obtained magnetic field so that the magnetic field has a small magnetic flux density although it has higher uniformity during the thin-film deposition, whereas the magnetic field has a large magnetic flux density although it has lower uniformity during the preheat. As a result, a substantially uniform plasma is produced in the plane of a wafer during the thin-film deposition, so that it is possible to carry out a uniform thin-film deposition. On the other hand, during the preheat, a plasma having a larger density than that during the thin-film deposition is produced although the uniformity thereof is lower. Therefore, the heat gain into the wafer is greater than that during the thin-film deposition, so that it is possible to shorten the preheat time.

    摘要翻译： 提供了一种能够在预热进行之后沉积薄膜时缩短预热时间的方法。 将预热和薄膜沉积期间的主电磁线圈和辅助电磁线圈的电流值设定为彼此不同，以改变所获得的磁场的形状，使得磁场具有小的磁通量 密度虽然在薄膜沉积期间具有更高的均匀性，而磁场具有大的磁通密度，尽管其在预热期间具有较低的均匀性。 结果，在薄膜沉积期间在晶片的平面中产生基本上均匀的等离子体，使得可以进行均匀的薄膜沉积。 另一方面，在预热期间，尽管其均匀性较低，但是产生具有比薄膜沉积期间更大的密度的等离子体。 因此，进入晶片的热增益大于薄膜沉积期间的热增益，从而可以缩短预热时间。

    Plasma treatment system and method
    10.
    发明授权
    Plasma treatment system and method 失效
    等离子体处理系统及方法

    公开(公告)号：US06333269B2

    公开(公告)日：2001-12-25

    申请号：US09153141

    申请日：1998-09-14

    申请人： Yoko Naito ,  Hideaki Amano

    发明人： Yoko Naito ,  Hideaki Amano

    IPC分类号： H01L213065

    CPC分类号： H01J37/32192 ,  C23C16/511 ,  H01J37/32678 ,  H01L21/02131 ,  H01L21/02164 ,  H01L21/022 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/31612 ,  H01L21/31629

    摘要： It is an object to enhance the degree of freedom for the shape of an obtained magnetic field to enhance the inplane uniformity of thickness of first and second films when the first and second films are continuously formed on a substrate to be treated. A main electromagnetic coil 5 is provided outside of a plasma chamber 21 so as to be movable vertically by a lifting shaft 52. When plasma is produced in a vacuum vessel 2 by the electron cyclotron resonance between a microwave and a magnetic field to continuously deposit a film of a two-layer structure, which comprises an SiOF film and an SiO2 film, on a wafer W with the produced plasma, a process for forming the SiOF film is carried out while the main electromagnetic coil 5 is arranged so that the lower surface of the coil 5 is positioned at a lower position than the lower surface of a transmission window 23 by 139 mm, and a process for forming the SiO2 film is carried out while the main electromagnetic coil 5 is arranged so that the lower surface of the coil 5 is positioned at a lower position than the lower surface of the transmission 23 by 157 mm.

    摘要翻译： 本发明的目的是提高所获得的磁场的形状的自由度，以在第一和第二膜连续地形成在待处理的基板上时增强第一和第二膜的厚度的面内均匀性。 主电磁线圈5设置在等离子体室21的外部，以便通过提升轴52可垂直移动。当通过微波和磁场之间的电子回旋共振在真空容器2中产生等离子体以连续沉积 在具有所产生的等离子体的晶片W上包括SiOF膜和SiO 2膜的两层结构的膜，进行形成SiOF膜的工艺，同时主电磁线圈5被布置成使得下电极 线圈5位于比透射窗23的下表面低139mm的位置，并且在主电磁线圈5被布置成使得线圈的下表面被布置的同时执行用于形成SiO 2膜的工艺 5位于比变速器23的下表面低157mm的位置。