Semiconductor wafer with reduced thickness variation and method for fabricating same
    1.
    发明授权
    Semiconductor wafer with reduced thickness variation and method for fabricating same 有权
    厚度变化减小的半导体晶片及其制造方法

    公开(公告)号:US08987898B2

    公开(公告)日:2015-03-24

    申请号:US13154360

    申请日:2011-06-06

    摘要: According to one embodiment, a semiconductor wafer comprises a plurality of solder bumps for providing device contacts formed over a functional region of the semiconductor wafer, and one or more support rings surrounding the functional region. The one or more support rings and the plurality of solder bumps are formed so as to have substantially matching heights. The presence of the one or more support rings causes the semiconductor wafer to have a substantially uniform thickness in the functional region after a thinning process is performed on the semiconductor wafer. A method for fabricating the semiconductor wafer comprises forming the plurality of solder bumps over the functional region, and forming the one or more support rings surrounding the functional region before performing the thinning process on the semiconductor wafer.

    摘要翻译: 根据一个实施例,半导体晶片包括用于提供形成在半导体晶片的功能区域上的器件触点的多个焊料凸块和围绕功能区域的一个或多个支撑环。 一个或多个支撑环和多个焊料凸块被形成为具有基本匹配的高度。 一个或多个支撑环的存在使得半导体晶片在半导体晶片上执行变薄处理之后,在功能区域中具有基本均匀的厚度。 制造半导体晶片的方法包括在功能区域之上形成多个焊料凸块,以及在对半导体晶片进行稀化处理之前形成围绕功能区域的一个或多个支撑环。

    Semiconductor Wafer with Reduced Thickness Variation and Method for Fabricating Same
    2.
    发明申请
    Semiconductor Wafer with Reduced Thickness Variation and Method for Fabricating Same 有权
    具有降低厚度变化的半导体晶片及其制造方法

    公开(公告)号:US20120306072A1

    公开(公告)日:2012-12-06

    申请号:US13154360

    申请日:2011-06-06

    IPC分类号: H01L23/488 H01L21/60

    摘要: According to one embodiment, a semiconductor wafer comprises a plurality of solder bumps for providing device contacts formed over a functional region of the semiconductor wafer, and one or more support rings surrounding the functional region. The one or more support rings and the plurality of solder bumps are formed so as to have substantially matching heights. The presence of the one or more support rings causes the semiconductor wafer to have a substantially uniform thickness in the functional region after a thinning process is performed on the semiconductor wafer. A method for fabricating the semiconductor wafer comprises forming the plurality of solder bumps over the functional region, and forming the one or more support rings surrounding the functional region before performing the thinning process on the semiconductor wafer.

    摘要翻译: 根据一个实施例,半导体晶片包括用于提供形成在半导体晶片的功能区域上的器件触点的多个焊料凸块和围绕功能区域的一个或多个支撑环。 一个或多个支撑环和多个焊料凸块被形成为具有基本匹配的高度。 一个或多个支撑环的存在使得半导体晶片在半导体晶片上执行变薄处理之后,在功能区域中具有基本均匀的厚度。 制造半导体晶片的方法包括在功能区域之上形成多个焊料凸块,以及在对半导体晶片进行稀化处理之前形成围绕功能区域的一个或多个支撑环。

    Wafer singulation process
    6.
    发明授权
    Wafer singulation process 有权
    晶圆切割过程

    公开(公告)号:US08153464B2

    公开(公告)日:2012-04-10

    申请号:US11582756

    申请日:2006-10-18

    申请人: Robert Montgomery

    发明人: Robert Montgomery

    IPC分类号: H01L21/00

    CPC分类号: H01L21/78

    摘要: A method of singulating a semiconductor die from a wafer is provided. The method includes etching or cutting several trenches into the wafer from a front surface of the wafer, such that each trench extends along an entire side of the die; depositing a passivation layer into the trenches to form a passivation plug on at least a bottom of the trenches to protect the dies and immobilize them during singulation; and forming a rigid carrier layer or plate at the first side of the wafer to secure the dies. The wafer is then ground from the back side to expose the bottom of each trench, a metal layer is formed on the back surface of the wafer; dicing tape is added, the carrier layer is removed, and the die is separated from the wafer by laser cutting or by flexing the tape.

    摘要翻译: 提供了一种从晶片上分离半导体管芯的方法。 该方法包括从晶片的前表面蚀刻或切割晶片中的多个沟槽,使得每个沟槽沿模具的整个侧面延伸; 将钝化层沉积到所述沟槽中以在所述沟槽的至少底部上形成钝化塞,以保护所述管芯并在分割过程中将其固定; 以及在所述晶片的第一侧上形成刚性载体层或板以固定所述模具。 然后将晶片从后侧研磨以暴露每个沟槽的底部,在晶片的背面上形成金属层; 加入切割胶带,除去载体层,通过激光切割或通过使胶带弯曲将模具与晶片分离。

    Methods and Kits for Measuring Von Willebrand Factor
    7.
    发明申请
    Methods and Kits for Measuring Von Willebrand Factor 有权
    测量血液血友病因子的方法和试剂盒

    公开(公告)号:US20120003670A1

    公开(公告)日:2012-01-05

    申请号:US13153105

    申请日:2011-06-03

    申请人: Robert Montgomery

    发明人: Robert Montgomery

    摘要: Methods and kits for measuring levels of von Willebrand factor function in a sample without using a platelet aggregation agonist, such as ristocetin, comprising recombinant glycoprotein Ibα having at least two of a G233V, D235Y and M239V mutations and an agent to detect a complex between the recombinant glycoprotein Ibα and von Willebrand factor.

    摘要翻译: 用于测量样品中von Willebrand因子功能水平的方法和试剂盒,不使用血小板聚集激动剂如瑞斯他汀,其包含具有G233V,D235Y和M239V突变中的至少两个的重组糖蛋白Ibα和检测其中的复合物 重组糖蛋白Ibα和von Willebrand因子。

    METHODS AND KITS FOR MEASURING VON WILLEBRAND FACTOR
    8.
    发明申请
    METHODS AND KITS FOR MEASURING VON WILLEBRAND FACTOR 有权
    用于测量VIL WBRLBRAND因子的方法和工具

    公开(公告)号:US20090142779A1

    公开(公告)日:2009-06-04

    申请号:US12197057

    申请日:2008-08-22

    申请人: Robert Montgomery

    发明人: Robert Montgomery

    IPC分类号: G01N33/53

    摘要: Methods and kits for measuring levels of von Willebrand factor function in a sample without using a platelet aggregation agonist, such as ristocetin, comprising recombinant glycoprotein Ibα having at least two of a G233V, D235Y and M239V mutations and an agent to detect a complex between the recombinant glycoprotein Ibα and von Willebrand factor.

    摘要翻译: 用于测量样品中von Willebrand因子功能水平的方法和试剂盒,不使用血小板聚集激动剂如瑞斯他汀,其包含具有至少两个G233V,D235Y和M239V突变的重组糖蛋白Ibalpha,以及用于检测 重组糖蛋白Ibalpha和von Willebrand因子。