Low temperature-sinterable dielectric composition and thick film
capacitor using the same
    5.
    发明授权
    Low temperature-sinterable dielectric composition and thick film capacitor using the same 失效
    低温烧结电介质组合物和使用其的厚膜电容器

    公开(公告)号:US4308571A

    公开(公告)日:1981-12-29

    申请号:US134281

    申请日:1980-03-26

    摘要: A low temperature-sinterable dielectric composition is provided, whose sintered composition when prepared by firing a uniform mixture consisting of lead ferrotungstate, lead titanate and manganese dioxide at a temperature of not higher than 1,000.degree. C. has the general formula A.Pb(Fe.sub.2/3 W.sub.1/3).sub.1-x Ti.sub.x O.sub.3 +B.MnO.sub.2, wherein 0.005.ltoreq..times..ltoreq.0.65, A=0.95-0.9995, and B=0.0005-0.05, a relative dielectric constant of at least 2,000 at 25.degree. C., a dissipation factor (tan .delta.) of not more than 5% at 25.degree. C., and a specific resistance of at least 10.sup.9 .OMEGA..cm at 25.degree. C. Also provided is a thick film capacitor having a dielectric layer prepared from said composition.

    摘要翻译: 提供了一种低温可烧结电介质组合物,其烧结组合物通过在不高于1000℃的温度下焙烧由钨酸铅,钛酸铅和二氧化锰组成的均匀混合物制备,具有通式A.Pb(Fe2 其中0.005≤x≤0.65,A = 0.95-0.9995和B = 0.0005-0.05,在25℃下的相对介电常数至少为2000。 ,在25℃下的损耗因子(tanδ)不超过5%,在25℃下的电阻率为至少为10Ω.EGEGA·cm。还提供了一种厚膜电容器,其具有由所述 组成。

    Magnetic disc substrate
    6.
    发明授权
    Magnetic disc substrate 失效
    磁盘基板

    公开(公告)号:US5494721A

    公开(公告)日:1996-02-27

    申请号:US112255

    申请日:1993-08-26

    摘要: A substrate for a magnetic disc, which comprises a crystallized glass consisting essentially of an amorphous glass continuous phase and crystal particles dispersed in the continuous phase, the substrate having fine projections of the crystal particles on the surface thereof, a method of producing the substrate, the magnetic disc using the substrate, and a method of producing the magnetic disc are provided. The crystallized glass is made from a glass material of a Li.sub.2 O--SiO.sub.2, Li.sub.2 O--Al.sub.2 O.sub.3 --SiO.sub.2, Li.sub.2 O--MgO--Al.sub.2 O.sub.3 --SiO.sub.2, MgO--Al.sub.2 O.sub.3 --SiO.sub.2, Na.sub.2 O--Al.sub.2 O.sub.3 --SiO .sub.2 or BaO--Al.sub.2 O.sub.3 --SiO.sub.2 system, and the crystal particles have one or more compositions selected from Li.sub.2 O--SiO.sub.2, Li.sub.2 O.2SiO.sub.2, Li.sub.2 O.Al.sub.2 O.sub.3.2Si.sub.2, Li.sub.2 O.Al.sub.2 O.sub.3 4SiO.sub.2, SiO.sub.2 and 2MgO--2Al.sub.2 O.sub.3.5SiO.sub.2, and an average particle size of 0.01 to 3.0 .mu.m, and are projected at a density of 10.sup.2 to 10.sup.6 / mm.sup.2 and at an average height of 0.005 to 0.2 .mu.m on the surface of the substrate, the total surface area of the projections of crystal particles occupying at most 30% of the unit surface area of the substrate. The projections are made by chemical etching with an aqueous solution of hydrofluoric acid, physical etching with sputtering under vacuum or ion-milling, or mechanical etching with sand blasting. The magnetic disc comprises the crystallized glass substrate, a chromium or chromium alloy undercoat film, thin magnetic film, protective carbon film and lubricant film.

    摘要翻译: 一种用于磁盘的基板,其包括基本上由无定形玻璃连续相组成的结晶玻璃和分散在连续相中的晶体颗粒,所述基板在其表面上具有晶体颗粒的微小突起,制造基板的方法, 提供使用该基板的磁盘及其制造方法。 结晶玻璃由Li2O-SiO2,Li2O-Al2O3-SiO2,Li2O-MgO-Al2O3-SiO2,MgO-Al2O3-SiO2,Na2O-Al2O3-SiO2或BaO-Al2O3-SiO2体系的玻璃材料制成, 所述结晶粒子具有选自Li 2 O-SiO 2,Li 2 O 2·SiO 2,Li 2 O·Al 2 O 3·2Si 2,Li 2 O·Al 2 O 34·SiO 2,SiO 2和2MgO·2Al 2 O 3·5SiO 2中的一种以上的组成,平均粒径为0.01〜3.0μm, 投影在基板表面上的密度为102〜106 / mm 2,平均高度为0.005〜0.2μm,晶体颗粒的突起的总表面积占据了单体表面积的至多30% 基质。 通过用氢氟酸的水溶液进行化学蚀刻,在真空下进行溅射物理蚀刻或离子研磨或通过喷砂机械蚀刻来进行突起。 磁盘包括结晶玻璃基板,铬或铬合金底涂层,薄磁膜,保护性碳膜和润滑膜。

    Magnetic disc comprising a substrate of an amorphous glass continuous
phase dispersed with crystal particles which produce a structurally
defined surface on the substrate
    7.
    发明授权
    Magnetic disc comprising a substrate of an amorphous glass continuous phase dispersed with crystal particles which produce a structurally defined surface on the substrate 失效
    磁盘包括分散有晶体颗粒的无定形玻璃连续相的基底,其在基底上产生结构上限定的表面

    公开(公告)号:US5093173A

    公开(公告)日:1992-03-03

    申请号:US462775

    申请日:1990-01-10

    摘要: A substrate for a magnetic disc, which comprises a crystallized glass consisting essentially of an amorphous glass continuous phase and crystal particles dispersed in the continuous phase, the substrate having fine projections of the crystal particles on the surface thereof, a method of producing the substrate, the magnetic disc using the substrate, and a method of producing the magnetic disc are provided. The crystallized glass is made from a glass material of a Li.sub.2 O-SiO.sub.2, Li.sub.2 O-Al.sub.2 O.sub.3 -SiO.sub.2, Li.sub.2 O-MgO-Al.sub.2 O.sub.3 -SiO.sub.2, MgO-Al.sub.2 O.sub.3 -SiO.sub.2, Na.sub.2 O-Al.sub.2 O.sub.3 -SiO.sub.2 or BaO-Al.sub.2 O.sub.3 -SiO.sub.2 system, and the crystal particles have one or more compositions selected from Li.sub.2 O.multidot.SiO.sub.2, Li.sub.2 O.multidot.2SiO.sub.2, Li.sub.2 O.multidot.Al.sub.2 O.sub.3 .multidot.2SiO.sub.2, Li.sub.2 O.multidot.Al.sub.2 O.sub.3 .multidot.4SiO.sub.2, SiO.sub.2 and 2MgO.multidot.2Al.sub.2 O.sub.3 .multidot.5SiO.sub.2, and an average particle size of 0.01 to 3.0 .mu.m, and are projected at a density of 10.sup.2 to 10.sup.6 /mm.sup.2 and at an average height of 0.005 to 0.2 .mu.m on the surface of the substrate, the total surface area of the projections of crystal particles occupying at most 30% of the unit surface area of the substrate. The projections are made by chemical etching with an aqueous solution of hydrofluoric acid, physical etching with sputtering under vacuum or ion-milling, or mechanical etching with sand blasting. The magnetic disc comprises the crystallized glass substrate, a chromium or chromium alloy undercoat film, thin magnetic film, protective carbon film and lubricant film.

    摘要翻译: 一种用于磁盘的基板,其包括基本上由无定形玻璃连续相组成的结晶玻璃和分散在连续相中的晶体颗粒,所述基板在其表面上具有晶体颗粒的微小突起,制造基板的方法, 提供使用该基板的磁盘及其制造方法。 结晶玻璃由Li2O-SiO2,Li2O-Al2O3-SiO2,Li2O-MgO-Al2O3-SiO2,MgO-Al2O3-SiO2,Na2O-Al2O3-SiO2或BaO-Al2O3-SiO2体系的玻璃材料制成, 晶体颗粒具有选自Li 2 O x SiO 2,Li 2 O x 2 SiO 2,Li 2 O x Al 2 O 3 xSiSiO 2,Li 2 O x Al 2 O 3 x 4 SiO 2,SiO 2和2MgO 2 Al 2 O x xSiSiO 2中的一种或多种组合物,平均粒径为0.01〜3.0μm,以102〜106 / mm 2的密度投影,平均高度 在基板表面上为0.005〜0.2μm,晶体颗粒的突起的总表面积占基板的单位面积的至多30%。 通过用氢氟酸的水溶液进行化学蚀刻,在真空下进行溅射物理蚀刻或离子研磨或通过喷砂机械蚀刻来进行突起。 磁盘包括结晶玻璃基板,铬或铬合金底涂层,薄磁膜,保护性碳膜和润滑膜。