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    Scuff resistant compositions comprising ethylene acid copolymers and polyamides
    2.
    发明申请
    Scuff resistant compositions comprising ethylene acid copolymers and polyamides 审中-公开
    包含乙烯酸共聚物和聚酰胺的防刮擦组合物

    公开(公告)号：US20050020762A1

    公开(公告)日：2005-01-27

    申请号：US10861973

    申请日：2004-06-04

    申请人： Richard Chou ,  Karlheinz Hausmann

    发明人： Richard Chou ,  Karlheinz Hausmann

    IPC分类号： B32B27/08 ,  B32B27/32 ,  B32B27/34 ,  C08L23/02 ,  C08L23/08 ,  C08L77/00 ,  C08L77/02 ,  C08L77/06 ,  C08K3/00

    CPC分类号： B32B27/08 ,  B32B27/20 ,  B32B27/308 ,  B32B27/32 ,  B32B27/34 ,  B32B27/36 ,  B32B37/153 ,  B32B2307/412 ,  B32B2307/584 ,  B32B2307/756 ,  B32B2323/04 ,  B32B2333/12 ,  B32B2367/00 ,  B32B2377/00 ,  B32B2419/04 ,  B32B2451/00 ,  B32B2553/00 ,  B32B2571/00 ,  C08L23/02 ,  C08L23/0876 ,  C08L77/00 ,  C08L77/02 ,  C08L77/06 ,  C08L2666/20 ,  C08L2666/06

    摘要： Disclosed are compositions of ethylene acid copolymers and polyamides that are useful for fabricating films, sheets and molded articles for scuff and scratch resistant material and their application as decorative and protective films, comprising (1) from about 30 to about 65 weight % of a polyamide; and (2) from about 70 to about 35 weight % of a copolymer of (a) ethylene; (b) from about 5 weight % to about 15 weight % of an α,β-unsaturated C3-C8 carboxylic acid; (c) from about 0.5 weight % to about 12 weight % of at least one comonomer that is an ethylenically unsaturated dicarboxylic acid; and (d) from 0 weight % to about 30 weight % of monomers selected from alkyl acrylate and alkyl methacrylate, wherein the alkyl groups have from one to twelve carbon atoms; at least partially neutralized by one or more alkali metal, transition metal, or alkaline earth metal cations. Articles prepared from these compositions, such as films, show high toughness, good mechanical properties, excellent scratch and scuff resistance and, most importantly, good optical properties. More particularly, the compositions of ethylene copolymers and polyamides of the present invention can be used as protective coatings or layers on scuff- and scratch-exposed objects.

    摘要翻译： 公开了可用于制造用于防刮擦和耐划伤材料的薄膜，片材和模塑制品的乙烯酸共聚物和聚酰胺的组合物，以及它们作为装饰和保护膜的应用，其包含（1）约30至约65重量％的聚酰胺 ; 和（2）约70-约35重量％的（a）乙烯共聚物; （b）约5重量％至约15重量％的α，β-不饱和C3-C8羧酸; （c）约0.5重量％至约12重量％的至少一种作为烯属不饱和二羧酸的共聚单体; 和（d）0重量％至约30重量％的选自丙烯酸烷基酯和甲基丙烯酸烷基酯的单体，其中烷基具有1至12个碳原子; 至少部分被一种或多种碱金属，过渡金属或碱土金属阳离子中和。 由这些组合物制备的制品，例如薄膜，显示出高韧性，良好的机械性能，优异的耐划伤性和耐擦伤性，最重要的是具有良好的光学性能。 更具体地说，本发明的乙烯共聚物和聚酰胺的组合物可以用作防刮伤和划伤的物体上的保护性涂层或层。

    Gas-Containing Surface Cover, Arrangement, And Use
    5.
    发明申请
    Gas-Containing Surface Cover, Arrangement, And Use 有权
    含气体表面覆盖物，布置和使用

    公开(公告)号：US20150273791A1

    公开(公告)日：2015-10-01

    申请号：US14382482

    申请日：2013-02-22

    申请人： Baden-Württemberg Stiftung gGmbH

    发明人： Thomas Schimmel

    IPC分类号： B32B3/30

    CPC分类号： B63B59/04 ,  A41D2400/24 ,  B05D5/02 ,  B05D5/083 ,  B32B3/30 ,  B32B2250/02 ,  B32B2255/26 ,  B32B2307/724 ,  B32B2307/728 ,  B32B2307/73 ,  B32B2307/752 ,  B32B2307/756 ,  B32B2597/00 ,  B32B2605/12 ,  B63B1/38 ,  B63B2001/387 ,  F15D1/008 ,  F16L57/06 ,  F16L58/02 ,  Y02T70/122 ,  Y02T70/123 ,  Y10T156/10

    摘要： An aspect of the invention relates to a surface cover for a body which can be brought into contact with a liquid, comprising: a layer which at least partly contains gas and which is designed and arranged such that at least some sections of a layer face facing the liquid contacts the liquid; a gas-permeable layer which is arranged on the gas-containing layer on a face that faces the body and is opposite the face facing the liquid or which is integrally formed with the gas-containing layer; and a gas-supplying device which is connected to the gas-permeable layer such that gas can flow from the gas-supplying device to the gas-containing layer through the gas-permeable layer. The invention also relates to an arrangement and a use.

    摘要翻译： 本发明的一个方面涉及一种能够与液体接触的主体表面罩，包括：至少部分地包含气体的层，其被设计和布置为使得层的至少一些部分面向 液体接触液体; 透气层，其设置在面对主体并与面向液体的面相对的或与气体含有层一体形成的面上的含气层上; 以及气体供给装置，其连接到透气层，使得气体可以通过透气层从气体供给装置流到含气体层。 本发明还涉及一种布置和用途。