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公开(公告)号:KR101810310B1
公开(公告)日:2017-12-18
申请号:KR1020157034723
申请日:2011-01-25
申请人: 에베 그룹 에. 탈너 게엠베하
发明人: 플라흐,토마스 , 힝얼,쿠르트 , 빔프링어,마르쿠스 , 플뢰트겐,크리스토프
IPC分类号: H01L21/18 , H01L21/70 , H01L21/20 , H01L21/762
CPC分类号: H01L24/83 , H01L21/187 , H01L21/2007 , H01L21/70 , H01L21/76251 , H01L24/80 , H01L2224/80907 , H01L2224/83009 , H01L2224/83894 , H01L2224/83907 , H01L2924/01001 , H01L2924/01007 , H01L2924/01008 , H01L2924/01018 , H01L2924/20102 , H01L2924/20103 , H01L2924/20104 , H01L2924/20105 , H01L2924/20106
摘要: 본발명은, 제 1 기질의제 1 접촉표면(3)을하기단계들특히, 하기시퀀스에따라제 2 기질(2)의제 2 접촉표면(4)에결합시키기위한결합방법에관한것이고, - 상기제 1 접촉표면(3)상의표면층(6)내에리저버(5)를형성하는단계, - 제 1 추출물또는제 1 그룹의추출물로상기리저버(5)를적어도부분적으로충진하는단계, - 예비결합연결부를형성하기위하여상기제 2 접촉표면(4)과제 1 접촉표면(3)이접촉하는단계, - 상기제 1 및제 2 접촉표면(3,4)들사이에위치하고상기제 2 기질(2)의반응층(7)내에포함된제 2 추출물과제 1 추출물의반응에의해강화되는영구적인결합을형성하는단계를포함하는것을특징으로한다.
摘要翻译: 本发明是液体涉及如权利要求1中的一个的相结合的方法,以在特定的接触面(3),到衬底根据序列,其中,(4)粘接在第二基板(2)的议程第二接触表面 在第一接触表面(3)上的表面层(6)中形成储存器(5),用第一提取物或第一组提取物至少部分地填充储存器(5) 将第二接触表面(4)的接触表面(3)与第二基板(2)的接触表面(3)接触, 以形成通过包含在层(7)中的第二萃取物质1的萃取物的反应而增强的永久结合。
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公开(公告)号:KR1020150013048A
公开(公告)日:2015-02-04
申请号:KR1020140093213
申请日:2014-07-23
申请人: 닛토덴코 가부시키가이샤
CPC分类号: H01L24/29 , H01L24/27 , H01L24/73 , H01L24/83 , H01L25/0657 , H01L2224/27436 , H01L2224/2929 , H01L2224/29386 , H01L2224/32145 , H01L2224/32225 , H01L2224/45 , H01L2224/45124 , H01L2224/45144 , H01L2224/45147 , H01L2224/48 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/83191 , H01L2224/83203 , H01L2224/85 , H01L2224/85207 , H01L2224/92247 , H01L2225/0651 , H01L2225/06565 , H01L2225/06568 , H01L2924/00014 , H01L2924/15747 , H01L2924/181 , H01L2924/20103 , H01L2924/20104 , H01L2924/20105 , H01L2924/20106 , H01L2924/0665 , H01L2924/067 , H01L2924/0635 , H01L2924/00012 , H01L2224/05599 , H01L2924/00
摘要: 본 발명은 고온에서 장시간 열처리한 조건에 있어서도, 밀봉 공정 후에 다이본딩 필름과 피착체의 경계에 기포(보이드)가 저류되는 것을 억제할 수 있고, 또한, 냉장 수송, 보관했을 때에도 필름에 금, 깨짐, 파편이 발생하는 것을 억제하는 것이 가능한 다이싱 테이프 부착 다이본딩 필름을 제공하기 위한 것으로, 다이싱 테이프와 다이본딩 필름을 갖고, 다이본딩 필름이, 열가소성 수지(a)와, 25℃에서의 점도가 0.1 내지 50Pa·sec인 열경화성 수지(b)를 함유하고, 열경화성 수지(b)가 에폭시 수지 및 페놀 수지로 이루어지는 군에서 선택되는 하나 이상이며, 열경화성 수지(b)의 전체 수지 성분에 대한 함유량이 1중량% 이상 50중량% 이하이고, 170℃에서 1시간 가열 경화한 후의 260℃에서의 저장 탄성률이 0.05㎫ 이상인 다이싱 테이프 부착 다이본딩 필름.
摘要翻译: 本发明提供一种即使在长期的高温加热过程中即使在密封过程中也能够防止物体边界处的空隙和芯片接合薄膜的切割带附着的芯片接合薄膜, 即使在运输和储存冷库中也会出现裂纹,断裂和碎片。 本发明包括切割带和芯片接合膜。 芯片接合膜含有热固性塑料(a)和在25℃下粘度为0.1〜50Pa·sec的热固性塑料(b)。 热固性塑料(b)是选自由环氧树脂和酚醛树脂组成的组中的至少一种。 热固化性塑料(b)在整个树脂中的含量为1重量%至50重量%,并且在170℃下加热1小时后,在260℃下的储能模量为0.02MPa以上。
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公开(公告)号:KR1020110008144A
公开(公告)日:2011-01-26
申请号:KR1020100125842
申请日:2010-12-09
申请人: 닛토덴코 가부시키가이샤
CPC分类号: H01L24/85 , H01L21/6836 , H01L24/27 , H01L24/29 , H01L24/32 , H01L24/45 , H01L24/48 , H01L24/73 , H01L24/83 , H01L24/92 , H01L25/0657 , H01L25/50 , H01L2221/68327 , H01L2224/274 , H01L2224/2919 , H01L2224/32145 , H01L2224/32225 , H01L2224/32245 , H01L2224/45015 , H01L2224/45124 , H01L2224/45144 , H01L2224/45147 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/83191 , H01L2224/83192 , H01L2224/83856 , H01L2224/83885 , H01L2224/85001 , H01L2224/85205 , H01L2224/92 , H01L2224/92247 , H01L2225/0651 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01014 , H01L2924/01015 , H01L2924/01019 , H01L2924/0102 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01051 , H01L2924/01056 , H01L2924/01074 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/0665 , H01L2924/07802 , H01L2924/10253 , H01L2924/15747 , H01L2924/15788 , H01L2924/181 , H01L2924/20103 , H01L2924/20104 , H01L2924/20105 , H01L2924/20106 , H01L2924/3011 , H01L2224/78 , H01L2924/00 , H01L2924/00012 , H01L2924/3512 , H01L2924/20752
摘要: PURPOSE: An adhesive sheet and a semiconductor device is provided to simplify a manufacturing process by enabling a resin sealing to be attached to the adhesive sheet while heating the resin sealing. CONSTITUTION: A wire bonding process is performed in a semiconductor device(13) without a process of temporally bonding an adhesive sheet on the substrate and the lead frame(11) and a heating process. The semiconductor device is sealed with a sealing resin, and then sealing resin is hardened. The adhesive strength is 0.2~10MPa under 80~250°C.
摘要翻译: 目的:提供粘合片和半导体器件,以通过在加热树脂密封的同时将树脂密封附着到粘合片上来简化制造过程。 构成:在半导体器件(13)中执行引线接合工艺,而不需要在基板和引线框架(11)上进行时间粘合粘合片和加热工艺。 半导体器件用密封树脂密封,然后密封树脂硬化。 80〜250℃粘合强度为0.2〜10MPa。
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公开(公告)号:KR1020080095283A
公开(公告)日:2008-10-28
申请号:KR1020087022345
申请日:2007-02-15
申请人: 닛토덴코 가부시키가이샤
IPC分类号: H01L21/48
CPC分类号: H01L24/29 , C09J7/28 , C09J7/38 , C09J2201/128 , C09J2201/36 , C09J2203/326 , H01L24/27 , H01L24/32 , H01L24/45 , H01L24/73 , H01L25/0657 , H01L25/50 , H01L2224/32145 , H01L2224/32225 , H01L2224/32245 , H01L2224/45124 , H01L2224/45144 , H01L2224/45147 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/83191 , H01L2224/85205 , H01L2224/92247 , H01L2225/0651 , H01L2225/06575 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01016 , H01L2924/01019 , H01L2924/0102 , H01L2924/01024 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01051 , H01L2924/01056 , H01L2924/01074 , H01L2924/01079 , H01L2924/01082 , H01L2924/0132 , H01L2924/15747 , H01L2924/181 , H01L2924/20103 , H01L2924/20104 , H01L2924/20105 , H01L2924/20106 , H01L2924/20107 , H01L2924/3011 , Y10T428/28 , H01L2924/00014 , H01L2924/00012 , H01L2924/01026 , H01L2924/00 , H01L2924/3512
摘要: A process for semiconductor device production in which three-dimensional mounting through a spacer is conducted without necessitating a novel device for fixing the spacer to an adherend and by which semiconductor devices can be produced in high yield at low cost. The process for semiconductor device production employs an adhesive sheet serving as a spacer. The adhesive sheet serving as a spacer is one comprising a spacer layer having an adhesive layer on at least one side thereof. The process is characterized by comprising a step in which the adhesive sheet serving as a spacer is subjected to dicing to form a chip-form spacer having an adhesive layer and a step in which the spacer is fixed to an adherend through the adhesive layer.
摘要翻译: 在不需要用于将间隔物固定到被粘物上的新颖的装置的情况下进行通过间隔物的三维安装的半导体装置的制造方法,能够低成本地制造半导体装置。 半导体器件制造方法采用作为间隔物的粘合片。 用作间隔物的粘合片是在其至少一侧具有粘合剂层的间隔层。 该方法的特征在于包括以下步骤:将用作间隔物的粘合片进行切割以形成具有粘合剂层的芯片形隔离物和通过粘合剂层将间隔物固定到被粘物的步骤。
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公开(公告)号:KR1020080080458A
公开(公告)日:2008-09-04
申请号:KR1020080019169
申请日:2008-02-29
申请人: 닛토덴코 가부시키가이샤
CPC分类号: H01L24/83 , H01L21/6836 , H01L23/3121 , H01L24/27 , H01L24/29 , H01L24/32 , H01L24/45 , H01L24/48 , H01L24/73 , H01L24/85 , H01L25/0657 , H01L2221/68327 , H01L2224/05599 , H01L2224/274 , H01L2224/2919 , H01L2224/29198 , H01L2224/2929 , H01L2224/293 , H01L2224/32145 , H01L2224/32225 , H01L2224/32245 , H01L2224/45124 , H01L2224/45144 , H01L2224/45147 , H01L2224/48091 , H01L2224/48227 , H01L2224/48247 , H01L2224/73265 , H01L2224/83191 , H01L2224/83192 , H01L2224/83855 , H01L2224/83885 , H01L2224/85001 , H01L2224/85099 , H01L2224/85205 , H01L2224/85399 , H01L2225/0651 , H01L2225/06575 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01019 , H01L2924/0102 , H01L2924/01024 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01032 , H01L2924/01033 , H01L2924/01045 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01051 , H01L2924/01056 , H01L2924/01074 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/0665 , H01L2924/07802 , H01L2924/10253 , H01L2924/15747 , H01L2924/15788 , H01L2924/181 , H01L2924/20102 , H01L2924/20103 , H01L2924/20104 , H01L2924/20105 , H01L2924/20106 , H01L2924/20107 , H01L2924/0635 , H01L2224/78 , H01L2924/00 , H01L2924/3512 , H01L2924/00012
摘要: A thermosetting die bonding film is provided to ensure excellent adhesiveness with an object, and to prevent contamination of a substrate or semiconductor chip caused by exudation of an adhesive. A thermosetting die bonding film(3a) is used in the manufacture of a semiconductor apparatus. The thermosetting die bonding film contains 5-15wt% of a thermoplastic resin component and 45-55wt% of a thermosetting resin component, and has a melt viscosity of 400-2500 Pa . s at 100 °C before thermosetting. The die bonding film has a tensile storage elastic modulus of 10 MPa or more at 250 °C after thermosetting. The thermoplastic resin component is an acrylic resin component, and the thermosetting resin component is an epoxy resin component and a phenol resin component.
摘要翻译: 提供热固性芯片接合膜以确保与物体的优异的粘合性,并且防止由粘合剂渗出引起的基板或半导体芯片的污染。 热固性芯片接合薄膜(3a)用于制造半导体装置。 热固性芯片接合膜含有5-15重量%的热塑性树脂组分和45-55重量%的热固性树脂组分,熔体粘度为400-2500Pa。 在100℃下热固化。 芯片接合膜在热固化后的250℃下的拉伸储能弹性模量为10MPa以上。 热塑性树脂组分是丙烯酸树脂组分,热固性树脂组分是环氧树脂组分和酚醛树脂组分。
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公开(公告)号:KR1020070106033A
公开(公告)日:2007-10-31
申请号:KR1020077021581
申请日:2006-02-20
申请人: 닛토덴코 가부시키가이샤
IPC分类号: H01L21/60
CPC分类号: H01L25/0657 , C08L33/00 , C08L63/00 , C08L2666/02 , C08L2666/22 , C09J161/06 , H01L21/6836 , H01L23/3121 , H01L24/27 , H01L24/29 , H01L24/45 , H01L24/48 , H01L24/73 , H01L24/83 , H01L24/85 , H01L2221/68327 , H01L2224/274 , H01L2224/2919 , H01L2224/32014 , H01L2224/32145 , H01L2224/32225 , H01L2224/45015 , H01L2224/45124 , H01L2224/45144 , H01L2224/45147 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/83101 , H01L2224/83191 , H01L2224/83192 , H01L2224/83801 , H01L2224/8385 , H01L2224/85001 , H01L2224/85201 , H01L2224/85203 , H01L2224/85205 , H01L2224/92 , H01L2224/92247 , H01L2225/0651 , H01L2225/06575 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01014 , H01L2924/01015 , H01L2924/01019 , H01L2924/0102 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01051 , H01L2924/01056 , H01L2924/01074 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/0665 , H01L2924/07802 , H01L2924/10253 , H01L2924/15747 , H01L2924/15788 , H01L2924/181 , H01L2924/20103 , H01L2924/20104 , H01L2924/20105 , H01L2924/20106 , H01L2924/3011 , Y10T156/10 , Y10T428/1462 , Y10T428/2887 , H01L2924/00012 , H01L2224/78 , H01L2924/00 , H01L2924/3512 , H01L2924/20752
摘要: A semiconductor device manufacturing method wherein manufacturing steps are simplified, while improving yield by preventing wire bonding failure due to bonding pad contamination and preventing bonding bodies such as a substrate, a lead frame and a semiconductor element from warping. An adhesive sheet used in such method and a semiconductor device obtained by such method are also provided. The method is characterized in that it is provided with a temporarily bonding step of temporarily bonding a semiconductor element (13) on a body (11) whereupon the semiconductor element is to be bonded through an adhesive sheet (12), and a wire bonding step of performing wire boding within a bonding temperature range of 80-250°C without a heating step. The method is also characterized in that an adhesive sheet having a storage elastic modulus of 1MPa or more prior to hardening within a temperature range of 80-250°C or 1MPa or more at a discretionary temperature within the temperature range is used as the adhesive sheet (12).
摘要翻译: 一种半导体器件制造方法,其中简化了制造步骤,同时通过防止由于焊盘污染引起的引线接合故障,并且防止诸如基板,引线框架和半导体元件的接合体翘曲而提高产量。 还提供了用于这种方法的粘合片和通过这种方法获得的半导体器件。 该方法的特征在于具有临时接合步骤,用于通过粘合片(12)将半导体元件(13)临时接合在待接合半导体元件的本体(11)上,并且引线接合步骤 在没有加热步骤的情况下在80-250℃的接合温度范围内进行导线焊接。 该方法的特征还在于,使用在温度范围内的任意温度下在80-250℃或1MPa以上的温度范围内硬化之前的储能弹性模量为1MPa以上的粘合片作为粘合片 (12)。
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公开(公告)号:KR1020050062438A
公开(公告)日:2005-06-23
申请号:KR1020040107978
申请日:2004-12-17
申请人: 닛토덴코 가부시키가이샤
CPC分类号: H01L24/85 , H01L21/6836 , H01L24/27 , H01L24/29 , H01L24/32 , H01L24/45 , H01L24/48 , H01L24/73 , H01L24/83 , H01L24/92 , H01L25/0657 , H01L25/50 , H01L2221/68327 , H01L2224/274 , H01L2224/2919 , H01L2224/32145 , H01L2224/32225 , H01L2224/32245 , H01L2224/45015 , H01L2224/45124 , H01L2224/45144 , H01L2224/45147 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/83191 , H01L2224/83192 , H01L2224/83856 , H01L2224/83885 , H01L2224/85001 , H01L2224/85205 , H01L2224/92 , H01L2224/92247 , H01L2225/0651 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01014 , H01L2924/01015 , H01L2924/01019 , H01L2924/0102 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01051 , H01L2924/01056 , H01L2924/01074 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/0665 , H01L2924/07802 , H01L2924/10253 , H01L2924/15747 , H01L2924/15788 , H01L2924/181 , H01L2924/20103 , H01L2924/20104 , H01L2924/20105 , H01L2924/20106 , H01L2924/3011 , H01L2224/78 , H01L2924/00 , H01L2924/00012 , H01L2924/3512 , H01L2924/20752
摘要: The process for producing a semiconductor device according to the invention comprises a pre-sticking/fixing step of pre-sticking/fixing a semiconductor element (13) through an adhesive sheet (12) to an object (11) to which the semiconductor element (13) is to be stuck/fixed, and a wire (16) bonding step of performing wire (16) bonding without a heating step, wherein the shear adhesive force of the adhesive sheet (12) to the object (11) is 0.2 MPa or more at the time of the pre-sticking/fixing. This makes it possible to provide a semiconductor device producing process wherein a drop in the yield of semiconductor devices is suppressed and steps therein are made simple; wherein an adhesive sheet (12) is used in this process, and a semiconductor device obtained by the process.
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公开(公告)号:KR1020160128937A
公开(公告)日:2016-11-08
申请号:KR1020160053221
申请日:2016-04-29
申请人: 주식회사 엘지화학
IPC分类号: H01L21/683 , H01L21/78 , H01L23/00 , H01L21/18 , C09J7/02
CPC分类号: C09J7/00 , B32B7/12 , B32B27/308 , B32B27/32 , B32B27/36 , B32B27/38 , B32B2457/14 , C08L63/00 , C09D163/00 , C09J7/10 , C09J7/20 , C09J161/12 , C09J163/00 , C09J163/04 , C09J201/00 , C09J2201/162 , C09J2201/36 , C09J2203/326 , C09J2423/006 , C09J2433/00 , C09J2433/006 , C09J2461/00 , C09J2463/00 , C09J2467/005 , H01L21/6836 , H01L21/78 , H01L23/00 , H01L24/29 , H01L2221/68327 , H01L2221/68377 , H01L2221/68381 , H01L2221/68386 , H01L2224/2919 , H01L2224/32145 , H01L2224/32245 , H01L2924/066 , H01L2924/0665 , H01L2924/20102 , H01L2924/20103 , H01L2924/20104 , H01L2924/2064 , H01L2924/20641 , H01L2924/20642 , H01L2924/20643 , C09J2201/622 , H01L21/185 , H01L24/28 , H01L24/31
摘要: 본발명은반도체기판의배선이나반도체칩에부설된와이어등의요철을보다용이하게매립할수 있으면서도, 다양한절단방법에큰 제한없이적용되어우수한분단성을구현하여반도체패키지공정의신뢰성및 효율을향상시킬수 있는특정물성을갖는반도체용접착필름에관한것이다.
摘要翻译: 本发明涉及一种用于半导体的具有能够提高半导体封装工艺的可靠性和效率的特定性质的粘合剂膜,该粘合剂膜更好地有助于将半导体衬底上的不均匀布线或连接到半导体芯片上的电线等等 而不显着限制各种切割方法的应用,从而允许实现极好的可分割性。
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公开(公告)号:KR1020160000388A
公开(公告)日:2016-01-04
申请号:KR1020140103753
申请日:2014-08-11
IPC分类号: C09K13/06 , H01L21/306
CPC分类号: C09K13/08 , C23F1/18 , C23F1/20 , C23F1/26 , H01L21/02063 , H01L21/0273 , H01L21/31111 , H01L21/32134 , H01L21/67017 , H01L21/6708 , H01L21/76802 , H01L24/03 , H01L24/11 , H01L2224/03614 , H01L2224/0401 , H01L2224/05571 , H01L2224/05624 , H01L2224/05647 , H01L2224/05666 , H01L2224/05681 , H01L2224/05684 , H01L2924/04941 , H01L2924/04953 , H01L2924/20102 , H01L2924/20103 , H01L2924/20104
摘要: 본발명은금속에천트조성물및 이를이용한반도체장치의제조방법을제공한다. 이금속에천트조성물은유기과산화물(Organic Peroxide)을 0.1~20 중량%로; 유기산(Organic Acid)을 0.1~70 중량%로; 그리고알콜계용매를 10~99.8 중량%로포함한다. 이금속에천트조성물은무수계에서적용된다.
摘要翻译: 本发明提供一种金属蚀刻剂组合物和使用其的半导体器件的制造方法。 金属蚀刻剂组合物包含:0.1-20重量%的有机过氧化物; 0.1〜70重量%的有机酸; 和10〜99.8重量%的醇系溶剂。 金属蚀刻剂组合物用于无水体系中。
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公开(公告)号:KR1020120118485A
公开(公告)日:2012-10-26
申请号:KR1020127022401
申请日:2011-01-20
申请人: 스미토모 베이클리트 컴퍼니 리미티드
发明人: 이토신고
CPC分类号: H01L21/56 , H01L23/3107 , H01L23/3114 , H01L23/3128 , H01L23/49503 , H01L24/05 , H01L24/09 , H01L24/43 , H01L24/45 , H01L24/48 , H01L24/49 , H01L24/73 , H01L24/85 , H01L2224/04042 , H01L2224/05144 , H01L2224/05164 , H01L2224/05624 , H01L2224/05644 , H01L2224/05664 , H01L2224/32225 , H01L2224/32245 , H01L2224/43 , H01L2224/45015 , H01L2224/45139 , H01L2224/45144 , H01L2224/45147 , H01L2224/48091 , H01L2224/48227 , H01L2224/48247 , H01L2224/484 , H01L2224/48624 , H01L2224/48644 , H01L2224/48664 , H01L2224/48844 , H01L2224/48864 , H01L2224/49 , H01L2224/73265 , H01L2224/85 , H01L2924/00011 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01012 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01019 , H01L2924/0102 , H01L2924/01022 , H01L2924/01024 , H01L2924/01025 , H01L2924/01027 , H01L2924/01029 , H01L2924/0103 , H01L2924/01031 , H01L2924/01032 , H01L2924/01033 , H01L2924/0104 , H01L2924/01042 , H01L2924/01044 , H01L2924/01045 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01059 , H01L2924/01072 , H01L2924/01074 , H01L2924/01076 , H01L2924/01079 , H01L2924/01082 , H01L2924/01083 , H01L2924/01105 , H01L2924/01201 , H01L2924/01202 , H01L2924/01204 , H01L2924/0132 , H01L2924/01327 , H01L2924/014 , H01L2924/10253 , H01L2924/12042 , H01L2924/1301 , H01L2924/14 , H01L2924/15311 , H01L2924/181 , H01L2924/20103 , H01L2924/20104 , H01L2924/20105 , H01L2924/20106 , H01L2924/01039 , H01L2924/01049 , H01L2924/00 , H01L2224/48824 , H01L2924/00012 , H01L2924/013 , H01L2924/0002 , H01L2924/20752 , H01L2924/20753 , H01L2224/43848 , H01L2924/20751
摘要: 본 발명은 전극 패드를 가진 반도체 소자, 반도체 소자를 탑재하고 전기적 접합 부재가 형성된 기재, 전극 패드와 전기적 접합 부재를 전기적으로 접속하는 본딩 와이어를 포함하는 반도체 장치에 관한 것이다. 본 발명의 반도체 소자 및 전극 패드의 주성분 금속은 본딩 와이어의 주성분 금속과 동일한 금속이거나 본딩 와이어의 주성분 금속과 다르며, 전극 패드의 주성분 금속이 본딩 와이어의 주성분 금속과 다른 경우, 봉지 수지의 후경화 온도에서 본딩 와이어 및 전극 패드의 접합부에서 본딩 와이어의 주성분 금속과 전극 패드의 주성분 금속이 상호 확산하는 속도가 후경화 온도에서의 알루미늄(Al)과 금(Au)의 접합부에서 금(Au)과 알루미늄(Al)이 상호 확산하는 속도보다 작은 것을 특징으로 한다.
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