Mass transfer tool manipulator assembly with remote center of compliance
    3.
    发明授权
    Mass transfer tool manipulator assembly with remote center of compliance 有权
    质量传递工具机械手组装与远程中心的合规

    公开(公告)号:US09522468B2

    公开(公告)日:2016-12-20

    申请号:US14273298

    申请日:2014-05-08

    Abstract: Systems and methods for transferring a micro device or an array of micro devices to or from a substrate are disclosed. In an embodiment, a remote center robot allows on-the-fly alignment between a micro pick up array and a target substrate. The remote center robot may include a plurality of symmetric linkages that move independently and share a remote rotational center. In an embodiment, the remote rotational center may be positioned at a surface of the micro pick up array to prevent damage to the array of micro devices during transfer.

    Abstract translation: 公开了用于将微器件或微阵列阵列转移到衬底或从衬底传送微阵列的系统和方法。 在一个实施例中,远程中心机器人允许微拾取阵列和目标基板之间的即时对准。 远程中心机器人可以包括独立移动并共享远程旋转中心的多个对称联动。 在一个实施例中,远程旋转中心可以定位在微拾取阵列的表面处,以防止在传送期间损坏微器件阵列。

    COMPLIANT ELECTROSTATIC TRANSFER HEAD WITH DEFINED CAVITY
    7.
    发明申请
    COMPLIANT ELECTROSTATIC TRANSFER HEAD WITH DEFINED CAVITY 有权
    具有定义孔的合适静电转印头

    公开(公告)号:US20160094160A1

    公开(公告)日:2016-03-31

    申请号:US14502994

    申请日:2014-09-30

    CPC classification number: B81C99/002 H01H59/0009 H01L41/113

    Abstract: A compliant electrostatic transfer head and method of forming a compliant electrostatic transfer head are described. In an embodiment, a compliant electrostatic transfer head includes a base substrate, a cavity template layer on the base substrate, a first confinement layer between the base substrate and the cavity template layer, and a patterned device layer on the cavity template layer. The patterned device layer includes an electrode that is deflectable toward a cavity in the cavity template layer. In an embodiment, a second confinement layer is between the cavity template layer and the patterned device layer.

    Abstract translation: 描述了柔性静电转印头和形成顺应性静电转印头的方法。 在一个实施例中,顺应性静电转印头包括基底衬底,在基底衬底上的空腔模板层,在基底衬底和腔模板层之间的第一限制层,以及腔模板层上的图案化器件层。 图案化器件层包括能够朝向空腔模板层中的空腔偏转的电极。 在一个实施例中,第二限制层位于空腔模板层和图案化器件层之间。

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