公开(公告)号：US20250112218A1

公开(公告)日：2025-04-03

申请号：US18478831

申请日：2023-09-29

Applicant: Intel Corporation

Inventor： Brandon M. Rawlings ,  Adel Elsherbini ,  Thomas L. Sounart ,  Feras Eid ,  Tushar Kanti Talukdar ,  Kimin Jun ,  Johanna Swan ,  Richard F. Vreeland

IPC: H01L25/00 ,  H01L21/683 ,  H01L25/075

Abstract: In one embodiment, a selective layer transfer process includes forming a layer of integrated circuit (IC) components on a first substrate, forming first bonding structures on a second substrate, and partially bonding the first substrate to the second substrate, which includes bonding a first subset of IC components on the first substrate to respective bonding structures on the second substrate. The process also includes forming second bonding structures on a third substrate, where the second bonding structures are arranged in a layout that is offset from the layout of the second substrate. The process further includes partially bonding the first substrate to the third substrate, which includes bonding a second subset of IC components on the first substrate to respective bonding structures on the third substrate.

公开(公告)号：US20250112127A1

公开(公告)日：2025-04-03

申请号：US18374573

申请日：2023-09-28

Applicant: Intel Corporation

Inventor： Kimin Jun ,  Feras Eid ,  Adel Elsherbini ,  Veronica Strong ,  Thomas Sounart

IPC: H01L23/495 ,  H01L21/48 ,  H01L23/498 ,  H01L23/528

Abstract: A surface finish on an integrated circuit (IC) die structure or a substrate structure to which an IC die structure is to be bonded has a chemical composition distinct from that of underlying metallization. The surface finish may comprise a Cu—Ni alloy. Optionally, the Cu—Ni alloy may further comprise Mn. Alternatively, the surface finish may comprise a noble metal, such as Pd, Pt, or Ru or may comprise self-assembled monolayer (SAM) molecules comprising Si and C. During the bonding process a biphilic surface on the IC die structure or substrate structure may facilitate liquid droplet-based fine alignment of the IC die structure to a host structure. Prior to bonding, the surface finish may be applied upon a top surface of metallization features and may inhibit oxidation of the top surface exposed to the liquid droplet.

公开(公告)号：US12266682B2

公开(公告)日：2025-04-01

申请号：US17025209

申请日：2020-09-18

Applicant: Intel Corporation

Inventor： Adel A. Elsherbini ,  Mohammad Enamul Kabir ,  Zhiguo Qian ,  Gerald S. Pasdast ,  Kimin Jun ,  Shawna M. Liff ,  Johanna M. Swan ,  Aleksandar Aleksov ,  Feras Eid

IPC: H01L23/49 ,  H01L23/492 ,  H01L49/02

Abstract: Disclosed herein are capacitors and resistors at direct bonding interfaces in microelectronic assemblies, as well as related structures and techniques. For example, in some embodiments, a microelectronic assembly may include a first microelectronic component and a second microelectronic component, wherein a direct bonding interface of the second microelectronic component is direct bonded to a direct bonding interface of the first microelectronic component, the microelectronic assembly includes a sensor, the sensor includes a first sensor plate and a second sensor plate, the first sensor plate is at the direct bonding interface of the first microelectronic component, and the second sensor plate is at the direct bonding interface of the second microelectronic component.

公开(公告)号：US20240355768A1

公开(公告)日：2024-10-24

申请号：US18761443

申请日：2024-07-02

Applicant: Intel Corporation

Inventor： Adel A. Elsherbini ,  Krishna Bharath ,  Kevin P. O'Brien ,  Kimin Jun ,  Han Wui Then ,  Mohammad Enamul Kabir ,  Gerald S. Pasdast ,  Feras Eid ,  Aleksandar Aleksov ,  Johanna M. Swan ,  Shawna M. Liff

IPC: H01L23/00 ,  H01L25/065

CPC classification number: H01L24/08 ,  H01L24/05 ,  H01L24/29 ,  H01L24/32 ,  H01L25/0657 ,  H01L28/10 ,  H01L2224/05147 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/0801 ,  H01L2224/08145 ,  H01L2224/0903 ,  H01L2224/09055 ,  H01L2224/09505 ,  H01L2224/29186 ,  H01L2224/32145

Abstract: Disclosed herein are microelectronic assemblies including microelectronic components that are coupled together by direct bonding, as well as related structures and techniques. For example, in some embodiments, a microelectronic assembly may include a first microelectronic component and a second microelectronic component coupled to the first microelectronic component by a direct bonding region, wherein the direct bonding region includes at least part of an inductor.

公开(公告)号：US12100762B2

公开(公告)日：2024-09-24

申请号：US17578847

申请日：2022-01-19

Applicant: Intel Corporation

Inventor： Patrick Morrow ,  Kimin Jun ,  Il-Seok Son ,  Donald W. Nelson

IPC: H01L29/78 ,  H01L23/00 ,  H01L23/14 ,  H01L23/31 ,  H01L23/498 ,  H01L29/417 ,  H01L23/15

CPC classification number: H01L29/78 ,  H01L23/147 ,  H01L23/3107 ,  H01L23/49827 ,  H01L24/00 ,  H01L24/05 ,  H01L29/41791 ,  H01L23/145 ,  H01L23/15 ,  H01L2224/0237 ,  H01L2224/04105 ,  H01L2224/0603 ,  H01L2224/16227

Abstract: An apparatus including a circuit structure including a first side including a device layer including a plurality of devices and an opposite second side; an electrically conductive contact coupled to one of the plurality of devices on the first side; and an electrically conductive interconnect disposed on the second side of the structure and coupled to the conductive contact. A method including forming a transistor device including a channel between a source and a drain and a gate electrode on the channel defining a first side of the device; forming an electrically conductive contact to one of the source and the drain from the first side; and forming an interconnect on a second side of the device, wherein the interconnect is coupled to the contact.

公开(公告)号：US20240063147A1

公开(公告)日：2024-02-22

申请号：US17891704

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Adel Elsherbini ,  Mohammad Enamul Kabir ,  Johanna Swan ,  Omkar Karhade ,  Kimin Jun ,  Feras Eid ,  Shawna Liff ,  Xavier Brun ,  Bhaskar Jyoti Krishnatreya ,  Tushar Talukdar ,  Haris Khan Niazi

IPC: H01L23/00 ,  H01L25/065 ,  H01L21/56 ,  H01L23/31 ,  H01L23/29

CPC classification number: H01L23/564 ,  H01L24/08 ,  H01L24/24 ,  H01L25/0652 ,  H01L24/19 ,  H01L21/56 ,  H01L23/3107 ,  H01L23/291 ,  H01L2224/08145 ,  H01L24/16 ,  H01L2224/16227 ,  H01L2224/16238 ,  H01L2924/37001 ,  H01L2224/24145 ,  H01L24/73 ,  H01L2224/73259 ,  H01L2224/24225 ,  H01L2224/73209 ,  H01L2224/2499

Abstract: Techniques and mechanisms to mitigate corrosion to via structures of a composite chiplet. In an embodiment, a composite chiplet comprises multiple integrated circuit (IC) components which are each in a different respective one of multiple levels. One or more conductive vias extend through an insulator layer in a first level of the multiple levels. An annular structure of the composite chiplet extends vertically through the insulator layer, and surrounds the one or more conductive vias in the insulator layer. The annular structure mitigates an exposure of the one or more conductive vias to moisture which is in a region of the insulator layer that is not surrounded by the annular structure. In another embodiment, the annular structure further surrounds an IC component which extends in the insulator layer.

公开(公告)号：US20240063076A1

公开(公告)日：2024-02-22

申请号：US17891727

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Mohammad Enamul Kabir ,  Bhaskar Jyoti Krishnatreya ,  Kimin Jun ,  Adel Elsherbini ,  Tushar Talukdar ,  Feras Eid ,  Debendra Mallik ,  Krishna Vasanth Valavala ,  Xavier Brun

IPC: H01L23/367 ,  H01L23/00 ,  H01L23/373 ,  H01L23/48 ,  H01L25/065

CPC classification number: H01L23/367 ,  H01L24/08 ,  H01L23/3736 ,  H01L23/373 ,  H01L23/3732 ,  H01L23/481 ,  H01L24/32 ,  H01L24/29 ,  H01L25/0657 ,  H01L2224/08145 ,  H01L2224/32225 ,  H01L2224/29147 ,  H01L2224/29124 ,  H01L2224/29139 ,  H01L2224/29144 ,  H01L2224/29193 ,  H01L2224/29186

Abstract: Microelectronic devices, assemblies, and systems include a multichip composite device having one or more integrated circuit dies bonded to a base die, a conformal thermal heat spreading layer on the top and sidewalls of the integrated circuit dies, and an inorganic dielectric material on a portion of the conformal thermal heat spreading layer, laterally adjacent the integrated circuit dies, and over the base die. The conformal thermal heat spreading layer includes a high thermal conductivity material to provide a thermal pathway for the integrated circuit dies during operation.

公开(公告)号：US11532719B2

公开(公告)日：2022-12-20

申请号：US16222946

申请日：2018-12-17

Applicant: Intel Corporation

Inventor： Kimin Jun ,  Jack T. Kavalieros ,  Gilbert Dewey ,  Willy Rachmady ,  Aaron Lilak ,  Brennen Mueller ,  Hui Jae Yoo ,  Patrick Morrow ,  Anh Phan ,  Cheng-Ying Huang ,  Ehren Mannebach

IPC: H01L29/423 ,  H01L29/66 ,  H01L29/49 ,  H01L29/45 ,  H01L29/786 ,  H01L21/762 ,  H01L21/02 ,  H01L29/06

Abstract: Embodiments herein describe techniques for a semiconductor device over a semiconductor substrate. A first bonding layer is above the semiconductor substrate. One or more nanowires are formed above the first bonding layer to be a channel layer. A gate electrode is around a nanowire, where the gate electrode is in contact with the first bonding layer and separated from the nanowire by a gate dielectric layer. A source electrode or a drain electrode is in contact with the nanowire, above a bonding area of a second bonding layer, and separated from the gate electrode by a spacer, where the second bonding layer is above and in direct contact with the first bonding layer.

公开(公告)号：US20220399324A1

公开(公告)日：2022-12-15

申请号：US17344348

申请日：2021-06-10

Applicant: Intel Corporation

Inventor： Han Wui Then ,  Adel A. Elsherbini ,  Kimin Jun ,  Johanna M. Swan ,  Shawna M. Liff ,  Sathya Narasimman Tiagaraj ,  Gerald S. Pasdast ,  Aleksandar Aleksov ,  Feras Eid

IPC: H01L25/00 ,  H01L25/065 ,  H01L23/00

Abstract: A die assembly comprising: a first component layer having conductive through-connections in an insulator, a second component layer comprising a die, and an active device layer (ADL) at an interface between the first component layer and the second component layer. The ADL comprises active elements electrically coupled to the first component layer and the second component layer. The die assembly further comprises a bonding layer electrically coupling the ADL to the second component layer. In some embodiments, the die assembly further comprises another ADL at another interface between the first component layer and a package support opposite to the interface. The first component layer may comprise another die having through-substrate vias (TSVs). The die and the another die may be fabricated using different process nodes.

公开(公告)号：US20220344376A1

公开(公告)日：2022-10-27

申请号：US17864264

申请日：2022-07-13

Applicant: Intel Corporation

Inventor： Aaron D. Lilak ,  Anh Phan ,  Patrick Morrow ,  Willy Rachmady ,  Gilbert Dewey ,  Jessica M. Torres ,  Kimin Jun ,  Tristan A. Tronic ,  Christopher J. Jezewski ,  Hui Jae Yoo ,  Robert S. Chau ,  Chi-Hwa Tsang

IPC: H01L27/12 ,  H01L21/02 ,  H01L21/285 ,  H01L21/84 ,  H01L27/22 ,  H01L27/24 ,  H01L29/08 ,  H01L29/16 ,  H01L29/417 ,  H01L29/45 ,  H01L29/66 ,  H01L29/78

Abstract: A stacked device structure includes a first device structure including a first body that includes a semiconductor material, and a plurality of terminals coupled with the first body. The stacked device structure further includes an insulator between the first device structure and a second device structure. The second device structure includes a second body such as a fin structure directly above the insulator. The second device structure further includes a gate coupled to the fin structure, a spacer including a dielectric material adjacent to the gate, and an epitaxial structure adjacent to a sidewall of the fin structure and between the spacer and the insulator. A metallization structure is coupled to a sidewall surface of the epitaxial structure, and further coupled with one of the terminals of the first device.