Optoelectronic semiconductor chip
    2.
    发明授权
    Optoelectronic semiconductor chip 有权
    光电半导体芯片

    公开(公告)号:US09214600B2

    公开(公告)日:2015-12-15

    申请号:US14382286

    申请日:2013-02-20

    Abstract: An optoelectronic semiconductor chip includes a number active regions that are arranged at a distance from each other and a substrate that is arranged on an underside of the active regions. One of the active regions has a main extension direction. The active region has a core region that is formed using a first semiconductor material. The active region has an active layer that covers the core region at least in directions perpendicular to the main extension direction of the active region. The active region has a cover layer that is formed using a second semiconductor material and covers the active layer at least in directions perpendicular to the main extension direction of the active region.

    Abstract translation: 光电子半导体芯片包括彼此间隔一定距离设置的多个有源区和布置在有源区的下侧的衬底。 其中一个活跃区域有一个主要的延伸方向。 有源区具有使用第一半导体材料形成的芯区。 有源区域具有至少在垂直于有源区域的主延伸方向的方向上覆盖芯区域的有源层。 有源区具有使用第二半导体材料形成的覆盖层,并且至少在垂直于有源区的主延伸方向的方向上覆盖有源层。

    Method for producing a connection region of an optoelectronic semiconductor chip
    5.
    发明授权
    Method for producing a connection region of an optoelectronic semiconductor chip 有权
    光电子半导体芯片的连接区域的制造方法

    公开(公告)号:US09461211B2

    公开(公告)日:2016-10-04

    申请号:US14646704

    申请日:2013-10-28

    Abstract: The invention relates to a method for producing a connection region (70) of an optoelectronic semiconductor chip (100), comprising the following steps: providing an optoelectronic semiconductor chip (100), forming or exposing a seed layer (6) on an outer surface (100a) of the optoelectronic semiconductor chip (100), and depositing a contact layer sequence (7) on the seed layer (6) without current, wherein the seed layer (6) is formed comprising a metal that enables nickel to be deposited on the seed layer (6) without current, the contact layer sequence (7) comprises a nickel layer (71) as a first layer facing the seed layer (6), and the contact layer sequence (7) has a contact surface (7a) on the side of the contact layer sequence facing away from the seed layer (6), by means of which contact surface the optoelectronic semiconductor chip (100) can be electrically contacted.

    Abstract translation: 本发明涉及一种用于制造光电半导体芯片(100)的连接区域(70)的方法,包括以下步骤:提供光电半导体芯片(100),在外表面上形成或暴露种子层(6) (100)的所述接触层序列(100a),以及在所述种子层(6)上没有电流沉积接触层序列(7),其中形成所述种子层(6),其包括使镍沉积在其上的金属 所述接触层序列(7)包括作为面向种子层(6)的第一层的镍层(71),并且所述接触层序列(7)具有接触表面(7a),所述接触层序列 在接触层序列背离种子层(6)的一侧上,通过该接触表面,光电子半导体芯片(100)可以电接触。

    Optoelectronic Semiconductor Chip
    7.
    发明申请
    Optoelectronic Semiconductor Chip 有权
    光电半导体芯片

    公开(公告)号:US20150021636A1

    公开(公告)日:2015-01-22

    申请号:US14382286

    申请日:2013-02-20

    Abstract: An optoelectronic semiconductor chip includes a number active regions that are arranged at a distance from each other and a substrate that is arranged on an underside of the active regions. One of the active regions has a main extension direction. The active region has a core region that is formed using a first semiconductor material. The active region has an active layer that covers the core region at least in directions perpendicular to the main extension direction of the active region. The active region has a cover layer that is formed using a second semiconductor material and covers the active layer at least in directions perpendicular to the main extension direction of the active region.

    Abstract translation: 光电子半导体芯片包括彼此间隔一定距离设置的多个有源区和布置在有源区的下侧的衬底。 其中一个活跃区域有一个主要的延伸方向。 有源区具有使用第一半导体材料形成的芯区。 有源区域具有至少在垂直于有源区域的主延伸方向的方向上覆盖芯区域的有源层。 有源区具有使用第二半导体材料形成的覆盖层,并且至少在垂直于有源区的主延伸方向的方向上覆盖有源层。

    METHOD FOR PRODUCING A CONNECTION REGION OF AN OPTOELECTRONIC SEMICONDUCTOR CHIP
    10.
    发明申请
    METHOD FOR PRODUCING A CONNECTION REGION OF AN OPTOELECTRONIC SEMICONDUCTOR CHIP 有权
    用于生产光电半导体芯片的连接区域的方法

    公开(公告)号:US20150295137A1

    公开(公告)日:2015-10-15

    申请号:US14646704

    申请日:2013-10-28

    Abstract: The invention relates to a method for producing a connection region (70) of an optoelectronic semiconductor chip (100), comprising the following steps: providing an optoelectronic semiconductor chip (100), forming or exposing a seed layer (6) on an outer surface (100a) of the optoelectronic semiconductor chip (100), and depositing a contact layer sequence (7) on the seed layer (6) without current, wherein the seed layer (6) is formed comprising a metal that enables nickel to be deposited on the seed layer (6) without current, the contact layer sequence (7) comprises a nickel layer (71) as a first layer facing the seed layer (6), and the contact layer sequence (7) has a contact surface (7a) on the side of the contact layer sequence facing away from the seed layer (6), by means of which contact surface the optoelectronic semiconductor chip (100) can be electrically contacted.

    Abstract translation: 本发明涉及一种用于制造光电半导体芯片(100)的连接区域(70)的方法,包括以下步骤:提供光电半导体芯片(100),在外表面上形成或暴露种子层(6) (100)的所述接触层序列(100a),以及在所述种子层(6)上没有电流沉积接触层序列(7),其中形成所述种子层(6),其包括使镍沉积在其上的金属 所述接触层序列(7)包括作为面向种子层(6)的第一层的镍层(71),并且所述接触层序列(7)具有接触表面(7a),所述接触层序列 在接触层序列背离种子层(6)的一侧上,通过该接触表面,光电子半导体芯片(100)可以电接触。

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