公开(公告)号：US20240011158A1

公开(公告)日：2024-01-11

申请号：US18474493

申请日：2023-09-26

Applicant: SEMES Co., Ltd.

Inventor： Hee Hwan Kim ,  Cheol Yong Shin ,  Jae Youl Kim ,  Moon Sik Choi

IPC: C23C16/458 ,  C23C16/455

CPC classification number: C23C16/4584 ,  C23C16/45565

Abstract: According to the disclosed substrate processing apparatus, a first bowl is located to correspond to a substrate, and a first chemical solution supply module supplies a first chemical solution while a support module rotates at a first speed, and a second bowl is located to correspond to the substrate, and a second chemical solution supply module supplies a second chemical solution at a first flow rate while a support module rotates at a second speed equal to or smaller than the first speed, and the second bowl is located to correspond to the substrate, and the second chemical solution supply module does not supply the second chemical solution or supplies the second chemical solution at a second flow rate smaller than the first flow rate while the support module rotates at a third speed smaller than the second speed.

公开(公告)号：US11869778B2

公开(公告)日：2024-01-09

申请号：US17137233

申请日：2020-12-29

Applicant: SEMES CO., LTD.

Inventor： Seungtae Yang ,  Gi Hun Choi ,  Buyoung Jung ,  Gui Su Park

IPC: H01L21/67 ,  B08B3/12 ,  B08B3/08 ,  H01L21/687 ,  C02F9/00 ,  C02F1/00 ,  C02F1/36 ,  C02F1/48

CPC classification number: H01L21/67051 ,  B08B3/08 ,  B08B3/12 ,  C02F9/00 ,  H01L21/68764 ,  C02F1/001 ,  C02F1/36 ,  C02F1/484

Abstract: An apparatus for processing a substrate includes a housing, a support unit that supports the substrate in the housing, a nozzle that dispenses a processing liquid onto the substrate, and a liquid supply unit that supplies the processing liquid to the nozzle. The liquid supply unit includes a container having a storage space in which the processing liquid is stored, a liquid supply tube through which the processing liquid flows from the container to the nozzle, and an ultrasonic-wave application member that applies ultrasonic waves to the processing liquid before the processing liquid is supplied to the nozzle. The ultrasonic-wave application member includes a liquid reservoir having an interior space in which a liquid is received and an ultrasonic generator that applies ultrasonic waves to the liquid received in the liquid reservoir. Part of the liquid supply tube is immersed in the liquid received in the liquid reservoir.

公开(公告)号：US20240006166A1

公开(公告)日：2024-01-04

申请号：US18332088

申请日：2023-06-09

Applicant: SEMES CO., LTD.

Inventor： Minyoung KIM ,  Hanglim LEE

IPC: H01J37/32

CPC classification number: H01J37/32715 ,  H01J37/32541 ,  H01J37/32449

Abstract: Provided is a substrate processing apparatus and substrate processing method capable of processing a substrate by using plasma, the substrate processing apparatus including a process chamber providing an internal space where a substrate is processed, a spin chuck serving as a lower electrode, supporting the substrate in the internal space of the process chamber, and rotating the supported substrate, and a plasma generation unit mounted in an upper portion of the process chamber to face the spin chuck, including a discharge space where an upper electrode is provided, generating plasma by using a process gas supplied from outside, linearly ejecting the plasma onto the substrate rotated by the spin chuck, and controlling a density of the plasma to change along an extension direction of the linearly ejected plasma.

公开(公告)号：US20240006160A1

公开(公告)日：2024-01-04

申请号：US18142442

申请日：2023-05-02

Applicant: SEMES CO., LTD.

Inventor： Kwangryul KIM ,  Yunsang KIM

IPC: H01J37/32 ,  B23K26/352

CPC classification number: H01J37/32449 ,  H01J37/32568 ,  H01J37/32082 ,  B23K26/352 ,  H01J2237/002 ,  H01J2237/334

Abstract: Provided is a substrate processing apparatus including a chamber including a processing space; a support table provided within the processing space of the chamber and configured to support a substrate; a dielectric plate covering an opening in an upper wall of the chamber; a transparent electrode provided on the dielectric plate; a laser supply head configured to supply a laser beam toward the substrate supported on the support table via the transparent electrode and the dielectric plate; and a cooling device configured to cool the transparent electrode by injecting a cooling gas toward the transparent electrode.

公开(公告)号：US20240001401A1

公开(公告)日：2024-01-04

申请号：US18099911

申请日：2023-01-20

Applicant: SEMES CO., LTD.

Inventor： Bong Moon LEE

IPC: B05C13/00 ,  B05C5/02 ,  B08B7/04 ,  B08B5/04 ,  B08B3/02 ,  B65G49/06

CPC classification number: B05C13/00 ,  B05C5/0291 ,  B08B7/04 ,  G02B5/201 ,  B08B3/022 ,  B65G49/061 ,  B08B5/043

Abstract: An apparatus for preventing blockage of a floating stage includes a moving member moving between a floating stage for lifting a substrate and a nozzle disposed above the floating stage, and a cover installed on the moving member and moving between the floating stage and the nozzle by the moving member to cover the floating stage.

公开(公告)号：US20230415207A1

公开(公告)日：2023-12-28

申请号：US18328203

申请日：2023-06-02

Applicant: SEMES CO., LTD.

Inventor： Sunghun EOM ,  Kangsul KIM ,  Youngjun SON ,  Seongyeol CHOI

IPC: B08B3/12 ,  H01L21/67 ,  H01L21/02

CPC classification number: B08B3/12 ,  H01L21/67057 ,  H01L21/02052

Abstract: An apparatus for cleaning a back side of a substrate may include a cleaning assembly which may include a cleaning solution supply part receiving a cleaning solution and an ultrasonic wave supply part applying an ultrasonic wave to the cleaning solution such that a column of the cleaning solution is formed from the cleaning solution supply part toward the back side of the substrate. The back side of the substrate may be cleaned by contacting the column of the cleaning solution with the back side of the substrate.

公开(公告)号：US11856680B2

公开(公告)日：2023-12-26

申请号：US17243954

申请日：2021-04-29

Applicant: SEMES CO., LTD.

Inventor： Sun Whan Kim ,  Byung Du Jeon

IPC: H05F3/02 ,  H01L21/67 ,  H01L21/687 ,  B08B3/02 ,  B08B13/00

CPC classification number: H05F3/02 ,  B08B3/02 ,  B08B13/00 ,  H01L21/67051 ,  H01L21/68764 ,  H01L21/67023

Abstract: A substrate processing system capable of setting a stable reference ground level for electrical components while handling electrostatic discharge (ESD) is provided. The substrate processing system includes a first ground bar connected to a building ground; and a second ground bar connected to the building ground and physically separated from the first ground bar, wherein the first ground bar is connected to a first electrical component to set a ground level of the first electrical component, wherein the second ground bar is dedicated to a charged component, and the second ground bar is connected to the first charged component to set a path of the electrostatic discharge current generated by the first charged component.

公开(公告)号：US20230406631A1

公开(公告)日：2023-12-21

申请号：US18211098

申请日：2023-06-16

Applicant: SEMES CO., LTD.

Inventor： No Jae PARK

IPC: B65G1/137 ,  B65G1/04 ,  B65G43/08

CPC classification number: B65G1/137 ,  B65G1/0492 ,  B65G2203/046 ,  B65G2203/0233 ,  B65G2203/041 ,  B65G43/08

Abstract: Provided is an article transfer apparatus and article transfer method capable of autonomously loading or unloading an article by accurately checking a correct position in an article storage without a teaching process, the article transfer apparatus including a carriage body travelling along travel rails to transfer an article, and a position detection device mounted in the carriage body to detect position information related to a correct position from a detection target mounted in an article storage capable of storing the article in order to place the article at the correct position in the article storage where the article is to be stored.

公开(公告)号：US20230405648A1

公开(公告)日：2023-12-21

申请号：US18201934

申请日：2023-05-25

Applicant: SEMES CO., LTD.

Inventor： Won Sik SON ,  Pil Kyun HEO ,  Ho Jong HWANG

IPC: B08B13/00 ,  B08B3/04

CPC classification number: B08B13/00 ,  B08B3/04

Abstract: The moving assembly for a recovery guard includes a recovery vessel including a first recovery vessel disposed to surround a substrate support and a second recovery vessel disposed inside of the first recovery vessel, concentrically with respect to the first recovery vessel, and a lifting driver connected to the first and second recovery vessels and elevating the first and second recovery vessels. The lifting driver includes a motor, a drive shaft connected to the motor and rotated in a first direction, a first shaft connected to the first recovery vessel and extending in a second direction, perpendicular to the first direction, a second shaft connected to the second recovery vessel and extending in the second direction, a first clutch connecting the drive shaft and the first shaft, and a second clutch connecting the drive shaft and the second shaft.

公开(公告)号：US11833555B2

公开(公告)日：2023-12-05

申请号：US17658163

申请日：2022-04-06

Applicant: Semes Co., Ltd.

Inventor： Sangmin Lee ,  Joojib Park ,  Euisang Lim

IPC: B08B7/00 ,  B08B13/00 ,  H01L21/67

CPC classification number: B08B7/0021 ,  B08B13/00 ,  H01L21/67011

Abstract: An apparatus for processing a substrate may include an upper chamber, a lower chamber being combined with the upper chamber and separated from the upper chamber, and at least one driving member for moving the lower chamber in an upward direction and a downward direction. The least one driving member may include a supporting element for supporting the lower chamber, a first driving element for moving the lower chamber and the supporting element, a second driving element for moving the lower chamber, the supporting element and the first driving element, the second driving element being disposed adjacent to the first driving element, and a connecting element for connecting the first driving element to the second driving element. A processing space may be provided between the upper chamber and the lower chamber when the lower chamber is combined with the upper chamber.