Abstract:
Methods, structures, devices and systems are disclosed for fabrication of microtube engines using membrane template electrodeposition. Such nanomotors operate based on bubble-induced propulsion in biological fluids and salt-rich environments. In one aspect, fabricating microengines includes depositing a polymer layer on a membrane template, depositing a conductive metal layer on the polymer layer, and dissolving the membrane template to release the multilayer microtubes.
Abstract:
The invention relates to a cathode for hydrogen evolution in electrolysis cells, for instance chlor-alkali cells or cells for producing chlorate or hypochlorite, obtained starting from a substrate of nickel or other conductive material galvanically coated with nickel co-deposited with an amorphous molybdenum oxide.
Abstract:
Free standing articles or articles at least partially coated with substantially porosity free, fine-grained and/or amorphous Co-bearing metallic materials optionally containing solid particulates dispersed therein, are disclosed. The electrodeposited metallic layers and/or patches comprising Co provide, enhance or restore strength, wear and/or lubricity of substrates without reducing the fatigue performance. The fine-grained and/or amorphous metallic coatings comprising Co are particularly suited for articles exposed to thermal cycling, fatigue and other stresses and/or in applications requiring anti-microbial properties.
Abstract:
A composite-plated article has a metallic material and a plating film coated on the metallic material in a nickel-plating bath containing carbon nanocomposite fibers. Each of the carbon nanocomposite fibers is formed of a carbon nanofiber core and microparticles that react with carbon to form a compound bonded to a surface of the carbon nanofiber core.
Abstract:
A Fischer-Tropsch process including the steps of providing a reactor having a substrate element with a surface and a plurality of elongated micro-structures of catalyst material attached to the substrate surface The catalyst material includes at least one of cobalt, iron, or ruthenium and the micro-structures have a width of less than about 1 um and a length at least five times the width. A carbon compound and hydrogen are injected into the reactor such that at least a portion of the carbon compound and hydrogen contact the catalyst material. The carbon compound and hydrogen are reacted with the catalyst at a temperature between about 150° F. and about 400° F.
Abstract:
The invention provides methods for manufacturing warm press-formed members which can ensure post-coating corrosion resistance. A method for manufacturing warm press-formed members includes heating a steel sheet to a temperature in the range from 200 to 800° C. and warm press-forming the steel sheet at a temperature in the above range of temperatures, the steel sheet having a Zn—Ni alloy coating layer on its surface, the coating layer including 10 to 25 mass % Ni and the balance being Zn and inevitable impurities and having a coating weight of 10 to 90 g/m2.
Abstract:
A method of forming an interference film on an aluminum alloy substrate includes the following steps: providing an aluminum alloy substrate; cleaning the aluminum alloy substrate through a pre-treatment process; performing an anodic treatment on the aluminum alloy substrate for a predetermined amount of time till an oxidized film having a plurality of cellular tubes is formed on the surface thereof; expanding the holes of the oxidized membrane of the aluminum alloy substrate with an acidic solution to enlarge the diameter of the cellular tubes; enlarging the bottom of the cellular tubes to form a deposition area through an electrical enlarging process; depositing a metal material on the deposition area of the cellular tubes to form an interference structure; sealing the cellular tubes with a sealing agent; and removing dirt. Furthermore, an interference film structure is formed on the aluminum alloy substrate using the aforementioned method.
Abstract:
A copper alloy sheet with a Sn coating layer comprises a base material made of Cu—Ni—Si system copper alloy. Formed on the base material is a Ni coating layer having an average thickness of 0.1 to 0.8 μm. Formed on the Ni coating layer is a Cu—Sn alloy coating layer having an average thickness of 0.4 to 1.0 μm. Formed on the Cu—Sn alloy coating layer is an Sn coating layer having average thickness of 0.1 to 0.8 μm. A material surface is subject to reflow treatment and has arithmetic mean roughness Ra of 0.03 μm or more and less than 0.15 μm in both a direction parallel to the rolling direction and a direction perpendicular to the rolling direction. An exposure rate of the Cu—Sn alloy coating layer to the material surface is 10 to 50%. A fitting type connection terminal requiring low insertion force can be obtained at a low cost.
Abstract:
Embodiments of the present invention include systems and methods for low-rate electrochemical (wet) etch that use a net cathodic current or potential. In particular, some embodiments achieve controlled etch rates of less than 0.1 nm/s by applying a small net cathodic current to a substrate as the substrate is submerged in an aqueous electrolyte. Depending on the embodiment, the aqueous electrolyte utilized may comprise the same type of cations as the material being etched from the substrate. Some embodiments are useful in etching thin film metals and alloys and fabrication of magnetic head transducer wafers.
Abstract:
The present invention provides a carrier-attached copper foil, wherein an ultrathin copper foil is not peeled from the carrier prior to the lamination to an insulating substrate, but can be peeled from the carrier after the lamination to the insulating substrate. A carrier-attached copper foil comprising a copper foil carrier, an intermediate layer laminated on the copper foil carrier, and an ultrathin copper layer laminated on the intermediate layer, wherein the intermediate foil is configured with a Ni layer in contact with an interface of the copper foil carrier and a Cr layer in contact with an interface of the ultrathin copper layer, said Ni layer containing 1,000-40,000 μg/dm2 of Ni and said Cr layer containing 10-100 μg/dm2 of Cr is provided.