SEMICONDUCTOR CHIP PACKAGE, SEMICONDUCTOR PACKAGE INCLUDING SEMICONDUCTOR CHIP PACKAGE, AND METHOD OF FABRICATING SEMICONDUCTOR PACKAGE
    12.
    发明申请
    SEMICONDUCTOR CHIP PACKAGE, SEMICONDUCTOR PACKAGE INCLUDING SEMICONDUCTOR CHIP PACKAGE, AND METHOD OF FABRICATING SEMICONDUCTOR PACKAGE 审中-公开
    半导体芯片封装,半导体封装,包括半导体芯片封装,以及制造半导体封装的方法

    公开(公告)号:US20080308935A1

    公开(公告)日:2008-12-18

    申请号:US12141764

    申请日:2008-06-18

    CPC classification number: H01L21/565 H01L21/566 H01L23/3114 H01L2224/16

    Abstract: Provided are a semiconductor chip package, a semiconductor package, and a method of fabricating the same. In some embodiments, the semiconductor chip packages includes a semiconductor chip including an active surface, a rear surface, and side surfaces, bump solder balls provided on bonding pads formed on the active surface, and a molding layer provided to cover the active surface and expose portions of the bump solder balls. The molding layer between adjacent bump solder balls may have a meniscus concave surface, where a height from the active surface to an edge of the meniscus concave surface contacting the bump solder ball is about a 1/7 length of the maximum diameter of a respective bump solder ball at below or above a section of the bump solder ball having the maximum diameter.

    Abstract translation: 提供半导体芯片封装,半导体封装及其制造方法。 在一些实施例中,半导体芯片封装包括包括有源表面,后表面和侧表面的半导体芯片,设置在形成在有源表面上的焊盘上的凸块焊球,以及设置成覆盖有源表面并暴露 凸块焊球的一部分。 相邻凸块焊球之间的成型层可以具有弯月面凹面,其中从活性表面到接触凸块焊球的弯液面凹面的边缘的高度约为相应凸块的最大直径的1/7长度 低于或高于具有最大直径的凸块焊球的部分的焊球。

    SEMICONDUCTOR DEVICE HAVING TRI-GATE TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
    16.
    发明申请
    SEMICONDUCTOR DEVICE HAVING TRI-GATE TRANSISTOR AND METHOD OF MANUFACTURING THE SAME 有权
    具有三极晶体管的半导体器件及其制造方法

    公开(公告)号:US20150041913A1

    公开(公告)日:2015-02-12

    申请号:US14192074

    申请日:2014-02-27

    Abstract: A semiconductor device includes a substrate including an NMOS region, a fin active region protruding from the substrate in the NMOS region, the fin active region including an upper surface and a sidewall, a gate dielectric layer on the upper surface and the sidewall of the fin active region, a first metal gate electrode on the gate dielectric layer, the first metal gate electrode having a first thickness at the upper surface of the fin active region and a second thickness at the sidewall of the fin active region, and a second metal gate electrode on the first metal gate electrode, the second metal gate electrode having a third thickness at the upper surface of the fin active region and a fourth thickness at the sidewall of the fin active region, wherein the third thickness is less than the fourth thickness.

    Abstract translation: 半导体器件包括:衬底,其包括NMOS区,在NMOS区中从衬底突出的鳍有源区,鳍有源区包括上表面和侧壁;栅极电介质层,位于鳍的上表面和侧壁上 有源区,栅极电介质层上的第一金属栅电极,第一金属栅电极在翅片有源区的上表面具有第一厚度,在鳍有源区的侧壁具有第二厚度,第二金属栅电极 所述第二金属栅电极在所述翅片有源区的上表面具有第三厚度,在所述鳍有源区的所述侧壁处具有第四厚度,其中所述第三厚度小于所述第四厚度。

    DEVICE AND METHOD FOR PROVIDING STUDYING OF INCORRECTLY ANSWERED QUESTION

    公开(公告)号:US20190251857A1

    公开(公告)日:2019-08-15

    申请号:US16342248

    申请日:2017-10-13

    Applicant: Jong-Ho LEE

    Inventor: Jong-Ho LEE

    Abstract: Disclosed are a device and method for providing a checking question designed to allow a user to perform the checking study of correct answers or incorrect answers by using the choices of one or more incorrectly answered questions. The device includes: an incorrectly answered question selection unit which selects one or more questions incorrectly answered by a user from among questions provided to the user; a choice extraction unit which extracts correct answers as choices for the respective selected incorrectly answered questions; a checking question generation unit which generates one or more checking questions designed to allow the user to study the incorrectly answered questions by allocating the extracted choices so that the extracted choices become the choices of the checking questions; and a checking study provision unit which provides the study of the incorrectly answered questions by transmitting the generated checking questions to a user terminal.

    PILLAR-TYPE FIELD EFFECT TRANSISTOR HAVING LOW LEAKAGE CURRENT
    20.
    发明申请
    PILLAR-TYPE FIELD EFFECT TRANSISTOR HAVING LOW LEAKAGE CURRENT 有权
    具有低漏电流的柱型场效应晶体管

    公开(公告)号:US20110121396A1

    公开(公告)日:2011-05-26

    申请号:US13010360

    申请日:2011-01-20

    Applicant: Jong-Ho LEE

    Inventor: Jong-Ho LEE

    Abstract: A pillar-type field effect transistor having low leakage current is provided. The pillar-type field effect transistor includes: a semiconductor body, source and drain formed in a semiconductor pillar; a gate insulating layer formed on a surface of the semiconductor body; a gate electrode formed on a surface of the gate insulating layer. The gate electrode includes a first gate electrode and a second gate electrode being electrically connected with the first gate electrode. The first gate electrode has a work function higher than that of the second gate electrode. Accordingly, the gate induced drain leakage (GIDL) can be reduced, so that an off-state leakage current can be greatly reduced.

    Abstract translation: 提供了具有低泄漏电流的柱型场效应晶体管。 柱型场效应晶体管包括:半导体本体,形成在半导体柱中的源极和漏极; 形成在所述半导体主体的表面上的栅极绝缘层; 形成在栅极绝缘层的表面上的栅电极。 栅电极包括与第一栅电极电连接的第一栅电极和第二栅电极。 第一栅电极具有比第二栅电极高的功函数。 因此,可以减小栅极感应漏极泄漏(GIDL),从而可以大大降低截止状态的漏电流。

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