Nanostructure device and method for manufacturing nanostructures
    14.
    发明授权
    Nanostructure device and method for manufacturing nanostructures 有权
    纳米结构器件及其制造方法

    公开(公告)号:US09206532B2

    公开(公告)日:2015-12-08

    申请号:US13879617

    申请日:2010-10-18

    摘要: A method for manufacturing a plurality of nanostructures (101) on a substrate (102). The method comprises the steps of: depositing a bottom layer (103) on an upper surface of the substrate (102), the bottom layer (103) comprising grains having a first average grain size; depositing a catalyst layer (104) on an upper surface of the bottom layer (103), the catalyst layer (104) comprising grains having a second average grain size different from the first average grain size, thereby forming a stack of layers comprising the bottom layer (103) and the catalyst layer (104); heating the stack of layers to a temperature where nanostructures (101) can form; and providing a gas comprising a reactant such that the reactant comes into contact with the catalyst layer (104).

    摘要翻译: 一种用于在基板(102)上制造多个纳米结构(101)的方法。 该方法包括以下步骤:在衬底(102)的上表面上沉积底层(103),底层(103)包含具有第一平均晶粒尺寸的晶粒; 在底层(103)的上表面上沉积催化剂层(104),所述催化剂层(104)包含具有与第一平均晶粒尺寸不同的第二平均晶粒尺寸的晶粒,从而形成包括底层 层(103)和催化剂层(104); 将层叠层加热到纳米结构(101)可以形成的温度; 以及提供包含反应物的气体,使得反应物与催化剂层(104)接触。