公开(公告)号：US08306264B2

公开(公告)日：2012-11-06

申请号：US12380432

申请日：2009-02-27

申请人： Toshiaki Fujii ,  Junichi Tashiro ,  Mike Hassel-Shearer

发明人： Toshiaki Fujii ,  Junichi Tashiro ,  Mike Hassel-Shearer

IPC分类号： G06K9/00

CPC分类号： H01J37/28 ,  H01J37/3056 ,  H01J37/31 ,  H01J2237/28 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01L21/67282 ,  H01L23/544 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

摘要： A section processing apparatus has a mark forming control portion that transmits control information for forming marks on a surface of a sample. Each of the marks has at least two portions intersecting at a converging portion located at a previously determined position of an observation target section of the sample or in the vicinity of the previously determined position. A first focused ion beam apparatus emits a first focused beam for forming each of the marks on the surface of the sample based on the control information transmitted by the mark forming control portion and for processing a section of the sample. The section of the sample is processed by scanning the first focused beam in parallel with the at least two portions of the marks in the direction of the converging portion, while the section of the sample and positions of the marks are observed by a second focused ion beam apparatus, and to finish processing of the section of the sample when the first focused beam reaches the converging portion or a vicinity thereof.

摘要翻译： 区段处理设备具有标记形成控制部分，其在样品的表面上传送用于形成标记的控制信息。 每个标记具有在位于样品的观察目标部分的预先确定的位置处的收敛部分或者在先前确定的位置附近的至少两个部分。 第一聚焦离子束装置基于由标记形成控制部分发送的控制信息和用于处理样品的一部分，发射用于形成样品表面上的每个标记的第一聚焦光束。 通过在收敛部分的方向上与标记的至少两个部分平行地扫描第一聚焦光束，同时样品的部分和标记的位置被第二聚焦离子 并且当第一聚焦光束到达会聚部分或其附近时，完成样品部分的处理。

公开(公告)号：US08274063B2

公开(公告)日：2012-09-25

申请号：US12733091

申请日：2008-08-06

申请人： Takashi Kaito ,  Yoshitomo Nakagawa ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

发明人： Takashi Kaito ,  Yoshitomo Nakagawa ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC分类号： H01J49/00

CPC分类号： H01J37/08 ,  G01N1/04 ,  G01N1/06 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/0807 ,  H01J2237/0817 ,  H01J2237/31745

摘要： A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.

摘要翻译： 复合聚焦离子束装置具有照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束用于处理或观察样品的第二离子束照射系统。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的等离子体型气体离子源，每个第一离子具有第一质量。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 每个第二离子具有比第一质量小的第二质量。

公开(公告)号：US20100176296A1

公开(公告)日：2010-07-15

申请号：US12733089

申请日：2008-08-06

申请人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

发明人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC分类号： H01J37/30 ,  H01J27/02 ,  H01J37/08 ,  H01J37/26

CPC分类号： H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G03F1/74 ,  G03F1/84 ,  H01J37/08 ,  H01J37/3005 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/31745

摘要： A composite focused ion beam device includes a first ion beam irradiation system 10 including a liquid metal ion source for generating a first ion, and a second ion beam irradiation system 20 including a gas field ion source for generating a second ion, and a beam diameter of the second ion beam 20A emitted from the second ion beam irradiation system 20 is less than that of the first ion beam 10A emitted from the first ion beam irradiation system 10.

摘要翻译： 复合聚焦离子束装置包括：第一离子束照射系统10，其包括用于产生第一离子的液态金属离子源;以及第二离子束照射系统20，其包括用于产生第二离子的气体场离子源， 从第二离子束照射系统20发射的第二离子束20A的距离小于从第一离子束照射系统10发射的第一离子束10A的离子束。

公开(公告)号：US07700367B2

公开(公告)日：2010-04-20

申请号：US10563515

申请日：2004-07-05

申请人： Toshiaki Fujii

发明人： Toshiaki Fujii

IPC分类号： G01N1/00

CPC分类号： H01J37/3005 ,  G01N1/32 ,  H01J37/304 ,  H01J37/3053 ,  H01J37/3056 ,  H01J2237/31745 ,  Y10T436/25

摘要： In a method of making a lamina specimen, first and second ion beams are simultaneously used to sputter etch first and second side walls of a lamina region at the same time under first and second ion beam conditions. A scanning ion microscope observation of the lamina region is made using the second ion beam while sputter etching of the first and second side walls is continued using the first ion beam until the thickness of the lamina has a predetermined value.

摘要翻译： 在制备薄片样品的方法中，第一和第二离子束同时用于在第一和第二离子束条件下同时溅射蚀刻层板区域的第一和第二侧壁。 使用第二离子束进行层状区域的扫描离子显微镜观察，同时使用第一离子束继续溅射蚀刻第一和第二侧壁，直到层的厚度具有预定值。

公开(公告)号：US20060188946A1

公开(公告)日：2006-08-24

申请号：US11353603

申请日：2006-02-14

申请人： Masanao Munekane ,  Hiroyuki Wada ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Takahiro Ochiya ,  Yusuke Yamamoto ,  Takumi Teratani

发明人： Masanao Munekane ,  Hiroyuki Wada ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Takahiro Ochiya ,  Yusuke Yamamoto ,  Takumi Teratani

IPC分类号： G01N33/567 ,  G01N33/53

CPC分类号： G01N33/5088 ,  Y10T436/11

摘要： objects to be achieved by the invention are to provide a nanobio device in which cultured cells are organized at a high-level in a state near in vivo, and to provide a method of using the nanobio device of imitative anatomy structure. The nanobio device of imitative anatomy structure of the invention is obtained by manufacturing a substrate with a bio-compatible substance and arranging a plurality of types of cells thereon in a desired array. A method of manufacturing a nanobio device in the invention includes a step of manufacturing a substrate for a nanobio device by a micromachine processing technique and a step of arranging a plurality of cultured cells on the substrate in a desired array with laser optical tweezers.

摘要翻译： 本发明要实现的目的是提供一种纳米生物装置，其中培养细胞在体内接近的状态下组织成高水平，并且提供使用模拟解剖结构的纳米装置的方法。 本发明的模拟解剖结构的纳米装置通过用生物相容性物质制造衬底并以期望的阵列布置多种类型的细胞而获得。 在本发明中制造纳米装置的方法包括通过微机械加工技术制造纳米装置用基板的步骤，以及使用激光光学镊子以期望的阵列在基板上排列多个培养细胞的步骤。

公开(公告)号：US20060038137A1

公开(公告)日：2006-02-23

申请号：US11196094

申请日：2005-08-03

申请人： Toshiaki Fujii ,  Masao Abe ,  Kunji Shigeto ,  Minuru Kawamura ,  Alekber Kasumov ,  Kazuhito Tsukagoshi ,  Yoshinobu Aoyagi

发明人： Toshiaki Fujii ,  Masao Abe ,  Kunji Shigeto ,  Minuru Kawamura ,  Alekber Kasumov ,  Kazuhito Tsukagoshi ,  Yoshinobu Aoyagi

IPC分类号： G21K7/00

CPC分类号： H01J37/3056 ,  H01J37/304 ,  H01J2237/043 ,  H01J2237/30466 ,  H01J2237/31732 ,  H01J2237/31737 ,  H01J2237/31749

摘要： A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points with which the probers are brought into contact, and an ammeter for measuring a current flowing between the two points, in which a conductive film is formed to narrow a gap thereof between the two points by operating a deflection electrode and a gas gun and the current flowing between the two points is monitored, and when the current becomes a predetermined value, a focused charged particle beam irradiated to the surface of the sample is made OFF by the blanking electrode.

摘要翻译： 一种聚焦离子束装置，其具有与样品表面的两个点接触的两个探测器，用于在与探测器接触的两个点之间施加恒定电压的电压源，以及用于测量 在两点之间流动的电流，其中通过操作偏转电极和气枪来形成导电膜以使两点间的间隙变窄，并且监测在两点之间流动的电流，并且当电流变为预定的 通过消隐电极使照射到样品表面的聚焦带电粒子束截止。

公开(公告)号：US20050150516A1

公开(公告)日：2005-07-14

申请号：US10486207

申请日：2002-05-14

申请人： Toshiaki Fujii ,  Shin Yokoyama

发明人： Toshiaki Fujii ,  Shin Yokoyama

IPC分类号： H01L21/311 ,  H01L21/316 ,  C25F1/00 ,  C25F3/30

CPC分类号： H01L21/02238 ,  H01L21/31138 ,  H01L21/31658

摘要： The present invention aims to provide processes and equipments for manufacturing semiconductors, according to which oxidation of wafer surfaces can be controlled by simple means and contaminants promoting oxidation and contaminants inviting a decreased yield of wafers can also be totally controlled. To achieve the object above, the present invention provides a process for manufacturing a semiconductor, characterized in that a substrate is treated while exposing the surface of the substrate with a negative ion-enriched gas; and an equipment for manufacturing a semiconductor comprising a gas channel through which a gas to be treated is passed; a negative ion-enriched gas generator consisting of a gas cleaner located at an upstream part of said gas channel and a negative ion generator located at a downstream part thereof: and means for supplying the resulting negative ion-enriched gas to the surface of each substrate.

摘要翻译： 本发明的目的在于提供制造半导体的工艺和设备，根据该工艺和设备可以通过简单的手段控制晶片表面的氧化，并且可以完全控制促进氧化的污染物和引起晶片产量降低的污染物。 为了实现上述目的，本发明提供一种制造半导体的方法，其特征在于，在用负离子富集气体暴露基板的表面的同时对基板进行处理; 以及用于制造半导体的设备，包括通过待处理气体的气体通道; 由位于所述气体通道的上游部分的气体清洁器和位于其下游部分的负离子发生器组成的负离子富集气体发生器和用于将所得负离子富集气体供应到每个基板的表面的装置 。

公开(公告)号：US06461692B2

公开(公告)日：2002-10-08

申请号：US09117285

申请日：1998-10-26

申请人： Toshiaki Fujii ,  Motoaki Adachi ,  Kikuo Okuyama

发明人： Toshiaki Fujii ,  Motoaki Adachi ,  Kikuo Okuyama

IPC分类号： C23C1648

CPC分类号： C23C16/402 ,  C23C16/409 ,  C23C16/487 ,  C23C16/50 ,  H01J37/3233

摘要： A method an apparatus for chemical vapor deposition for producing a thin film. The method includes the steps of: introducing a reactive gas into a reaction chamber wherein a substrate is supported in the reaction chamber; combining charged particles with a component of the reactive gas for ionizing the component; and electrostatically depositing the ionized component onto the substrate in an electric field. Charged particles may be photoelectrons or positive or negative ions produced by discharge. The reactive gas may be solely an ingredient gas containing a component for a thin film or a mixture of the ingredient gas and an oxidizing or reducing gas. The apparatus includes a reaction chamber including a support for a substrate, a device for introducing a reactive gas into the reaction chamber, an electric discharge device, and a device for forming an electric field in the reaction chamber in a direction to the support for the substrate, and an outlet for discharging the reactive gas.

摘要翻译： 一种用于生产薄膜的化学气相沉积装置的方法。 该方法包括以下步骤：将反应气体引入反应室，其中将基底支撑在反应室中; 将带电粒子与反应气体的组分结合起来，用于离子化该组分; 并在电场中将离子化的组分静电沉积到衬底上。 带电粒子可以是光电子或通过放电产生的正离子或负离子。 反应性气体可以单独是含有薄膜成分或成分气体和氧化还原气体的混合物的成分气体。 该装置包括反应室，该反应室包括用于基板的支撑件，用于将反应气体引入反应室的装置，放电装置，以及用于在反应室中朝着支撑件的方向形成电场的装置 基板和用于排出反应气体的出口。

公开(公告)号：US06395240B1

公开(公告)日：2002-05-28

申请号：US09555381

申请日：2000-05-30

申请人： Toshiaki Fujii ,  Osamu Horita

发明人： Toshiaki Fujii ,  Osamu Horita

IPC分类号： B01J1908

CPC分类号： H01L21/67393 ,  H01L21/67017

摘要： A carrier box 21 for a semiconductor substrate, including an opening and closing mechanism for taking the semiconductor in or out of the box 21. The box 21 is provided with a gas cleaning device A-2 which uses a photo-electron or the photo-catalyst actuated by light irradiation for cleaning an inside of the box, or a gas cleaning unit including the gas cleaning device and a rechargeable battery for supplying the gas cleaning device with electricity and integrated into the gas cleaning unit, and thereby providing a practically efficient function to remove particles or gaseous harmful components.

摘要翻译： 一种用于半导体衬底的载体盒21，包括用于将半导体插入或取出盒21的开闭机构。盒21设置有使用光电子或光电子的气体净化装置A-2， 通过光照射来驱动以清洁盒子内部的催化剂，或包括气体清洁装置的气体净化单元和用于向气体净化装置供电并集成到气体净化单元中的可再充电电池，从而提供实际有效的功能 去除颗粒或气体有害成分。

公开(公告)号：US06391118B1

公开(公告)日：2002-05-21

申请号：US09845177

申请日：2001-05-01

申请人： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

发明人： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

IPC分类号： B08B312

摘要： A method and an apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.