Integration of shallow trench isolation and through-substrate vias into integrated circuit designs
    29.
    发明授权
    Integration of shallow trench isolation and through-substrate vias into integrated circuit designs 有权
    将浅沟槽隔离和贯通衬底通孔集成到集成电路设计中

    公开(公告)号:US08742535B2

    公开(公告)日:2014-06-03

    申请号:US12969852

    申请日:2010-12-16

    IPC分类号: H01L23/52 H01L21/76 H01L21/44

    摘要: A method of manufacturing an IC, comprising providing a substrate having a first side and a second opposite side, forming a STI opening in the first side of the substrate and forming a partial TSV opening in the first side of the substrate and extending the partial TSV opening. The extended partial TSV opening is deeper into the substrate than the STI opening. The method also comprises filling the STI opening with a first solid material and filling the extended partial TSV opening with a second solid material. Neither the STI opening, the partial TSV opening, nor the extended partial TSV opening penetrate an outer surface of the second side of the substrate. At least either: the STI opening and the partial TSV opening are formed simultaneously, or, the STI opening and the extended partial TSV opening are filled simultaneously.

    摘要翻译: 一种制造IC的方法,包括提供具有第一侧和第二相对侧的衬底,在衬底的第一侧中形成STI开口,并在衬底的第一侧形成部分TSV开口,并延伸部分TSV 开放 扩展的部分TSV开口比STI开口更深入衬底。 该方法还包括用第一固体材料填充STI开口并用第二固体材料填充延伸的部分TSV开口。 STI打开,部分TSV打开,也不延伸部分TSV开口都不穿透基板的第二侧的外表面。 至少同时形成STI开口和部分TSV开口,或者同时填充STI开口和延伸部分TSV开口。