公开(公告)号：US07215024B2

公开(公告)日：2007-05-08

申请号：US10936922

申请日：2004-09-08

Applicant: Jing-Cheng Lin ,  Cheng-Lin Huang ,  Ching-Hua Hsieh ,  Shau-Lin Shue ,  Mong-Song Liang

Inventor： Jing-Cheng Lin ,  Cheng-Lin Huang ,  Ching-Hua Hsieh ,  Shau-Lin Shue ,  Mong-Song Liang

IPC: H01L23/48

CPC classification number: H01L21/76843 ,  H01L21/32051 ,  H01L21/32136 ,  H01L21/76844 ,  H01L21/76846 ,  H01L21/76855 ,  H01L21/76877 ,  H01L21/76888 ,  H01L23/53238 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A new method is provided for the creation of a barrier-free copper interconnect. A dual damascene structure is created in a layer of dielectric, a thin metal barrier layer is deposited. The metal barrier layer is oxidized, two layers are then deposited with the first layer comprising doped copper and the second layer comprising pure copper. The dual damascene structure is filled with copper, a thermal anneal is applied, stabilizing the deposited copper filling the dual damascene structure and forming metal oxide of the doped minority element. Excess copper is then removed from the dielectric.

Abstract translation: 提供了一种创建无障碍铜互连的新方法。 在电介质层中形成双镶嵌结构，沉积薄金属阻挡层。 金属阻挡层被氧化，然后沉积两层，第一层包含掺杂的铜，第二层包含纯铜。 双镶嵌结构填充铜，进行热退火，稳定沉积的铜填充双镶嵌结构并形成掺杂少数元素的金属氧化物。 然后从电介质中除去过量的铜。

公开(公告)号：US07030023B2

公开(公告)日：2006-04-18

申请号：US10655972

申请日：2003-09-04

Applicant: Shing-Chyang Pan ,  Ching-Hua Hsieh ,  Jing-Cheng Lin ,  Hsien-Ming Lee ,  Cheng-Lin Huang ,  Shau-Lin Shue

Inventor： Shing-Chyang Pan ,  Ching-Hua Hsieh ,  Jing-Cheng Lin ,  Hsien-Ming Lee ,  Cheng-Lin Huang ,  Shau-Lin Shue

IPC: H01L21/302

CPC classification number: H01L21/3105 ,  H01L21/28556 ,  H01L21/76807 ,  H01L21/76814 ,  H01L21/76838 ,  H01L21/76843 ,  H01L21/76873

Abstract: A method for forming a copper damascene feature including providing a semiconductor process wafer including at least one via opening formed to extend through a thickness of at least one dielectric insulating layer and an overlying trench line opening encompassing the at least one via opening to form a dual damascene opening; etching through an etch stop layer at the at least one via opening bottom portion to expose an underlying copper area; carrying out a sub-atmospheric DEGAS process with simultaneous heating of the process wafer in a hydrogen containing ambient; carrying out an in-situ sputter-clean process; and, forming a barrier layer in-situ to line the dual damascene opening.

Abstract translation: 一种用于形成铜镶嵌特征的方法，包括提供半导体工艺晶片，其包括形成为延伸穿过至少一个介电绝缘层的厚度的至少一个通孔开口，以及覆盖所述至少一个通孔开口的上覆沟槽开口，以形成双重 大马士革开幕 在所述至少一个通孔开口底部处蚀刻通过蚀刻停止层以暴露下面的铜区域; 在含氢环境中同时加热工艺晶片，进行亚低温DEGAS工艺; 进行原位溅射清洗过程; 并且原位形成阻挡层以使双镶嵌开口成线。

公开(公告)号：US06943111B2

公开(公告)日：2005-09-13

申请号：US10361732

申请日：2003-02-10

Applicant: Jing-Cheng Lin ,  Cheng-Lin Huang ,  Winston Shue ,  Mong-Song Liang

Inventor： Jing-Cheng Lin ,  Cheng-Lin Huang ,  Winston Shue ,  Mong-Song Liang

IPC: H01L21/768 ,  H01L21/4763 ,  H01L21/302 ,  H01L21/44

CPC classification number: H01L21/76843 ,  H01L21/76855 ,  H01L21/76864 ,  H01L21/76873 ,  H01L2221/1089

Abstract: A new method is provided for the creation of a copper seed interface capability. A first seed layer of copper alloy and a second seed layer of copper is provided over an opening in a layer of dielectric. The opening is filled with copper, the first and second seed layers are annealed.

Abstract translation: 提供了一种用于创建铜种子界面能力的新方法。 在介电层中的开口上方设置有铜合金的第一籽晶层和铜的第二晶种层。 开口填充有铜，第一和第二种子层被退火。

公开(公告)号：US20050189075A1

公开(公告)日：2005-09-01

申请号：US10789660

申请日：2004-02-27

Applicant: Shing-Chyang Pan ,  Jing-Cheng Lin ,  Hsien-Ming Lee ,  Cheng-Lin Huang ,  Ching-Hua Hsieh ,  Chao-Hsien Peng ,  Li-Lin Su ,  Shau-Lin Shue

Inventor： Shing-Chyang Pan ,  Jing-Cheng Lin ,  Hsien-Ming Lee ,  Cheng-Lin Huang ,  Ching-Hua Hsieh ,  Chao-Hsien Peng ,  Li-Lin Su ,  Shau-Lin Shue

IPC: B08B7/00 ,  H01J37/32 ,  H01L21/00 ,  C23F1/00

CPC classification number: H01L21/67109 ,  B08B7/0071 ,  H01J37/32862

Abstract: A reactive pre-clean chamber that contains a wafer heating apparatus, such as a high-temperature electrostatic chuck (HTESC), for directly heating a wafer supported on the apparatus during a pre-cleaning process. The wafer heating apparatus is capable of heating the wafer to the optimum temperatures required for a hydrogen plasma reactive pre-clean (RPC) process. Furthermore, degassing and pre-cleaning can be carried out in the same pre-clean chamber. The invention further includes a method of pre-cleaning a wafer using a pre-clean chamber that contains a wafer heating apparatus.

Abstract translation: 一种反应性预清洁室，其包含诸如高温静电卡盘（HTESC）的晶片加热装置，用于在预清洁过程期间直接加热支撑在装置上的晶片。 晶片加热装置能够将晶片加热到氢等离子体反应性预清洁（RPC）工艺所需的最佳温度。 此外，脱气和预清洁可以在相同的预清洁室中进行。 本发明还包括使用包含晶片加热装置的预清洁室预清洁晶片的方法。

公开(公告)号：US08610285B2

公开(公告)日：2013-12-17

申请号：US13298046

申请日：2011-11-16

Applicant: Chen-Hua Yu ,  Shin-Puu Jeng ,  Shang-Yun Hou ,  Kuo-Ching Hsu ,  Cheng-Chieh Hsieh ,  Ying-Ching Shih ,  Po-Hao Tsai ,  Cheng-Lin Huang ,  Jing-Cheng Lin

Inventor： Chen-Hua Yu ,  Shin-Puu Jeng ,  Shang-Yun Hou ,  Kuo-Ching Hsu ,  Cheng-Chieh Hsieh ,  Ying-Ching Shih ,  Po-Hao Tsai ,  Cheng-Lin Huang ,  Jing-Cheng Lin

IPC: H01L23/498 ,  H01L21/768 ,  H01L23/48 ,  H01L29/40

CPC classification number: H01L24/11 ,  H01L23/147 ,  H01L23/49827 ,  H01L24/13 ,  H01L24/16 ,  H01L24/81 ,  H01L25/04 ,  H01L25/50 ,  H01L2224/0361 ,  H01L2224/03912 ,  H01L2224/0401 ,  H01L2224/05022 ,  H01L2224/05027 ,  H01L2224/05073 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05184 ,  H01L2224/05666 ,  H01L2224/05681 ,  H01L2224/05686 ,  H01L2224/10145 ,  H01L2224/10156 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/1182 ,  H01L2224/11831 ,  H01L2224/13017 ,  H01L2224/1308 ,  H01L2224/13082 ,  H01L2224/13083 ,  H01L2224/13111 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13164 ,  H01L2224/13565 ,  H01L2224/13578 ,  H01L2224/13686 ,  H01L2224/16058 ,  H01L2224/16145 ,  H01L2224/81193 ,  H01L2224/81815 ,  H01L2924/01322 ,  H01L2924/01327 ,  H01L2924/3651 ,  H01L2924/3841 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/01047 ,  H01L2924/049 ,  H01L2924/053 ,  H01L2924/00

Abstract: A package component is free from active devices therein. The package component includes a substrate, a through-via in the substrate, a top dielectric layer over the substrate, and a metal pillar having a top surface over a top surface of the top dielectric layer. The metal pillar is electrically coupled to the through-via. A diffusion barrier is over the top surface of the metal pillar. A solder cap is disposed over the diffusion barrier.

Abstract translation: 封装组件不含其中的有源器件。 封装部件包括衬底，衬底中的通孔，衬底上的顶部电介质层，以及在顶部电介质层的顶表面上方具有顶表面的金属柱。 金属柱电连接到通孔。 扩散阻挡层在金属支柱的上表面之上。 焊料帽设置在扩散阻挡层上。

公开(公告)号：US20090047780A1

公开(公告)日：2009-02-19

申请号：US12287516

申请日：2008-10-10

Applicant: Cheng-Lin Huang ,  Ching-Hua Hsieh ,  Hsien-Ming Lee ,  Shing-Chyang Pan ,  Chao-Hsien Peng ,  Li-Lin Su ,  Jing-Cheng Lin ,  Shao-Lin Shue ,  Mong-Song Liang

Inventor： Cheng-Lin Huang ,  Ching-Hua Hsieh ,  Hsien-Ming Lee ,  Shing-Chyang Pan ,  Chao-Hsien Peng ,  Li-Lin Su ,  Jing-Cheng Lin ,  Shao-Lin Shue ,  Mong-Song Liang

IPC: H01L21/44

CPC classification number: H01L21/76844 ,  H01L21/76846 ,  H01L21/76862 ,  Y10S438/927

Abstract: Provided is a method for forming a composite barrier layer with superior barrier qualities and superior adhesion properties to both dielectric materials and conductive materials as the composite barrier layer extends throughout the semiconductor device. The composite barrier layer may be formed in regions where it is disposed between two conductive layers and in regions where it is disposed between a conductive layer and a dielectric material. The composite barrier layer may consist of various pluralities of layers and the arrangement of layers that form the composite barrier layer may differ as the barrier layer extends throughout different sections of the device. Amorphous layers of the composite barrier layer generally form boundaries with dielectric materials and crystalline layers generally form boundaries with conductive materials such as interconnect materials.

Abstract translation: 提供了一种形成复合阻挡层的方法，该复合阻挡层具有优异的阻挡性能，并且当复合阻挡层贯穿整个半导体器件时，两种电介质材料和导电材料具有优异的粘合性能。 复合阻挡层可以形成在其设置在两个导电层之间的区域中，并且在其布置在导电层和电介质材料之间的区域中。 复合阻挡层可以由各种多个层组成，并且形成复合阻挡层的层的布置可以随着阻挡层在装置的不同部分延伸而不同。 复合阻挡层的非晶层通常与电介质材料形成边界，并且结晶层通常与诸如互连材料的导电材料形成边界。

公开(公告)号：US20060027922A1

公开(公告)日：2006-02-09

申请号：US10909980

申请日：2004-08-03

Applicant: Hsien-Ming Lee ,  Jing-Cheng Lin ,  Shing-Chyang Pan ,  Ching-Hua Hsieh ,  Chao-Hsien Peng ,  Cheng-Lin Huang ,  Li-Lin Su ,  Shau-Lin Shue

Inventor： Hsien-Ming Lee ,  Jing-Cheng Lin ,  Shing-Chyang Pan ,  Ching-Hua Hsieh ,  Chao-Hsien Peng ,  Cheng-Lin Huang ,  Li-Lin Su ,  Shau-Lin Shue

IPC: H01L23/48

CPC classification number: H01L21/76834 ,  H01L21/76849 ,  H01L21/76867 ,  H01L23/5329 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A semiconductor device having a nonconductive cap layer comprising a first metal element. The nonconductive cap layer comprises a first metal nitride, a first metal oxide, or a first metal oxynitride over conductive lines and an insulating material between the conductive lines. An interface region may be formed over the top surface of the conductive lines, the interface region including the metal element of the cap layer. The cap layer prevents the conductive material in the conductive lines from migrating or diffusing into adjacent subsequently formed insulating material layers. The cap layer may also function as an etch stop layer.

Abstract translation: 一种具有包括第一金属元件的非导电盖层的半导体器件。 非导电盖层包括导电线上的第一金属氮化物，第一金属氧化物或第一金属氧氮化物，以及导电线之间的绝缘材料。 界面区域可以形成在导电线的顶表面上，界面区域包括盖层的金属元件。 盖层防止导电线中的导电材料迁移或扩散到相邻的随后形成的绝缘材料层中。 盖层也可以用作蚀刻停止层。

公开(公告)号：US20050054202A1

公开(公告)日：2005-03-10

申请号：US10655972

申请日：2003-09-04

Applicant: Shing-Chyang Pan ,  Ching-Hua Hsieh ,  Jing-Cheng Lin ,  Hsien-Ming Lee ,  Cheng-Lin Huang ,  Shau-Lin Shue

Inventor： Shing-Chyang Pan ,  Ching-Hua Hsieh ,  Jing-Cheng Lin ,  Hsien-Ming Lee ,  Cheng-Lin Huang ,  Shau-Lin Shue

IPC: H01L21/285 ,  H01L21/3105 ,  H01L21/311 ,  H01L21/768

CPC classification number: H01L21/3105 ,  H01L21/28556 ,  H01L21/76807 ,  H01L21/76814 ,  H01L21/76838 ,  H01L21/76843 ,  H01L21/76873

Abstract: A method for forming a copper damascene feature including providing a semiconductor process wafer including at least one via opening formed to extend through a thickness of at least one dielectric insulating layer and an overlying trench line opening encompassing the at least one via opening to form a dual damascene opening; etching through an etch stop layer at the at least one via opening bottom portion to expose an underlying copper area; carrying out a sub-atmospheric DEGAS process with simultaneous heating of the process wafer in a hydrogen containing ambient; carrying out an in-situ sputter-clean process; and, forming a barrier layer in-situ to line the dual damascene opening.

Abstract translation: 一种用于形成铜镶嵌特征的方法，包括提供半导体工艺晶片，其包括形成为延伸穿过至少一个介电绝缘层的厚度的至少一个通孔开口，以及覆盖所述至少一个通孔开口的上覆沟槽开口，以形成双重 大马士革开幕 在所述至少一个通孔开口底部处蚀刻通过蚀刻停止层以暴露下面的铜区域; 在含氢环境中同时加热工艺晶片，进行亚低温DEGAS工艺; 进行原位溅射清洗过程; 并且原位形成阻挡层以使双镶嵌开口成线。

公开(公告)号：US09024438B2

公开(公告)日：2015-05-05

申请号：US13192756

申请日：2011-07-28

Applicant: Cheng-Lin Huang ,  I-Ting Chen ,  Ying Ching Shih ,  Po-Hao Tsai ,  Szu Wei Lu ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

Inventor： Cheng-Lin Huang ,  I-Ting Chen ,  Ying Ching Shih ,  Po-Hao Tsai ,  Szu Wei Lu ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

IPC: H01L23/498 ,  H01L21/60 ,  H01L23/00

CPC classification number: H01L24/14 ,  H01L23/49811 ,  H01L24/11 ,  H01L24/13 ,  H01L24/17 ,  H01L24/81 ,  H01L2224/0346 ,  H01L2224/03912 ,  H01L2224/0401 ,  H01L2224/1146 ,  H01L2224/11462 ,  H01L2224/11472 ,  H01L2224/1161 ,  H01L2224/11622 ,  H01L2224/13011 ,  H01L2224/13014 ,  H01L2224/13078 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/1403 ,  H01L2224/1405 ,  H01L2224/14051 ,  H01L2224/145 ,  H01L2224/16238 ,  H01L2224/17107 ,  H01L2224/81141 ,  H01L2224/81193 ,  H01L2224/81815 ,  H01L2224/81897 ,  H01L2924/1305 ,  H01L2924/1306 ,  H01L2924/00014 ,  H01L2924/01047 ,  H01L2924/01082 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01083 ,  H01L2924/01053 ,  H01L2924/01079 ,  H01L2924/01051 ,  H01L2924/014 ,  H01L2924/00012 ,  H01L2924/00

Abstract: A conductive bump structure of a semiconductor device comprises a substrate comprising a major surface and conductive bumps distributed over the major surface of the substrate. Each of a first subset of the conductive bumps comprises a regular body, and each of a second subset of the conductive bumps comprises a ring-shaped body.

Abstract translation: 半导体器件的导电凸块结构包括包括主表面的衬底和分布在衬底的主表面上的导电凸块。 导电凸块的第一子集中的每一个包括规则体，并且导电凸块的第二子集中的每一个包括环形体。

公开(公告)号：US20140035135A1

公开(公告)日：2014-02-06

申请号：US13572302

申请日：2012-08-10

Applicant: Jung-Hua Chang ,  Cheng-Lin Huang ,  Jing-Cheng Lin

Inventor： Jung-Hua Chang ,  Cheng-Lin Huang ,  Jing-Cheng Lin

IPC: H01L23/48 ,  H01L21/60

CPC classification number: H01L24/13 ,  H01L23/49816 ,  H01L24/11 ,  H01L2224/118 ,  H01L2224/13 ,  H01L2224/13016 ,  H01L2224/131 ,  H01L2224/1319 ,  H01L2924/01029 ,  H01L2924/014 ,  H01L2924/06 ,  H01L2924/0665 ,  H01L2924/15788 ,  H01L2924/37001 ,  H01L2924/00

Abstract: A solder bump structure for a ball grid array (BGA) includes at least one under bump metal (UBM) layer and a solder bump formed over the at least one UBM layer. The solder bump has a bump width and a bump height and the ratio of the bump height over the bump width is less than 1.

Abstract translation: 用于球栅阵列（BGA）的焊料凸块结构包括在至少一个UBM层上形成的至少一个下凸块金属（UBM）层和焊料凸块。 焊料凸块具有凸块宽度和凸块高度，并且凸块高度比凸块宽度的比值小于1。