ELECTROCONDUCTIVE-FILM-FORMING COMPOSITION AND METHOD FOR PRODUCING ELECTROCONDUCTIVE FILM
    37.
    发明申请
    ELECTROCONDUCTIVE-FILM-FORMING COMPOSITION AND METHOD FOR PRODUCING ELECTROCONDUCTIVE FILM 有权
    电导膜成膜组合物及其生产电极膜的方法

    公开(公告)号:US20160137855A1

    公开(公告)日:2016-05-19

    申请号:US15002464

    申请日:2016-01-21

    IPC分类号: C09D5/24

    摘要: An electroconductive-film-forming composition capable of forming an electroconductive film having excellent conductivity and few voids and a method for producing an electroconductive film using the same. The electroconductive-film-forming composition contains copper particles having an average particle diameter of 1 nm to 10 copper oxide particles having an average particle diameter of 1 nm to 500 nm, a reducing agent having a hydroxy group, a metal catalyst including metals other than copper, and a solvent, in which the content of the copper oxide particles is 50% by mass to 300% by mass with respect to the content of the copper particles, the content of the reducing agent is 100 mol % to 800 mol % with respect to the content of the copper oxide particles, and the content of the metal catalyst is 10% by mass or less with respect to the content of the copper oxide particles.

    摘要翻译: 一种导电膜形成组合物,其能够形成导电性优异且孔隙少的导电膜,以及使用该导电膜的导电膜的制造方法。 导电膜形成组合物包含平均粒径为1nm至10的平均粒径为1nm至500nm的氧化铜颗粒的铜颗粒,具有羟基的还原剂,除金属以外的金属的金属催化剂 铜和溶剂,其中相对于铜颗粒的含量,氧化铜颗粒的含量为50质量%至300质量%,还原剂的含量为100摩尔%至800摩尔%,而 相对于氧化铜粒子的含量,金属催化剂的含量为10质量%以下。