公开(公告)号：US07388217B2

公开(公告)日：2008-06-17

申请号：US11700468

申请日：2007-01-31

Applicant: Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

Inventor： Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

IPC: H01J37/302 ,  H01L21/027

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J2237/024 ,  H01J2237/10 ,  H01J2237/216 ,  H01J2237/30455

Abstract: In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.

Abstract translation: 在粒子光学投影系统中，通过能量带电粒子将图案成像到靶上。 所述图案表示在所述带电粒子的图案化束中，所述带电粒子通过至少一个交叉从对象平面出射; 它被成像为具有给定尺寸和失真的图像。 为了补偿图像位置的Z偏差与目标的实际定位（Z表示基本上平行于光轴的轴向坐标），而不改变图像的尺寸，系统包括用于测量Z的位置检测器 - 位置，以及用于计算最终粒子 - 光学透镜的所选透镜参数的修改并根据所述修改来控制所述透镜参数的控制器。

公开(公告)号：US20040211914A1

公开(公告)日：2004-10-28

申请号：US10829002

申请日：2004-04-21

Applicant: FEI Company

Inventor： Bart Buijsse

IPC: H01J037/145

CPC classification number: H01J37/26 ,  H01J37/145 ,  H01J2237/10

Abstract: Particle-optical apparatus are normally embodied with a magnetic or electrostatic lens so as to focus a beam 1 of charged particles onto a sample 8. It is desirable to be able to use these apparatus at different beam energies. It is, however, undesirable that the focus position 9 of the beam, as a result hereof, should shift with respect to the sample 8. Use of a permanent-magnetic material 6 in a magnetic lens has advantages as regards compact construction, but is normally avoided because it is not easily possible to adjust the lens power to match varying beam energies. The invention shows how it is possible to keep constant the focus position 9, independent of the energy of the particles in the beam 1, by combining a magnetic lensnullthat has been furnished with permanent-magnetic materialnullwith an electrostatic lens. The electrostatic lens is embodied in that case as an accelerating lens.

Abstract translation: 通常使用磁性或静电透镜来实现粒子光学装置，以将带电粒子的束1聚焦在样品8上。希望能够以不同的光束能量使用这些装置。 然而，不合适的是，作为其结果的光束的聚焦位置9应该相对于样品8移动。在磁性透镜中使用永久磁性材料6具有紧凑结构的优点，但是 通常避免，因为不容易调整透镜功率以匹配变化的光束能量。 本发明通过组合具有永久磁性材料的磁性透镜与静电透镜组合，可以不依赖于光束1中的颗粒的能量而保持聚焦位置9的恒定。 在这种情况下，静电透镜被体现为加速透镜。

公开(公告)号：US09741528B2

公开(公告)日：2017-08-22

申请号：US14724681

申请日：2015-05-28

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Michael Albiez ,  Stefan Meyer ,  Daniel Kirsten ,  Stewart Bean ,  Erik Essers

IPC: H01J37/18 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/18 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/188 ,  H01J2237/2605

Abstract: Disclosed is a charged particle optical apparatus, which includes a particle optical arrangement, configured to define a particle beam path for inspecting an object. The object is accommodated in a pressure-controlled interior of a specimen chamber during the inspection of the object. The charged particle optical apparatus further includes a differential pressure module having a differential pressure aperture. A positioning arm is arranged in the specimen chamber for selectively position the differential pressure module within the pressure-controlled interior of the specimen chamber into an operating position in which the particle beam path passes through the differential pressure aperture. The selective positioning includes an advancing movement of the differential pressure module toward the primary particle beam path. The advancing movement is transmitted to the differential pressure module by a track-guided movement of the positioning arm.

公开(公告)号：US09466467B2

公开(公告)日：2016-10-11

申请号：US14096735

申请日：2013-12-04

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Mitsuaki Kabasawa ,  Kazuhiro Watanabe ,  Hitoshi Ando ,  Kouji Inada ,  Tatsuya Yamada

IPC: H01J37/00 ,  H01J37/32 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/32412 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/057 ,  H01J2237/10

Abstract: An ion implantation apparatus includes: a plurality of units for accelerating an ion beam generated in an ion source; and a plurality of units for adjusting a scan beam and implanting ions into a wafer. A horizontal U-shaped folder type beamline having opposite long straight portions includes the plurality of units for adjusting the scan beam in a long straight portion to have substantially the same length as the ion source and the plurality of units for accelerating the ion beam.

Abstract translation: 离子注入装置包括：用于加速在离子源中产生的离子束的多个单元; 以及用于调整扫描光束并将离子注入晶片的多个单元。 具有相对的长直线部分的水平U形折叠型光束线包括多个单元，用于将长直线部分中的扫描光束调整为具有与离子源大致相同的长度和用于加速离子束的多个单元。

公开(公告)号：US09281164B2

公开(公告)日：2016-03-08

申请号：US12966906

申请日：2010-12-13

Applicant: Sean X. Wu ,  Kini Vivekanand

Inventor： Sean X. Wu ,  Kini Vivekanand

IPC: H01J37/28 ,  H01J37/26 ,  H01L21/66

CPC classification number: H01J37/222 ,  H01J37/06 ,  H01J37/265 ,  H01J37/285 ,  H01J37/292 ,  H01J2237/10 ,  H01J2237/202 ,  H01J2237/2813 ,  H01J2237/2817 ,  H01L22/12

Abstract: One embodiment relates to a method of automated inspection of scattered hot spot areas on a manufactured substrate using an electron beam apparatus. A stage holding the substrate is moved along a swath path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate. Off-axis imaging of the hot spot areas within the moving field of view is performed. A number of hot spot areas within the moving field of view may be determined, and the speed of the stage movement may be adjusted based on the number of hot spot areas within the moving field of view. Another embodiment relates to an electron beam apparatus for inspecting scattered areas on a manufactured substrate. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及一种使用电子束装置自动检查制造的衬底上的散射热点区域的方法。 保持基板的台阶沿着条带路径移动，以便移动电子束装置的视野，使得移动视场覆盖基板上的目标区域。 执行移动视野内的热点区域的离轴成像。 可以确定运动视场内的多个热点区域，并且可以基于运动视场内的热点区域的数量来调整平台运动的速度。 另一实施例涉及一种用于检查制造的基板上的散射区域的电子束装置。 还公开了其它实施例，方面和特征。

公开(公告)号：US20160005570A1

公开(公告)日：2016-01-07

申请号：US14831225

申请日：2015-08-20

Applicant: Nissin Ion Equipment Co., Ltd.

Inventor： Sami K. Hahto ,  Tetsuro Yamamoto

IPC: H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3171 ,  H01J37/3007 ,  H01J2237/047 ,  H01J2237/04756 ,  H01J2237/10 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/24542 ,  H01J2237/30472

Abstract: In one aspect, an ion implantation system is disclosed, which comprises a deceleration system configured to receive an ion beam and decelerate the ion beam at a deceleration ratio of at least 2, and an electrostatic bend disposed downstream of the deceleration system for causing a deflection of the ion beam. The electrostatic bend includes three tandem electrode pairs for receiving the decelerated beam, where each electrode pair has an inner and an outer electrode spaced apart to allow passage of the ion beam therethrough. Each of the electrodes of the end electrode pair is held at an electric potential less than an electric potential at which any of the electrodes of the middle electrode pair is held and the electrodes of the first electrode pair are held at a lower electric potential relative to the electrodes of the middle electrode pair.

Abstract translation: 一方面，公开了一种离子注入系统，其包括减速系统，该减速系统被配置为接收离子束并且以至少为2的减速比使离子束减速，以及设置在减速系统下游的静电弯曲件，用于引起偏转 的离子束。 静电弯曲包括用于接收减速梁的三个串联电极对，其中每个电极对具有间隔开的内电极和外电极，以允许离子束通过其中。 端电极对的每个电极被保持在比中间电极对的电极被保持的电位小的电位，并且第一电极对的电极相对于第一电极对的电位保持在较低的电位 中间电极对的电极。

公开(公告)号：US20150348742A1

公开(公告)日：2015-12-03

申请号：US14724681

申请日：2015-05-28

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Michael Albiez ,  Stefan Meyer ,  Daniel Kirsten ,  Stewart Bean

IPC: H01J37/18 ,  H01J37/28 ,  H01J37/20

CPC classification number: H01J37/18 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/188 ,  H01J2237/2605

Abstract: Disclosed is a charged particle optical apparatus, which includes a particle optical arrangement, configured to define a particle beam path for inspecting an object. The object is accommodated in a pressure-controlled interior of a specimen chamber during the inspection of the object. The charged particle optical apparatus further includes a differential pressure module having a differential pressure aperture. A positioning arm is arranged in the specimen chamber for selectively position the differential pressure module within the pressure-controlled interior of the specimen chamber into an operating position in which the particle beam path passes through the differential pressure aperture. The selective positioning includes an advancing movement of the differential pressure module toward the primary particle beam path. The advancing movement is transmitted to the differential pressure module by a track-guided movement of the positioning arm.

Abstract translation: 公开了一种带电粒子光学装置，其包括粒子光学装置，其被配置为限定用于检查物体的粒子束路径。 在检查物体期间，物体被容纳在样本室的压力控制的内部。 带电粒子光学装置还包括具有差压孔的差压模块。 定位臂设置在试样室中，用于将压差模块选择性地定位在试样室的受压控制的内部中，使得其中的粒子束路径穿过差压孔。 选择性定位包括差压模块朝向初级粒子束路径的前进运动。 前进运动通过定位臂的轨道引导运动传递到差压模块。

公开(公告)号：US09196456B2

公开(公告)日：2015-11-24

申请号：US14509402

申请日：2014-10-08

Applicant: JEOL Ltd.

Inventor： Hirofumi Iijima

IPC: H01J37/21 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/21 ,  H01J37/226 ,  H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/10 ,  H01J2237/1534 ,  H01J2237/2007 ,  H01J2237/21 ,  H01J2237/2602 ,  H01J2237/2614

Abstract: An image acquisition method and system for use in transmission electron microscopy and capable of providing information about a wide range of frequency range. The method is initiated with setting at least one of the spherical aberration coefficient and chromatic aberration coefficient of the imaging system of the microscope to suppress attenuation of a contrast transfer function due to an envelope function. Then, an image is obtained by the imaging system placed in defocus conditions.

Abstract translation: 一种用于透射电子显微镜的图像采集方法和系统，能够提供有关宽范围频率范围的信息。 通过设置显微镜的成像系统的球面像差系数和色差系数中的至少一个来开始该方法，以抑制由于包络函数引起的对比度传递函数的衰减。 然后，通过放置在散焦条件下的成像系统获得图像。

公开(公告)号：US09153415B2

公开(公告)日：2015-10-06

申请号：US14581728

申请日：2014-12-23

Applicant: Mapper Lithography IP B.V.

Inventor： Paul IJmert Scheffers

IPC: G21K5/10 ,  G21K5/00 ,  G21K4/00 ,  H01J37/22 ,  H01J37/20

CPC classification number: H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/10 ,  H01J2237/202 ,  H01J2237/2443 ,  H01J2237/24507

Abstract: The invention relates to a charged particle lithography system for transferring a pattern onto a target, said system comprising:a target positioning device comprising a target holder having a first side for holding the target,a charged particle optical unit for generating a charged particle beam, modulating said charged particle beam, and directing said charged particle beam towards the first side of the target holder, anda sensor assembly comprising a converter element for converting charged particles which impinge on said converter element into light, wherein the converter element is arranged on said target positioning device, a light sensor for detecting the light, wherein the light sensor is arranged at a distance from said target positioning device, and a light optical lens which is arranged between the converter element and the light sensor for directing light originating from said converter element to said sensor.

Abstract translation: 本发明涉及一种用于将图案转印到目标上的带电粒子光刻系统，所述系统包括：目标定位装置，包括具有用于保持靶的第一侧的靶保持器，用于产生带电粒子束的带电粒子光学单元， 调制所述带电粒子束，并将所述带电粒子束引向所述目标保持器的第一侧;以及传感器组件，其包括用于将撞击在所述转换器元件上的带电粒子转换成光的转换器元件，其中所述转换器元件布置在所述 目标定位装置，用于检测光的光传感器，其中所述光传感器布置在距所述目标定位装置一定距离处;以及光学透镜，布置在所述转换器元件和所述光传感器之间，用于引导源自所述转换器的光 元件到所述传感器。

公开(公告)号：US20150279615A1

公开(公告)日：2015-10-01

申请号：US14668233

申请日：2015-03-25

Applicant: FEI Company

Inventor： Pavel Potocek ,  Cornelis S. Kooijman ,  Hendrik Nicolaas Slingerland ,  Gerardus Nicolaas Anne Van Veen ,  Faysal Boughorbel ,  Albertus Aemillius Seyno Sluijterman ,  Jacob Simon Faber

IPC: H01J37/26 ,  H01J37/06 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/261 ,  G01N21/6458 ,  G01N23/225 ,  G01N2223/418 ,  G01N2223/427 ,  G02B21/0016 ,  H01J37/06 ,  H01J37/1472 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/226 ,  H01J2237/2446 ,  H01J2237/2447 ,  H01J2237/2448 ,  H01J2237/24507 ,  H01J2237/2602

Abstract: A multi-beam apparatus for inspecting or processing a sample with a multitude of focused beams uses a multitude of detectors for detecting secondary radiation emitted by the sample when is irradiated by the multitude of beams. Each detector signal comprises information caused by multiple beams, the apparatus equipped with a programmable controller for processing the multitude of detector signals to a multitude of output signals, using weight factors so that each output signal represents information caused by a single beam. The weight factors are dynamic weight factors depending on the scan position of the beams with respect to the detectors and the distance between sample and detectors.

Abstract translation: 用于用多个聚焦光束检查或处理样品的多光束装置使用多个检测器来检测由多个光束照射时由样品发射的次级辐射。 每个检测器信号包括由多个光束引起的信息，该装置配备有可编程控制器，用于使用加权因子将多个检测器信号处理到多个输出信号，使得每个输出信号表示由单个波束引起的信息。 重量因数是取决于梁相对于检测器的扫描位置和样品与检测器之间的距离的动态加权因子。