Abstract:
A liquid crystal display apparatus is disclosed. A plurality of pixel electrodes are arranged on a display region of a substrate in a matrix form having a plurality of column lines and a plurality of row lines. Each of a plurality of thin film transistors has a first current electrode connected to a corresponding one of the plurality of pixel electrodes. Each of a plurality of data lines is arranged between odd column line and even column line of a pair of the plurality of column lines and is connected to second current electrodes of thin film transistors which are coupled to odd column line and even column line of the pair. Each of a plurality of first gate lines is connected to gate electrodes of odd thin film transistors which are coupled to one of the plurality of row lines. Each of a plurality of second gate lines is connected to gate electrodes of even thin film transistors which is coupled to the one of the plurality of row lines. A data driving circuit is provided for driving the data lines. At least two gate driving circuits having a first gate driving circuit and a second gate driving circuit are provided, wherein the first gate driving circuit is connected to the plurality of first gate lines and the second gate driving circuit is connected to the plurality of second gate lines.
Abstract:
In a semiconductor package, an electrode has a first part extending through a semiconductor substrate and a second part extending from the first part through a compositional layer to reach a conductive pad.
Abstract:
A non-volatile memory device and a fabrication method thereof. A high-k layer is formed between nitrogen-containing insulating layers. Accordingly, an interface reaction between an underlying oxide layer and the high-k insulating layer or between the oxide layer and a floating gate or a control gate can be prohibited and the electrical characteristics of the high-k layer can be improved, and a non-volatile memory device with high performance and high reliability can be fabricated.
Abstract:
Provided are a wafer level chip scale package in which a redistribution process is applied at a wafer level, a manufacturing method thereof, and a semiconductor chip module including the wafer level chip scale package. The wafer level chip scale package includes a semiconductor chip having a bonding pad, a first insulating layer disposed on the semiconductor chip so as to expose the bonding pad, a redistribution line disposed on the exposed bonding pad and the first insulating layer, a sacrificial layer disposed below a redistribution pad of the redistribution line, a second insulating layer disposed on the redistribution line so as to expose the redistribution pad and including a crack inducement hole disposed beside the sacrificial layer, and an external connection terminal attached to the redistribution pad.
Abstract:
Provided are a camera module and a method of fabricating the same. The method includes preparing a lens structure including upper connection portions. Lower connection portions are formed in a predetermined region of a substrate. The lower connection portions define a chip region and fit in the upper connection portions, respectively. An image sensor chip is located on the bottom surface of the chip region. The lens structure is adhered to the substrate using the upper and lower connection portions.
Abstract:
A method of forming a source/drain region of a semiconductor device includes forming a photoresist pattern through which an NMOS region of a semiconductor substrate is exposed, and then performing an ion implant process to form NMOS LDD regions in the semiconductor substrate of the NMOS region. An ion implant process is performed to form PMOS pocket regions in a PMOS region of the semiconductor substrate. Spacers are formed on sidewalls of a PMOS gate electrode pattern and sidewalls of an NMOS gate electrode pattern, and an ion implant process is performed to form PMOS source/drain regions in the semiconductor substrate in which the PMOS pocket regions are formed. An ion implant process is performed to form NMOS source/drain regions in the semiconductor substrate in which the NMOS LDD regions are formed.
Abstract:
Provided is a semiconductor device having a cooling path on its bottom surface. The stack-type semiconductor device having a cooling path comprises a stack-type semiconductor chip comprising a first semiconductor chip and a second semiconductor chip. The first semiconductor chip comprises a first surface in which a circuit unit is formed and a second surface in which a first cooling path is formed, and the second semiconductor chip comprises a first surface in which a circuit unit is formed and a second surface in which a second cooling path is formed. The second surface of the first semiconductor chip and the second surface of the second semiconductor chip are bonded to each other, and a third cooling path is formed in the middle of the stack-type semiconductor chip using the first and second cooling paths. Warpage of the stack-type semiconductor device is suppressed and heat is easily dissipated.
Abstract:
A multi-chip package includes first through Nth semiconductor chips, each of which includes an input/output pad, an input/output driver coupled to the input/output pad, and an internal circuit. Each of the first through Nth semiconductor chips includes an internal pad for coupling the internal input/output driver and the internal circuit. The input/output pad of the first semiconductor chip directly receives an input/output signal via a corresponding pin of the multi-chip package. The second through Nth semiconductor chips indirectly receive the input/output signal via the internal pads coupled to each other. The multi-chip package can improve signal compatibility by maintaining a parasitic load of a pin to at least the level of a single chip, when a signal is transmitted to the pin at high speed.
Abstract:
A wafer level chip scale package capable of reducing parasitic capacitances between a rerouting and the metal wiring of a wafer, and a method for manufacturing the same are provided. An embodiment of the wafer level chip scale package includes a wafer arranged with a plurality of bonding pads and an insulating member formed on the wafer so that the bonding pads are exposed. A rerouting is further formed on the insulating member in contact with the exposed bonding pads and an external connecting terminal is electrically connected to a portion of the rerouting. Here, the insulating member overlapping the rerouting is provided with a plurality of spaces in which air is trapped.