Memory cell constructions, and methods for fabricating memory cell constructions

    公开(公告)号:US08921823B2

    公开(公告)日:2014-12-30

    申请号:US14243710

    申请日:2014-04-02

    发明人: Jun Liu Jian Li

    IPC分类号: H01L45/00 H01L21/06

    摘要: Some embodiments include methods for fabricating memory cell constructions. A memory cell may be formed to have a programmable material directly against a material having a different coefficient of expansion than the programmable material. A retaining shell may be formed adjacent the programmable material. The memory cell may be thermally processed to increase a temperature of the memory cell to at least about 300° C., causing thermally-induced stress within the memory cell. The retaining shell may provide a stress which substantially balances the thermally-induced stress. Some embodiments include memory cell constructions. The constructions may include programmable material directly against silicon nitride that has an internal stress of less than or equal to about 200 megapascals. The constructions may also include a retaining shell silicon nitride that has an internal stress of at least about 500 megapascals.

    Memory cell constructions, and methods for fabricating memory cell constructions
    60.
    发明授权
    Memory cell constructions, and methods for fabricating memory cell constructions 有权
    存储单元结构以及用于制造存储单元结构的方法

    公开(公告)号:US08735216B2

    公开(公告)日:2014-05-27

    申请号:US13763664

    申请日:2013-02-09

    发明人: Jun Liu Jian Li

    IPC分类号: H01L21/06

    摘要: Some embodiments include methods for fabricating memory cell constructions. A memory cell may be formed to have a programmable material directly against a material having a different coefficient of expansion than the programmable material. A retaining shell may be formed adjacent the programmable material. The memory cell may be thermally processed to increase a temperature of the memory cell to at least about 300° C., causing thermally-induced stress within the memory cell. The retaining shell may provide a stress which substantially balances the thermally-induced stress. Some embodiments include memory cell constructions. The constructions may include programmable material directly against silicon nitride that has an internal stress of less than or equal to about 200 megapascals. The constructions may also include a retaining shell silicon nitride that has an internal stress of at least about 500 megapascals.

    摘要翻译: 一些实施例包括用于制造存储器单元结构的方法。 存储单元可以形成为具有可编程材料,以直接抵抗具有与可编程材料不同的膨胀系数的材料。 可以在可编程材料附近形成保持壳。 可以对存储单元进行热处理以将存储单元的温度升高至至少约300℃,从而在存储单元内引起热诱导的应力。 保持壳可以提供基本上平衡热诱导应力的应力。 一些实施例包括存储器单元结构。 这些结构可以包括直接针对氮化硅的可编程材料,其具有小于或等于约200兆帕的内部应力。 该结构还可以包括具有至少约500兆帕的内应力的保持壳氮化硅。