公开(公告)号：US12159392B2

公开(公告)日：2024-12-03

申请号：US17753555

申请日：2020-09-14

Applicant: Applied Materials, Inc.

Inventor： Yongan Xu ,  Chan Juan Xing ,  Jinxin Fu ,  Yifei Wang ,  Ludovic Godet

IPC: G06T7/33 ,  G06T7/00

Abstract: Embodiments of the present disclosure include a die system and a method of comparing alignment vectors. The die system includes a plurality of dies arranged in a desired pattern. An alignment vector, such as a die vector, can be determined from edge features of the die. The alignment vectors can be compared to other dies or die patterns in the same system. A method of comparing dies and die patterns includes comparing die vectors and/or pattern vectors. The comparison between alignment vectors allows for fixing the die patterns for the next round of processing. The methods provided allow accurate comparisons between as-deposited edge features, such that accurate stitching of dies can be achieved.

公开(公告)号：US12158605B2

公开(公告)日：2024-12-03

申请号：US18662859

申请日：2024-05-13

Applicant: Applied Materials, Inc.

Inventor： Levent Colak ,  Ludovic Godet ,  Andre P. Labonte

IPC: F21V8/00

Abstract: Embodiments described herein provide for methods of forming optical device structures. The methods utilize rotation of a substrate, to have the optical device structures formed thereon, and tunability of etch rates of a patterned resist disposed over the substrate and one of a device layer or the substrate to form the optical device structures without multiple lithographic patterning steps and angled etch steps.

公开(公告)号：US12109641B2

公开(公告)日：2024-10-08

申请号：US17455288

申请日：2021-11-17

Applicant: Applied Materials, Inc.

Inventor： Kang Luo ,  Ludovic Godet ,  Daihua Zhang ,  Nai-Wen Pi ,  Jinrui Guo ,  Rami Hourani

IPC: B23K10/00 ,  F21V8/00

CPC classification number: B23K10/00 ,  G02B6/0016 ,  G02B6/0036

Abstract: The present disclosure generally relates to a method and apparatus for forming a substrate having a graduated refractive index. A method of forming a waveguide structure includes expelling plasma from an applicator having a head toward a plurality of grating structures formed on a substrate. The plasma is formed in the head at atmospheric pressure. The method further includes changing a depth of the plurality of grating structures with the plasma by removing grating material from the plurality of grating structures.

公开(公告)号：US12084761B2

公开(公告)日：2024-09-10

申请号：US18111385

申请日：2023-02-17

Applicant: Applied Materials, Inc.

Inventor： Karl J. Armstrong ,  Ludovic Godet ,  Brian Alexander Cohen ,  Wayne McMillan ,  James D. Strassner ,  Benjamin B. Riordon

IPC: H01L21/677 ,  C23C14/04 ,  C23C14/06 ,  C23C14/08 ,  C23C14/14 ,  C23C16/04 ,  C23C16/24 ,  C23C16/34 ,  C23C16/40 ,  C23C16/455 ,  C23C16/56 ,  H01L21/68 ,  H01L21/683 ,  G02B6/132

CPC classification number: C23C16/405 ,  C23C14/042 ,  C23C14/0652 ,  C23C14/083 ,  C23C14/086 ,  C23C14/14 ,  C23C16/042 ,  C23C16/24 ,  C23C16/345 ,  C23C16/407 ,  C23C16/45525 ,  C23C16/56 ,  H01L21/67766 ,  H01L21/67778 ,  H01L21/682 ,  H01L21/6838 ,  G02B6/132

Abstract: Embodiments of the present disclosure relate to forming multi-depth films for the fabrication of optical devices. One embodiment includes disposing a base layer of a device material on a surface of a substrate. One or more mandrels of the device material are disposed on the base layer. The disposing the one or more mandrels includes positioning a mask over of the base layer. The device material is deposited with the mask positioned over the base layer to form an optical device having the base layer with a base layer depth and the one or more mandrels having a first mandrel depth and a second mandrel depth.

公开(公告)号：US11976351B2

公开(公告)日：2024-05-07

申请号：US17692465

申请日：2022-03-11

Applicant: Applied Materials, Inc.

Inventor： Kenichi Ohno ,  Andrew Ceballos ,  Karl J. Armstrong ,  Takashi Kuratomi ,  Rami Hourani ,  Ludovic Godet

IPC: G02B1/10 ,  C03C17/245 ,  C23C14/08 ,  C23C14/35 ,  C23C14/54 ,  G02B1/04

CPC classification number: C23C14/083 ,  C03C17/2456 ,  C23C14/35 ,  C23C14/54 ,  G02B1/10 ,  G02B1/041

Abstract: An optical device is provided. The optical device includes an optical device substrate having a first surface; and an optical device film disposed over the first surface of the optical device substrate. The optical device film is formed of titanium oxide. The titanium oxide is selected from the group of titanium(IV) oxide (TiO2), titanium monoxide (TiO), dititanium trioxide (Ti2O3), Ti3O, Ti2O, δ-TiOx, where x is 0.68 to 0.75, and TinO2n-1, where n is 3 to 9, the optical device film has a refractive index greater than 2.72 at a 520 nanometer (nm) wavelength, and a rutile phase of the titanium oxide comprises greater than 94 percent of the optical device film.

公开(公告)号：US11892367B2

公开(公告)日：2024-02-06

申请号：US17692573

申请日：2022-03-11

Applicant: Applied Materials, Inc.

Inventor： Jinxin Fu ,  Kang Luo ,  Fariah Hayee ,  Ludovic Godet

IPC: G01M11/02

CPC classification number: G01M11/0285 ,  G01M11/0207

Abstract: A method of optical device metrology is provided. The method includes introducing a first type of light into a first optical device during a first time period, the first optical device including an optical substrate and an optical film disposed on the optical substrate, the first optical device further including a first surface, a second surface, and one or more sides connecting the first surface with the second surface; and measuring, during the first time period, a quantity of the first type of light transmitted from a plurality of locations on the first surface or the second surface during the first time period, wherein the measuring is performed by a detector coupled to one or more fiber heads positioned to collect the light transmitted from the plurality of locations.

公开(公告)号：US11873554B2

公开(公告)日：2024-01-16

申请号：US17655849

申请日：2022-03-22

Applicant: Applied Materials, Inc.

Inventor： Nai-Wen Pi ,  Jinxin Fu ,  Kang Luo ,  Ludovic Godet

IPC: C23C14/48 ,  C23C14/02 ,  C23C14/00 ,  C03C23/00 ,  C23C14/58 ,  G02B6/10

CPC classification number: C23C14/48 ,  C03C23/0095 ,  C23C14/0031 ,  C23C14/021 ,  C23C14/5873 ,  G02B6/10

Abstract: Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.

公开(公告)号：US11868043B2

公开(公告)日：2024-01-09

申请号：US17527819

申请日：2021-11-16

Applicant: Applied Materials, Inc.

Inventor： Amita Joshi ,  Andrew Ceballos ,  Kenichi Ohno ,  Rami Hourani ,  Ludovic Godet

IPC: C08K9/02 ,  G03F7/00 ,  C09D7/40 ,  C09D7/62 ,  G03F7/16 ,  C09D7/65

CPC classification number: G03F7/0002 ,  C09D7/62 ,  C09D7/65 ,  C09D7/67 ,  G03F7/167

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds.

公开(公告)号：US11851740B2

公开(公告)日：2023-12-26

申请号：US16716691

申请日：2019-12-17

Applicant: Applied Materials, Inc.

Inventor： Ludovic Godet ,  Bencherki Mebarki ,  Jinxin Fu

IPC: C23C14/04 ,  G02B27/10 ,  G02B27/01 ,  G02B6/132 ,  C23C14/22 ,  C23C14/34

CPC classification number: C23C14/046 ,  C23C14/042 ,  C23C14/225 ,  C23C14/3407 ,  C23C14/3464 ,  G02B6/132 ,  G02B27/0172 ,  G02B27/1073 ,  G02B2027/0178

Abstract: Embodiments described herein relate to encapsulated nanostructured optical devices and methods of encapsulating gratings of such devices by asymmetric selective physical vapor deposition (PVD). In some embodiments, a method for encapsulating optical device gratings includes a first PVD process and a second PVD process that may be carried out simultaneously or sequentially. The first PVD process may provide a first stream of material at a first angle non-perpendicular to a substrate of the grating. The second PVD process may provide a second stream of material at a second angle non-perpendicular to the substrate of the grating. The combination of the first PVD process and the second PVD process forms an encapsulation layer over the grating and one or more air gaps between adjacent fins of the grating.

公开(公告)号：US11846836B2

公开(公告)日：2023-12-19

申请号：US17306853

申请日：2021-05-03

Applicant: Applied Materials, Inc.

Inventor： Russell Chin Yee Teo ,  Ludovic Godet ,  Nir Yahav ,  Robert Jan Visser

IPC: G02F1/035 ,  C30B1/02 ,  C30B29/32

CPC classification number: G02F1/035 ,  C30B1/02 ,  C30B29/32

Abstract: An electro-optical waveguide modulator device includes a seed layer on a substrate, the seed layer having a first crystallographic plane aligned with a surface of the seed layer, an electro-optical channel extending in a first direction on the seed layer and having a second crystallographic plane aligned with the surface of the seed layer, an insulator layer on both sides of the electro-optical channel on the substrate in a second direction perpendicular to the first direction, an electrode barrier layer on the electro-optical channel and the insulator layer, and one or more of electrodes extending in the second direction. The seed layer and the insulator layer each comprise material having a refractive index that is lower than the electro-optical channel.