公开(公告)号：US20150090899A1

公开(公告)日：2015-04-02

申请号：US14372274

申请日：2013-01-14

Applicant: THE SCRIPPS RESEARCH INSTITUTE

Inventor： Bridget Carragher ,  Clinton S. Potter ,  Tilak Jain

IPC: G01N1/28 ,  H01J37/20 ,  H01J37/26

CPC classification number: G01N1/28 ,  G01N1/30 ,  G01N1/31 ,  G01N1/312 ,  H01J37/20 ,  H01J37/261 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/2602

Abstract: The invention provides methods and compositions for preparation of complex specimen arrays for analysis by electron microscopy. These methods and compositions can permit high throughput screening of samples on single EM grid supports using sample volumes in the nanoliter and picoliter range.

Abstract translation: 本发明提供用于制备用于通过电子显微镜分析的复合样品阵列的方法和组合物。 这些方法和组合物可以允许使用纳升速度和皮升范围内的样品体积在单EM网格支架上进行高通量筛选。

公开(公告)号：US20150083908A1

公开(公告)日：2015-03-26

申请号：US14562260

申请日：2014-12-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke OMINAMI ,  Mami KONOMI ,  Sukehiro ITO ,  Tomohisa OHTAKI ,  Shinsuke KAWANISHI

IPC: H01J37/18 ,  H01J37/16 ,  H01J37/20 ,  H01J37/26 ,  H01J37/22

CPC classification number: H01J37/18 ,  H01J37/16 ,  H01J37/20 ,  H01J37/22 ,  H01J37/226 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/166 ,  H01J2237/182 ,  H01J2237/2007 ,  H01J2237/204 ,  H01J2237/2602 ,  H01J2237/2608

Abstract: A sample observation method uses a charged particle beam apparatus comprising a charged particle optical column irradiating a charged particle beam, a vacuum chamber, and a sample chamber being capable of storing a sample. The method includes maintaining a pressure of the sample chamber higher than that of the vacuum chamber by a thin film which permits the charged particle beam to be transmitted, determining a relation between a height of a lower surface of the thin film and a height of a lower end of a lens barrel of an optical microscope, measuring a distance between the sample and the lens barrel, and setting a distance between the sample and thin film based on the relation and the distance.

Abstract translation: 样品观察方法使用带电粒子束装置，其包括照射带电粒子束的带电粒子光学柱，真空室和能够存储样品的样品室。 该方法包括通过允许带电粒子束透射的薄膜来保持样品室的压力高于真空室的压力，确定薄膜下表面的高度与薄膜的高度之间的关系 基于光学显微镜的镜筒的下端，测量样品和镜筒之间的距离，并根据关系和距离设定样品和薄膜之间的距离。

公开(公告)号：US20150022807A1

公开(公告)日：2015-01-22

申请号：US14384770

申请日：2013-03-12

Applicant: ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)

Inventor： Graham Knott

IPC: G01N21/01 ,  H01J37/26

CPC classification number: G01N21/01 ,  G01N1/06 ,  G02B21/34 ,  H01J37/20 ,  H01J37/261 ,  H01J2237/2004 ,  H01J2237/2007 ,  H01J2237/20214

Abstract: This device is for holding samples during their preparation prior to imaging in the electron microscope. The design means it can be transferred between the light and electron microscopes as well as trimming devices used to prepare the final sample. It can also be used at both ambient and cryo temperatures down to −110° C. The device consists of a base plate that can be held on the stage of a light microscope. It has an aperture through which transmitted light can pass. In this aperture is a clamp which holds a small transparent plastic sphere; the sample sphere. The sample for preparation is bonded to this sphere. The shape of this clamp and sphere means that the sample can be held at any angle to allow for optimal imaging in any light microscope and in the trimming devices, including the ultramicrotome. Once trimmed, the entire universal sample holder can then be transferred into the scanning electron microscope, or held in the ultramicrotome for thin sectioning.

Abstract translation: 该装置用于在电子显微镜成像之前准备样品。 该设计意味着它可以在光和电子显微镜之间转移，以及用于制备最终样品的修整装置。 它也可以在低于-110°C的环境温度和低温条件下使用。该设备由可以保持在光学显微镜的平台上的基板组成。 它具有透射光可以通过的孔径。 该孔是夹持小透明塑料球的夹具; 样品球体。 用于制备的样品结合到该球体上。 该夹具和球体的形状意味着样品可以保持任何角度，以允许任何光学显微镜和修剪装置（包括超薄切片机）中的最佳成像。 一旦修整，整个通用样品架可以转移到扫描电子显微镜中，或者保持在超薄切片机中用于薄切片。

公开(公告)号：US20140367570A1

公开(公告)日：2014-12-18

申请号：US14326076

申请日：2014-07-08

Applicant: EBARA CORPORATION

Inventor： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC: H01J37/22 ,  H01J37/18 ,  H01J37/06 ,  H01J37/28

CPC classification number: H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

Abstract: There is provided a substrate inspection method. The method includes: maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; positioning the substrate on a stage in the inspection chamber; selecting an evaluation parameter according to a kind of said processing apparatus; and determining inspection regions of the substrate so that an inspection time required per a lot of the substrate is equal to a processing time spent for said processing step required per a lot of the substrate. The method also includes radiating a primary electron beam from an electron gun; deflecting the primary electron beam with an E*B unit; irradiating said inspection regions of the substrate with the deflected primary electron beam; and projecting secondary electrons emitted from said substrate through the E*B unit onto a detector with a secondary optical system.

Abstract translation: 提供了基板检查方法。 该方法包括：在所述检查室中保持真空; 将所述检查室与振动隔离; 将基板定位在检查室中的台上; 根据所述处理装置的种类选择评估参数; 并且确定基板的检查区域，使得每批次的基板所需的检查时间等于每批基板所需的所述处理步骤所花费的处理时间。 该方法还包括从电子枪辐射一次电子束; 用E * B单元偏转一次电子束; 用偏转的一次电子束照射基板的所述检查区域; 并且通过E * B单元将从所述衬底发射的二次电子投射到具有次级光学系统的检测器上。

公开(公告)号：US08872129B2

公开(公告)日：2014-10-28

申请号：US12599339

申请日：2008-05-09

Applicant: John Damiano, Jr. ,  Stephen E. Mick ,  David P. Nackashi

Inventor： John Damiano, Jr. ,  Stephen E. Mick ,  David P. Nackashi

IPC: H01J37/20 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J37/261 ,  H01J2237/188 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2602 ,  H01J2237/28 ,  H01J2237/2802

Abstract: Electron microscope support structures and methods of making and using same. The support structures are generally constructed using semiconductor materials and semiconductor manufacturing processes. The temperature of the support structure may be controlled and/or gases or liquids may be confined in the observation region for reactions and/or imaging.

Abstract translation: 电子显微镜支撑结构及其制作和使用方法。 支撑结构通常使用半导体材料和半导体制造工艺构造。 可以控制支撑结构的温度和/或气体或液体被限制在观察区域中用于反应和/或成像。

公开(公告)号：US08847178B2

公开(公告)日：2014-09-30

申请号：US13625231

申请日：2012-09-24

Applicant: NuFlare Technology, Inc

Inventor： Michihiro Kawaguchi ,  Kazuhiro Shiba ,  Keisuke Yamaguchi ,  Kiminobu Akeno ,  Yoshinori Kagawa

IPC: G21K5/00 ,  G03F9/00 ,  G21K5/08 ,  H01L21/00 ,  G03F7/00

CPC classification number: G21K5/08 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  G03F9/7096 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/2007 ,  H01J2237/204 ,  H01L21/00

Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes a substrate cover attachment/detachment unit to attach or detach a substrate cover that covers a whole periphery of a substrate being a writing target from an upper part, to/from the substrate, a writing unit to write a pattern on the substrate, in a state where the substrate cover is attached to the substrate, by a charged particle beam, a position measurement unit, before and after writing by the writing unit, to measure a position of the substrate cover in a state attached to the substrate, at a predetermined measurement position, and a correction unit, with respect to a position of the substrate to which the substrate cover is attached, to correct a positional deviation amount between a position of the substrate cover measured after writing and a position of the substrate cover measured before writing.

Abstract translation: 根据本发明的一个方面的带电粒子束写入装置包括：基板盖安装/拆卸单元，用于将覆盖作为书写目标的基板的整个周边的基板盖从上部附接到所述基板盖 基板，写入单元，以基板盖子附着于基板的状态，通过带电粒子束，位置测量单元，在写入单元写入之前和之后，在基板上写入图案，以测量位置 在相对于与基板盖相连接的基板的位置上的预定测量位置处的基板覆盖物的状态和校正单元，校正位于基板盖的位置之间的位置偏差量 写入后测量的基板盖和写入前测量的基板盖的位置。

公开(公告)号：US08829469B2

公开(公告)日：2014-09-09

申请号：US13813818

申请日：2011-08-02

Applicant: John Damiano, Jr. ,  David P. Nackashi ,  Stephen E. Mick

Inventor： John Damiano, Jr. ,  David P. Nackashi ,  Stephen E. Mick

IPC: G21K5/08

CPC classification number: H01J37/20 ,  H01J37/16 ,  H01J37/18 ,  H01J37/26 ,  H01J37/29 ,  H01J37/30 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2007

Abstract: A novel sample holder for specimen support devices for insertion in electron microscopes. The novel sample holder of the invention allows for the introduction of gases or liquids to specimens for in situ imaging, as well as electrical contacts for electrochemical or thermal experiments.

Abstract translation: 用于插入电子显微镜的样品支撑装置的新型样品架。 本发明的新型样品保持器允许将气体或液体引入用于原位成像的样品，以及用于电化学或热学实验的电触点。

公开(公告)号：US08822951B2

公开(公告)日：2014-09-02

申请号：US13639737

申请日：2010-04-07

Applicant: Yu Sun ,  Changai Ru ,  Yong Zhang

Inventor： Yu Sun ,  Changai Ru ,  Yong Zhang

IPC: H01J37/26 ,  H01J37/20 ,  H01J37/28 ,  H01J37/18

CPC classification number: H01J37/20 ,  H01J37/185 ,  H01J37/28 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/204 ,  H01J2237/206 ,  H01J2237/208

Abstract: The present invention relates to a carrier device for transporting one or more manipulators into a vacuum specimen chamber of an electron microscope, characterized in that the carrier device comprises: (i) a platform having securing means for detachably securing the one or more manipulators to the platform, and (ii) electrical connectors secured to the platform for the electrical connection of the one or more manipulators. The present invention also relates to a method for transporting the carrier device into the vacuum specimen chamber of the electron microscope without altering the vacuum of the vacuum specimen chamber comprising transporting the carrier device of the invention through the specimen exchange chamber of the electron microscope and into the vacuum specimen chamber.

Abstract translation: 本发明涉及一种用于将一个或多个操纵器输送到电子显微镜的真空样品室中的载体装置，其特征在于，载体装置包括：（i）具有用于将一个或多个操纵器可拆卸地固定到 平台，以及（ii）固定到平台的用于一个或多个操纵器的电连接的电连接器。 本发明还涉及一种用于将载体装置输送到电子显微镜的真空样品室中而不改变真空试样室的真空的方法，包括将本发明的载体装置通过电子显微镜的试样更换室输送到 真空试样室。

公开(公告)号：US20140191125A1

公开(公告)日：2014-07-10

申请号：US14147884

申请日：2014-01-06

Applicant: FEI Company

Inventor： Matthew Barrett ,  Michael D. Smith ,  Michal Geryk ,  Paul Scagnetti ,  Richard Tovey

IPC: H01J37/20 ,  H01J37/16

CPC classification number: H01J37/20 ,  G01N2223/307 ,  G01N2223/418 ,  G01N2223/616 ,  H01J37/16 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/28 ,  H01J2237/2826

Abstract: A sample holder assembly includes a sample tray, a base plate, a stage mount, and a calibration standard mounted onto the stage mount. Three mating structures on the bottom of the base plate mate with corresponding structures on a stage mount that is attached to the sample stage of the SEM. An optional contacting conductor provides electrical contact between the stage mount and the base plate so that charge generated on the sample by the electron beam can leave the sample through the sample conductive layer to the sample tray, to the base plate, to the stage mount, and through the grounded stage.

Abstract translation: 样品架组件包括样品托盘，基板，载物台和安装在载物台上的校准标准品。 底板底部的三个配合结构与安装在扫描电镜样品台上的台架上的相应结构配合。 可选的接触导体提供台架和基板之间的电接触，使得通过电子束在样品上产生的电荷可以使样品通过样品导电层到样品托盘，到基板，到载物台， 并通过接地阶段。

公开(公告)号：US20140048972A1

公开(公告)日：2014-02-20

申请号：US14110576

申请日：2012-04-23

Applicant: Paul Gottlieb

Inventor： Paul Gottlieb

IPC: G01N1/28

CPC classification number: G01N1/28 ,  G01N1/06 ,  G01N1/286 ,  G01N1/36 ,  H01J2237/2007 ,  H01J2237/201

Abstract: Mineral samples for use in analytical instruments are created by a system that greatly reduces the sample preparation time and facilitates automation. For example, in some implementations, rather than grinding to expose the interior of mineral particles in sample plug containing mineral particles in an epoxy compound, the sample plug is sliced with a saw, which more rapidly provides in many applications a sufficiently smooth surface on the exposed particle surfaces for observation. Rather than slowly mixing a slow curing epoxy to avoid introducing bubbles into the sample plug, some implementations use a fast settle fixative and a mechanical mixture that avoid bubbles.

Abstract translation: 用于分析仪器的矿物样品由大大降低样品准备时间并便于自动化的系统创建。 例如，在一些实施方案中，不是研磨以暴露含有环氧化合物中的矿物颗粒的样品塞中的矿物颗粒的内部，用锯切片样品塞，其在许多应用中更快地提供足够光滑的表面 暴露的颗粒表面进行观察。 不是缓慢地混合缓慢固化的环氧树脂，以避免将气泡引入到样品塞中，一些实施方案使用快速沉降固定剂和避免气泡的机械混合物。