公开(公告)号：US08701268B2

公开(公告)日：2014-04-22

申请号：US13828176

申请日：2013-03-14

申请人： Lam Research Corporation

发明人： Dean Jay Larson ,  Tom Stevenson ,  Victor Wang

IPC分类号： H01S4/00 ,  B23P17/04 ,  B23P19/00 ,  H01L21/306 ,  C23F1/00

CPC分类号： H01L21/3065 ,  B29C65/483 ,  B29C65/4835 ,  B29C65/4855 ,  B29C65/4865 ,  B29C65/4875 ,  B29C65/4885 ,  B29C65/5028 ,  B29C65/5057 ,  B29C65/5071 ,  B29C66/73111 ,  B29C66/73112 ,  B29C66/742 ,  B29K2305/00 ,  B32B37/025 ,  B32B37/1292 ,  B32B38/145 ,  B32B38/164 ,  B32B2307/202 ,  B32B2309/02 ,  B32B2309/10 ,  B32B2309/105 ,  B32B2457/00 ,  C23C16/45565 ,  H01J37/32009 ,  H01J37/3244 ,  H01J37/32541 ,  H01J37/3255 ,  H05K13/00 ,  Y10T29/49 ,  Y10T29/49002 ,  Y10T29/5313 ,  Y10T29/532 ,  Y10T29/53204 ,  Y10T156/10 ,  Y10T156/1062

摘要： A method of forming an elastomeric sheet adhesive bond between mating surfaces of an electrode and a backing member to accommodate stresses generated during temperature cycling due to mismatch in coefficients of thermal expansion. The elastomeric sheet comprises a thermally conductive silicone adhesive able to withstand a high shear strain of ≧300% in a temperature range of room temperature to 300° C. such as heat curable high molecular weight dimethyl silicone with fillers. Installation can be manually, manually with installation tooling, or with automated machinery.

摘要翻译： 在电极和背衬构件的配合表面之间形成弹性体片粘合剂的方法，以适应在温度循环期间由于热膨胀系数不匹配而产生的应力。 弹性体片材包括能够在室温至300℃的温度范围内承受≥300％的高剪切应变的导热硅胶粘合剂，例如具有填料的热固化高分子量二甲基硅酮。 安装可以手动，手动安装工具或自动化机械。

公开(公告)号：US20140042902A1

公开(公告)日：2014-02-13

申请号：US14029196

申请日：2013-09-17

申请人： NISSIN ION EQUIPMENT CO., LTD

发明人： Hideki FUJITA ,  Tetsuya IGO

IPC分类号： H05H1/46

CPC分类号： H05H1/46 ,  H01J37/3211 ,  H01J37/32357 ,  H01J37/32541 ,  H05H2001/463 ,  H05H2001/4667

摘要： A plasma generator generates a plasma by ionizing a gas with a high-frequency discharge in a plasma generating chamber so that electrons from the plasma are emitted outside the plasma generator through an electron emitting hole. The plasma generator includes an antenna that is provided in the plasma generating chamber and that emits a high-frequency wave, and an antenna cover that is made of an insulating material and that covers an entire body of the antenna. A plasma electrode having the electron emitting hole is made of a conductive material. A frame cover with a protrusion ensures conductivity by preventing an insulating material from accumulating on a surface of the plasma electrode on a plasma side in sputtering by the plasma.

摘要翻译： 等离子体发生器通过在等离子体发生室中以高频放电气体离子化来产生等离子体，使得来自等离子体的电子通过电子发射孔发射到等离子体发生器外部。 等离子体发生器包括设置在等离子体发生室中并且发射高频波的天线，以及由绝缘材料制成并覆盖天线整体的天线盖。 具有电子发射孔的等离子体电极由导电材料制成。 具有突起的框架盖通过等离子体在溅射中防止绝缘材料在等离子体电极的等离子体侧的表面上积聚而确保导电性。

公开(公告)号：US20140011356A1

公开(公告)日：2014-01-09

申请号：US13543701

申请日：2012-07-06

申请人： Manfred Engelhardt

发明人： Manfred Engelhardt

IPC分类号： H01L21/683 ,  C23C16/509 ,  H01L21/283 ,  H01L21/3065 ,  H01L21/31

CPC分类号： H01L21/67069 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32532 ,  H01J37/32541 ,  H01J37/32724 ,  H01J2237/332 ,  H01J2237/3341 ,  H01L21/6831 ,  Y10T279/21

摘要： A chuck, a system including a chuck and a method for making a semiconductor device are disclosed. In one embodiment the chuck includes a first conductive region configured to be capacitively coupled to a first RF power generator, a second conductive region configured to be capacitively coupled to a second RF power generator and an insulation region that electrically insulates the first conductive region from the second conductive region.

摘要翻译： 公开了一种卡盘，包括卡盘的系统和制造半导体器件的方法。 在一个实施例中，卡盘包括被配置为电容耦合到第一RF功率发生器的第一导电区域，被配置为电容耦合到第二RF功率发生器的第二导电区域和将第一导电区域与 第二导电区域。

公开(公告)号：US20130280914A1

公开(公告)日：2013-10-24

申请号：US13919635

申请日：2013-06-17

申请人： Lam Research Corporation

发明人： Rajinder Dhindsa

IPC分类号： H01L21/67

CPC分类号： H01L21/67069 ,  C23C16/45565 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32541 ,  H01J37/32605 ,  Y10T29/49002 ,  Y10T29/4913 ,  Y10T29/49401 ,  Y10T29/49428 ,  Y10T29/49769 ,  Y10T29/49895 ,  Y10T29/49959 ,  Y10T156/10

摘要： A showerhead electrode for a plasma processing apparatus includes an interface gel between facing surfaces of an electrode plate and a backing plate. The interface gel maintains thermal conductivity during lateral displacements generated during temperature cycling due to mismatch in coefficients of thermal expansion. The interface gel comprises, for example, a silicone based composite filled with aluminum oxide microspheres. The interface gel can conform to irregularly shaped features and maximize surface contact area between mating surfaces. The interface gel can be pre-applied to a consumable upper electrode.

摘要翻译： 用于等离子体处理装置的喷头电极包括在电极板和背板的相对表面之间的界面凝胶。 界面凝胶在温度循环期间由于热膨胀系数不匹配而产生的横向位移期间保持导热性。 界面凝胶包括例如填充有氧化铝微球的硅氧烷基复合材料。 界面凝胶可以符合不规则形状的特征并最大化配合表面之间的表面接触面积。 界面凝胶可以预先施加到可消耗的上电极上。

公开(公告)号：US20130276982A1

公开(公告)日：2013-10-24

申请号：US13922892

申请日：2013-06-20

申请人： TOKYO ELECTRON LIMITED

发明人： Tatsuya HANDA

IPC分类号： H01L21/3065

CPC分类号： H01L21/3065 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32541 ,  H01L21/67069

摘要： A substrate processing apparatus capable of preventing the abnormal discharge from being generated on a substrate. A housing chamber houses the substrate. A mounting stage arranged in the housing chamber, is configured to enable the substrate to be mounted thereon. A disc-like electrode structure is connected to a high-frequency power supply, and connected to a gas supply apparatus via at least one gas supply system. The electrode structure has therein at least one buffer chamber and a plurality of connecting sections connected to the gas supply system. The buffer chamber is communicated with the inside of the housing chamber via a number of gas holes, and is communicated with the gas supply system via the plurality of connecting sections. The plurality of connecting sections for the buffer chamber are arranged on the circumference of a circle centering around the center of the electrode structure at equal intervals.

摘要翻译： 一种能够防止在基板上产生异常放电的基板处理装置。 容纳室容纳衬底。 布置在容纳室中的安装台被配置为使得基板能够安装在其上。 盘状电极结构与高频电源连接，经由至少一个气体供给系统与气体供给装置连接。 电极结构中具有至少一个缓冲室和连接到气体供应系统的多个连接部分。 缓冲室经由多个气孔与容纳室的内部连通，经由多个连接部与气体供给系统连通。 用于缓冲室的多个连接部分以等间隔布置在以电极结构的中心为中心的圆周上。

公开(公告)号：US20130233491A1

公开(公告)日：2013-09-12

申请号：US13874288

申请日：2013-04-30

申请人： Jong Yong CHOI

发明人： Jong Yong CHOI

IPC分类号： H01L31/18

CPC分类号： H01L31/18 ,  H01J37/32541 ,  H01J37/32568 ,  H01J2237/20 ,  H01L21/67069 ,  H01L21/68785 ,  H01L31/02363 ,  Y02E10/50

摘要： A dry etching apparatus is disclosed, which is capable of forming a uniform pattern in a substrate surface, the dry etching apparatus for etching at least one substrate through the use of plasma, comprising the at least one substrate placed on a tray inside a chamber; a susceptor, provided inside the chamber while confronting with the at least one substrate, for supplying a high-frequency power to form the plasma; a grounding part provided beneath the susceptor while being untouchable to the susceptor; and an insulating part provided between the susceptor and the grounding part.

摘要翻译： 公开了能够在基板表面形成均匀图案的干蚀刻装置，该干蚀刻装置用于通过使用等离子体蚀刻至少一个基板，该干蚀刻装置包括放置在室内的托盘上的至少一个基板; 基座，设置在所述腔室内部，同时面对所述至少一个基板，用于提供高频电力以形成所述等离子体; 接地部分设置在基座之下，同时不可接触基座; 以及设置在基座和接地部之间的绝缘部。

公开(公告)号：US20130098873A1

公开(公告)日：2013-04-25

申请号：US13595655

申请日：2012-08-27

申请人： Kartik Ramaswamy ,  Kallol Bera ,  Kenneth S. Collins ,  Shahid Rauf

发明人： Kartik Ramaswamy ,  Kallol Bera ,  Kenneth S. Collins ,  Shahid Rauf

IPC分类号： H01L21/3065 ,  C23F1/08

CPC分类号： H01J37/32091 ,  H01J37/32541

摘要： A plasma reactor has a main chamber for processing a workpiece in a processing region bounded between an overhead ceiling and a workpiece support surface, the reactor having an overhead electron beam source that produces an electron beam flowing into the processing region through the ceiling of the main chamber.

摘要翻译： 等离子体反应器具有用于在位于顶棚顶板和工件支撑表面之间的加工区域内加工工件的主室，所述反应器具有塔顶电子束源，其产生通过主体的天花板流入处理区域的电子束 房间。

公开(公告)号：US08418649B2

公开(公告)日：2013-04-16

申请号：US12337323

申请日：2008-12-17

申请人： Dean Jay Larson ,  Tom Stevenson ,  Victor Wang

发明人： Dean Jay Larson ,  Tom Stevenson ,  Victor Wang

IPC分类号： C23C16/455 ,  C23C16/50 ,  C23C16/505 ,  C23C16/509 ,  H01L21/306 ,  C23F1/00 ,  C23C16/06 ,  C23C16/22

CPC分类号： H01L21/3065 ,  B29C65/483 ,  B29C65/4835 ,  B29C65/4855 ,  B29C65/4865 ,  B29C65/4875 ,  B29C65/4885 ,  B29C65/5028 ,  B29C65/5057 ,  B29C65/5071 ,  B29C66/73111 ,  B29C66/73112 ,  B29C66/742 ,  B29K2305/00 ,  B32B37/025 ,  B32B37/1292 ,  B32B38/145 ,  B32B38/164 ,  B32B2307/202 ,  B32B2309/02 ,  B32B2309/10 ,  B32B2309/105 ,  B32B2457/00 ,  C23C16/45565 ,  H01J37/32009 ,  H01J37/3244 ,  H01J37/32541 ,  H01J37/3255 ,  H05K13/00 ,  Y10T29/49 ,  Y10T29/49002 ,  Y10T29/5313 ,  Y10T29/532 ,  Y10T29/53204 ,  Y10T156/10 ,  Y10T156/1062

摘要： A showerhead electrode for a plasma processing apparatus includes an elastomeric sheet adhesive bond between mating surfaces of an electrode and a backing member to accommodate stresses generated during temperature cycling due to mismatch in coefficients of thermal expansion. The elastomeric sheet comprises a thermally conductive silicone adhesive able to withstand a high shear strain of ≧300% in a temperature range of room temperature to 300° C. such as heat curable high molecular weight dimethyl silicone with fillers. The sheet form adhesive has bond thickness control for parallelism of bonded surfaces over large areas. The sheet adhesive may be cast or die cut into pre-form shapes that can conform to irregularly shaped features, maximize surface contact area with mating electrode surfaces, and installed into cavities of the mating assembly. Installation can be manually, manually with installation tooling, or with automated machinery. Composite layers of sheet adhesive having different physical properties can be laminated or coplanar.

摘要翻译： 用于等离子体处理装置的喷头电极包括在电极的配合表面和背衬构件之间的弹性片粘合剂粘合，以适应由于热膨胀系数的失配而在温度循环期间产生的应力。 弹性体片材包括能够在室温至300℃的温度范围内承受≥300％的高剪切应变的导热硅胶粘合剂，例如具有填料的热固化高分子量二甲基硅酮。 片状粘合剂具有用于在大面积上的接合表面的平行度的结合厚度控制。 片状粘合剂可以被铸造或模切成预成形的形状，其可以符合不规则形状的特征，使与配合的电极表面的表面接触面积最大化并且安装到配合组件的空腔中。 安装可以手动，手动安装工具或自动化机械。 具有不同物理性质的片状粘合剂的复合层可以层压或共面。

公开(公告)号：US20130072002A1

公开(公告)日：2013-03-21

申请号：US13674753

申请日：2012-11-12

申请人： HITACHI KOKUSAI ELECTRIC INC.

发明人： Kazuyuki TOYODA ,  Yasuhiro INOKUCHI ,  Motonari TAKEBAYASHI ,  Tadashi KONTANI ,  Nobuo ISHIMARU

IPC分类号： H01L21/205

CPC分类号： H01L21/02274 ,  C23C16/452 ,  C23C16/45525 ,  C23C16/45542 ,  C23C16/45546 ,  C23C16/45578 ,  C23C16/4583 ,  C23C16/4584 ,  C23C16/54 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32513 ,  H01J37/32541 ,  H01J37/32834 ,  H01J2237/332 ,  H01L21/02183 ,  H01L21/02205 ,  H01L21/02211 ,  H01L21/205 ,  H01L21/31604 ,  H01L21/67109 ,  H01L21/77

摘要： A plasma processing apparatus comprises a processing chamber in which a plurality of substrates are stacked and accommodated; a pair of electrodes extending in the stacking direction of the plurality of substrates, which are disposed at one side of the plurality of substrates in said processing chamber, and to which high frequency electricity is applied; and a gas supply member which supplies processing gas into a space between the pair of electrodes.

公开(公告)号：US20130034967A1

公开(公告)日：2013-02-07

申请号：US13591039

申请日：2012-08-21

申请人： Gregory R. Bettencourt ,  Gautam Bhattacharyya ,  Simon Gosselin Eng. ,  Sandy Chao

发明人： Gregory R. Bettencourt ,  Gautam Bhattacharyya ,  Simon Gosselin Eng. ,  Sandy Chao

IPC分类号： H01L21/3065 ,  B23P6/00

CPC分类号： H01L21/67069 ,  H01J37/16 ,  H01J37/3244 ,  H01J37/32541 ,  H01J37/32605 ,  H01J2237/166

摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.

摘要翻译： 用于等离子体反应室的电极组件，用于半导体衬底处理。 该组件包括上部喷头电极，其通过一系列间隔开的凸轮锁定机械地附接到背板。 在其上具有突起的导电和导电垫片在喷头电极和背板之间在距离喷头电极的中心三至四英寸的位置处被压缩。 保护环围绕背板并且可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以用工具旋转以释放从电极的上表面延伸的锁定销。