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公开(公告)号:US20210125911A1
公开(公告)日:2021-04-29
申请号:US16664631
申请日:2019-10-25
发明人: Chi-Tsung CHIU , Hui-Ying HSIEH , Kuo-Hua CHEN , Cheng Yuan CHEN
IPC分类号: H01L23/498 , H01L23/495 , H01L21/768
摘要: A semiconductor package structure includes a base, at least one semiconductor element, a first dielectric layer, a second dielectric layer and a circuit layer. The semiconductor element is disposed on the base and has an upper surface. The first dielectric layer covers at least a portion of a peripheral surface of the semiconductor element and has a top surface. The top surface is non-coplanar with the upper surface of the semiconductor element. The second dielectric layer covers the semiconductor element and the first dielectric layer. The circuit layer extends through the second dielectric layer to electrically connect the semiconductor element.
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公开(公告)号:US20170365543A1
公开(公告)日:2017-12-21
申请号:US15621970
申请日:2017-06-13
发明人: Hui Hua LEE , Chun Hao CHIU , Hui-Ying Hsieh , Kuo-Hua CHEN , Chi-Tsung CHIU
IPC分类号: H01L23/495
摘要: A semiconductor device package includes a first conductive base, a first insulation layer and a second insulation layer. The first conductive base has a first surface, a second surface opposite to the first surface and a lateral surface extended between the first surface and the second surface. The lateral surface includes a first portion adjacent to the first surface and a second portion adjacent to the second surface. The first insulation layer comprises a first insulation material. The first insulation layer has a first surface and a second surface opposite to the first surface. The first insulation layer covers the first portion of the lateral surface of the first conductive base. The second insulation layer comprises a second insulation material and covers the second portion of the lateral surface of the first conductive base. The first insulation material is different from the second insulation material.
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公开(公告)号:US20140239494A1
公开(公告)日:2014-08-28
申请号:US14192029
申请日:2014-02-27
发明人: Kuo-Hua CHEN , Tzu-Hua LIN , Kuan-Neng CHEN , Yan-Pin HUANG
IPC分类号: H01L23/498 , H01L23/00 , H01L23/532
CPC分类号: H01L24/11 , H01L21/563 , H01L23/3128 , H01L23/49816 , H01L23/49827 , H01L24/13 , H01L24/16 , H01L24/81 , H01L25/0657 , H01L25/50 , H01L2224/0401 , H01L2224/05022 , H01L2224/05124 , H01L2224/05147 , H01L2224/05572 , H01L2224/13082 , H01L2224/13111 , H01L2224/13118 , H01L2224/13124 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13149 , H01L2224/13155 , H01L2224/13157 , H01L2224/13164 , H01L2224/13166 , H01L2224/13169 , H01L2224/13176 , H01L2224/13178 , H01L2224/16146 , H01L2224/16225 , H01L2224/16227 , H01L2224/16235 , H01L2224/16501 , H01L2224/73204 , H01L2224/75251 , H01L2224/75252 , H01L2224/81193 , H01L2224/81203 , H01L2224/8183 , H01L2225/06513 , H01L2225/06517 , H01L2225/06541 , H01L2225/06568 , H01L2924/15788 , H01L2924/00014 , H01L2924/01047 , H01L2924/01029 , H01L2924/00
摘要: The disclosure relates to a semiconductor bonding structure and process and a semiconductor chip. The semiconductor bonding structure includes a first pillar, a first interface, an intermediate area, a second interface and a second pillar in sequence. The first pillar, the second pillar and the intermediate area include a first metal. The first interface and the second interface include the first metal and an oxide of a second metal. The content percentage of the first metal in the first interface and the second interface is less than that of the first metal in the intermediate area.
摘要翻译: 本公开涉及半导体接合结构和工艺以及半导体芯片。 半导体接合结构依次包括第一柱,第一界面,中间区域,第二界面和第二柱。 第一支柱,第二支柱和中间区域包括第一金属。 第一界面和第二界面包括第一金属和第二金属的氧化物。 第一界面和第二界面中的第一金属的含量百分比小于中间区域中的第一金属的含量百分比。
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公开(公告)号:US20140144683A1
公开(公告)日:2014-05-29
申请号:US14169640
申请日:2014-01-31
发明人: Kuo-Hua CHEN , Ming-Chiang LEE , Tsung-Hsun LEE , Chen-Chuan FAN
CPC分类号: H05K1/0298 , H01L23/3128 , H01L23/49838 , H01L2224/16225 , H01L2224/73204 , H01L2924/15311 , H05K1/0271 , H05K1/09 , H05K1/116 , H05K2201/09781
摘要: A substrate structure is provided. The substrate structure includes a number of traces, a substrate core, a number of first metal tiles, a number of second metal tiles, a number of first electrically-functioning circuits, and a number of second electrically-functioning circuits. The substrate core has a first surface and a second surface opposite to the first surface. The traces, the first metal tiles, and the first electrically-functioning circuits are disposed on the first surface and add up to a first metal structure proportion, and the second metal tiles and the second electrically-functioning circuits are disposed on the second surface and add up to a second metal structure proportion. The difference between the first metal structure proportion and the second metal structure proportion is within 15%.
摘要翻译: 提供了基板结构。 衬底结构包括多个迹线,衬底芯,多个第一金属瓦,多个第二金属瓦,多个第一电功能电路和多个第二电功能电路。 衬底芯具有与第一表面相对的第一表面和第二表面。 迹线,第一金属瓦片和第一电功能电路设置在第一表面上并且加到第一金属结构比例,并且第二金属瓦片和第二电功能电路设置在第二表面上, 加起来第二个金属结构比例。 第一金属结构比例与第二金属结构比例之差在15%以内。
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公开(公告)号:US20200243427A1
公开(公告)日:2020-07-30
申请号:US16846085
申请日:2020-04-10
发明人: Hui Hua LEE , Chun Hao CHIU , Hui-Ying Hsieh , Kuo-Hua CHEN , Chi-Tsung CHIU
IPC分类号: H01L23/495 , H01L23/00 , H01L23/538 , H01L23/498 , H01L25/065 , H01L21/48 , H01L25/16
摘要: A semiconductor device package includes a first conductive base, a first insulation layer and a second insulation layer. The first conductive base has a first surface, a second surface opposite to the first surface and a lateral surface extended between the first surface and the second surface. The lateral surface includes a first portion adjacent to the first surface and a second portion adjacent to the second surface. The first insulation layer comprises a first insulation material. The first insulation layer has a first surface and a second surface opposite to the first surface. The first insulation layer covers the first portion of the lateral surface of the first conductive base. The second insulation layer comprises a second insulation material and covers the second portion of the lateral surface of the first conductive base. The first insulation material is different from the second insulation material.
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公开(公告)号:US20160300782A1
公开(公告)日:2016-10-13
申请号:US14685529
申请日:2015-04-13
发明人: Tang-Yuan CHEN , Chin-Li KAO , Kuo-Hua CHEN , Ming-Hung CHEN , Dao-Long CHEN
IPC分类号: H01L23/495 , H01L21/56 , H01L21/48 , H01L23/00 , H01L23/31
CPC分类号: H01L23/49548 , H01L21/4825 , H01L21/565 , H01L23/3114 , H01L23/3121 , H01L23/49503 , H01L23/4952 , H01L23/49541 , H01L23/49568 , H01L23/49582 , H01L23/49816 , H01L23/5389 , H01L23/562 , H01L24/19 , H01L24/20 , H01L24/32 , H01L24/83 , H01L2224/04105 , H01L2224/12105 , H01L2224/19 , H01L2224/20 , H01L2224/29111 , H01L2224/29144 , H01L2224/32245 , H01L2224/32502 , H01L2224/73267 , H01L2224/8203 , H01L2224/83801 , H01L2224/83805 , H01L2224/92244 , H01L2924/15153 , H01L2924/3511 , H01L2924/3512 , H01L2924/00014
摘要: The present disclosure relates to a semiconductor package structure and a method for manufacturing the same. The semiconductor package structure includes a leadframe and a semiconductor die. The leadframe includes a main portion and a protrusion portion. The semiconductor die is bonded to a first surface of the main portion. The protrusion portion protrudes from a second surface of the main portion. The position of the protrusion portion corresponds to the position of the semiconductor die.
摘要翻译: 本公开涉及一种半导体封装结构及其制造方法。 半导体封装结构包括引线框和半导体管芯。 引线框架包括主体部分和突出部分。 半导体管芯结合到主要部分的第一表面。 突出部分从主体部分的第二表面突出。 突起部分的位置对应于半导体管芯的位置。
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公开(公告)号:US20160079157A1
公开(公告)日:2016-03-17
申请号:US14486755
申请日:2014-09-15
发明人: Jen-Kuang FANG , Kuo-Hua CHEN
IPC分类号: H01L23/528 , H01L23/522 , H01L23/00
CPC分类号: H01L24/33 , H01L23/5226 , H01L24/05 , H01L24/09 , H01L24/17 , H01L2224/0401 , H01L2224/04026 , H01L2224/0557 , H01L2224/05571 , H01L2224/05572 , H01L2224/06164 , H01L2224/13644 , H01L2224/13647 , H01L2224/13655 , H01L2224/13664 , H01L2924/381
摘要: The present disclosure relates to a semiconductor package structure, including a die and a package substrate. The die includes a semiconductor substrate, multiple interconnect metal layers, and at least one inter-level dielectric disposed between ones of the interconnect metal layers. Each inter-level dielectric is formed of a low k material. An outermost interconnect metal layer has multiple first conductive segments exposed from a surface of the inter-level dielectric. The package substrate includes a substrate body and multiple second conductive segments exposed from a surface of the substrate body. The second conductive segments are electrically connected to the first conductive segments.
摘要翻译: 本公开涉及包括管芯和封装衬底的半导体封装结构。 芯片包括半导体衬底,多个互连金属层以及设置在互连金属层之间的至少一个层间电介质。 每个层间电介质由低k材料形成。 最外面的互连金属层具有从层间电介质的表面暴露的多个第一导电段。 封装衬底包括衬底主体和从衬底主体的表面暴露的多个第二导电段。 第二导电段电连接到第一导电段。
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