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1.
公开(公告)号:US06636118B1
公开(公告)日:2003-10-21
申请号:US09914678
申请日:2001-11-14
申请人: Cyushiro Kusano , Eiichi Hase , Hideyuki Ono , Osamu Kagaya , Yasunari Umemoto , Takahiro Fujita , Kiichi Yamashita
发明人: Cyushiro Kusano , Eiichi Hase , Hideyuki Ono , Osamu Kagaya , Yasunari Umemoto , Takahiro Fujita , Kiichi Yamashita
IPC分类号: H03F304
CPC分类号: H01L27/0255 , H03F1/52 , H03F3/195 , H03F2200/444 , H03F2203/21178
摘要: In a high frequency power amplifier module of a multi-stage structure in which a plurality of heterojunction bipolar transistors (npn-type HBTs) are cascade-connected, a protection circuit in which a plurality of pn junction diodes are connected in series is connected between the collector and emitter of each HBT. The p-side is connected to the collector side, and the n-side is connected to the emitter side. A protection circuit in which pn junction diodes of the number equal to or smaller than that of the pn junction diodes are connected in series is connected between the base and the emitter. The p-side is connected to the base side, and the n-side is connected to the emitter side. With the configuration, in the case where an overvoltage is applied across the collector and emitter due to a fluctuation in load on the antenna side, the collector terminal is clamped by an ON-state voltage of the protection circuits, so that the HBT can be prevented from being destroyed. Since the similar protection circuit is assembled between the base and emitter, even when the operator touches the module at the time of manufacturing the high frequency power amplifier module, the HBT can be prevented from being destroyed by the clamping effect of the protection circuit between the base and emitter and the protection circuit between the collector and emitter. Thus, an improved manufacturing yield of the high frequency power amplifier module and a wireless communication apparatus can be achieved, and destruction caused by fluctuation in load impedance of the wireless communication apparatus can be prevented.
摘要翻译: 在其中级联多个异质结双极型晶体管(npn型HBT)的多级结构的高频功率放大器模块中,将多个pn结二极管串联连接的保护电路连接在 每个HBT的集电极和发射极。 p侧连接到集电极侧,并且n侧连接到发射极侧。 其中pn结二极管的数量等于或小于pn结二极管串联的保护电路连接在基极和发射极之间。 p侧连接到基极侧,并且n侧连接到发射极侧。 通过该结构,由于天线侧的负载的波动,在集电极和发射极两端施加过电压的情况下,集电端子被保护电路的导通状态电压钳位,HBT可以 防止被摧毁。 由于类似的保护电路组装在基极和发射极之间,即使在制造高频功率放大器模块时操作者接触模块时,也可以防止HBT被保护电路的钳位效应所破坏 基极和发射极以及集电极和发射极之间的保护电路。 因此,可以实现高频功率放大器模块和无线通信装置的制造成品率的提高,并且可以防止由无线通信装置的负载阻抗的波动引起的破坏。
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公开(公告)号:US5027167A
公开(公告)日:1991-06-25
申请号:US175705
申请日:1988-03-31
申请人: Osamu Kagaya , Yasunari Umemoto , Junji Shigeta
发明人: Osamu Kagaya , Yasunari Umemoto , Junji Shigeta
IPC分类号: H01L21/761 , H01L21/338 , H01L21/76 , H01L21/765 , H01L27/10 , H01L29/812
CPC分类号: H01L21/765 , H01L21/7605
摘要: The semiconductor integrated circuit of the present invention includes an electrode to which potential is supplied to apply an electric field to an isolation layer between similar semiconductor layers having ohmic electrodes and implanted into a compound semiconductor substrate. By this construction this invention reduces the development of temporary conduction in the isolation layer due to disturbance of potential barrier by .alpha. particles, and can improve pronouncedly the tolerance to .alpha. particle induced soft errors.
摘要翻译: 本发明的半导体集成电路包括提供电位的电极,用于向具有欧姆电极的类似半导体层之间的隔离层施加电场并注入到化合物半导体衬底中。 通过这种结构,本发明减少了由于α粒子对势垒的干扰而导致的隔离层临时传导的发展,并且可以显着改善对α粒子诱导的软错误的耐受性。
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公开(公告)号:US4954866A
公开(公告)日:1990-09-04
申请号:US247250
申请日:1988-09-21
申请人: Hirotoshi Tanaka , Hiroki Yamashita , Noboru Masuda , Junji Shigeta , Yasunari Umemoto , Osamu Kagaya
发明人: Hirotoshi Tanaka , Hiroki Yamashita , Noboru Masuda , Junji Shigeta , Yasunari Umemoto , Osamu Kagaya
IPC分类号: H01L27/06 , H01L27/105 , H01L27/11
CPC分类号: H01L27/1104 , H01L27/0605 , H01L27/1116 , H01L27/105
摘要: A semiconductor integrated circuit memory is disclosed in which a first impurity-doped layer for making circuit elements such as MESFET's and a second impurity-doped layer opposite in conductivity type to the first impurity-doped layer are formed in a semi-insulating substrate in such a manner that the second impurity-doped layer is formed under and between circuit elements for making up a memory cell array part and a peripheral circuit part, and is divided into at least first and second regions. For example, the first region formed under and between the circuit elements of the memory cell array part is made of a P-type layer which is high in carrier density, and the second region formed under and between the circuit elements of the peripheral circuit part is made of a P-type layer which is low in carrier density. The high carrier-density P-type layer formed under the memory cell array part allows a memory cell having a minimum critical charge for alpha-particles to gain satisfactory alpha-particle immunity even when the memory cell is made fine in size. Further, the low carrier-density P-type layer formed under the peripheral circuit part having a critical charge larger than that of the memory cell can improve the alpha-particle immunity of the peripheral circuit part and can suppress an increase in parasitic capacitance at the peripheral circuit part to maintain the high-speed operation of the memory.
摘要翻译: 公开了一种半导体集成电路存储器,其中在半绝缘衬底中形成用于制造电路元件的第一杂质掺杂层,例如MESFET和与第一杂质掺杂层的导电类型相反的第二杂质掺杂层 第二杂质掺杂层形成在用于构成存储单元阵列部分的电路元件和外围电路部分之间的方式,并且被划分为至少第一和第二区域。 例如,形成在存储单元阵列部分的电路元件之下和之间的第一区域由载流子密度高的P型层制成,并且第二区域形成在外围电路部分的电路元件之下 由载流子浓度低的P型层构成。 形成在存储单元阵列部分下方的高载流子密度P型层允许具有最小临界电荷的存储单元获得满意的α粒子免疫,即使当存储单元的尺寸精细时。 此外,形成在具有大于存储单元的临界电荷的外围电路部分下的低载流子密度P型层可以改善外围电路部分的α粒子免疫力,并且可以抑制在外部电路部分的寄生电容的增加 外围电路部分保持高速运行的内存。
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公开(公告)号:US07045877B2
公开(公告)日:2006-05-16
申请号:US10420740
申请日:2003-04-23
申请人: Yasunari Umemoto , Hideyuki Ono , Tomonori Tanoue , Yasuo Ohsone , Isao Ohbu , Chushiro Kusano , Atsushi Kurokawa , Masao Yamane
发明人: Yasunari Umemoto , Hideyuki Ono , Tomonori Tanoue , Yasuo Ohsone , Isao Ohbu , Chushiro Kusano , Atsushi Kurokawa , Masao Yamane
IPC分类号: H01L31/072
CPC分类号: H01L27/0825 , H01L27/0259 , H01L29/7371 , H01L2224/48091 , H01L2224/73265 , H03K17/08146 , H03K17/615 , H01L2924/00014
摘要: The invention is directed to improve resistance to destruction of a semiconductor device. A protection circuit having a plurality of bipolar transistors which are Darlington connected between outputs (collector and emitter) of an amplification circuit of a high output is electrically connected in parallel with the amplification circuit. The amplification circuit has a plurality of unit HBTs (Heterojunction Bipolar Transistors) which are connected in parallel with each other. The protection circuit has a two-stage configuration including a first group of a protection circuit having a plurality of bipolar transistors Q1 to Q5 and a second group of a protection circuit having a plurality of bipolar transistors.
摘要翻译: 本发明旨在提高对半导体器件的破坏性。 具有连接在高输出的放大电路的输出(集电极和发射极)之间的达林顿的多个双极晶体管的保护电路与放大电路并联电连接。 放大电路具有彼此并联连接的多个单元HBT(异质结双极晶体管)。 保护电路具有包括具有多个双极型晶体管Q 1至Q 5的第一组保护电路和具有多个双极晶体管的第二组保护电路的两级配置。
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公开(公告)号:US20060157825A1
公开(公告)日:2006-07-20
申请号:US11376116
申请日:2006-03-16
申请人: Yasunari Umemoto , Hideyuki Ono , Tomonori Tanoue , Yasuo Ohsone , Isao Ohbu , Chushiro Kusano , Atsushi Kurokawa , Masao Yamane
发明人: Yasunari Umemoto , Hideyuki Ono , Tomonori Tanoue , Yasuo Ohsone , Isao Ohbu , Chushiro Kusano , Atsushi Kurokawa , Masao Yamane
IPC分类号: H01L27/082
CPC分类号: H01L27/0825 , H01L27/0259 , H01L29/7371 , H01L2224/48091 , H01L2224/73265 , H03K17/08146 , H03K17/615 , H01L2924/00014
摘要: The invention is directed to improve resistance to destruction of a semiconductor device. A protection circuit having a plurality of bipolar transistors which are Darlington connected between outputs (collector and emitter) of an amplification circuit of a high output is electrically connected in parallel with the amplification circuit. The amplification circuit has a plurality of unit HBTs (Heterojunction Bipolar Transistors) which are connected in parallel with each other. The protection circuit has a two-stage configuration including a first group of a protection circuit having a plurality of bipolar transistors Q1 to Q5 and a second group of a protection circuit having a plurality of bipolar transistors.
摘要翻译: 本发明旨在提高对半导体器件的破坏性。 具有连接在高输出的放大电路的输出(集电极和发射极)之间的达林顿的多个双极晶体管的保护电路与放大电路并联电连接。 放大电路具有彼此并联连接的多个单元HBT(异质结双极晶体管)。 保护电路具有包括具有多个双极型晶体管Q 1至Q 5的第一组保护电路和具有多个双极晶体管的第二组保护电路的两级配置。
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公开(公告)号:US20070164316A1
公开(公告)日:2007-07-19
申请号:US11723769
申请日:2007-03-22
申请人: Isao Ohbu , Chushiro Kusano , Yasunari Umemoto , Atsushi Kurokawa
发明人: Isao Ohbu , Chushiro Kusano , Yasunari Umemoto , Atsushi Kurokawa
IPC分类号: H01L31/00
CPC分类号: H01L29/7304 , H01L27/0605 , H01L29/7371 , H03F2200/444 , H03F2203/21178
摘要: A heterojunction bipolar transistor with InGaP as the emitter layer and capable of both reliable electrical conduction and thermal stability wherein a GaAs layer is inserted between the InGaP emitter layer and AlGaAs ballast resistance layer, to prevent holes reverse-injected from the base layer from diffusing and reaching the AlGaAs ballast resistance layer.
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公开(公告)号:US20060138460A1
公开(公告)日:2006-06-29
申请号:US11319084
申请日:2005-12-28
申请人: Satoshi Sasaki , Yasunari Umemoto , Yasuo Osone , Tsutomu Kobori , Chushiro Kusano , Isao Ohbu , Kenji Sasaki
发明人: Satoshi Sasaki , Yasunari Umemoto , Yasuo Osone , Tsutomu Kobori , Chushiro Kusano , Isao Ohbu , Kenji Sasaki
IPC分类号: H01L31/109
CPC分类号: H01L29/7304 , H01L23/66 , H01L24/48 , H01L24/49 , H01L25/042 , H01L27/0605 , H01L27/067 , H01L28/40 , H01L29/0808 , H01L29/7371 , H01L2223/6627 , H01L2223/6644 , H01L2224/05553 , H01L2224/05554 , H01L2224/32225 , H01L2224/48091 , H01L2224/48095 , H01L2224/48137 , H01L2224/48227 , H01L2224/48235 , H01L2224/49113 , H01L2224/49171 , H01L2224/73265 , H01L2924/00014 , H01L2924/01002 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/0102 , H01L2924/01022 , H01L2924/01028 , H01L2924/01029 , H01L2924/01031 , H01L2924/01032 , H01L2924/01033 , H01L2924/01037 , H01L2924/01041 , H01L2924/01042 , H01L2924/01049 , H01L2924/01074 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/10329 , H01L2924/10336 , H01L2924/1305 , H01L2924/13091 , H01L2924/14 , H01L2924/1423 , H01L2924/19032 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , H01L2924/19105 , H01L2924/30105 , H01L2924/3011 , H01L2924/30111 , H01L2924/00 , H01L2224/45099
摘要: A technology which allows a reduction in the thermal resistance of a semiconductor device and the miniaturization thereof is provided. The semiconductor device has a plurality of unit transistors Q, transistor formation regions 3a, 3b, and 3e each having a first number (seven) of the unit transistors Q, and transistor formation regions 3c and 3d each having a second number (four) of the unit transistors Q. The transistor formation regions 3c and 3d are located between the transistor formation regions 3a, 3b, 3e, and 3f and the first number is larger than the second number.
摘要翻译: 提供了允许半导体器件的热阻降低和小型化的技术。 半导体器件具有多个单位晶体管Q,具有第一数量(7)的单位晶体管Q的晶体管形成区域3a,3b和3e,以及分别具有第二 (4个)晶体管Q.晶体管形成区域3c和3d位于晶体管形成区域3a,3b,3e和3f之间,第一个数量大于第二个数量。
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公开(公告)号:US08227836B2
公开(公告)日:2012-07-24
申请号:US12579975
申请日:2009-10-15
申请人: Satoshi Sasaki , Yasunari Umemoto , Yasuo Osone , Tsutomu Kobori , Chushiro Kusano , Isao Ohbu , Kenji Sasaki
发明人: Satoshi Sasaki , Yasunari Umemoto , Yasuo Osone , Tsutomu Kobori , Chushiro Kusano , Isao Ohbu , Kenji Sasaki
IPC分类号: H01L27/082 , H01L27/102
CPC分类号: H01L29/7304 , H01L23/66 , H01L24/48 , H01L24/49 , H01L25/042 , H01L27/0605 , H01L27/067 , H01L28/40 , H01L29/0808 , H01L29/7371 , H01L2223/6627 , H01L2223/6644 , H01L2224/05553 , H01L2224/05554 , H01L2224/32225 , H01L2224/48091 , H01L2224/48095 , H01L2224/48137 , H01L2224/48227 , H01L2224/48235 , H01L2224/49113 , H01L2224/49171 , H01L2224/73265 , H01L2924/00014 , H01L2924/01002 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/0102 , H01L2924/01022 , H01L2924/01028 , H01L2924/01029 , H01L2924/01031 , H01L2924/01032 , H01L2924/01033 , H01L2924/01037 , H01L2924/01041 , H01L2924/01042 , H01L2924/01049 , H01L2924/01074 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/10329 , H01L2924/10336 , H01L2924/1305 , H01L2924/13091 , H01L2924/14 , H01L2924/1423 , H01L2924/19032 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , H01L2924/19105 , H01L2924/30105 , H01L2924/3011 , H01L2924/30111 , H01L2924/00 , H01L2224/45099
摘要: A technology which allows a reduction in the thermal resistance of a semiconductor device and the miniaturization thereof is provided. The semiconductor device has a plurality of unit transistors Q, transistor formation regions 3a, 3b, and 3e each having a first number (e.g., seven) of the unit transistors Q, and transistor formation regions 3c and 3d each having a second number (e.g., four) of the unit transistors Q. The transistor formation regions 3c and 3d are located between the transistor formation regions 3a, 3b, 3e, and 3f, and the first number is larger than the second number.
摘要翻译: 提供了允许半导体器件的热阻降低和小型化的技术。 半导体器件具有多个单位晶体管Q,每个具有单位晶体管Q的第一数量(例如七个)的晶体管形成区域3a,3b和3e以及每个具有第二数量的晶体管形成区域3c和3d(例如, ,四个)单位晶体管Q.晶体管形成区域3c和3d位于晶体管形成区域3a,3b,3e和3f之间,并且第一数量大于第二数量。
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公开(公告)号:US07723753B2
公开(公告)日:2010-05-25
申请号:US11962169
申请日:2007-12-21
申请人: Kenji Sasaki , Ikuro Akazawa , Yoshinori Imamura , Atsushi Kurokawa , Tatsuhiko Ikeda , Hiroshi Inagawa , Yasunari Umemoto , Isao Obu
发明人: Kenji Sasaki , Ikuro Akazawa , Yoshinori Imamura , Atsushi Kurokawa , Tatsuhiko Ikeda , Hiroshi Inagawa , Yasunari Umemoto , Isao Obu
IPC分类号: H01L27/082 , H01L21/331
CPC分类号: H01L21/8252 , H01L23/481 , H01L23/66 , H01L24/03 , H01L24/05 , H01L24/29 , H01L24/45 , H01L24/48 , H01L24/49 , H01L24/73 , H01L27/0605 , H01L29/0619 , H01L29/7371 , H01L29/7811 , H01L2224/04042 , H01L2224/05553 , H01L2224/05556 , H01L2224/05599 , H01L2224/29339 , H01L2224/32225 , H01L2224/45099 , H01L2224/451 , H01L2224/45117 , H01L2224/45144 , H01L2224/45155 , H01L2224/48091 , H01L2224/48227 , H01L2224/48465 , H01L2224/48599 , H01L2224/49171 , H01L2224/73265 , H01L2224/85399 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01019 , H01L2924/01022 , H01L2924/01023 , H01L2924/01024 , H01L2924/01028 , H01L2924/01031 , H01L2924/01033 , H01L2924/01042 , H01L2924/01047 , H01L2924/01049 , H01L2924/01078 , H01L2924/01079 , H01L2924/05042 , H01L2924/10158 , H01L2924/10329 , H01L2924/10336 , H01L2924/1305 , H01L2924/1306 , H01L2924/13064 , H01L2924/13091 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , H01L2924/19105 , H01L2924/30107 , H01L2924/01032 , H01L2924/00 , H01L2924/3512 , H01L2924/00012 , H01L2224/45015 , H01L2924/207
摘要: In a GaAs substrate as a semi-insulating substrate, a heterojunction bipolar transistor (HBT) is formed in an element formation region, while an isolation region is formed in an insulating region. The isolation region formed in the insulating region is formed by introducing helium into the same semiconductor layers as the sub-collector semiconductor layer and collector semiconductor layer of the HBT. In an outer peripheral region, a conductive layer is formed to be exposed from protective films and coupled to a back surface electrode. Because a GND potential is supplied to the back surface electrode, the conductive layer is fixed to the GND potential. The conductive layer is formed of the same semiconductor layers as the sub-collector semiconductor layer and collector semiconductor layer of the HBT.
摘要翻译: 在作为半绝缘基板的GaAs衬底中,在元件形成区域中形成异质结双极晶体管(HBT),而在绝缘区域中形成隔离区域。 通过将氦引入与HBT的副集电极半导体层和集电体半导体层相同的半导体层中而形成在绝缘区域中的隔离区域。 在外围区域中,形成导电层以从保护膜露出并耦合到背面电极。 由于将GND电位提供给背面电极,所以导电层固定为GND电位。 导电层由与HBT的副集电极半导体层和集电极半导体层相同的半导体层形成。
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公开(公告)号:US07511315B2
公开(公告)日:2009-03-31
申请号:US11108729
申请日:2005-04-19
申请人: Satoru Konishi , Tsuneo Endo , Hirokazu Nakajima , Yasunari Umemoto , Satoshi Sasaki , Chushiro Kusano , Yoshinori Imamura , Atsushi Kurokawa
发明人: Satoru Konishi , Tsuneo Endo , Hirokazu Nakajima , Yasunari Umemoto , Satoshi Sasaki , Chushiro Kusano , Yoshinori Imamura , Atsushi Kurokawa
IPC分类号: H01L21/00 , H01L29/34 , H01L23/48 , H01L21/4763
CPC分类号: H01L29/4933 , H01L21/84 , H01L23/4824 , H01L23/49844 , H01L24/48 , H01L24/49 , H01L24/73 , H01L25/16 , H01L29/456 , H01L29/7835 , H01L2224/1403 , H01L2224/16235 , H01L2224/1703 , H01L2224/32145 , H01L2224/48091 , H01L2224/48227 , H01L2224/49171 , H01L2224/49175 , H01L2224/73253 , H01L2224/73265 , H01L2924/00014 , H01L2924/01078 , H01L2924/01079 , H01L2924/1305 , H01L2924/13091 , H01L2924/15153 , H01L2924/1517 , H01L2924/181 , H01L2924/19041 , H01L2924/19105 , H01L2924/30107 , H01L2924/3011 , H01L2924/30111 , H01L2924/00 , H01L2924/00012 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
摘要: A semiconductor device has an external wiring for GND formed over an underside surface of a wiring substrate. A plurality of via holes connecting to the external wiring for GND are formed to penetrate the wiring substrate. A first semiconductor chip of high power consumption, including HBTs, is mounted over a principal surface of the wiring substrate. The emitter bump electrode of the first semiconductor chip is connected in common with emitter electrodes of a plurality of HBTs formed in the first semiconductor chip. The emitter bump electrode is extended in a direction in which the HBTs line up. The first semiconductor chip is mounted over the wiring substrate so that a plurality of the via holes are connected with the emitter bump electrode. A second semiconductor chip lower in heat dissipation value than the first semiconductor chip is mounted over the first semiconductor chip.
摘要翻译: 半导体器件具有在布线基板的下表面上形成的用于GND的外部布线。 连接到GND的外部配线的多个通孔形成为穿透布线基板。 包括HBT的高功率的第一半导体芯片安装在布线基板的主表面上。 第一半导体芯片的发射极电极与形成在第一半导体芯片中的多个HBT的发射极共同连接。 发射极电极沿HBT排列的方向延伸。 第一半导体芯片安装在布线基板上,使得多个通孔与发射极电极连接。 散热值比第一半导体芯片低的第二半导体芯片安装在第一半导体芯片上。
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