Process for forming printed wiring by electroless deposition
    3.
    发明授权
    Process for forming printed wiring by electroless deposition 失效
    通过无电沉积形成印刷线路的工艺

    公开(公告)号:US4239813A

    公开(公告)日:1980-12-16

    申请号:US33218

    申请日:1979-04-25

    CPC分类号: H05K3/185 C23C18/1605

    摘要: Highly precise wiring formed on an insulating substrate can be obtained by electroless deposition without using a printing process. Said process is characterized by forming an adhesive layer containing a photo-setting substance on a substrate, exposing the adhesive layer to actinic light imagewisely so as to irradiate only portions other than those forming wiring, treating the surface of the substrate with a roughening solution so as to roughen the portions not exposed to actinic light, and subjecting to the conventional treatments for electroless deposition so as to form prescribed wiring on the portions not exposed to actinic light.

    摘要翻译: 在绝缘基板上形成的高精度布线可以通过无电沉积而不使用印刷工艺获得。 所述方法的特征在于,在基材上形成含有光固化物质的粘合剂层,将粘合剂层成像曝光于光化反射光,以仅照射形成布线的部分以外的部分,以粗糙化溶液处理基材表面 以使不暴露于光化光的部分粗糙化,并进行常规的无电沉积处理,以便在不暴露于光化的光的部分上形成规定的布线。

    Electroless copper solution
    4.
    发明授权
    Electroless copper solution 失效
    无电解铜溶液

    公开(公告)号:US4099974A

    公开(公告)日:1978-07-11

    申请号:US665708

    申请日:1976-03-10

    IPC分类号: H05K3/18 C23C18/40 C23C3/02

    CPC分类号: C23C18/405

    摘要: An electroless copper solution capable of forming an electroless deposited copper film having as a higher elongation as that of electro deposited copper film is provided, which is characterized by adding either 2,2'-dipyridyl or 2,9-dimethyl-1,10-phenanthroline, and polyethylene glycol to the well known electroless copper solution containing a copper salt, such as cupric sulfate, a complexing agent such as ethylenediaminetetraacetic acid, a reducing agent such as formalin, and a pH-adjusting agent such as alkali hydroxide as main components.The present copper solution can provide not only a higher elongation of deposited film, but also higher depositing rate, about 3 - 4 .mu.m/hr, which is equal or superior to that of the conventional art.

    摘要翻译: 提供能够形成具有比电沉积铜膜高的伸长率的无电沉积铜膜的无电解铜溶液,其特征在于加入2,2'-二吡啶基或2,9-二甲基-1,10- 菲咯啉和聚乙二醇与众所周知的含有铜盐的化学镀铜溶液如硫酸铜,络合剂如乙二胺四乙酸,还原剂如福尔马林以及pH调节剂如碱金属氢氧化物作为主要成分 。

    Process for producing printed circuit board by electroless plating
    5.
    发明授权
    Process for producing printed circuit board by electroless plating 失效
    通过化学镀制造印刷电路板的工艺

    公开(公告)号:US4378384A

    公开(公告)日:1983-03-29

    申请号:US297565

    申请日:1981-08-31

    摘要: A process for producing a printed circuit board which comprises forming a plating film forming adhesive layer on the whole exposed surface of an insulating board, roughening said adhesive layer surface, depositing a catalyst for electroless copper plating on said adhesive layer surface from a catalyst solution, masking the thus treated insulating board surface excepting the part where a circuit is to be formed, and then performing the electroless copper plating on the catalyst of the board to form a circuit thereon, wherein an improvement comprises treating the roughened adhesive layer surface with an alkaline solution before depositing the catalyst thereon and treating the masked insulating board with an aqueous solution containing a surfactant before performing the electroless copper plating. The above process assures a higher copper utilization and a large adhesive strength of the copper plating to the board.

    摘要翻译: 一种制造印刷电路板的方法,包括在绝缘板的整个暴露表面上形成镀膜形成粘合剂层,使所述粘合剂层表面粗糙化,在所述粘合剂层表面上从催化剂溶液沉积无电镀铜催化剂, 掩蔽除了形成电路的部分之外的如此处理的绝缘板表面,然后在板的催化剂上进行无电镀铜以在其上形成电路,其中改进包括用碱性处理粗糙化的粘合剂层表面 在将催化剂沉积在其上并在进行化学镀铜之前用含有表面活性剂的水溶液处理掩蔽的绝缘板。 上述方法确保了铜的铜利用率和电镀铜的较大的粘合强度。

    Photo-curable resist resin composition for electroless plating, process
for preparing a printed circuit board with the said resist resin
composition and a printed circuit board having resist prepared from the
said resist resin composition
    8.
    发明授权
    Photo-curable resist resin composition for electroless plating, process for preparing a printed circuit board with the said resist resin composition and a printed circuit board having resist prepared from the said resist resin composition 失效
    用于化学镀的光固化抗蚀剂树脂组合物,用所述抗蚀树脂组合物制备印刷电路板的方法和具有由所述抗蚀树脂组合物制备的抗蚀剂的印刷电路板

    公开(公告)号:US4820549A

    公开(公告)日:1989-04-11

    申请号:US51518

    申请日:1987-05-19

    摘要: A photo-curable resist resin composition for electroless plating comprising an epoxy resin having a viscosity of at least 150 poises at 25.degree. C., and at least two glycidyl ether groups in one molecule, the glycidyl ether groups being directly bonded to the aromatic ring as Component A, an oxirane ring-containing compound having a boiling point of at least 140.degree. C. and a molecular weight of not more than 500 as Component B, and a photo-sensitive aromatic onium salt as Component C, wherein the Component A is in an amount of 90 to 40 parts by weight per total 100 parts by weight of the Components A and B, and the Component C is in an amount of 0.1 to 5 parts by weight per total 100 parts by weight of the Components A and B, and, if any, other resin components, can produce a resist film capable of withstanding highly alkaline electroless copper plating solution at a high temperature for a long time without any decrease in the physical properties of plating films deposited even by repeated use of the electroless copper plating solution. The resist film prepared from the resist resin composition has distinguished soldering heat resistance, solvent resistance and electrical insulation.

    摘要翻译: 一种用于化学镀的光固化抗蚀剂树脂组合物,包括在25℃下具有至少150泊的粘度的环氧树脂和一个分子中的至少两个缩水甘油醚基团,缩水甘油醚基团直接键合到芳环上 作为组分A,作为组分B的沸点为至少140℃,分子量不超过500的含环氧乙烷环的化合物和作为组分C的感光芳族鎓盐,其中组分A 组分A和B的总量为每100重量份为90〜40重量份,组分C为0.1〜5重量份/ 100重量份的组分A和 B和任何其他树脂组分,可以在高温下长时间地产生能够耐受高碱性化学镀铜溶液的抗蚀剂膜,而不会通过重复沉积而沉积的电镀膜的物理性能降低 使用无电镀铜溶液。 由抗蚀剂树脂组合物制备的抗蚀剂膜具有显着的耐焊接耐热性,耐溶剂性和电绝缘性。

    Process for electroless copper plating
    9.
    发明授权
    Process for electroless copper plating 失效
    化学镀铜工艺

    公开(公告)号:US4632852A

    公开(公告)日:1986-12-30

    申请号:US746099

    申请日:1985-06-18

    IPC分类号: C23C18/40 H05K3/18 C23C3/02

    CPC分类号: H05K3/187 C23C18/40

    摘要: In a process for electroless copper plating in an electroless copper plating solution containing a copper salt, a complexing agent for the copper salt, a reducing agent for the copper salt, and a pH-adjusting agent, a plating film having distinguished mechanical properties can be obtained by adding at least one of soluble inorganic silicon compounds and soluble inorganic germanium compounds and conducting the electroless copper plating by injecting an oxygen-containing gas into the plating solution or by adding an oxidizing agent to the plating solution or by both injection or the oxygen-containing gas and addition of the oxidizing agent thereto. The stability of the electroless copper plating solution can be maintained better thereby and substantially thick plating is possible.

    摘要翻译: 在含有铜盐,铜盐络合剂,铜盐还原剂和pH调节剂的化学镀铜溶液中的无电镀铜方法中,具有显着的机械性能的镀膜可以是 通过添加可溶性无机硅化合物和可溶性无机锗化合物中的至少一种而进行无电镀铜,通过将含氧气体注入镀液中或者通过向镀液中添加氧化剂,或者通过注入或氧气 并且向其中加入氧化剂。 可以更好地保持化学镀铜溶液的稳定性,并且可以实现基本上厚的镀覆。