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    Gas laser chamber with vertical vibration isolator
    1.
    发明授权
    Gas laser chamber with vertical vibration isolator 有权
    带垂直隔振器的气体激光室

    公开(公告)号：US06425559B1

    公开(公告)日：2002-07-30

    申请号：US09675492

    申请日：2000-09-29

    申请人： I. Roger Oliver ,  Alex P. Ivaschenko ,  William N. Partlo ,  Palash P. Das

    发明人： I. Roger Oliver ,  Alex P. Ivaschenko ,  William N. Partlo ,  Palash P. Das

    IPC分类号： F16M1100

    CPC分类号： H01S3/03 ,  H01S3/02

    摘要： A chamber/optics support structure for a laser having a laser chamber with a vibration source. The chamber and the laser resonance cavity optical elements are supported on a platform. The chamber is supported by a plurality of wheels which in turn rests on two tracks on track supports mounted on the platform. A vertical vibration isolator isolates vertical vibrations originating in the chamber from the laser optics. A flexible clamp flexibly clamps the chamber in a horizontal position to align it with the resonance cavity optical elements and to substantially decouple vibration between the chamber vibration source to the optical elements in a frequency range of concern. The invention is especially useful for positioning the heavy laser chamber of a narrow band excimer laser and for decoupling vibrations resulting from its blower from the lasers line narrowing module and output coupler. In a preferred embodiment the plurality of wheels is three wheels, two of which rest in a V-groove track and one of which rests on a flat track. This preferred embodiment uses two flexible clamps each having an adjustment bolt and four symmetrically spaced silicon rubber vibration isolators. Precise horizontal alignment of the chamber is accomplished using the adjustment bolt which is then held in position with a lock nut and a clamping bolt. Silicon rubber dampers in the isolators decouple horizontal chamber vibrations from the optical elements. In specific embodiments, the vertical vibration isolator may be a flexible liner in the wheels or in the rails or alternatively a pad on which the chamber rests.

    摘要翻译： 一种用于具有具有振动源的激光室的激光器的腔室/光学器件支撑结构。 腔室和激光共振腔光学元件支撑在平台上。 该室由多个轮支撑，多个轮依次放置在安装在平台上的轨道支架上的两个轨道上。 垂直隔振器将起始于室内的垂直振动与激光光学器件隔离。 柔性夹具可灵活地将腔室夹紧在水平位置，以将其与共振腔光学元件对准，并使其在腔室振动源与光学元件之间的振动基本上在关注的频率范围内分离。本发明特别适用于定位重物 激光腔的窄带准分子激光器，并将其鼓风机的振动与激光线变窄模块和输出耦合器分离。 在优选实施例中，多个车轮是三个车轮，其中两个车轮搁置在V形槽轨道中，其中一个车轮搁置在平坦轨道上。 该优选实施例使用两个柔性夹具，每个柔性夹具具有调节螺栓和四个对称间隔的硅橡胶隔振器。 使用调节螺栓实现腔室的精确水平对准，调节螺栓然后通过锁紧螺母和夹紧螺栓保持在适当的位置。 隔离器中的硅橡胶阻尼器将水平室振动与光学元件分离。在具体实施例中，垂直隔振器可以是轮子中或轨道中的柔性衬垫，或者替代地，腔室搁置在其上。

    Laser thin film poly-silicon annealing optical system
    2.
    发明授权
    Laser thin film poly-silicon annealing optical system 有权
    激光薄膜多晶硅退火光学系统

    公开(公告)号：US07884303B2

    公开(公告)日：2011-02-08

    申请号：US11201877

    申请日：2005-08-11

    申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： B23K26/00

    CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

    摘要： A high, energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.

    摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统，并且扩展 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够的强度分布的倍率 陡峭的侧壁允许现场停止在工件处保持足够陡峭的梁轮廓。

    Laser thin film poly-silicon annealing system
    3.
    发明授权
    Laser thin film poly-silicon annealing system 有权
    激光薄膜多晶硅退火系统

    公开(公告)号：US07061959B2

    公开(公告)日：2006-06-13

    申请号：US10884547

    申请日：2004-07-01

    申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： H01S3/22

    CPC分类号： H01S3/0818 ,  B23K26/042 ,  B23K26/0622 ,  B23K26/0738 ,  B23K26/705 ,  H01L21/02532 ,  H01L21/02675 ,  H01S3/225 ,  H01S3/2255 ,  H01S3/2308 ,  H01S3/2366

    摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.

    摘要翻译： 公开了一种气体放电激光结晶装置和方法，用于在工件上的膜中进行晶体补偿或取向的变换，其可以包括主振荡器功率放大器MOPA或功率振荡器功率放大器，配置XeF激光系统，产生激光输出光 脉冲束以高重复率和高功率脉冲到脉冲剂量控制; 从激光输出光脉冲光束产生细长脉冲工作光束的光学系统。 该装置还可以包括激光系统被配置为POPA激光系统，并且还包括：可操作地将来自第一激光PO单元的第一输出激光束脉冲光束引导到第二激光器PA单元中的中继光学器件; 并且定时和控制模块定时在正或负3ns内在第一和第二激光单元中产生气体放电，以产生第二激光输出光脉冲束作为第一激光输出光脉冲光束的放大。 该系统可以包括振荡器激光单元中的发散控制。 发散控制可以包括不稳定的谐振器装置。 该系统还可以包括在激光和工件之间的光束指向控制机构和在激光和工件之间的光束位置控制机构。 光束参数测量可以向光束指向机构提供主动反馈控制，并向光束位置控制机构提供主动反馈控制。

    Pulse power generating circuit with energy recovery
    7.
    发明授权
    Pulse power generating circuit with energy recovery 失效
    具有能量回收的脉冲发电电路

    公开(公告)号：US5729562A

    公开(公告)日：1998-03-17

    申请号：US739873

    申请日：1996-10-31

    申请人： Daniel L. Birx ,  Palash P. Das ,  Igor V. Fomenkov ,  William N. Partlo ,  Tom A. Watson

    发明人： Daniel L. Birx ,  Palash P. Das ,  Igor V. Fomenkov ,  William N. Partlo ,  Tom A. Watson

    IPC分类号： H01S3/00 ,  H01S3/097 ,  H01S3/225 ,  H02M9/04 ,  H03K3/57 ,  H03K17/00 ,  H03K17/80 ,  H05H1/06

    CPC分类号： H05H1/06 ,  H01S3/097 ,  H03K17/80 ,  H03K3/57 ,  H01S3/225 ,  H03K2217/0036

    摘要： A high voltage pulse power generating circuit capable of providing energy recovery is disclosed. The energy efficient pulse generating circuit source comprises a high voltage charge storing element which is periodically discharged into a compressor circuit. An energy recovery circuit coupled to the compressor circuit reverses the polarity of energy dissipated by the pulse power generating circuit and transfers the waste energy back to the power source. In a preferred embodiment, the pulse power generating circuit of the present invention utilizes an SCR switch for periodically discharging the charge storing element. This embodiment of the present invention provides pulses consistently and will not provide even a single missed pulse.

    摘要翻译： 公开了一种能够提供能量回收的高压脉冲发生电路。 能量效率脉冲发生电路源包括周期性地排放到压缩机电路中的高电压电荷存储元件。 耦合到压缩机电路的能量恢复电路反转由脉冲发电电路消耗的能量的极性，并将废能转移回电源。 在优选实施例中，本发明的脉冲发生电路利用SCR开关来周期性地对电荷存储元件进行放电。 本发明的该实施例一致地提供脉冲，并且甚至不会提供单个错过的脉冲。

    Lithography laser system with in-place alignment tool
    10.
    发明授权
    Lithography laser system with in-place alignment tool 有权
    光刻激光系统具有就地对准工具

    公开(公告)号：US06704340B2

    公开(公告)日：2004-03-09

    申请号：US10255806

    申请日：2002-09-25

    申请人： Alexander I. Ershov ,  William N. Partlo ,  Palash P. Das ,  Laura S. Casas ,  Daniel J. W. Brown

    发明人： Alexander I. Ershov ,  William N. Partlo ,  Palash P. Das ,  Laura S. Casas ,  Daniel J. W. Brown

    IPC分类号： H01S310

    CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

    摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with optical components adjustable from outside of the enclosure without the need to open it. Targets and beam directors are included within the beam path enclosure and are used to judge the quality of alignment. These target and beam directors are located on a moveable mount which is insertable in the beam path for alignment and are removed out of the beam path for normal operation. The positions of the targets and beam directors are controlled from outside the beam path enclosure. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. In a preferred embodiment the beam directors clients laser beam being aligned to a monitor outside the beam path enclosure to permit the normal to image a cross-section of the beam and the target.

    摘要翻译： 本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光源。 该系统包括封闭和清洗的光束路径，光学元件可从外壳外部调节，无需打开。 目标和光束导向器包含在光束路径外壳内，用于判断对准的质量。 这些目标和光束指向器位于可移动的安装件上，该安装件可插入到光束路径中用于对准，并且被移出光束路径以用于正常操作。 目标和光束导向器的位置由光束外壳外部控制。 在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。 与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。 在优选实施例中，光束导向器将激光束与射束路径外部的监视器对准，以允许对光束和靶的横截面进行法向成像。