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    Process for the preparation of 3-(substituted phenyl)-5-alkylidene-1,3-oxazolidine-2,4-dione derivatives
    2.
    发明授权
    Process for the preparation of 3-(substituted phenyl)-5-alkylidene-1,3-oxazolidine-2,4-dione derivatives 失效
    3-（取代苯基）-5-亚烷基-1,3-恶唑烷-2,4-二酮衍生物的制备方法

    公开(公告)号：US6090946A

    公开(公告)日：2000-07-18

    申请号：US894655

    申请日：1997-12-15

    申请人： Kenji Hirai ,  Katsuyuki Masuda ,  Tomoyuki Yano ,  Ryuta Ohno ,  Tomoko Matsukawa ,  Kiyomi Imai ,  Natsuko Okano ,  Tomoko Yoshii ,  Takehito Mouri

    发明人： Kenji Hirai ,  Katsuyuki Masuda ,  Tomoyuki Yano ,  Ryuta Ohno ,  Tomoko Matsukawa ,  Kiyomi Imai ,  Natsuko Okano ,  Tomoko Yoshii ,  Takehito Mouri

    IPC分类号： C07C67/31 ,  C07D263/44

    CPC分类号： C07D263/44 ,  C07C67/31

    摘要： The present invention provides an industrial process for efficiently preparing a 3-(substituted phenyl)-5-isopropylidene-1,3-oxazolidine-2,4-dione derivative having a potent herbicidal activity without using phosgene or the like. The present invention relates to a process for preparing a 3-(substituted phenyl)-5-alkylidene-1,3-oxazolidine-2,4-dione derivative represented by general formula (III), which comprises reaction of an N-(substituted phenyl)carbamate represented by general formula (I) with a 2-hydroxy-3-alkenoate represented by-general formula (II) or with a 3-alkoxy-2-hydroxyalkanoate represented by general formula (IV): ##STR1## (wherein Ar is a substituted phenyl group, R.sup.1 is an alkyl group having a carbon number of from 1 to 6, R.sup.2 and R.sup.3 are independently hydrogen atoms or alkyl groups having carbon numbers of from 1 to 12, and R.sup.4 and R.sup.5 are independently alkyl groups having carbon numbers of from 1 to 6).

    摘要翻译： PCT No.PCT / JP96 / 00430 Sec。 371 1997年12月15日第 102（e）日期1997年12月15日PCT提交1996年2月26日PCT公布。 公开号WO96 / 26930 PCT。 日本1996年9月6日本发明提供了一种不使用光气等有效制备具有强效除草活性的3-（取代苯基）-5-异亚丙基-1,3-恶唑烷-2,4-二酮衍生物的工业方法 。 本发明涉及一种制备由通式（III）表示的3-（取代苯基）-5-亚烷基-1,3-恶唑烷-2,4-二酮衍生物的方法，该方法包括N-（取代的 苯基）氨基甲酸酯与由通式（II）表示的2-羟基-3-烯酸酯或由通式（IV）表示的3-烷氧基-2-羟基链烷酸酯反应：（其中Ar为 取代的苯基，R1是碳数为1至6的烷基，R2和R3独立地为氢原子或碳数为1至12的烷基，R4和R5独立地为碳数为 从1到6）。

    Process for producing 2-(halomethyl)phenylacetic acid esters
    3.
    发明授权
    Process for producing 2-(halomethyl)phenylacetic acid esters 失效
    2-（卤代甲基）苯乙酸酯的制备方法

    公开(公告)号：US5886211A

    公开(公告)日：1999-03-23

    申请号：US981449

    申请日：1998-03-18

    申请人： Kenji Hirai ,  Katsuyuki Masuda ,  Yoshihiro Takao ,  Masahide Sugiyama ,  Yukio Ono ,  Masahumi Matsuzawa

    发明人： Kenji Hirai ,  Katsuyuki Masuda ,  Yoshihiro Takao ,  Masahide Sugiyama ,  Yukio Ono ,  Masahumi Matsuzawa

    IPC分类号： C07C67/24 ,  C07C69/65 ,  C07D311/76 ,  C07C69/76

    CPC分类号： C07D311/76 ,  C07C67/24 ,  C07C69/65

    摘要： 2-(Halomethyl)phenylacetic acid esters (3) which are useful as intermediates for producing agricultural fungicides are produced efficiently and conveniently by reacting a 3-isochromanone derivative (1) with a hydrogen halide and an alcohol or reacting (1) with a halomethyl alkyl ether and then reacting the product with an alcohol in the presence of a base. The starting compound, 3-isochromanone (1), is produced in good yield by reacting an .alpha.,.alpha.'-o-xylene dihalide (4) with carbon monoxide and water in an organic solvent in the presence of a palladium catalyst and an inorganic base and then treating the product with an acid. ##STR1##

    摘要翻译： PCT No.PCT / JP96 / 01677 Sec。 371日期1998年3月18日 102（e）1998年3月18日PCT PCT 1996年6月19日PCT公布。 公开号WO97 / 00850 PCT 日本1 9 9 2年1月9日 - 用于制备农药杀菌剂的中间体的（卤代甲基）苯乙酸酯（3）通过使3-异色满酮衍生物（1）与卤化氢和醇反应（或 1）与卤代甲基烷基醚反应，然后在碱的存在下使产物与醇反应。 通过使α，α'-二甲苯二卤化物（4）与一氧化碳和水在有机溶剂中在钯催化剂和无机物存在下反应，以良好的产率制备起始化合物3-异色满酮（1） 然后用酸处理产物。 + TR

    Silicon-containing alicyclic polyimide resin, polyamic acid resin, and manufacturing method for same
    4.
    发明授权
    Silicon-containing alicyclic polyimide resin, polyamic acid resin, and manufacturing method for same 有权
    含硅脂环族聚酰亚胺树脂，聚酰胺酸树脂及其制造方法

    公开(公告)号：US08592546B2

    公开(公告)日：2013-11-26

    申请号：US13583727

    申请日：2011-04-13

    申请人： Tooru Kikuchi ,  Toshihiko Takasaki ,  Katsuyuki Masuda

    发明人： Tooru Kikuchi ,  Toshihiko Takasaki ,  Katsuyuki Masuda

    IPC分类号： C08G77/452

    CPC分类号： C08G73/106 ,  C08G69/42 ,  C08G73/105 ,  C08G73/1075 ,  C08G73/1078 ,  C08G77/455

    摘要： A polyimide resin including repeating units represented by formula (1): wherein R is a diamine residue or a diisocyanate residue; m is an integer of 2 to 30; any of silicon atoms bonded to norbornane rings is in exo configuration with respect to the norbornane rings; and any of imide rings bonded to the norbornane rings is in exo configuration with respect to the norbornane rings, and a polyamic acid resin including repeating units represented by formula (2): wherein R is a diamine residue; m is an integer of 2 to 30; any of silicon atoms bonded to norbornane rings is in exo configuration with respect to the norbornane rings; and any of amide groups and carboxyl groups bonded to the norbornane rings is in exo configuration with respect to the norbornane rings. The polyimide resin is soluble in general-purpose solvents, has a good transparency and a high molecular weight, and is excellent in mechanical properties, such as tensile strength and elongation.

    摘要翻译： 包含由式（1）表示的重复单元的聚酰亚胺树脂：其中R是二胺残基或二异氰酸酯残基; m为2〜30的整数， 与降冰片烷环结合的任何硅原子相对于降冰片烷环都处于外部构型; 并且与降冰片烷环结合的任何酰亚胺环相对于降冰片烷环为外部构型，和包含由式（2）表示的重复单元的聚酰胺酸树脂：其中R是二胺残基; m为2〜30的整数， 与降冰片烷环结合的任何硅原子相对于降冰片烷环都处于外部构型; 与降冰片烷环结合的酰胺基和羧基中的任何一个相对于降冰片烷环都处于外部构型。 聚酰亚胺树脂可溶于通用溶剂，透明度高，分子量高，机械性能优异，拉伸强度和伸长率优异。

    Primer, conductor foil with resin, laminated sheet and method of manufacturing laminated sheet
    9.
    发明授权
    Primer, conductor foil with resin, laminated sheet and method of manufacturing laminated sheet 有权
    底漆，带树脂的导体箔，层叠片及其制造方法

    公开(公告)号：US07648770B2

    公开(公告)日：2010-01-19

    申请号：US10557728

    申请日：2004-05-21

    申请人： Kenji Tanaka ,  Kazumasa Takeuchi ,  Nobuyuki Ogawa ,  Katsuyuki Masuda

    发明人： Kenji Tanaka ,  Kazumasa Takeuchi ,  Nobuyuki Ogawa ,  Katsuyuki Masuda

    IPC分类号： B32B15/08

    CPC分类号： B32B27/36 ,  B32B7/04 ,  B32B15/08 ,  B32B25/08 ,  B32B25/14 ,  B32B27/08 ,  B32B27/281 ,  B32B27/322 ,  B32B2307/202 ,  B32B2307/206 ,  B32B2307/748 ,  B32B2457/00 ,  C08G73/14 ,  H05K3/386 ,  H05K2201/0358 ,  Y10T156/10 ,  Y10T428/24355 ,  Y10T428/31678 ,  Y10T428/31681 ,  Y10T428/31721

    摘要： The invention aims to provide a resin primer which can stick an insulator layer to a conductor foil whereof the surface is not much roughened with sufficient adhesive force, a conductor foil with resin, a laminated sheet and a method of manufacturing same. The resin primer of the invention comprises a resin having film-forming ability and a breaking energy of 0.15 J or more. The conductor foil with resin of the invention comprises a resin layer comprising a conductor foil and the aforesaid resin primer. Further, the laminated sheet of the invention comprises the conductor foil, an insulating layer disposed facing the conductor foil, and a resin layer comprising the aforesaid resin primer disposed between the conductor foil and insulating layer so that it is in contact therewith. This laminated sheet can be manufactured by heating and pressurizing a laminate comprising the aforesaid conductor foil with resin, and a prepreg laminated on this resin layer.

    摘要翻译： 本发明的目的是提供一种树脂底漆，其可以将绝缘体层粘附到具有足够的粘合力的表面不被粗糙化的导体箔上，具有树脂的导体箔，层压片及其制造方法。 本发明的树脂底漆包括具有成膜能力和断裂能为0.15J以上的树脂。 本发明的具有树脂的导体箔包括由导体箔和上述树脂底漆构成的树脂层。 此外，本发明的层压片包括导体箔，与导体箔相对设置的绝缘层，以及包含设置在导体箔与绝缘层之间的上述树脂底漆的树脂层，使其与其接触。 该层叠片材可以通过用树脂对包含上述导体箔的层压体进行加热加压，并将该层压在该树脂层上的预浸料坯来制造。

    Polishing fluid and polishing method
    10.
    发明申请
    Polishing fluid and polishing method 有权
    抛光液和抛光方法

    公开(公告)号：US20050181609A1

    公开(公告)日：2005-08-18

    申请号：US10513002

    申请日：2003-04-28

    申请人： Yasushi Kurata ,  Katsuyuki Masuda ,  Hiroshi Ono ,  Yasuo Kamigata ,  Kazuhiro Enomoto

    发明人： Yasushi Kurata ,  Katsuyuki Masuda ,  Hiroshi Ono ,  Yasuo Kamigata ,  Kazuhiro Enomoto

    IPC分类号： B24B37/00 ,  C09G1/02 ,  C09G1/04 ,  H01L21/321 ,  H01L21/302 ,  H01L21/461

    CPC分类号： B24B37/0056 ,  B24B37/044 ,  C09G1/02 ,  C09G1/04 ,  C09K3/1463 ,  H01L21/3212

    摘要： A polishing slurry including an oxidant, a metal oxide dissolver, a metal inhibitor and water and having a pH from 2 to 5. The metal oxide dissolver contains one or more types selected from one or more acids (A-group) selected from acids of which the dissociation constant (pKa) of a first dissociable acid group is less than 3.7 and from which five acids of lactic acid, phthalic acid, fumaric acid, maleic acid and aminoacetic acid are excluded, ammonium salts of the A-group and esters of the A-group, and one or more types selected from one or more acids (B-group) selected from acids of which the dissociation constant (pKa) of a first dissociable acid group is 3.7 or more and the five acids, ammonium salts of the B-group and esters of the B-group. The metal inhibitor contains one or more types selected from the group consisting of aromatic compounds having a triazole skeleton and one or more types selected from the group consisting of aliphatic compounds having a triazole skeleton and compounds having any one of pyrimidine skeleton, imidazole skeleton, guanidine skeleton, thiazole skeleton and pyrazole skeleton. The polishing slurry having a high metal-polishing rate, reducing etching rate and polishing friction, results in the production, with high productivity, of semiconductor devices reduced in dishing and erosion in metal wiring.

    摘要翻译： 包括氧化剂，金属氧化物溶解器，金属抑制剂和水并且pH为2至5的抛光浆料。金属氧化物溶解器含有一种或多种选自一种或多种选自以下的酸的一种（A-group）酸： 其中第一离解酸基团的解离常数（pKa）小于3.7，排除了乳酸，邻苯二甲酸，富马酸，马来酸和氨基乙酸的五种酸，A组的铵盐和 A组和选自一种或多种选自第一可解离酸基团的解离常数（pKa）为3.7以上的酸的酸（B组）和5种酸的一种或多种，​​以及五种酸的铵盐 B族的B族和酯类。 金属抑制剂含有选自具有三唑骨架的芳香族化合物和选自具有三唑骨架的脂肪族化合物和具有嘧啶骨架，咪唑骨架，胍等任意一种的化合物的一种或多种的一种或多种 骨架，噻唑骨架和吡唑骨架。 具有高金属抛光速率，降低蚀刻速率和抛光摩擦的抛光浆料导致半导体器件的高生产率的生产减少了金属布线中的凹陷和侵蚀。