Multilayered circuitized substrate and method of fabrication
    1.
    发明授权
    Multilayered circuitized substrate and method of fabrication 失效
    多层电路基板及其制造方法

    公开(公告)号:US5858254A

    公开(公告)日:1999-01-12

    申请号:US789813

    申请日:1997-01-28

    摘要: A multilayer circuit fabrication approach and circuitized substrate are presented wherein at least two conductive layers are formed over a substrate. The conductive layers are separated by a first dielectric layer and the structure is encapsulated with a second dielectric layer. The first dielectric layer includes open areas exposing a portion of the underlying support structure aligned to those areas where contact points are to reside in the second conductive layer. The first dielectric layer comprises a blanket dielectric layer such that recesses are defined in the upper surface thereof aligned to the open areas of the first conductive layer. The second conductive layer thus resides in two planes, both of which comprise planes other than a plane of the first conductive layer. A plurality of openings can be simultaneously formed to expose contact points in both the first and second conductive layers.

    摘要翻译: 提出了一种多层电路制造方法和电路化衬底,其中在衬底上形成至少两个导电层。 导电层由第一介电层分开,并且结构被第二介电层封装。 第一电介质层包括暴露下面的支撑结构的一部分的开放区域,其与接触点将驻留在第二导电层中的那些区域对准。 第一电介质层包括覆盖电介质层,使得在其上表面中限定了与第一导电层的开放区域对准的凹部。 因此,第二导电层位于两个平面中,它们都包括除了第一导电层的平面之外的平面。 可以同时形成多个开口以暴露第一和第二导电层中的接触点。

    Method for connecting an electrical device to a circuit substrate
    2.
    发明授权
    Method for connecting an electrical device to a circuit substrate 失效
    将电气设备连接到电路基板的方法

    公开(公告)号:US06429113B1

    公开(公告)日:2002-08-06

    申请号:US09518447

    申请日:2000-03-03

    IPC分类号: H01L2144

    摘要: A method of making a circuitized substrate for use in an electronic package wherein the substrate, e.g., ceramic, includes more than one conductive layer, e.g., copper, thereon separated by a suitable dielectric material, e.g., polyimide. Each layer includes its own conductive location(s) which are designed for being directly electrically connected, e.g. using solder, to respective contact sites on a semiconductor chip to form part of the final package. Significantly, the resulting package does not include interconnections between the conductive layers at the desired contact locations; these locations, as mentioned, instead being directly connected to the chip.

    摘要翻译: 制造用于电子封装的电路化衬底的方法,其中衬底例如陶瓷包括多于一个的导电层,例如铜,其上由合适的电介质材料(例如聚酰亚胺)分隔开。 每个层包括其自己的导电位置,其被设计用于直接电连接,例如, 使用焊料到半导体芯片上的相应接触部位以形成最终封装的一部分。 显着地,所得到的封装不包括在期望的接触位置处的导电层之间的互连; 这些位置,如上所述,而是直接连接到芯片。

    Method and system of distortion compensation in a projection imaging expose system
    3.
    发明授权
    Method and system of distortion compensation in a projection imaging expose system 有权
    投影成像曝光系统中失真补偿的方法和系统

    公开(公告)号:US06580494B1

    公开(公告)日:2003-06-17

    申请号:US10198383

    申请日:2002-07-16

    IPC分类号: G03B2752

    摘要: A photolithography imaging system and method that performs the tasks of mask alignment, panel recognition, establishing position offsets and adjusting mask rotation for accurate overlay imaging of the mask onto the panel, and correctly adjusting image magnification or reduction to properly size each stepped image to the panel distortion. This invention applies more directly to substrate panels whose dimensional stability is found difficult to control, repeatedly. More specifically, it applies to panels whose X axis distortion factor varies greatly from its Y axis distortion factor and the average adjustment of the image magnification or reduction does not satisfy tight registration requirements. What is new is that the calculation of the magnification or reduction adjustment is based on the mask image dimensions.

    摘要翻译: 一种光刻成像系统和方法,其执行掩模对准,面板识别,建立位置偏移和调整掩模旋转的任务,以将掩模精确地叠加到面板上,并且正确地调整图像放大率或缩小以将每个步进图像适当地调整为 面板扭曲。 本发明更直接地应用于其尺寸稳定性难以控制的衬底面板。 更具体地说,它适用于其X轴失真因子从其Y轴失真因子变化很大的面板,并且图像放大或缩小的平均调整不满足严格的配准要求。 什么是新的是放大或缩小调整的计算是基于掩模图像尺寸。

    Process for fabricating circuitry on substrates having plated
through-holes
    9.
    发明授权
    Process for fabricating circuitry on substrates having plated through-holes 失效
    在具有电镀通孔的基板上制造电路的工艺

    公开(公告)号:US6013417A

    公开(公告)日:2000-01-11

    申请号:US54374

    申请日:1998-04-02

    摘要: Circuitry is formed on a substrate having at least one plated through-hole employing two different photoresist materials. A first photoresist is applied on a conductive layer located on a substrate and is developed to define a desired conductive circuit pattern. A second photoresist is laminated onto the structure and is developed so that the second photoresist material remains in the vicinity of the through-hole. The conductive layer is etched to provide the desired circuit pattern, and the remaining portions of the second and first photoresists are removed.

    摘要翻译: 在具有至少一个使用两种不同光致抗蚀剂材料的电镀通孔的基板上形成电路。 将第一光致抗蚀剂施加在位于衬底上的导电层上,并显影以限定所需的导电电路图案。 将第二光致抗蚀剂层压到结构上并显影,使得第二光致抗蚀剂材料保留在通孔附近。 蚀刻导电层以提供期望的电路图案,并且去除第二和第一光致抗蚀剂的剩余部分。