Process for fabricating circuitry on substrates having plated
through-holes
    4.
    发明授权
    Process for fabricating circuitry on substrates having plated through-holes 失效
    在具有电镀通孔的基板上制造电路的工艺

    公开(公告)号:US6013417A

    公开(公告)日:2000-01-11

    申请号:US54374

    申请日:1998-04-02

    Abstract: Circuitry is formed on a substrate having at least one plated through-hole employing two different photoresist materials. A first photoresist is applied on a conductive layer located on a substrate and is developed to define a desired conductive circuit pattern. A second photoresist is laminated onto the structure and is developed so that the second photoresist material remains in the vicinity of the through-hole. The conductive layer is etched to provide the desired circuit pattern, and the remaining portions of the second and first photoresists are removed.

    Abstract translation: 在具有至少一个使用两种不同光致抗蚀剂材料的电镀通孔的基板上形成电路。 将第一光致抗蚀剂施加在位于衬底上的导电层上,并显影以限定所需的导电电路图案。 将第二光致抗蚀剂层压到结构上并显影,使得第二光致抗蚀剂材料保留在通孔附近。 蚀刻导电层以提供期望的电路图案,并且去除第二和第一光致抗蚀剂的剩余部分。

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