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    Method and apparatus for controlling the output of a gas discharge MOPA laser system
    103.
    发明申请
    Method and apparatus for controlling the output of a gas discharge MOPA laser system 有权

    公开(公告)号：US20050238077A9

    公开(公告)日：2005-10-27

    申请号：US10740659

    申请日：2003-12-18

    申请人： John Rule ,  Paolo Zambon

    发明人： John Rule ,  Paolo Zambon

    IPC分类号： H01S3/134 ,  H01S3/22 ,  H01S3/225 ,  H01S3/23

    CPC分类号： H01S3/225 ,  H01S3/134 ,  H01S3/2258 ,  H01S3/2308 ,  H01S3/2366

    摘要： A method and apparatus are disclosed for controlling the output of a two chamber gas discharge laser comprising an oscillator gas discharge laser and an amplifier gas discharge laser that may comprise establishing a multidimensional variable state space comprising a coordinate system having at least two coordinates, each coordinate comprising a selected variable representing an operating parameter of the oscillator or the amplifier; tracking a multidimensional operating point in the multidimensional variable state space according to the variation of the selected variables in either or both of the oscillator or the amplifier to determine the position of the multidimensional operating point in the multidimensional state space; determining from the position of the multidimensional operating point in the multidimensional operating space a region from a plurality of defined regions in the multidimensional operating space in which the multidimensional operating point is located and identifying the region; based upon the identity of the identified region, and parameters of that region relative to the condition of an actuator in each of the oscillator and the amplifier, determining a necessary modification to the actuator for each of the oscillator and the amplifier to attempt to move the multidimensional operating point from the parameters indicated by the position of the multidimensional operating point being in the particular region to a preselected region in the coordinate system. The method and apparatus may also comprise establishing a multidimensional variable state space comprising a coordinate system having at least two coordinates, each coordinate comprising a selected variable representing an operating parameter of the oscillator or the amplifier; changing the gas mixture in one or both of the oscillator and amplifier by injection of at least one constituent gas in the gas mixture at least part of which injection for the respective oscillator and amplifier is based upon a calculated estimate of consumption of the at least one constituent gas in the gas mixture in the respective oscillator and amplifier from a prior change in the gas mixture; allowing the oscillator and amplifier to operate for a selected period of time with the changed gas mixture; determining the position of an operating point in the multidimensional variable state space and based upon the location of the operating point in the multidimensional state space determining a respective boost factor to modify the calculated estimate of consumption for the current change of the gas mixture in the respective oscillator and amplifier. A third dimension may be added relating to a spectral characteristic of the output of the oscillator or the amplifier, which may be bandwidth of the output of the amplifier, and including modifying that output with a beam correction device.

    Long delay and high TIS pulse stretcher
    104.
    发明授权
    Long delay and high TIS pulse stretcher 有权

    公开(公告)号：US06928093B2

    公开(公告)日：2005-08-09

    申请号：US10712545

    申请日：2003-11-13

    申请人： R. Kyle Webb ,  Scot T. Smith ,  Roy Luoma

    发明人： R. Kyle Webb ,  Scot T. Smith ,  Roy Luoma

    IPC分类号： H01S3/00 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/23 ,  H01S3/10

    CPC分类号： G03F7/7055 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

    摘要： A method and apparatus for laser light pulse stretching is disclosed which may comprise a beam splitter in the path of a laser output light pulse beam; selected to pass a first percent of the energy of a first input pulse of the laser output light pulse beam along a laser output light pulse beam output path as a first output pulse and to reflect a second percent of the energy of the laser output light pulse beam into a first delayed beam; an optical delay path receiving the first delayed beam and returning the first delayed beam to the beam splitter in an orientation such that a third percent of the first delayed beam is reflected into the output path as a second output pulse and a fourth percent is passed into the optical delay path as a second delayed beam; the optical delay path receiving the second delayed beam and returning the second delayed beam to the beam splitter in an orientation such that the third percent of the second delayed beam is reflected into the output path as a third output pulse and the fourth percent of the second delayed beam is passed into the optical delay path as a third delayed beam; the optical delay path receiving the third delayed beam and returning the third delayed beam to the beam splitter in an orientation such that the third percent of the third delayed beam is reflected into the output path as a fourth output pulse; the first input pulse being a first pulse in a plurality of pulses output from a prior pulse stretcher, each of a plurality of succeeding input pulses comprising the output of the prior pulse stretcher resulting from the stretching of a narrow band laser light output pulse, forming successive first, second, third and fourth output pulses, the combination of which forms a pulse stretcher having an output with TIS of at least 200 ns. The optical delay path may be formed of a plurality of at least eight reflecting mirrors and contained in an elongated enclosure having first and second end plates mounting a first group of at least four of the at least eight reflecting mirrors mounted on the first mounting surface symmetrically about a center axis of the optical delay path and a second group of at least four of the at least eight reflecting mirrors mounted on the second mounting surface symmetrically about the center axis. The mirrors may be staggered in a predefined pattern, e.g., a circular pattern. The delay path may lie in a plurality of planes. The apparatus may be part of a laser system, part of a beam delivery system or an interface between the two.

    Resonator arrangement for bandwidth control
    106.
    发明授权
    Resonator arrangement for bandwidth control 失效
    用于带宽控制的谐振器布置

    公开(公告)号：US06856638B2

    公开(公告)日：2005-02-15

    申请号：US10035351

    申请日：2001-10-19

    申请人： Konstantin Aab ,  Juergen Kleinschmidt ,  Peter Lokai ,  Matthias Ulrich

    发明人： Konstantin Aab ,  Juergen Kleinschmidt ,  Peter Lokai ,  Matthias Ulrich

    IPC分类号： H01S3/081 ,  H01S3/106 ,  H01S3/13 ,  H01S3/134 ,  H01S3/136 ,  H01S3/137 ,  H01S3/223 ,  H01S3/225 ,  H01S3/22

    CPC分类号： H01S3/0811 ,  H01S3/106 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/136 ,  H01S3/137 ,  H01S3/223 ,  H01S3/225

    摘要： A line-narrowed excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture at least including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber connected to a discharge circuit for energizing the gas mixture, a resonator including a pair of resonator reflecting surfaces disposed on either side of the discharge chamber for generating a laser beam, and a line-narrowing/selection unit within the resonator for narrowing the bandwidth of the laser beam. The resonator further includes a third reflecting surface which is deformable and disposed between the pair of resonator reflecting surfaces. The line-narrowing/selection unit preferably includes a beam expander and a dispersive element, wherein the deformable third reflecting surface is disposed between the beam expander and the dispersive element.

    摘要翻译： 线狭窄的准分子或分子氟激光系统包括填充有至少包括分子氟和缓冲气体的气体混合物的放电室，放电室内的多个电极连接到用于激励气体混合物的放电电路，包括 一对谐振器反射表面，设置在用于产生激光束的放电室的任一侧上;以及在谐振器内的线窄选择单元，用于使激光束的带宽变窄。 谐振器还包括可变形并设置在该对谐振器反射表面之间的第三反射表面。 线条变窄/选择单元优选地包括光束扩展器和分散元件，其中可变形的第三反射表面设置在光束扩展器和色散元件之间。

    Laser gas replenishment method
    109.
    发明申请
    Laser gas replenishment method 有权
    激光加气方式

    公开(公告)号：US20040252740A1

    公开(公告)日：2004-12-16

    申请号：US10338779

    申请日：2003-01-06

    申请人： Lambda Physik AG.

    发明人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Juergen Kleinschmidt ,  Thomas Schroeder ,  Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Wolfgang Zschocke ,  Sergei Govorkov

    IPC分类号： H01S003/22 ,  H01S003/223

    CPC分类号： G03F7/70025 ,  G02B5/1814 ,  G02B5/1838 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08031 ,  H01S3/08045 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225

    摘要： A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a molecular fluorine component of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is provided at an initial partial pressure and is subject to depletion within the laser discharge chamber. Injections of gas including molecular fluorine are performed each to increase the partial pressure of molecular fluorine by a selected amount in the laser chamber preferably less than 0.2 mbar per injection, or 7% of an amount of F2 already within the laser chamber. A number of successive injections may be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the molecular fluorine in the discharge chamber. The driving voltage is preferably determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.

    摘要翻译： 提供了一种用于通过使用气体供应单元和处理器将激光气体混合物的分子氟成分维持在预定分压来稳定气体放电激光器的输出光束参数的方法和装置。 分子氟以初始分压提供，并在激光放电室内耗尽。 每次喷射包括分子氟的气体，以在激光室中选择的量增加分子氟的分压，优选每次注射小于0.2mbar，或已经在激光室内的F2的量的7％。 可以以选定的间隔执行多次连续喷射，以维持构成气体基本处于初始分压，以维持稳定的输出光束参数。 每次注射量和/或注射间隔可以基于驱动电压的测量值和/或放电室中分子氟的计算量而变化。 驱动电压优选地被确定为基于系统的老化而被调整的多个驱动电压范围之一。 在每个范围内，气体注入和气体替换优选地基于对放电的总施加的电能和/或在时间和/或脉冲计数上进行。

    Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser
    110.
    发明授权
    Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser 失效
    用于补偿由准分子激光器外部的测量系统检测的光束特性漂移的方法和装置

    公开(公告)号：US06822977B1

    公开(公告)日：2004-11-23

    申请号：US10165767

    申请日：2002-06-06

    申请人： Uwe Stamm ,  Hans-Stephan Albrecht ,  Günter Nowinski

    发明人： Uwe Stamm ,  Hans-Stephan Albrecht ,  Günter Nowinski

    IPC分类号： H01S310

    CPC分类号： H01S3/225 ,  H01S3/1305 ,  H01S3/1312 ,  H01S3/134

    摘要： A lithography laser system for incorporating with a semiconductor processing system includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber and connected with a discharge circuit for energizing the laser gas, a resonator including the discharge chamber for generating a laser beam, and a processor. The processor runs an energy control algorithm and sends a signal to the discharge circuit based on said algorithm to apply electrical pulses to the electrodes so that the laser beam exiting the laser system has a specified first energy distribution over a group of pulses. The energy control algorithm is based upon a second energy distribution previously determined of a substantially same pattern of pulses as the group of pulses having the first energy distribution. The second energy distribution is determined for the laser beam at a location after passing the beam through beam shaping optical elements of the semiconductor processing system while a value of the energy of the laser beam exiting the laser system is maintained at an approximately constant first energy.

    摘要翻译： 一种用于与半导体处理系统结合的光刻激光系统包括：填充有分子氟和缓冲气体的激光气体的放电室，放电室内的多个电极，并与用于激励激光气体的放电电路连接，包括 用于产生激光束的放电室和处理器。 处理器运行能量控制算法，并且基于所述算法将信号发送到放电电路，以将电脉冲施加到电极，使得离开激光系统的激光束在一组脉冲上具有规定的第一能量分布。 能量控制算法基于先前确定的具有与具有第一能量分布的脉冲群基本相同的脉冲模式的第二能量分布。 在将光束通过半导体处理系统的光束整形光学元件之后的位置处的激光束确定第二能量分布，同时离开激光系统的激光束的能量的值保持在大致恒定的第一能量。