公开(公告)号：US07223973B2

公开(公告)日：2007-05-29

申请号：US11037084

申请日：2005-01-19

Applicant: Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

Inventor： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC: G01N23/225

CPC classification number: H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

公开(公告)号：US20060231776A1

公开(公告)日：2006-10-19

申请号：US11452378

申请日：2006-06-14

Applicant: Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

Inventor： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

IPC: H01J37/08

CPC classification number: G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A specimen fabrication apparatus including: an ion source, an optical system for irradiating a projection ion beam to a sample, wherein the optical system includes a patterning mask to form a ion beam emitted from the ion source into the projection ion beam, a sample stage to mount the sample, a vacuum specimen chamber to contain the sample stage, a probe for separating a micro-specimen from the sample by irradiation of the projection ion beam, a specimen holder to fix the micro-specimen, wherein the projection ion beam is irradiated to the micro-specimen fixed to the specimen holder and extracted by the probe in the specimen chamber, so that a finish fabrication to the micro-specimen is enabled.

Abstract translation: 一种试样制造装置，包括：离子源，用于将投射离子束照射到样品的光学系统，其中所述光学系统包括图案化掩模，以形成从所述离子源发射到所述投影离子束中的离子束;样品台 安装样品，用于容纳样品台的真空样本室，用于通过照射投影离子束从样品分离微量样本的探针，固定微型样品的样本保持器，其中投影离子束为 照射到固定到样品架上并由探针在样品室中提取的微型样品，使得能够对微型样品进行精加工制造。

公开(公告)号：US06995380B2

公开(公告)日：2006-02-07

申请号：US10801521

申请日：2004-03-12

Applicant: Jørgen Rasmussen

Inventor： Jørgen Rasmussen

IPC: H01J27/20

CPC classification number: H01J37/20 ,  G01N1/04 ,  G01N1/08 ,  G01N1/286 ,  G01N2001/282 ,  H01J2237/2007 ,  H01J2237/204

Abstract: An end effector for supporting a microsample during instrumental analysis, including a generally planar body and a cantilever tip configured to be associated with the microsample.

Abstract translation: 一种末端执行器，用于在仪器分析期间支撑微型样品，包括大致平面的主体和构造成与微型样品相关联的悬臂顶端。

公开(公告)号：US20060022135A1

公开(公告)日：2006-02-02

申请号：US11186073

申请日：2005-07-21

Applicant: Thomas Moore ,  Lyudmilla Zaykova-Feldman

Inventor： Thomas Moore ,  Lyudmilla Zaykova-Feldman

IPC: G21K7/00

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J2237/2005 ,  H01J2237/2006 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/26 ,  H01J2237/262 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: We disclose a gripper and associated apparatus and methods for delivering nano-manipulator probe tips inside a vacuum chamber. The gripper includes a tube; a compression cylinder inside of and coaxial with the tube; and at least one elastic ring adjacent to the compression cylinder. There is a vacuum seal coaxial with the compression cylinder for receiving and sealing against a probe tip. An actuator is connected to the compression cylinder for compressing the elastic ring and causing it to grip the probe tip. Thus the probe tip can be gripped, transferred to a different location in the vacuum chamber, and released there. Samples attached to the probe tips will be transferred to a TEM sample holder, shown in several embodiments, that includes a bar having opposed ends; an arm attached to each opposed end of the bar; one or more slots for receiving a probe tip; and, each slot having an inner part and an outer part, where the inner part is smaller than the outer part. The TEM sample holders just described are inserted into a carrier cassette. A cassette for transferring one or more TEM sample holders comprises a platform; at least one bar extending upwardly from the platform; the bar having a groove for receiving and holding a TEM sample holder. A rotatable magazine holds one or more probe tips and selectively releases the tips. The magazine includes a cartridge having a plurality of longitudinal openings for receiving probe tips and dispensing probe tips.

Abstract translation: 我们公开了一种夹具和相关的装置和方法，用于在真空室内输送纳米机械手探针尖端。 夹具包括管; 压缩缸内部并与管同轴; 以及与压缩圆筒相邻的至少一个弹性环。 存在与压缩筒同轴的真空密封件，用于接收和密封探针尖端。 致动器连接到压缩气缸，用于压缩弹性环并使其夹持探针尖端。 因此，探针尖端可以被夹持，转移到真空室中的不同位置，并在那里释放。 附接到探针尖端的样品将转移到TEM样品保持器，如几个实施方案中所示，其包括具有相对端的棒; 连接到杆的每个相对端的臂; 用于接收探针尖端的一个或多个狭槽; 并且每个狭槽具有内部部分和外部部分，其中内部部分小于外部部分。 刚刚描述的TEM样品架被插入到载体盒中。 用于转移一个或多个TEM样品保持器的盒子包括平台; 从平台向上延伸的至少一个杆; 该棒具有用于容纳和保持TEM样品保持器的凹槽。 一个可旋转刀库可容纳一个或多个探针尖端并选择性地释放尖端。 该盒包括具有多个用于接收探针尖端并分配探针尖端的多个纵向开口的盒。

公开(公告)号：US06960772B1

公开(公告)日：2005-11-01

申请号：US10709961

申请日：2004-06-09

Applicant: Gary J. Johnson ,  David J. Pinckney

Inventor： Gary J. Johnson ,  David J. Pinckney

IPC: H01J37/00

CPC classification number: H01J37/20 ,  H01J2237/2007 ,  H01J2237/30438 ,  H01J2237/31788

Abstract: A carrier for the masks used in Electron Projection Lithography, or other workpieces used in nanotechnology fields, comprises a rectangular frame having a set of four electrostatic chucks in the top surface for holding the mask above a central aperture that has an electron absorber on the bottom for suppressing backscattering; the frame being supported by a bottom carrier that grips the frame with a set of flexures flexible in the z-direction, stiff in an azimuthal direction and flexible in a radial direction.

Abstract translation: 用于电子投影平版印刷术中的掩模的载体或纳米技术领域中使用的其他工件包括在顶表面中具有一组四个静电卡盘的矩形框架，用于将掩模保持在位于底部的电子吸收体的中心孔上方 用于抑制后向散射; 框架由底部托架支撑，该底托架通过在z方向上具有柔性的一组挠曲来夹持框架，在方位角方向上是刚性的并且在径向上是柔性的。

公开(公告)号：US20050087697A1

公开(公告)日：2005-04-28

申请号：US10974953

申请日：2004-10-28

Applicant: Myoung-Rack Lee ,  Sun-Young Lee

Inventor： Myoung-Rack Lee ,  Sun-Young Lee

IPC: H01L21/304 ,  G01N1/28 ,  G01N1/36 ,  H01J37/20

CPC classification number: H01J37/20 ,  G01N1/286 ,  G01N1/36 ,  G01N2001/2866 ,  H01J2237/2007 ,  H01J2237/31745

Abstract: A method of manufacturing a transmission electron microscope inspection sample. The sample is mounted into a recess in the mount and the sample is grinded to a preset target thickness. A recess for mounting the sample and a groove for separating the sample from the recess are formed on a top surface of the mount. The sample is fixed into the recess using mounting wax. The protruding portion of the sample protrudes above the mount and is grinded by the grinder. The depth of the recess is based on the target thickness of the sample. The protruding portion of the sample is grinded to the top surface of the mount.

Abstract translation: 一种制造透射电子显微镜检查样品的方法。 将样品安装到安装座中的凹槽中，并将样品研磨至预设的目标厚度。 用于安装样品的凹部和用于将样品与凹部分离的凹槽形成在安装件的顶表面上。 使用安装蜡将样品固定到凹部中。 样品的突出部分突出于支架上方，并被研磨机研磨。 凹部的深度基于样品的目标厚度。 将样品的突出部分研磨到底座的顶面。

公开(公告)号：US06674077B1

公开(公告)日：2004-01-06

申请号：US09897304

申请日：2001-07-02

Applicant: Brian E. Joseph ,  Elizabeth N. Kraftician

Inventor： Brian E. Joseph ,  Elizabeth N. Kraftician

IPC: G21K700

CPC classification number: H01J37/28 ,  B81C99/005 ,  H01J37/256 ,  H01J2237/2007 ,  H01J2237/2561

Abstract: A novel MEMS assembly and testing system that utilizes a scanning electron microscope (SEM) having 5 axes of freedom as the imaging instrument. Microgrippers or other tools mounted at the end of a linear motion feed through device having a motion resolution of about 10 nanometers are used as the manipulator. All of the assembly features are located inside of a vacuum chamber to permit operation of the SEM imaging system. A variety of other auxiliary devices that support the MEMS assembly and testing system are also included to enhance the capabilities thereof.

Abstract translation: 一种利用具有5轴自由度的扫描电子显微镜（SEM）作为成像仪器的新型MEMS组装和测试系统。 使用安装在直线运动末端的微夹爪或其他工具作为机械手使用具有约10纳米的运动分辨率的装置。 所有组装特征位于真空室内，以允许SEM成像系统的操作。 还包括支持MEMS组装和测试系统的各种其他辅助装置，以增强其功能。

公开(公告)号：US6273958B2

公开(公告)日：2001-08-14

申请号：US32902099

申请日：1999-06-09

Applicant: APPLIED MATERIALS INC

Inventor： SHAMOUILIAN SHAMOUIL ,  KUMAR ANANDA H ,  SALIMIAN SIAMAK ,  DAHIMENE MAHMOUD ,  CHAFIN MICHAEL G ,  GRIMARD DENNIS S

IPC: C23C16/458 ,  H01J37/32 ,  H01L21/00 ,  H01L21/02 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/683 ,  C23C16/00 ,  H05H1/00

CPC classification number: H01L21/67069 ,  H01J37/32559 ,  H01J37/32697 ,  H01J2237/2007 ,  H01L21/6831

Abstract: A support 55 comprises a dielectric 60 covering a primary electrode 70, the dielectric 60 having a surface 75 adapted to receive a substrate 25 and a conduit 160 that extends through the dielectric 60. The thickness of a portion of the dielectric 60 between an edge 195 of the primary electrode 70 and a surface 180 of the conduit 160 is sufficiently large to reduce the incidence of plasma formation in the conduit 160 when the primary electrode 70 is charged by an RF voltage to form a plasma of gas in the chamber 30 during processing of the substrate 25.

Abstract translation: 支撑件55包括覆盖主电极70的电介质60，电介质60具有适于接纳基底25的表面75和延伸穿过电介质60的导管160.电介质60的一部分的厚度在边缘195 的主电极70和导管160的表面180足够大以减小当通过RF电压对初级电极70充电以在处理期间在室30中形成气体等离子体时在管道160中的等离子体形成的入射 的基板25。

公开(公告)号：US6025602A

公开(公告)日：2000-02-15

申请号：US66180

申请日：1998-04-23

Applicant: Peter H. Rose ,  Julian G. Blake ,  Adam A. Brailove ,  Zhongmin Yang ,  Richard F. McRay ,  Barbara J. Hughey

Inventor： Peter H. Rose ,  Julian G. Blake ,  Adam A. Brailove ,  Zhongmin Yang ,  Richard F. McRay ,  Barbara J. Hughey

IPC: H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/30 ,  H01J37/304 ,  H01J37/317 ,  H01L21/00 ,  H01L21/677 ,  H01L21/683 ,  H01J37/20

CPC classification number: H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01L21/67069 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system. According to one practice, the scanning direction and the longitudinal axis form an angle therebetween that is less than or equal to about 85 degrees.

Abstract translation: 一种快速有效地处理大量工件的离子注入系统，如平板显示器。 离子注入系统包括安装离子源的高真空处理室，单个工件平移台和负载锁。 安装在处理室内的单个工件处理组件都将工件从装载锁上移除，并通过由离子源产生的离子束在植入期间支撑工件。 处理室与负载锁组件选择性地流体连通，负载锁组件又与工件加载或终端机械地集成。 另外，工件处理组件包括用于在植入期间沿线性扫描方向平移工件的平移台或元件。 该线性扫描方向沿着与植入系统的水平纵向轴线横向或正交的路径延伸。 根据一个实践，扫描方向和纵向轴线之间形成小于或等于约85度的角度。

公开(公告)号：US5218209A

公开(公告)日：1993-06-08

申请号：US826141

申请日：1992-01-27

Applicant: Kunihiko Takeyama

Inventor： Kunihiko Takeyama

IPC: H01J37/317 ,  H01L21/265 ,  H01L21/683 ,  H01L21/687

CPC classification number: H01L21/68764 ,  H01J37/3171 ,  H01L21/68771 ,  H01J2237/2007

Abstract: An ion implanter for implanting ions into a batch of semiconductor wafers comprises a wafer holding disk of the centrifugal holding type, and a plurality of wafer rests in the wafer holding disk having a wafer holding surface which is conically curved. When the wafer holding disk is rotated, the wafer is pushed onto the wafer holding surface so that the surface of the wafer is curved nearly in the same manner as the conically-curved inner surface of the peripheral portion of the s wafer holding disk As a result, an ion beam being irradiated upon the surface of the wafer is always perpendicular to the surface of the wafer.

Abstract translation: 用于将离子注入一批半导体晶片的离子注入机包括离心保持型晶片保持盘，并且晶片保持盘中的多个晶片托架具有圆锥形弯曲的晶片保持表面。 当晶片保持盘旋转时，晶片被推到晶片保持表面上，使得晶片的表面几乎以与晶片保持盘的周边部分的锥形内表面相同的方式弯曲为 结果，照射在晶片表面上的离子束总是垂直于晶片的表面。