Total internal reflection (TIR) CMOS imager
    159.
    发明授权
    Total internal reflection (TIR) CMOS imager 有权
    全内反射(TIR)CMOS成像仪

    公开(公告)号:US07001795B2

    公开(公告)日:2006-02-21

    申请号:US10373785

    申请日:2003-02-27

    Abstract: The subject invention is directed to use of photoconductors as conductors of light to photo diodes in a CMOS chip, wherein said photoconductors are separated by at least one low refractive index material (i.e. air). The present invention offers advantages over previous CMOS imaging technology, including enhanced light transmission to photo diodes. The instant methods for producing a CMOS imaging device and CMOS imager system involve minimal power loss. Since no lens is required, the invention eliminates concerns about radius limitation and about damaging lenses during die attach, backgrind, and mount. The invention also provides little or no cross talk between photo diodes.

    Abstract translation: 本发明涉及使用光电导体作为CMOS芯片中的光导体的光导体,其中所述光导体由至少一种低折射率材料(即空气)分开。 本发明提供了优于先前CMOS成像技术的优点,包括对光电二极管的增强的光传输。 用于制造CMOS成像装置和CMOS成像器系统的即时方法涉及最小的功率损耗。 由于不需要镜头,本发明消除了对于半径限制以及关于在芯片附着,后研磨和安装期间损坏的透镜的担忧。 本发明还提供了很少或没有光二极管之间的串扰。

    Methods of fabricating integrated circuitry
    160.
    发明申请
    Methods of fabricating integrated circuitry 有权
    集成电路的制造方法

    公开(公告)号:US20060030078A1

    公开(公告)日:2006-02-09

    申请号:US11246755

    申请日:2005-10-07

    Abstract: A substrate including a plurality of integrated circuitry die is fabricated or otherwise provided. The individual die have bond pads. A passivation layer comprising a silicone material is formed over the bond pads. Openings are formed through the silicone material to the bond pads. After the openings are formed, the die are singulated from the substrate. In one implementation, a method of fabricating integrated circuitry includes providing a substrate comprising a plurality of integrated circuitry die. Individual of the die have bond pads. A first blanket passivation layer is formed over the substrate in contact with the bond pads. A different second blanket passivation layer comprising silicone material is formed over the first passivation layer. Openings are formed through the first and second passivation layers to the bond pads. After the openings are formed, the die are singulated from the substrate. Other aspects and implementations are contemplated.

    Abstract translation: 制造或提供包括多个集成电路管芯的基板。 单个模具具有接合垫。 在接合焊盘上形成包含硅酮材料的钝化层。 开口通过硅胶材料形成到接合垫。 在形成开口之后,从衬底上分离裸片。 在一个实现中,制造集成电路的方法包括提供包括多个集成电路管芯的衬底。 模具的个体具有接合垫。 第一覆盖钝化层形成在与接合焊盘接触的衬底上。 包含硅树脂材料的不同的第二覆盖钝化层形成在第一钝化层上。 开口通过第一和第二钝化层形成到接合焊盘。 在形成开口之后,从衬底上分离裸片。 考虑了其他方面和实现。

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