公开(公告)号：US20140116873A1

公开(公告)日：2014-05-01

申请号：US14029368

申请日：2013-09-17

Applicant: FEI Company

Inventor： Jeffrey Blackwood ,  Stacey Stone

IPC: G01N1/32 ,  H01J37/305

CPC classification number: G01N1/28 ,  G01N1/06 ,  G01N1/08 ,  G01N1/32 ,  G01N23/04 ,  H01J37/06 ,  H01J37/18 ,  H01J37/20 ,  H01J37/26 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/063 ,  H01J2237/182 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (

Abstract translation: 一种用于S / TEM样品制备和分析的改进方法和装置。 本发明的优选实施例提供用于TEM样品制备的改进方法，特别是对于小几何（<100nm厚）TEM薄片。 新颖的样品结构和铣削图案的新颖应用允许产生薄至50nm的S / TEM样品，而没有显着的弯曲或翘曲。 本发明的优选实施方案提供了部分或全部自动化TEM样品制备的方法，使TEM样品的创建和分析过程减少劳动密集度，并提高TEM分析的产量和再现性。

公开(公告)号：US20180301319A1

公开(公告)日：2018-10-18

申请号：US16012888

申请日：2018-06-20

Applicant: FEI Company

Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

IPC: H01J37/317 ,  H01J37/305

Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

公开(公告)号：US10026590B2

公开(公告)日：2018-07-17

申请号：US14758466

申请日：2013-12-30

Applicant: FEI Company

Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

IPC: H01J37/317 ,  H01J37/305

Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

公开(公告)号：US09696372B2

公开(公告)日：2017-07-04

申请号：US14432712

申请日：2013-10-04

Applicant: FEI Company

Inventor： Jeffrey Blackwood ,  Sang Hoon Lee ,  Michael Schmidt ,  Stacey Stone ,  Karey Holland

IPC: G01R31/305 ,  G01R31/265 ,  G01N1/28 ,  H01L21/66 ,  G01N1/32 ,  H01J37/30 ,  H01J37/153 ,  G01R31/307 ,  G01R31/28 ,  G01R31/312

CPC classification number: G01R31/2653 ,  G01N1/286 ,  G01N1/32 ,  G01R31/2808 ,  G01R31/2898 ,  G01R31/307 ,  G01R31/312 ,  H01J37/153 ,  H01J37/3005 ,  H01J2237/208 ,  H01J2237/24564 ,  H01J2237/2817 ,  H01J2237/31749 ,  H01L22/14 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Multiple planes within the sample are exposed from a single perspective for contact by an electrical probe. The sample can be milled at a non-orthogonal angle to expose different layers as sloped surfaces. The sloped edges of multiple, parallel conductor planes provide access to the multiple levels from above. The planes can be accessed, for example, for contacting with an electrical probe for applying or sensing a voltage. The level of an exposed layer to be contacted can be identified, for example, by counting down the exposed layers from the sample surface, since the non-orthogonal mill makes all layers visible from above. Alternatively, the sample can be milled orthogonally to the surface, and then tilted and/or rotated to provide access to multiple levels of the device. The milling is preferably performed away from the region of interest, to provide electrical access to the region while minimizing damage to the region.

公开(公告)号：US09653260B2

公开(公告)日：2017-05-16

申请号：US13691270

申请日：2012-11-30

Applicant: FEI Company

Inventor： Paul Keady ,  Brennan Peterson ,  Guus Das ,  Craig Henry ,  Larry Dworkin ,  Jeff Blackwood ,  Stacey Stone ,  Michael Schmidt

IPC: G01N1/32 ,  H01J37/305 ,  C23C14/58 ,  H01J37/28 ,  H01J37/30

CPC classification number: H01J37/3056 ,  C23C14/5833 ,  G01N1/32 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/024 ,  H01J2237/20207 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A method for TEM sample preparation and analysis that can be used in a FIB-SEM system without re-welds, unloads, user handling of the lamella, or a motorized flip stage. The method allows a dual beam FIB-SEM system with a typical tilt stage to be used to extract a sample to from a substrate, mount the sample onto a TEM sample holder capable of tilting, thin the sample using FIB milling, and rotate the sample so that the sample face is perpendicular to an electron column for STEM imaging.

公开(公告)号：US20150330877A1

公开(公告)日：2015-11-19

申请号：US14758150

申请日：2013-12-30

Applicant: FEI COMPANY

Inventor： Michael Schmidt ,  Jeffrey Blackwood ,  Stacey Stone ,  Sang Hoon Lee ,  Ronald Kelley ,  Trevan Landin

IPC: G01N1/32 ,  H01L21/3065

CPC classification number: G01N1/32 ,  G01N1/28 ,  H01L21/30655

Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. An ion beam mills exposes a cross section of the work piece using a bulk mill process. A deposition precursor gas is directed to the sample surface while a small amount of material is removed from the exposed cross section face, the deposition precursor producing a more uniform cross section. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 离子束研磨机使用大量研磨工艺暴露工件的横截面。 沉积前体气体被引导到样品表面，同时少量的材料从暴露的横截面去除，沉积前体产生更均匀的横截面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

公开(公告)号：US09111720B2

公开(公告)日：2015-08-18

申请号：US14572626

申请日：2014-12-16

Applicant: FEI Company

Inventor： Ronald Kelley ,  Michael Moriarty ,  Stacey Stone ,  Jeffrey Blackwood

IPC: G01N23/00 ,  H01J37/305 ,  C23C14/30

CPC classification number: H01J37/3053 ,  B05D3/044 ,  C23C14/30 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/2886 ,  H01J37/265 ,  H01J37/3056 ,  H01J2237/31745 ,  H01J2237/3348 ,  H01L21/02318

Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间，使用带电粒子束沉积将材料沉积到样品上，这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

公开(公告)号：US08912490B2

公开(公告)日：2014-12-16

申请号：US14081947

申请日：2013-11-15

Applicant: FEI Company

Inventor： Ronald Kelley ,  Michael Moriarty ,  Stacey Stone ,  Jeffrey Blackwood

IPC: G01N23/00 ,  B05D3/04 ,  H01J37/305 ,  H01L21/02 ,  G01N1/28

CPC classification number: H01J37/3053 ,  B05D3/044 ,  C23C14/30 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/2886 ,  H01J37/265 ,  H01J37/3056 ,  H01J2237/31745 ,  H01J2237/3348 ,  H01L21/02318

Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

公开(公告)号：US20170256380A1

公开(公告)日：2017-09-07

申请号：US15464307

申请日：2017-03-20

Applicant: FEI Company

Inventor： Valerie Brogden ,  Jeffrey Blackwood ,  Michael Schmidt ,  Dhruti Trivedi ,  Richard J. Young ,  Thomas G. Miller ,  Brian Roberts Routh, JR. ,  Stacey Stone ,  Todd Templeton

IPC: H01J37/302 ,  H01J37/31 ,  H01J37/28 ,  H01J37/285

CPC classification number: H01J37/3023 ,  G01N1/286 ,  G01N2001/2873 ,  H01J37/28 ,  H01J37/285 ,  H01J37/3045 ,  H01J37/31 ,  H01J2237/208 ,  H01J2237/31745

Abstract: Techniques are described that facilitate automated extraction of lamellae and attaching the lamellae to sample grids for viewing on transmission electron microscopes. Some embodiments of the invention involve the use of machine vision to determine the positions of the lamella, the probe, and/or the TEM grid to guide the attachment of the probe to the lamella and the attachment of the lamella to the TEM grid. Techniques that facilitate the use of machine vision include shaping a probe tip so that its position can be readily recognized by image recognition software. Image subtraction techniques can be used to determine the position of the lamellae attached to the probe for moving the lamella to the TEM grid for attachment. In some embodiments, reference structures are milled on the probe or on the lamella to facilitate image recognition.

公开(公告)号：US09384982B2

公开(公告)日：2016-07-05

申请号：US14758043

申请日：2013-12-30

Applicant: FEI Company

Inventor： Sang Hoon Lee ,  Jeffrey Blackwood ,  Stacey Stone

IPC: H01L21/76 ,  H01L21/31 ,  H01L21/469 ,  H01L21/26 ,  H01L21/02 ,  H01L21/285 ,  C23C16/04 ,  H01L21/768

CPC classification number: H01L21/2605 ,  C23C16/045 ,  C23C16/047 ,  H01L21/02115 ,  H01L21/02277 ,  H01L21/0243 ,  H01L21/0262 ,  H01L21/02636 ,  H01L21/28556 ,  H01L21/76879 ,  H01L21/76898

Abstract: A method is provided, along with a corresponding apparatus, for filling a high aspect ratio hole without voids or for producing high aspect ratio structures without voids. A beam having a diameter smaller than the diameter of the hole is directed into the hole to induced deposition beginning in the center region of the hole bottom. After an elongated structure is formed in the hole by the beam-induced deposition, a beam can then be scanned in a pattern at least as large as the hole diameter to fill the remainder of the hole. The high aspect ratio hole can then be cross-sectioned using an ion beam for observation without creating artefacts. When electron-beam-induced deposition is used, the electrons preferably have a high energy to reach the bottom of the hole, and the beam has a low current, to reduce spurious deposition by beam tails.

Abstract translation: 提供了一种方法，连同相应的装置，用于填充没有空隙的高纵横比孔或用于产生没有空隙的高纵横比结构。 直径小于孔直径的梁被引导到孔中以在孔底的中心区域开始诱导沉积。 在通过光束沉积在孔中形成细长结构之后，可以以至少与孔直径一样大的图案扫描光束，以填充孔的其余部分。 然后可以使用离子束对高纵横比孔进行横截面观察而不产生伪影。 当使用电子束感应沉积时，电子优选具有高能量以到达孔的底部，并且光束具有低电流，以减少光束尾部的杂散沉积。