Connection of integrated circuit to a substrate
    13.
    发明授权
    Connection of integrated circuit to a substrate 失效
    将集成电路连接到基板

    公开(公告)号:US06916185B2

    公开(公告)日:2005-07-12

    申请号:US10464429

    申请日:2003-06-18

    摘要: The present invention provides a method of connecting an integrated circuit to a substrate and a corresponding circuit arrangement. Connecting occurs by performing the steps of: providing a main area (HF1) of the integrated circuit (1), which has an electrical contacting region (2), with a mechanical supporting structure (3a, 3b; 33a, 33b, 33c; 43a, 43b, 43c); providing a solderable surface region (5a, 5b; 35a, 35b, 35c; 60a, 60b, 60c) of the mechanical supporting structure (3a, 3b; 33a, 33b, 33c; 43a, 43b, 43c); providing a solderable terminal region (10; 5, 30; 40, 50), which is electrically connected to the electrical contacting region (2), on the main area (HF1) of the integrated circuit (1); providing a main area (HF2) of the substrate (20) with a first soldering region (22′, 23′; 22′, 23′, 22″, 23″), which can be aligned with the solderable surface regions (5a, 5b; 35a, 35b, 35c; 60a, 60b, 60c), and with a second soldering region (22, 23), which can be aligned with the solderable terminal region (10; 5, 30; 40, 50); and simultaneous soldering of the surface regions (5a, 5b; 35a, 35b, 35c; 60a, 60b, 60c) to the first soldering region (22′, 23′; 22′, 23′, 22″, 23″) and of the terminal region (10; 5, 30; 40, 50) to the second soldering region (22, 23).

    摘要翻译: 本发明提供了一种将集成电路连接到基板和相应的电路装置的方法。 通过执行以下步骤进行连接:提供具有电接触区域(2)的集成电路(1)的主区域(HF 1),其具有机械支撑结构(3a,3b; 33a,33b b,33c; 43a,43b,43c); 提供机械支撑结构(3a,3b; 33a,33b,33c)的可焊接表面区域(5a,5b; 35a,35b,35c; 60a,60b,60c) ; 43 a,43 b,43 c); 在所述集成电路(1)的主区域(HF 1)上提供与所述电接触区域(2)电连接的可焊接终端区域(10; 5,30; 40,50) 通过第一焊接区域(22',23'; 22',23',22“,23”)提供基板(20)的主区域(HF 2),其可与可焊接表面区域 (5a,5b; 35a,35b,35c; 60a,60b,60c)以及可与可焊接终端区域(10; ...)对齐的第二焊接区域(22,23) 5,30; 40,50); 以及将所述表面区域(5a,5b; 35a,35b,35c; 60a,60b,60c)同时焊接到所述第一焊接区域(22',23'; 22',23' 22“,23”)和端子区域(10; 5,30; 40,50)连接到第二焊接区域(22,23)。

    Forming a structure on a wafer
    18.
    发明授权
    Forming a structure on a wafer 有权
    在晶圆上形成结构

    公开(公告)号:US06638870B2

    公开(公告)日:2003-10-28

    申请号:US10044136

    申请日:2002-01-10

    IPC分类号: H01L21311

    摘要: A method for fabricating a structure on an integrated circuit (IC) wafer, includes providing a material onto a surface of the wafer and shaping the material to have a shape corresponding to the structure. The method can also include removing a remaining portion of the material, depositing a seed layer onto the wafer and the material, and depositing a photoresist on the wafer. In addition, the method can include depositing a metal layer on top of the seed layer, removing the photoresist, etching the seed layer, and etching the material. The resulting structure is usable as a compression stop, a compliant element or a rerouting layer or a combination thereof.

    摘要翻译: 一种用于在集成电路(IC)晶片上制造结构的方法,包括在晶片的表面上提供材料并使材料成形以具有与该结构相对应的形状。 该方法还可以包括去除材料的剩余部分,将晶种层沉积到晶片和材料上,以及在晶片上沉积光致抗蚀剂。 此外,该方法可以包括在种子层的顶部上沉积金属层,去除光致抗蚀剂,蚀刻种子层和蚀刻材料。 所得到的结构可用作压缩止挡,柔性元件或重路由层或其组合。

    Method for producing an electronic component, especially a memory chip
    19.
    发明授权
    Method for producing an electronic component, especially a memory chip 有权
    用于制造电子部件,特别是存储芯片的方法

    公开(公告)号:US07338843B2

    公开(公告)日:2008-03-04

    申请号:US10477967

    申请日:2002-05-13

    摘要: A method for producing an electronic component, especially a memory chip, using a laser-induced correction to equalize an integrated circuit by means of at least one laser via in a layer at least partially covering the circuit. The component comprises a rewiring of the contact pads. The inventive method comprises the following steps: each laser via is closed by means of a separate covering layer which is to be applied locally; a rewiring extending between the local covering layers is created; the local covering layers are removed; and the laser-induced correction is carried out by means of the open laser vias.

    摘要翻译: 一种用于制造电子部件,特别是存储芯片的方法,其使用激光诱导校正,以至少部分地覆盖电路的层中的至少一个激光通孔来均衡集成电路。 该部件包括接线垫的重新布线。 本发明的方法包括以下步骤:通过局部施加的单独的覆盖层封闭每个激光通孔; 创建在局部覆盖层之间延伸的重新布线; 移除局部覆盖层; 并且通过开放的激光通孔进行激光诱导的校正。