公开(公告)号：US09842832B2

公开(公告)日：2017-12-12

申请号：US15183179

申请日：2016-06-15

Applicant: Intel Corporation

Inventor： Omkar G. Karhade ,  John S. Guzek ,  Johanna M. Swan ,  Christopher J. Nelson ,  Nitin A. Deshpande ,  William J. Lambert ,  Charles A. Gealer ,  Feras Eid ,  Islam A. Salama ,  Kemal Aygun ,  Sasha N. Oster ,  Tyler N. Osborn

IPC: H01L25/16 ,  H01L23/538 ,  H01L25/065 ,  H01L23/00 ,  H01L25/00 ,  H05K1/18

CPC classification number: H01L25/16 ,  H01L23/5383 ,  H01L23/5386 ,  H01L23/5387 ,  H01L24/50 ,  H01L24/86 ,  H01L25/00 ,  H01L25/0655 ,  H01L2224/0405 ,  H01L2224/04105 ,  H01L2224/05568 ,  H01L2224/056 ,  H01L2224/05647 ,  H01L2224/29078 ,  H01L2224/86203 ,  H01L2224/86815 ,  H05K1/185 ,  Y10T29/49155 ,  H01L2924/00014 ,  H01L2924/014

Abstract: A microelectronic package of the present description may comprises a first microelectronic device having at least one row of connection structures electrically connected thereto and a second microelectronic device having at least one row of connection structures electrically connected thereto, wherein the connection structures within the at least one first microelectronic device row are aligned with corresponding connection structures within the at least one second microelectronic device row in an x-direction. An interconnect comprising an interconnect substrate having a plurality of electrically isolated conductive traces extending in the x-direction on a first surface of the interconnect substrate may be attached to the at least one first microelectronic device connection structure row and the at least one second microelectronic device connection structure row, such that at least one interconnect conductive trace forms a connection between a first microelectronic device connection structure and its corresponding second microelectronic device connection structure.

公开(公告)号：US20170301625A1

公开(公告)日：2017-10-19

申请号：US15636117

申请日：2017-06-28

Applicant: Intel Corporation

Inventor： Ravindranath V. Mahajan ,  Christopher J. Nelson ,  Omkar G. Karhade ,  Feras Eid ,  Nitin A. Deshpande ,  Shawna M. Liff

IPC: H01L23/538 ,  H01L23/31 ,  H01L23/367 ,  H01L25/065

CPC classification number: H01L23/5381 ,  H01L21/563 ,  H01L21/568 ,  H01L23/145 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/367 ,  H01L23/3675 ,  H01L23/4334 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/16 ,  H01L24/17 ,  H01L24/19 ,  H01L24/24 ,  H01L24/73 ,  H01L24/81 ,  H01L24/92 ,  H01L25/0657 ,  H01L25/165 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/16265 ,  H01L2224/17181 ,  H01L2224/24145 ,  H01L2224/24245 ,  H01L2224/291 ,  H01L2224/29109 ,  H01L2224/29111 ,  H01L2224/29113 ,  H01L2224/29116 ,  H01L2224/2912 ,  H01L2224/29139 ,  H01L2224/29144 ,  H01L2224/2919 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/73209 ,  H01L2224/73253 ,  H01L2224/73259 ,  H01L2224/73267 ,  H01L2224/81005 ,  H01L2224/92124 ,  H01L2224/92224 ,  H01L2224/92242 ,  H01L2224/92244 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06565 ,  H01L2924/12042 ,  H01L2924/1432 ,  H01L2924/1433 ,  H01L2924/1434 ,  H01L2924/15192 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/19104 ,  H01L2924/014 ,  H01L2924/00 ,  H01L2924/0665

Abstract: Embodiments of the present disclosure are directed towards an integrated circuit (IC) package having first and second dies with first and second input/output (I/O) interconnect structures, respectively. The IC package may include a bridge having first and second electrical routing features coupled to a portion of the first and second I/O interconnect structures, respectively. In embodiments, the first and second electrical routing features may be disposed on one side of the bridge; and third electrical routing features may be disposed on an opposite side. The first and second electrical routing features may be configured to route electrical signals between the first die and the second die and the third electrical routing features may be configured to route electrical signals between the one side and the opposite side. The first die, the second die, and the bridge may be embedded in electrically insulating material. Other embodiments may be described and/or claimed.

公开(公告)号：US20160300824A1

公开(公告)日：2016-10-13

申请号：US15183179

申请日：2016-06-15

Applicant: Intel Corporation

Inventor： Omkar G. Karhade ,  John S. Guzek ,  Johanna M. Swan ,  Christopher J. Nelson ,  Nitin A. Deshpande ,  William J. Lambert ,  Charles A. Gealer ,  Feras Eid ,  Islam A. Salama ,  Kemal Aygun ,  Sasha N. Oster ,  Tyler N. Osborn

IPC: H01L25/16 ,  H01L23/538 ,  H01L23/00 ,  H01L25/065

CPC classification number: H01L25/16 ,  H01L23/5383 ,  H01L23/5386 ,  H01L23/5387 ,  H01L24/50 ,  H01L24/86 ,  H01L25/00 ,  H01L25/0655 ,  H01L2224/0405 ,  H01L2224/04105 ,  H01L2224/05568 ,  H01L2224/056 ,  H01L2224/05647 ,  H01L2224/29078 ,  H01L2224/86203 ,  H01L2224/86815 ,  H05K1/185 ,  Y10T29/49155 ,  H01L2924/00014 ,  H01L2924/014

Abstract: A microelectronic package of the present description may comprises a first microelectronic device having at least one row of connection structures electrically connected thereto and a second microelectronic device having at least one row of connection structures electrically connected thereto, wherein the connection structures within the at least one first microelectronic device row are aligned with corresponding connection structures within the at least one second microelectronic device row in an x-direction. An interconnect comprising an interconnect substrate having a plurality of electrically isolated conductive traces extending in the x-direction on a first surface of the interconnect substrate may be attached to the at least one first microelectronic device connection structure row and the at least one second microelectronic device connection structure row, such that at least one interconnect conductive trace forms a connection between a first microelectronic device connection structure and its corresponding second microelectronic device connection structure.

公开(公告)号：US20250060531A1

公开(公告)日：2025-02-20

申请号：US18938732

申请日：2024-11-06

Applicant: Intel Corporation

Inventor： Omkar G. Karhade ,  Xiaoqian Li ,  Tarek A. Ibrahim ,  Ravindranath Vithal Mahajan ,  Nitin A. Deshpande

IPC: G02B6/122 ,  G02B6/12

Abstract: Photonic packages and device assemblies that include photonic integrated circuits (PICs) coupled to optical lenses on lateral sides of the PICS. An example photonic package comprises a package support, an integrated circuit (IC), an insulating material, a PIC having an active side and a lateral side substantially perpendicular to the active side. At least one optical structure is on the active side. A substantial portion of the active side is in contact with the insulating material, and the PIC is electrically coupled to the package support and to the IC. The photonic package further includes an optical lens coupled to the PIC on the lateral side. In some embodiments, the photonic package further includes an interposer between the PIC or the IC and the package support.

公开(公告)号：US20250006653A1

公开(公告)日：2025-01-02

申请号：US18346108

申请日：2023-06-30

Applicant: Intel Corporation

Inventor： Omkar G. Karhade ,  Nitin A. Deshpande ,  Bhaskar Jyoti Krishnatreya ,  Francisco Maya ,  Siyan Dong ,  Alveera Gill ,  Tan Nguyen ,  Keith E. Zawadzki

IPC: H01L23/544 ,  H01L23/00 ,  H01L25/065

Abstract: An apparatus comprising an integrated circuit device comprising a fiducial area of a first layer, the fiducial area comprising a metal area and a metal free area; and a plurality of zones that are metal free in multiple layers adjacent to the first layer, wherein the zones are defined by a footprint based on the fiducial area of the first layer and a second fiducial area of a second integrated circuit device, the footprint comprising multiple slits.

公开(公告)号：US11923307B2

公开(公告)日：2024-03-05

申请号：US16902958

申请日：2020-06-16

Applicant: Intel Corporation

Inventor： Bai Nie ,  Gang Duan ,  Omkar G. Karhade ,  Nitin A. Deshpande ,  Yikang Deng ,  Wei-Lun Jen ,  Tarek A. Ibrahim ,  Sri Ranga Sai Boyapati ,  Robert Alan May ,  Yosuke Kanaoka ,  Robin Shea McRee ,  Rahul N. Manepalli

IPC: H01L23/538 ,  H01L21/48

CPC classification number: H01L23/5381 ,  H01L21/4857 ,  H01L23/5383 ,  H01L23/5386

Abstract: Disclosed herein are microelectronic structures including bridges, as well as related assemblies and methods. In some embodiments, a microelectronic structure may include a substrate and a bridge.

公开(公告)号：US11887962B2

公开(公告)日：2024-01-30

申请号：US16902927

申请日：2020-06-16

Applicant: Intel Corporation

Inventor： Omkar G. Karhade ,  Nitin A. Deshpande ,  Mohit Bhatia ,  Sairam Agraharam ,  Edvin Cetegen ,  Anurag Tripathi ,  Malavarayan Sankarasubramanian ,  Jan Krajniak ,  Manish Dubey ,  Jinhe Liu ,  Wei Li ,  Jingyi Huang

IPC: H01L23/538 ,  H01L23/00 ,  H01L23/498

CPC classification number: H01L24/30 ,  H01L23/49827 ,  H01L23/5384 ,  H01L24/17 ,  H01L2224/1703

Abstract: Disclosed herein are microelectronic structures including bridges, as well as related assemblies and methods. In some embodiments, a microelectronic structure may include a substrate and a bridge.

公开(公告)号：US20240006332A1

公开(公告)日：2024-01-04

申请号：US17856801

申请日：2022-07-01

Applicant: Intel Corporation

Inventor： Dimitrios Antartis ,  Nitin A. Deshpande ,  Siyan Dong ,  Omkar Karhade ,  Gwang-soo Kim ,  Shawna Liff ,  Siddhartha Mal ,  Debendra Mallik ,  Khant Minn ,  Haris Khan Niazi ,  Arnab Sarkar ,  Yi Shi ,  Botao Zhang

IPC: H01L23/544 ,  H01L23/00 ,  H01L23/48

CPC classification number: H01L23/544 ,  H01L24/08 ,  H01L23/481 ,  H01L2224/08145 ,  H01L2223/54426

Abstract: An integrated circuit (IC) device comprises a host component and an IC die directly bonded to the host component. The IC die comprises a substrate material layer and a die metallization level between the substrate material layer and host component. The IC die includes an upper die alignment fiducial between the die metallization level and host component. The upper die alignment fiducial at least partially overlaps one or more metallization features within the die metallization level. In embodiments, at least two orthogonal edges of the upper die alignment fiducial do not overlap any of the metallization features within the die metallization level. In embodiments, the IC die includes a lower die alignment fiducial between the substrate material layer and the die metallization level. The lower die alignment fiducial may at least partially overlap one or more second metallization features within a second die metallization level of the IC die.

公开(公告)号：US20230420409A1

公开(公告)日：2023-12-28

申请号：US17846086

申请日：2022-06-22

Applicant: Intel Corporation

Inventor： Sagar Suthram ,  Omkar G. Karhade ,  Ravindranath Vithal Mahajan ,  Debendra Mallik ,  Nitin A. Deshpande ,  Pushkar Sharad Ranade ,  Wilfred Gomes ,  Abhishek A. Sharma ,  Tahir Ghani ,  Anand S. Murthy ,  Joshua Fryman ,  Stephen Morein ,  Matthew Adiletta ,  Michael Crocker ,  Aaron Gorius

IPC: H01L25/065 ,  H01L23/00 ,  H01L23/522

CPC classification number: H01L25/0652 ,  H01L24/08 ,  H01L23/5226 ,  H01L24/94 ,  H01L2224/80896 ,  H01L24/80 ,  H01L2224/08145 ,  H01L2224/80895 ,  H01L24/97

Abstract: Embodiments of an integrated circuit (IC) die comprise: a first region having a first surface and a second surface, the first surface being orthogonal to the second surface; and a second region attached to the first region along a planar interface that is orthogonal to the first surface and parallel to the second surface, the second region having a third surface coplanar with the first surface. The first region comprises: a dielectric material; layers of conductive traces in the dielectric material, each layer of the conductive traces being parallel to the second surface such that the conductive traces are orthogonal to the first surface; conductive vias through the dielectric material; and bond-pads on the first surface, the bond-pads comprising portions of the conductive traces exposed on the first surface, and the second region comprises a material different from the dielectric material.

公开(公告)号：US20230299049A1

公开(公告)日：2023-09-21

申请号：US17699028

申请日：2022-03-18

Applicant: Intel Corporation

Inventor： Nitin A. Deshpande ,  Omkar G. Karhade ,  Mohit Bhatia ,  Debendra Mallik

IPC: H01L25/065 ,  H01L23/00 ,  H01L23/48 ,  H01L21/768 ,  H01L23/498 ,  H01L23/31 ,  H01L21/56 ,  H01L25/00

CPC classification number: H01L25/0657 ,  H01L24/16 ,  H01L23/481 ,  H01L24/32 ,  H01L21/76898 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/3128 ,  H01L21/565 ,  H01L25/50 ,  H01L2224/16225 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2224/32225 ,  H01L2224/16145 ,  H01L2224/0401

Abstract: A microelectronic component and a method of forming same. The microelectronic component includes: a first substrate having first through vias therein, the first substrate including silicon or glass; a first layer on a front surface of the first substrate and including one or more first dies coupled to the first through vias; a second substrate on a front surface of first layer and having second through vias therein and including silicon or glass; a second layer on a front surface of the second substrate, the first layer between the first substrate and the second substrate, the second layer including one or more second dies coupled to the second through vias; and electrically conductive structures on a back surface of the first substrate coupled to the first through vias.