利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

31 条记录 (耗时 0.038 秒)

    Process for recovering high boiling solvents from a photolithographic waste stream comprising less than 10 percent by weight monomeric units
    16.
    发明授权
    Process for recovering high boiling solvents from a photolithographic waste stream comprising less than 10 percent by weight monomeric units 有权
    从包含少于10重量％单体单元的光刻废料流中回收高沸点溶剂的方法

    公开(公告)号：US5994597A

    公开(公告)日：1999-11-30

    申请号：US188006

    申请日：1998-11-06

    申请人： Anilkumar C. Bhatt ,  Jerome J. Wagner

    发明人： Anilkumar C. Bhatt ,  Jerome J. Wagner

    IPC分类号： C07C29/80 ,  C07C69/96 ,  C07D307/33 ,  C07D317/36

    CPC分类号： C07C29/80

    摘要： A method of recovering solvents from an impure effluent stream of an industrial process. The effluent waste stream contains less than about 10 percent by weight of monomeric units that are reacted to form larger oligomers and polymers. The waste stream contains dissolved polymers, polymeric particles, and the hydrolysis, oxidation and/or other decomposition products of one of the solvents. In one embodiment, the first step involves filtering particulate matter from the waste stream. In another embodiment, the filtering step is omitted. The filtered or unfiltered waste stream is fed to a first separation stage for separation into (i) a gaseous stream of water, soluble gases, and volatile contaminants and (ii) a suspension comprising the solvent, water, semi-volatile and non-volatile contaminants, and photoresist products. Following the first separation stage, the dewatered solvent-containing suspension is either distilled or evaporated to separate the solvent from photoresist products and other non-volatile contaminants. Then the solvent-containing suspension is separated into (i) a solvent vapor fraction which contains solvent and semi-volatile contaminants such as plasticizers and monomers, and (ii) a sludge fraction which contains non-volatile contaminants such as polymer and benzoic acid. Thereafter, the solvent vapor fraction is fed into a vapor stripper to strip the semi-volatile contaminants from the solvent vapor fraction using an organic solvent as a mass transfer medium. This removes the semi-volatiles from the solvent-containing vapor fraction and produces a solvent vapor fraction that is essentially pure.

    摘要翻译： 从工业过程不纯的流出物流中回收溶剂的方法。 流出物废物流含有小于约10重量％的单体单元，其被反应形成较大的低聚物和聚合物。 废物流含有溶解的聚合物，聚合物颗粒以及其中一种溶剂的水解，氧化和/或其它分解产物。 在一个实施方案中，第一步骤涉及从废物流中过滤颗粒物质。 在另一个实施例中，省略了过滤步骤。 过滤或未过滤的废物流被送入第一分离阶段以分离为（i）气态的水，可溶性气体和挥发性污染物流，和（ii）包含溶剂，水，半挥发性和非挥发性的悬浮液 污染物和光致抗蚀剂产品。 在第一分离阶段之后，将脱水的含溶剂的悬浮液蒸馏或蒸发以将溶剂与光致抗蚀剂产物和其它非挥发性污染物分离。 然后将含溶剂的悬浮液分离成（i）含有溶剂和半挥发性污染物如增塑剂和单体的溶剂蒸汽馏分，和（ii）含有非挥发性污染物如聚合物和苯甲酸的污泥馏分。 此后，将溶剂蒸气馏分送入蒸汽汽提器中，以使用有机溶剂作为传质介质从溶剂蒸气馏分中分离出半挥发性污染物。 这从含溶剂的蒸汽馏分中除去半挥发物，并产生基本上纯的溶剂蒸气馏分。

    Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol
    17.
    发明授权
    Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol 失效
    用于处理含有抗蚀剂或焊接掩模和γ-丁内酯或苄醇的光刻显影剂和汽提废料流的方法

    公开(公告)号：US5571417A

    公开(公告)日：1996-11-05

    申请号：US365088

    申请日：1994-12-28

    申请人： Anilkumar C. Bhatt ,  Gary S. Ksenak ,  Kostas I. Papathomas ,  James A. Shurtleff ,  Jerome J. Wagner

    发明人： Anilkumar C. Bhatt ,  Gary S. Ksenak ,  Kostas I. Papathomas ,  James A. Shurtleff ,  Jerome J. Wagner

    IPC分类号： G03F7/32 ,  G03F7/42 ,  C02F3/02

    CPC分类号： G03F7/422 ,  G03F7/325 ,  G03F7/425 ,  Y10S210/908 ,  Y10S210/909

    摘要： A method is disclosed for using the simple, environmentally-friendly organic compounds gamma-butyrolactone and benzyl alcohol to develop and to strip free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and Vacrel photoresists. In all cases the developers and strippers include gamma butyrolactone or benzyl alcohol. The developers and strippers optionally also include a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water. During development of the photopatterned resist or solder mask, the unpolymerized regions are dissolved in the disclosed developers. During stripping of the resist or solder mask, the polymerized regions are debonded from a circuit board in the disclosed strippers. Following removal of the developers and strippers, any residual monomers or polymers of the resist or solder mask as well as residual developing solution and stripping solution are rinsed from the printed circuit package. A method is also disclosed for treating the combined developer and stripper rinse effluents in an activated biomass to reduce the biological oxygen demand of the developer/stripper/resist/solder mask waste streams.

    摘要翻译： 公开了一种使用简单的，环境友好的有机化合物γ-丁内酯和苄醇来开发和剥离自由基引发的可加成聚合抗蚀剂，阳离子固化的抗蚀剂和焊接掩模和Vacrel光致抗蚀剂的方法。 在所有情况下，显影剂和脱模剂包括γ-丁内酯或苄醇。 显影剂和脱模剂任选地还包括少量甲醇，乙醇，异丙醇，丙二醇单甲基乙酸酯，乙二醇单甲醚，甲酰胺，硝基甲烷，环氧丙烷或甲基乙基酮，丙酮和水。 在光刻图案的抗蚀剂或焊接掩模的显影期间，未聚合的区域溶解在所公开的显影剂中。 在剥离抗蚀剂或焊接掩模期间，聚合区域从公开的剥离器中的电路板脱粘。 在除去显影剂和剥离剂之后，从印刷电路封装中冲洗抗蚀剂或焊料掩模的任何残留单体或聚合物以及残留的显影溶液和剥离溶液。 还公开了一种用于处理活性生物质中的组合的显影剂和汽提漂洗废液以减少显影剂/汽提器/抗蚀剂/阻燃剂/焊料掩模废物流的生物需氧量的方法。

    Methyl chloroform-free desmear process in additive circuitization
    18.
    发明授权
    Methyl chloroform-free desmear process in additive circuitization 失效
    甲基无氯化除垢工艺的加成电路

    公开(公告)号：US5311660A

    公开(公告)日：1994-05-17

    申请号：US15742

    申请日：1993-02-10

    申请人： Warren A. Alpaugh ,  Anilkumar C. Bhatt ,  Michael J. Canestaro ,  Robert J. Day ,  Edmond O. Fey ,  John E. Larrabee

    发明人： Warren A. Alpaugh ,  Anilkumar C. Bhatt ,  Michael J. Canestaro ,  Robert J. Day ,  Edmond O. Fey ,  John E. Larrabee

    IPC分类号： H05K3/26 ,  H05K3/00 ,  H05K3/42 ,  H01K3/10

    CPC分类号： H05K3/0055 ,  H05K2203/0783 ,  H05K2203/0789 ,  H05K2203/0796 ,  H05K2203/081 ,  H05K2203/088 ,  Y10T29/49165

    摘要： Disclosed is a method of drilling, desmearing, and additively circuitizing a printed circuit board. The printed circuit board is drilled under conditions which produce glass and polymer smeared vias and through holes. The particulate debris is removed by vapor blasting the drilled printed circuit board. Next the printed circuit board is soaked in a solvent to swell the drill smear on the circuit interplanes of the printed circuit board. This solvent is then removed by entrainment in a gas, and a stream of an aqueous, acidic, oxidizing solution is passed through the printed circuit board holes to remove swollen smear in the thru holes and produce an etchback of conductors. After a water rinse an aqueous reducing solution is passed through the printed circuit board to reduce and remove aqueous acidic oxidizing solution, e.g., residual aqueous acid oxidizing solution. The printed circuit board is rinsed to remove the aqueous reducing solution. The surface of the printed circuit board is then seeded, the intended circuitization is photolithographically defined on the printed circuit board, and the circuitization, including the surface circuitization and the plated through hole circuitization, is additively plated.

    摘要翻译： 公开了一种对印刷电路板进行钻孔，去除和附加电路化的方法。 印刷电路板在产生玻璃和聚合物涂抹通孔和通孔的条件下钻孔。 通过对钻孔的印刷电路板进行蒸气喷射除去颗粒物。 接下来，将印刷电路板浸泡在溶剂中以使印刷电路板的电路插板上的钻头污迹膨胀。 然后通过夹带在气体中除去该溶剂，并且将水性，酸性氧化溶液流通过印刷电路板孔，以除去通孔中的溶胀污迹并产生导体回蚀。 在水冲洗之后，将水性还原溶液通过印刷电路板以减少并除去酸性氧化性水溶液，例如残留的酸性水溶液。 漂洗印刷电路板以除去还原水溶液。 然后将印刷电路板的表面接种，将预期的电路光刻地定义在印刷电路板上，并且包括表面电路化和电镀通孔电路的电路被附加电镀。