公开(公告)号：US07838842B2

公开(公告)日：2010-11-23

申请号：US11268005

申请日：2005-11-07

Applicant: Thomas N. Horsky

Inventor： Thomas N. Horsky

IPC: H01J27/00 ,  H05B31/26

CPC classification number: C23C14/48 ,  H01J27/026 ,  H01J27/08 ,  H01J27/205 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0815 ,  H01J2237/082 ,  H01J2237/0827 ,  H01J2237/31701 ,  H01L21/265 ,  H01L21/26513 ,  H01L21/2658 ,  H01L21/823814

Abstract: An ion source is disclosed for providing a range of ion beams consisting of either ionized clusters, such as B2Hx+, B5Hx+, B10Hx+, B18Hx+, P4+ or As4+, or monomer ions, such as Ge+, In+, Sb+, B+, As+, and P+, to enable cluster implants and monomers implants into silicon substrates for the purpose of manufacturing CMOS devices, and to do so with high productivity. The range of ion beams is generated by a universal ion source in accordance with the present invention which is configured to operate in two discrete modes: an electron impact mode, which efficiently produces ionized clusters, and an arc discharge mode, which efficiently produces monomer ions.

Abstract translation: 公开了一种离子源，用于提供由诸如B 2 H x +，B 5 H x +，B 10 H x +，B 18 H x +，P 4 +或As 4+的离子化簇或诸如Ge +，In +，Sb +，B +，As +和P + ，以使集群植入物和单体植入物进入硅衬底以制造CMOS器件，并以高生产率进行。 离子束的范围由根据本发明的通用离子源产生，其被配置为以两种离散模式操作：电子冲击模式，其有效地产生离子簇，以及电弧放电模式，其有效地产生单体离子 。

公开(公告)号：US20080230714A1

公开(公告)日：2008-09-25

申请号：US11689572

申请日：2007-03-22

Applicant: Scott Lane

Inventor： Scott Lane

IPC: H01J27/02

CPC classification number: H01J37/3053 ,  H01J27/026 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0812 ,  H01J2237/0825

Abstract: Embodiments of a gas cluster ion beam apparatus and methods for forming a gas cluster ion beam using a low-pressure process source are generally described herein. In one embodiment, the low-pressure process source is mixed with a high-pressure diluent source in a static pump to form a mixed source, from which a gas cluster jet is generated and ionized to form the gas cluster ion beam. Other embodiments may be described and claimed.

Abstract translation: 气体簇离子束装置的实施例和使用低压处理源形成气体簇离子束的方法在本文中一般地被描述。 在一个实施方案中，将低压过程源与静压泵中的高压稀释剂源混合以形成混合源，产生气体簇射流并离子化以形成气体团簇离子束。 可以描述和要求保护其他实施例。

公开(公告)号：US20080149826A1

公开(公告)日：2008-06-26

申请号：US11615290

申请日：2006-12-22

Applicant: Anthony RENAU ,  Joseph C. Olson ,  Jonathan Gerald England

Inventor： Anthony RENAU ,  Joseph C. Olson ,  Jonathan Gerald England

IPC: H01J27/02 ,  H01J27/08

CPC classification number: H01J27/026 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/006 ,  H01J2237/0812 ,  H01J2237/15

Abstract: Techniques for providing a ribbon-shaped gas cluster ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for providing a ribbon-shaped gas cluster ion beam. The apparatus may comprise at least one nozzle configured to inject a source gas at a sufficient speed into a low-pressure vacuum space to form gas clusters. The apparatus may also comprise at least one ionizer that causes at least a portion of the gas clusters to be ionized. The apparatus may further comprise a beam-shaping mechanism that forms a ribbon-shaped gas cluster ion beam based on the ionized gas clusters.

Abstract translation: 公开了提供带状气体簇离子束的技术。 在一个特定的示例性实施例中，可以将技术实现为用于提供带状气体簇离子束的装置。 该装置可以包括至少一个喷嘴，其构造成以足够的速度将源气体注入到低压真空空间中以形成气体团。 该装置还可以包括使至少一部分气体簇被离子化的至少一个离子发生器。 该装置还可以包括基于离子化气体簇形成带状气体团簇离子束的束形成机构。

公开(公告)号：US20070085000A1

公开(公告)日：2007-04-19

申请号：US11581574

申请日：2006-10-17

Applicant: Osamu Furuhashi ,  Kiyoshi Ogawa

Inventor： Osamu Furuhashi ,  Kiyoshi Ogawa

IPC: H01J49/00

CPC classification number: H01J49/005 ,  H01J27/026

Abstract: The present invention provides a mass spectrometer capable of breaking even a sample molecule having a large molecular weight by a CID process. In an embodiment of the present invention, the mass spectrometer includes an ionizing source 10 for turning a sample into ions, mass-separating sections 40 and 60 for mass-separating the sample ions, a detecting section 20 for detecting the mass-separated ions, and a collision section (collision cell) 51 located on an ion path extending from the ionizing source 10 through the mass-separating sections 40 and 60 to the detecting section 20. It also includes a cluster generator 30 for producing clusters of atoms or molecules. The clusters produced by the cluster generator 30 are introduced into the collision cell 51. The use of the clusters having a huge mass as the target gas in the CID process enables the collision energy of the sample ions to be efficiently assigned to the breaking of the ions.

Abstract translation: 本发明提供一种能够通过CID方法破坏甚至具有大分子量的样品分子的质谱仪。 在本发明的一个实施例中，质谱仪包括用于将样品转换成离子的电离源10，用于质量分离样品离子的质量分离部分40和60;用于检测质量分离的离子的检测部分20， 以及位于从电离源10经由质量分离部40,60延伸到检测部20的离子路径上的碰撞部（碰撞单元）51。 它还包括用于产生原子或分子簇的簇生成器30。 由簇发生器30产生的簇被引入到碰撞单元51中。 在CID过程中使用具有巨大质量的簇作为目标气体使得能够有效地将样品离子的碰撞能量分配给离子的断裂。

公开(公告)号：US20060097645A1

公开(公告)日：2006-05-11

申请号：US11268005

申请日：2005-11-07

Applicant: Thomas Horsky

Inventor： Thomas Horsky

IPC: H01J7/24

CPC classification number: C23C14/48 ,  H01J27/026 ,  H01J27/08 ,  H01J27/205 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0815 ,  H01J2237/082 ,  H01J2237/0827 ,  H01J2237/31701 ,  H01L21/265 ,  H01L21/26513 ,  H01L21/2658 ,  H01L21/823814

Abstract: An ion source is disclosed for providing a range of ion beams consisting of either ionized clusters, such as B2Hx+, B5Hx+, B10Hx+, B18Hx+, P4+ or As4+, or monomer ions, such as Ge+, In+, Sb+, B+, As+, and P+, to enable cluster implants and monomers implants into silicon substrates for the purpose of manufacturing CMOS devices, and to do so with high productivity. The range of ion beams is generated by a universal ion source in accordance with the present invention which is configured to operate in two discrete modes: an electron impact mode, which efficiently produces ionized clusters, and an arc discharge mode, which efficiently produces monomer ions.

Abstract translation: 公开了一种离子源，用于提供由离子簇组成的一系列离子束，例如B 2 H 2，H 2，SUP 2 +，/ B 2， > 5 + ，B 或B 1，B 3，B 3，...，...，...， 或者单体离子，例如Ge +，Sb +，Sb +，Sb + 为了使集群植入物和单体植入物进入硅衬底以制造CMOS器件，以及 以高生产力这样做。 离子束的范围由根据本发明的通用离子源产生，其被配置为以两种离散模式操作：电子冲击模式，其有效地产生离子簇，以及电弧放电模式，其有效地产生单体离子 。

公开(公告)号：US20010054686A1

公开(公告)日：2001-12-27

申请号：US09811904

申请日：2001-03-19

Inventor： Richard P. Torti ,  Matthew C. Gwinn ,  Jerald P. Dykstra

IPC: H01J049/00 ,  B01D059/44

CPC classification number: H01J49/10 ,  H01J27/026 ,  H01J49/0422 ,  H01J2237/0812 ,  H01J2237/24485

Abstract: A detector apparatus and its use for cluster ion beam diagnostics are described. The detector has a Faraday cup with a conductance path to a gas pressure detector and a conductance to the detector exit. The detector acquires ion current, which is a measure of the ion beam flux, and also acquires mass flux, through a pressure measurement. The pressure measurement responds to the mass of dissociated gas clusters and is combined with information about instantaneous ion current to estimate mean gas cluster ion size ({overscore (N)}i).

Abstract translation: 描述了一种检测器装置及其用于群集离子束诊断的用途。 检测器具有法拉第杯，其具有通向气体压力检测器的电导路径和对检测器出口的电导。 检测器获取离子电流，其是离子束通量的量度，并且还通过压力测量获得质量通量。 压力测量响应于解离的气体团簇的质量，并与关于瞬时离子电流的信息相结合以估计平均气体团簇离子大小（{overscore（N）} i）。

公开(公告)号：US4737637A

公开(公告)日：1988-04-12

申请号：US920020

申请日：1986-10-15

Applicant: Wolfgang Knauer

Inventor： Wolfgang Knauer

IPC: H01J37/05 ,  H01J49/10 ,  H01J49/26 ,  H01J49/28 ,  H01J49/40 ,  H01J49/48

CPC classification number: H01J49/282 ,  H01J27/026 ,  H01J37/05 ,  H01J37/305 ,  H01J2237/053 ,  H01J2237/057

Abstract: An apparatus for producing a beam of ionized clusters, having a cluster source and an ionizer, includes an electrostatic mass separator which permits only those clusters having a mass greater than a selected value to pass. Unclustered ions and clusters of smaller size are reflected and do not reach the substrate target. The mass separator has a retarding field electrode and an entrance electrode, both in the form of grids with the grid openings aligned. Use of a second electrostatic mass separator allows selection of a narrow range of cluster masses for acceleration against the substrate.

Abstract translation: 用于制造具有簇源和离子发生器的离子簇束的装置包括仅允许质量大于所选值的那些簇通过的静电质量分离器。 较小尺寸的非聚集离子和簇被反射并​​且不到达底物靶。 质量分离器具有延迟场电极和入口电极，两者都是栅格形式，网格开口对准。 使用第二静电质量分离器允许选择较小范围的团簇质量以加速抵靠衬底。

公开(公告)号：US09735019B2

公开(公告)日：2017-08-15

申请号：US14842416

申请日：2015-09-01

Applicant: TEL Epion Inc.

Inventor： Michael Graf ,  Noel Russell ,  Matthew C. Gwinn ,  Allen J. Leith

IPC: H01L21/3065 ,  H01L27/02 ,  H01J37/305 ,  H01L21/311 ,  H01J27/02 ,  H01L21/3213 ,  H01J37/317

CPC classification number: H01L21/3065 ,  H01J27/026 ,  H01J37/317 ,  H01J2237/006 ,  H01J2237/0812 ,  H01J2237/16 ,  H01J2237/31732 ,  H01J2237/3174 ,  H01L21/31116 ,  H01L21/32136

Abstract: A beam processing system and method of operating are described. In particular, the beam processing system includes a beam source having a nozzle assembly that is configured to introduce a primary gas through the nozzle assembly to a vacuum vessel in order to produce a gaseous beam, such as a gas cluster beam, and optionally, an ionizer positioned downstream from the nozzle assembly, and configured to ionize the gaseous beam to produce an ionized gaseous beam. The beam processing system further includes a process chamber within which a substrate is positioned for treatment by the gaseous beam, and a secondary gas source, wherein the secondary gas source includes a secondary gas supply system that delivers a secondary gas, and a secondary gas controller that operatively controls the flow of the secondary gas injected into the beam processing system downstream of the nozzle assembly.

公开(公告)号：US09663862B2

公开(公告)日：2017-05-30

申请号：US14932038

申请日：2015-11-04

Applicant: JAPAN AVIATION ELECTRONICS INDUSTRY, LIMITED

Inventor： Akinobu Sato ,  Akiko Suzuki ,  Emmanuel Bourelle ,  Jiro Matsuo ,  Toshio Seki

IPC: H01J27/00 ,  C23F4/00 ,  H01J27/02 ,  H01J37/20 ,  H01J37/305 ,  H01J37/317 ,  H01L21/3065

CPC classification number: C23F4/00 ,  H01J27/026 ,  H01J37/20 ,  H01J37/3053 ,  H01J37/317 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01L21/3065

Abstract: A method of smoothing a solid surface with a gas cluster ion beam includes irradiating the solid surface with the gas cluster ion beam. The irradiating includes, when scratches which can be likened to a line-and-space pattern structure with widths and heights on the order of a submicrometer to micrometer are present on the solid surface, a process of emitting the gas cluster ion beam so as to expose substances, which remain on side-walls of the scratches due to lateral transferal caused by collisions with gas clusters, to other gas clusters, and the gas cluster ion beam diverges non-concentrically and/or non-uniformly.

公开(公告)号：US09478388B2

公开(公告)日：2016-10-25

申请号：US13823499

申请日：2011-10-10

Applicant: Bryan Barnard

Inventor： Bryan Barnard

IPC: H01J37/08 ,  H01J27/02 ,  H01J49/14 ,  H01J37/05 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J27/026 ,  H01J37/05 ,  H01J37/3171 ,  H01J49/142 ,  H01J2237/057 ,  H01J2237/0812 ,  H01J2237/0827

Abstract: A method of processing one or more surfaces is provided, comprising: providing a switchable ion gun which is switchable between a cluster mode setting for producing an ion beam substantially comprising ionized gas clusters for irradiating a surface and an atomic mode setting for producing an ion beam substantially comprising ionized gas atoms for irradiating a surface; and selectively operating the ion gun in the cluster mode by mass selecting ionized gas clusters using a variable mass selector thereby irradiating a surface substantially with ionized gas clusters or the atomic mode by mass selecting ionized gas atoms using a variable mass selector thereby irradiating a surface substantially with ionized gas atoms. Also provided is a switchable ion gun comprising: a gas expansion nozzle for producing gas clusters; an ionization chamber for ionizing the gas clusters and gas atoms; and a variable (preferably a magnetic sector) mass selector for mass selecting the ionized gas clusters and ionized gas atoms to produce an ion beam variable between substantially comprising ionized gas clusters and substantially comprising ionized gas atoms. Preferably, the gun comprises an electrically floating flight tube for adjusting the energy of the ions while within the mass selector.

Abstract translation: 提供一种处理一个或多个表面的方法，包括：提供可切换离子枪，其可在用于产生基本上包括用于照射表面的电离气体簇的离子束的簇模式设置和用于产生离子束的原子模式设置之间切换 基本上包括用于照射表面的电离气体原子; 并且通过使用可变质量选择器大量选择离子化气体簇来选择性地操作离子枪，由此通过使用可变质量选择器大量选择电离气体原子，基本上用离子化气体簇或原子模式照射表面，从而基本上照射表面 与电离气体原子。 还提供了一种可切换离子枪，包括：用于产生气体团的气体膨胀喷嘴; 用于电离气团和气原子的电离室; 以及用于质量选择电离气体团簇和离子化气体原子以产生基本上包括电离气体簇并且基本上包含电离气体原子的离子束可变的变量（优选磁性扇形体）选择器。 优选地，枪包括电浮动飞行管，用于在质量选择器内调节离子的能量。