公开(公告)号：US20180286653A1

公开(公告)日：2018-10-04

申请号：US15471507

申请日：2017-03-28

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Frank Sinclair ,  Joseph C. Olson ,  Costel Biloiu ,  Alexandre Likhanskii ,  Peter F. Kurunczi

IPC: H01J49/06 ,  H01J49/40 ,  H01J49/10

CPC classification number: H01J49/061 ,  H01J37/05 ,  H01J37/3171 ,  H01J49/10 ,  H01J49/22

Abstract: An electrodynamic mass analysis system which has the capability of filtering unwanted species from an extracted ion beam without the use of a mass analyzer magnet is disclosed. The electrodynamic mass analysis system includes an ion source and an electrode disposed outside the ion source. The ion source and the electrode are biased relative to one another so as to emit pulses of ions. Each of these pulses enters a tube where each ion travels at a speed related to its mass. Thus, ions of the same mass travel in clusters through the tube. Ions reach the distal end of the tube separated temporally and spatially from one another based on their mass. The ions then enter a deflector, which is energized so as to allow the cluster of ions having the desired mass to pass through a resolving aperture disposed at the exit of the deflector.

公开(公告)号：US20180190468A1

公开(公告)日：2018-07-05

申请号：US15909482

申请日：2018-03-01

Applicant: Exogenesis Corporation

Inventor： Joseph Khoury ,  Sean R. Kirkpatrick ,  Michael J. Walsh ,  James G. Bachand ,  Allen R. Kirkpatrick

IPC: H01J37/05 ,  H05H3/02 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/05 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H05H3/02 ,  H05H5/04 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: A device such as a medical device and a method for making same provides a surface modified by beam irradiation, such as a gas cluster ion beams or a neutral beam, to inhibit or delay attachment or activation or clotting of platelets.

公开(公告)号：US09991087B2

公开(公告)日：2018-06-05

申请号：US14860586

申请日：2015-09-21

Applicant: FEI Company

Inventor： Erwin Fernand de Jong ,  Sorin Lazar ,  Peter Christiaan Tiemeijer ,  Rudolf Geurink

IPC: H01J37/05 ,  H01J37/21 ,  H01J37/244 ,  H01J37/26 ,  H01J37/20 ,  H01J37/285

CPC classification number: H01J37/05 ,  H01J37/20 ,  H01J37/21 ,  H01J37/244 ,  H01J37/26 ,  H01J37/285 ,  H01J2237/0455 ,  H01J2237/057 ,  H01J2237/24485 ,  H01J2237/2802

Abstract: An imaging system for directing a flux of charged particles transmitted through a specimen onto a spectroscopic apparatus, wherein the flux is dispersed by a dispersing device into an energy-resolved array of spectral sub-beams propagating substantially parallel to a propagation axis. An adjustable aperture device defines an aperture in a path of the array so as to select a subset of the array to be admitted to a detector, which aperture is delimited in a dispersion direction perpendicular to the propagation axis to allow independent adjustment of both of: a width of the aperture parallel to the dispersion direction; and a position of a center of the aperture relative to the propagation axis.

公开(公告)号：US09984851B2

公开(公告)日：2018-05-29

申请号：US14463041

申请日：2014-08-19

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Hiroyuki Kariya

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/24 ,  G01R33/07

CPC classification number: H01J37/243 ,  G01R33/07 ,  G01R33/072 ,  H01J37/05 ,  H01J37/147 ,  H01J37/3171 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/152 ,  H01J2237/24514 ,  H01J2237/248 ,  H01J2237/3045

Abstract: An ion implanter includes an energy analyzer electromagnet provided between an ion source and a processing chamber. The energy analyzer electromagnet includes a Hall probe configured to generate a measurement output in response to a deflecting magnetic field and an NMR probe configured to generate an NMR output. A control unit of the ion implanter includes a magnetic field measurement unit configured to measure the deflecting magnetic field in accordance with a known correspondence between the deflecting magnetic field and the measurement output, a magnetic field determination unit configured to determine the deflecting magnetic field from the NMR output, and a Hall probe calibration unit configured to update the known correspondence by using the deflecting magnetic field determined from the NMR output and a new measurement output of the Hall probe corresponding to the determined deflecting magnetic field.

公开(公告)号：US09978579B2

公开(公告)日：2018-05-22

申请号：US15221340

申请日：2016-07-27

Applicant: SCIENTA OMICRON AB

Inventor： Björn Wannberg

IPC: H01J49/48 ,  H01J37/05 ,  H01J49/00 ,  H01J49/06 ,  G01N23/227

CPC classification number: H01J49/48 ,  G01N23/2273 ,  G01N2223/085 ,  H01J37/05 ,  H01J49/0031 ,  H01J49/06 ,  H01J49/061 ,  H01J49/484 ,  H01J2237/0535

Abstract: The present invention relates to a method for determining at least one parameter related to charged particles emitted from a particle emitting sample, e.g. a parameter related to the energies, the start directions, the start positions or the spin of the particles. The method comprises the steps of guiding a beam of charged particles into an entrance of a measurement region by means of a lens system, and detecting positions of the particles indicative of said at least one parameter within the measurement region. Furthermore, the method comprises the steps of deflecting the particle beam at least twice in the same coordinate direction before entrance of the particle beam into the measurement region. Thereby, both the position and the direction of the particle beam at the entrance of the measurement region can be controlled in a way that to some extent eliminates the need for physical manipulation of the sample. This in turn allows the sample to be efficiently cooled such that the energy resolution in energy measurements can be improved.

公开(公告)号：US09978556B2

公开(公告)日：2018-05-22

申请号：US14966227

申请日：2015-12-11

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： William Davis Lee ,  Frank Sinclair

IPC: H01J37/05 ,  H01J37/12 ,  H01J37/08 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/12 ,  H01J37/05 ,  H01J37/08 ,  H01J37/1477 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/04924 ,  H01J2237/121

Abstract: Provided herein are approaches for controlling a charged particle beam using a series of electrodes including a plurality of different shapes. In one approach, an electrostatic optical element includes a first set of electrodes having a first electrode shape for parallelizing and deflecting the charged particle beam using a first set of electrodes having a first electrode shape, such as a concave or convex profile. The electrostatic optical element further includes a second set of electrodes adjacent the first set of electrodes for accelerating or decelerating the charged particle beam along a beamline, wherein the second set of electrodes include a cylindrical shape. In one approach, a power supply is electrically connected to the first and second sets of electrodes, the power supply arranged to enable independent voltage/current control.

公开(公告)号：US09953801B1

公开(公告)日：2018-04-24

申请号：US15363728

申请日：2016-11-29

Applicant: Axcelis Technologies, Inc.

Inventor： Michael Paul Cristoforo ,  Justin White McCabe

IPC: H01J37/05 ,  H01J37/317 ,  H01J37/08

CPC classification number: H01J37/05 ,  H01J37/023 ,  H01J37/08 ,  H01J37/15 ,  H01J37/3171 ,  H01J2237/057 ,  H01J2237/24585 ,  H01J2237/31701

Abstract: A resolving aperture assembly for an ion implantation system has a first plate and a second plate, where the first plate and second plate generally define a resolving aperture therebetween. A position of the first plate with respect to the second plate generally defines a width of the resolving aperture. One or more actuators are operably coupled to one or more of the first plate and second plate and are configured to selectively vary the position the first plate and second plate with respect to one another, thus selectively varying the width of the resolving aperture. A servo motor precisely varies the resolving aperture width and a pneumatic cylinder independently selectively closes the resolving aperture. A downstream position actuator varies a position of the resolving aperture along a path of the ion beam, and a controller controls the one or more actuators based on desired properties of the ion beam.

公开(公告)号：US20180082829A1

公开(公告)日：2018-03-22

申请号：US15503342

申请日：2016-01-21

Applicant: JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE

Inventor： Takayuki MURO ,  Tomohiro MATSUSHITA

IPC: H01J49/48 ,  H01J49/02

CPC classification number: H01J49/488 ,  H01J37/05 ,  H01J37/244 ,  H01J49/022 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/24485

Abstract: A retarding potential type energy analyzer including a front grid electrode, reference grid electrode and rear grid electrode sequentially arranged, with a predetermined amount of potential difference given between the reference grid electrode and the front grid electrode to form an upward potential gradient as well as a potential difference given between the reference grid electrode and the rear grid electrode to form a downward potential gradient, the grid electrodes are arranged so that the distance between the reference grid electrode and the rear grid electrode is shorter than the distance between the reference grid electrode and the front grid electrode, or the potential difference between the reference grid electrode and the rear grid electrode is made to be greater than the potential difference between the reference grid electrode and the front grid electrode.

公开(公告)号：US20180076009A1

公开(公告)日：2018-03-15

申请号：US15813895

申请日：2017-11-15

Applicant: Peter F. Vandermeulen

Inventor： Peter F. Vandermeulen

IPC: H01J37/32 ,  H01Q21/00 ,  H01P3/127 ,  H01P3/12 ,  C23C16/513 ,  H01J37/05 ,  C23C16/511 ,  H01J37/08

CPC classification number: H01J37/32229 ,  C23C16/511 ,  C23C16/513 ,  H01J37/05 ,  H01J37/08 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/3244 ,  H01J37/32669 ,  H01J2237/057 ,  H01J2237/0817 ,  H01J2237/3323 ,  H01P3/12 ,  H01P3/127 ,  H01Q21/0043

Abstract: This application is directed to an apparatus for creating microwave radiation patterns for an object detection system. The apparatus includes a waveguide conduit having first slots at one side of the conduit and corresponding second slots at an opposite side of the conduit. The waveguide conduit is coupled to a microwave source for transmitting microwaves from the microwave source through the plurality of first slots. A plunger is moveably positioned in the waveguide conduit from one end thereof. The plunger allows the waveguide conduit to be tuned to generally optimize the power of the microwaves exiting the first slots. Secondary plungers are each fitted in one of the second slots to independently tune or detune microwave emittance through a corresponding first slot.

公开(公告)号：US09847212B2

公开(公告)日：2017-12-19

申请号：US14341450

申请日：2014-07-25

Applicant: Peter F. Vandermeulen

Inventor： Peter F. Vandermeulen

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01J37/32 ,  H01Q21/00 ,  C23C16/511 ,  C23C16/513 ,  H01J37/05 ,  H01J37/08 ,  H01P3/12 ,  H01P3/127

CPC classification number: H01J37/32229 ,  C23C16/511 ,  C23C16/513 ,  H01J37/05 ,  H01J37/08 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/3244 ,  H01J37/32669 ,  H01J2237/057 ,  H01J2237/0817 ,  H01J2237/3323 ,  H01P3/12 ,  H01P3/127 ,  H01Q21/0043

Abstract: This application is directed to an apparatus for creating microwave radiation patterns for an object detection system. The apparatus includes a waveguide conduit having first slots at one side of the conduit and corresponding second slots at an opposite side of the conduit. The waveguide conduit is coupled to a microwave source for transmitting microwaves from the microwave source through the plurality of first slots. A plunger is moveably positioned in the waveguide conduit from one end thereof. The plunger allows the waveguide conduit to be tuned to generally optimize the power of the microwaves exiting the first slots. Secondary plungers are each fitted in one of the second slots to independently tune or detune microwave emittance through a corresponding first slot.