Interconnect etch with polymer layer edge protection

    公开(公告)号:US10403589B2

    公开(公告)日:2019-09-03

    申请号:US15639812

    申请日:2017-06-30

    申请人: Roden R. Topacio

    发明人: Roden R. Topacio

    摘要: Various semiconductor workpiece polymer layers and methods of fabricating the same are disclosed. In one aspect, a method of manufacturing is provided that includes applying a polymer layer to a passivation structure of a semiconductor workpiece where the semiconductor workpiece has first and second semiconductor chips separated by a dicing street. A first opening is patterned in the polymer layer with opposing edges pulled back from the dicing street. A mask is applied over the first opening. A first portion of the passivation structure is etched while using the polymer layer as an etch mask.