公开(公告)号：US09773639B2

公开(公告)日：2017-09-26

申请号：US15196149

申请日：2016-06-29

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki

IPC: H01J37/26 ,  H01J37/18 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/18 ,  H01J37/10 ,  H01J37/16 ,  H01J37/244 ,  H01J37/26 ,  H01J2237/002 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/18 ,  H01J2237/186

Abstract: There is provided an electron microscope capable of easily achieving power saving. The electron microscope (100) includes a controller (60) for switching the mode of operation of the microscope from a first mode where electron lenses (12, 14, 18, 20) are activated to a second mode where the electron lenses (12, 14, 18, 20) are not activated. During this operation for making a switch from the first mode to the second mode, the controller (60) performs the steps of: closing a first vacuum gate valve (50), opening a second vacuum gate valve (52), and vacuum pumping the interior of the electron optical column (2) of the microscope by the second vacuum pumping unit (40); then controlling a heating section (26) to heat an adsorptive member (242); then opening the first vacuum gate valve (50), closing the second vacuum gate valve (52), and vacuum pumping the interior of the electron optical column (2) by the first vacuum pumping unit (30); and turning off the electron lenses (12, 14, 18, 20).

公开(公告)号：US09761409B2

公开(公告)日：2017-09-12

申请号：US14761963

申请日：2014-01-10

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsunenori Nomaguchi ,  Toshihide Agemura

IPC: G01N23/00 ,  H01J37/28 ,  H01J37/22 ,  H01J37/244 ,  H01J37/24 ,  G01T1/20 ,  H01J37/10 ,  H01J37/147 ,  H01J37/30

CPC classification number: H01J37/28 ,  G01T1/20 ,  H01J37/10 ,  H01J37/147 ,  H01J37/22 ,  H01J37/24 ,  H01J37/244 ,  H01J37/30 ,  H01J37/3178

Abstract: The present invention relates to modulating an irradiation condition of a charged particle beam at high speed and detecting a signal in synchronization with a modulation period for the purpose of extracting a signal arising from a certain charged particle beam when a sample is irradiated with a plurality of charged particle beams simultaneously or, for example, for the purpose of separating a secondary electron signal arising from ion beam irradiation and a secondary electron signal arising from electron beam irradiation in an FIB-SEM system. The present invention further relates to dispersing light emitted from two or more kinds of scintillators having different light emitting properties, detecting each signal strength, and processing a signal on the basis of a ratio of first signal strength when the sample is irradiated with a first charged particle beam alone to second signal strength when the sample is irradiated with a second charged particle beam alone, the ratio being set by a mechanism. The present invention enables extraction of only a signal arising from a desired charged particle beam even when the sample is irradiated with the plurality of charged particle beams simultaneously. The SEM observation can be performed in the middle of the FIB processing using the secondary electron in the FIB-SEM system, for example.

公开(公告)号：US20170236680A1

公开(公告)日：2017-08-17

申请号：US15341309

申请日：2016-11-02

Applicant: JEOL Ltd.

Inventor： Shuji Kawai

IPC: H01J37/02 ,  H01J37/10 ,  H01J37/20

CPC classification number: H01J37/023 ,  G01N23/20091 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/2445

Abstract: There is provided a charged particle beam system in which a detector can be placed in an appropriate analysis position. The charged particle beam system (100) includes: a charged particle source (11) for producing charged particles; a sample holder (20) for holding a sample (S); a detector (40) for detecting, in the analysis position, a signal produced from the sample (S) by impingement of the charged particles on the sample (S); a drive mechanism (42) for moving the detector (40) into the analysis position; and a controller (52) for controlling the drive mechanism (42). The controller (52) performs the steps of: obtaining information about the type of the sample holder (20); determining the analysis position on the basis of the obtained information about the type of the sample holder (20); and controlling the drive mechanism (42) to move the detector (40) into the determined analysis position.

公开(公告)号：US20170069456A1

公开(公告)日：2017-03-09

申请号：US15256967

申请日：2016-09-06

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J37/08 ,  H01J37/10

CPC classification number: H01J37/08 ,  H01J37/10 ,  H01J37/12 ,  H01J37/18 ,  H01J2237/0805 ,  H01J2237/083 ,  H01J2237/103

Abstract: A focused ion beam apparatus includes an ion source that emits an ion beam, an extraction electrode that extracts ions from a tip end of an emitter of the ion source, and a first lens electrode that configures a condenser lens by a potential difference with the extraction electrode, the condenser lens focusing the ions extracted by the extraction electrode, in which a strong lens action is generated between the extraction electrode and the first lens electrode so as to focus all ions extracted from the ion source to pass through a hole of the condenser lens including the first lens electrode.

Abstract translation: 聚焦离子束装置包括发射离子束的离子源，从离子源的发射极的前端提取离子的提取电极和通过提取电位差构成聚光透镜的第一透镜电极 电极，所述聚光透镜聚焦由所述提取电极提取的离子，其中在所述提取电极和所述第一透镜电极之间产生强透镜作用，以便将从所述离子源提取的所有离子聚焦通过所述冷凝器的孔 透镜包括第一透镜电极。

公开(公告)号：US20170025241A1

公开(公告)日：2017-01-26

申请号：US15213781

申请日：2016-07-19

Applicant: Hermes Microvision, Inc.

Inventor： Shuai Li ,  Weiming Ren ,  Xuedong Liu ,  Juying Dou ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/14 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

Abstract translation: 提出了一种用于以高分辨率和高吞吐量和灵活变化的观察条件观察样品的多光束装置。 该装置使用可移动准直透镜来灵活地改变多个探针点的电流而不影响其间隔，新的源转换单元形成单个电子源的多个图像并补偿多个探针点的离轴像差 以及用于减小由于一次电子束引起的强烈的库仑效应的前束形成装置。

公开(公告)号：US09520266B2

公开(公告)日：2016-12-13

申请号：US14455878

申请日：2014-08-09

Applicant: Hitachi High-Technologies Corporation

Inventor： Kaori Shirahata ,  Yasunari Sohda ,  Makoto Sakakibara ,  Daisuke Bizen ,  Hajime Kawano ,  Hideyuki Kazumi

IPC: H01J37/244 ,  H01J37/22 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/244 ,  G01B2210/56 ,  H01J37/10 ,  H01J37/147 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: Pattern critical dimension measurement equipment includes an electron source configured to generate a primary electron beam, a deflector configured to deflect the primary electron beam emitted from the electron source, a focusing lens configured to focus the primary electron beam deflected by the deflector, a decelerator configured to decelerate the primary electron beam that irradiates the sample, a first detector located between the electron source and the focusing lens, the first detector being configured to detect electrons at part of azimuths of electrons generated from the sample upon irradiation of the sample with the primary electron beam, and a second detector located between the electron source and the first detector, the second detector being configured to detect electrons at substantially all azimuths of the electrons generated from the sample.

Abstract translation: 图案关键尺寸测量设备包括被配置为产生一次电子束的电子源，被配置为使从电子源发射的一次电子束偏转的偏转器，配置成聚焦由偏转器偏转的一次电子束的聚焦透镜， 使照射样品的一次电子束减速，位于电子源和聚焦透镜之间的第一检测器，第一检测器被配置为在样品照射样品时与主要样品一起检测从样品产生的电子方位角的一部分处的电子 电子束和位于电子源和第一检测器之间的第二检测器，第二检测器被配置为在从样品产生的电子的基本上所有的方位角处检测电子。

公开(公告)号：US09478389B2

公开(公告)日：2016-10-25

申请号：US14422374

申请日：2013-07-01

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsunenori Nomaguchi ,  Toshihide Agemura

IPC: H01J37/10 ,  H01J37/28 ,  H01J37/147 ,  H01J37/22 ,  H01J37/305 ,  H01J37/317 ,  H01J37/26 ,  H01J37/141 ,  H01J37/16 ,  H01J37/30

CPC classification number: H01J37/10 ,  H01J37/1413 ,  H01J37/1471 ,  H01J37/16 ,  H01J37/222 ,  H01J37/261 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/305 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0245 ,  H01J2237/032 ,  H01J2237/12 ,  H01J2237/31745

Abstract: The present invention provides a composite charged particle beam device which is provided with two or more charged particle beam columns and enables high-resolution observation while a sample is placed at the position of a cross point. The present invention has the following configuration. A composite charged particle beam device is provided with a plurality of charged particle beam columns (101a, 102a), and is characterized in that a sample (103) is disposed at the position of an intersection point (171) where the optical axes of the plurality of columns intersect, a component (408a, 408b) that forms the tip of an objective lens of the charged particle beam column (102a) is detachable, and by replacing the component (408a, 408b), the distance between the intersection point (171) and the tip of the charge particle beam column can be changed.

Abstract translation: 本发明提供了一种复合带电粒子束装置，其具有两个或更多个带电粒子束柱，并且当将样品放置在交叉点的位置时能够进行高分辨率观察。 本发明具有以下结构。 复合带电粒子束装置设置有多个带电粒子束柱（101a，102a），其特征在于，样品（103）设置在交叉点（171）的位置， 多个列相交，形成带电粒子束列（102a）的物镜的尖端的部件（408a，408b）是可拆卸的，并且通过更换部件（408a，408b），交点 171），并且可以改变电荷粒子束柱的尖端。

公开(公告)号：US20160196952A1

公开(公告)日：2016-07-07

申请号：US14916529

申请日：2014-05-16

Applicant: HIitachi High-Technologies Corporation

Inventor： Hiroaki MATSUMOTO ,  Takeshi SATO ,  Yoshifumi TANIGUCHI ,  Ken HARADA

IPC: H01J37/10 ,  H01J37/147 ,  H01J37/05 ,  H01J37/285

CPC classification number: H01J37/10 ,  G01N23/20058 ,  G01N2223/418 ,  H01J37/04 ,  H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/24 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J37/285 ,  H01J37/295 ,  H01J2237/21 ,  H01J2237/2614

Abstract: The present invention relates to a lens-less Foucault method wherein a transmission electron microscope objective lens (5) is turned off, an electron beam crossover (11, 13) is matched with a selected area aperture (65), and the focal distance of a first imaging lens (61) can be changed to enable switching between a sample image observation mode and a sample diffraction pattern observation mode, characterized in that a deflector (81) is disposed in a stage following the first imaging lens (61), and conditions for an irradiating optical system (4) can be fixed after conditions for the imaging optical system have been determined. This allows a lens-less Foucault method to be implemented in a common general-use transmission electron microscope with no magnetic shielding lens equipped, without burdening the operator.

Abstract translation: 本发明涉及一种无透镜Foucault方法，其中透射电子显微镜物镜（5）被关闭，电子束交叉（11,13）与所选区域孔径（65）匹配，并且焦距 可以改变第一成像透镜（61）以在样本图像观察模式和样本衍射图案观察模式之间切换，其特征在于，偏转器（81）设置在跟随第一成像透镜（61）的阶段中，以及 可以在确定成像光学系统的条件之后固定照射光学系统（4）的条件。 这样就可以在没有磁屏蔽透镜的公共通用透射电子显微镜中实现无镜头福柯方法，而不会对操作者造成负担。

公开(公告)号：US20160126058A1

公开(公告)日：2016-05-05

申请号：US14891494

申请日：2014-03-12

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yusuke OMINAMI ,  Taku SAKAZUME ,  Sukehiro ITO

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/20 ,  H01J37/10

CPC classification number: H01J37/22 ,  G01N23/046 ,  G01N2223/3307 ,  G01N2223/418 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/047 ,  H01J2237/10 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/2611 ,  H01J2237/2802

Abstract: An electron microscope has a large depth of focus in comparison with an optical microscope. Thus, information is superimposed on one image in the direction of depth. Therefore, it is necessary to accurately specify the three-dimensional position and density of a structure in a specimen so as to observe the three-dimensional structure of the interior of the specimen by using the electron microscope. Furthermore, a specimen that is observed with the optical microscope on a slide glass is not put into a TEM device of the related art. Thus, performing three-dimensional internal structure observation with the electron microscope on a location that is observed with the optical microscope requires very cumbersome preparation of the specimen. By controlling a vector parameter that defines the interrelationship between a primary charged particle beam and the specimen and by irradiation with the primary charged particle beam with a plurality of different vector parameters, images of transmitted charged particles of the specimen that correspond to each of the vector parameters are obtained. Irradiation with the primary charged particle beam is performed on the specimen that is arranged either directly or through a predetermined member on a detector which detects charged particles transmitted through or scattered by the interior of the specimen.

Abstract translation: 与光学显微镜相比，电子显微镜具有较大的聚焦深度。 因此，信息在深度方向上叠加在一个图像上。 因此，必须准确地确定试样中的结构的三维位置和密度，以便通过电子显微镜观察试样内部的三维结构。 此外，用幻灯片玻璃上的光学显微镜观察的样品没有放入现有技术的TEM器件中。 因此，在用光学显微镜观察的位置上用电子显微镜进行三维内部结构观察需要非常繁琐的样品制备。 通过控制限定初级带电粒子束和样本之间的相互关系的矢量参数以及通过用多个不同矢量参数照射初级带电粒子束的样本的透射带电粒子对应于每个矢量的图像 获得参数。 对于直接或通过检测器上的预定部件布置的试样进行照射，该检测器检测通过样本内部传播或散射的带电粒子。

公开(公告)号：US20160111251A1

公开(公告)日：2016-04-21

申请号：US14975314

申请日：2015-12-18

Applicant: CARL ZEISS MICROSCOPY GMBH ,  APPLIED MATERIALS ISRAEL LTD.

Inventor： Rainer KNIPPELMEYER ,  Oliver KIENZLE ,  Thomas KEMEN ,  Heiko MUELLER ,  Stephan UHLEMANN ,  Maximilian HAIDER ,  Antonio CASARES ,  Steven ROGERS

IPC: H01J37/30 ,  H01J37/317 ,  H01J37/10

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。