Method of removing contaminants
    32.
    发明授权
    Method of removing contaminants 失效
    去除污染物的方法

    公开(公告)号:US5300187A

    公开(公告)日:1994-04-05

    申请号:US940108

    申请日:1992-09-03

    CPC classification number: H01L21/02046 Y10S438/906

    Abstract: Contaminants are removed from a semiconductor material by heating the semiconductor material to temperature within the range of a minimum temperature where a halogen compound will decompose to halogen atoms without the use of ultraviolet irradiation and react with contaminants present on the semiconductor material and a maximum temperature of 800.degree. C., wherein less than or equal to approximately 50 Angstroms of oxide is formed on the semiconductor material. The ambient in which the semiconductor material is heated is an ambient comprised of a nonreactive gas and a halogen compound for at least a time sufficient to remove a substantial amount of contaminants from the semiconductor material.

    Abstract translation: 通过将半导体材料加热到卤素化合物将分解成卤素原子的最低温度的范围内的温度而不使用紫外线照射并与存在于半导体材料上的污染物反应并且与半导体材料的最高温度 800℃,其中在半导体材料上形成小于或等于约50埃的氧化物。 其中半导体材料被加热的环境是由非反应性气体和卤素化合物组成的环境,其至少足以从半导体材料中除去大量污染物的时间。

    Method for fabricating semiconductor device including package
    34.
    发明授权
    Method for fabricating semiconductor device including package 失效
    制造包括封装的半导体器件的方法

    公开(公告)号:US5049526A

    公开(公告)日:1991-09-17

    申请号:US362644

    申请日:1989-06-07

    Abstract: A method for fabricating and especially for encapsulating a semiconductor device in a plastic package is disclosed. In accordance with one embodiment of the invention the method includes steps of providing an encapsulation mold having a first chamber and a second chamber, with the second chamber spaced outwardly from and substantially surrounding the first chamber. The first chamber is shaped to receive a removable insert. An insert is selected for the particular body type and style which is desired and that insert is secured in the first chamber. The insert has a cavity which is shaped to define the desired encapsulated device package body. A lead frame is provided including a bonding area and a plurality of leads, each lead having a inner portion near the bonding area and an outer portion extending outwardly from the bonding area. A semiconductor device die is secured to the lead frame and the lead frame with the die attached is aligned within the encapsulation mold to place the semiconductor device die and the inner ends of the leads within the cavity defined by the inserts. The outer ends of the leads extend through the second chamber. Plastic material is then injected into the mold to form the device package body about the semiconductor device die. The package body is shaped by the cavity and the inserts and the carrier ring is shaped by the second chamber.

    Method of programming ROM by offset masking of selected gates
    35.
    发明授权
    Method of programming ROM by offset masking of selected gates 失效
    通过偏移屏蔽所选择的门来编程ROM的方法

    公开(公告)号:US4380866A

    公开(公告)日:1983-04-26

    申请号:US260493

    申请日:1981-05-04

    CPC classification number: H01L27/11266 H01L27/112 H01L29/0847

    Abstract: A process is disclosed for fabricating a MOS ROM which allows programming of the ROM late in the process sequence. A conventional silicon gate process is used to fabricate the devices up through the step of patterning the polycrystalline silicon gate electrode. Selected devices in the array are then programmed to an off-state by fabricatng those devices with either the source or drain region offset from the gate electrode. This is accomplished by a programming mask which, together with the gate electrode, provides selective location of the source or drain regions. Devices having an offset source or drain are off-state devices, while those having a normal source and drain function conventionally and conduct when a read voltage is applied.

    Abstract translation: 公开了一种用于制造MOS ROM的过程,其允许在处理顺序中较晚编程ROM。 常规的硅栅极工艺用于通过图案化多晶硅栅电极的步骤向上制造器件。 阵列中的选定器件然后通过将源极或漏极区域偏离栅极电极的器件编程为关断状态。 这通过编程掩模来实现,编程掩模与栅极电极一起提供源极或漏极区域的选择性位置。 具有偏移源或漏极的器件是截止状态器件,而具有常规源极和漏极功能的器件通常是在施加读取电压时导通的。

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